Patent application number | Description | Published |
20080204902 | ZOOM LENS SYSTEM AND OPTICAL APPARATUS INCLUDING THE SAME - A zoom lens system includes a first lens unit having a negative refractive power, at least one lens unit having a positive refractive power, and an optical element composed of a material having an Abbe number and a partial dispersion that satisfy a predetermined condition. The first lens unit, an aperture stop, and the at least one lens unit are arranged in this order from the object side to the image side. The zoom lens system performs zooming while changing the distance between the lens units. The focal length f | 08-28-2008 |
20080273249 | ZOOM LENS AND IMAGE PICKUP APPARATUS INCLUDING THE SAME - A compact zoom lens includes a first lens unit disposed closest to an object side, an aperture, and a rear lens group. The first lens unit includes a first diffraction optical part having positive refractive power, and the rear lens group includes a second diffraction optical part having positive refractive power. The power relation between the two diffraction optical parts and the positions of the diffraction optical parts are set appropriately. The zoom lens can have a high zoom ratio wherein chromatic aberration is fully corrected, and an image pickup apparatus employing this zoom lens can be provided. | 11-06-2008 |
20090040604 | ZOOM LENS DEVICE AND IMAGE PICKUP APPARATUS INCLUDING THE SAME - A zoom lens device includes, from an object side to an image side, a first lens unit having a positive refractive power, a second lens unit having a negative refractive power, a third lens unit having a positive refractive power, and a fourth lens unit having a positive refractive power. The zoom lens device is formed so that a distance Ximg between a position of the first lens unit at the wide-angle end and a position of the first lens unit that is maximally moved towards the image side, a distance Xobj between the position of the first lens unit at the wide-angle end and a position of the first lens unit that is maximally moved towards the object side, and a focal length fw of the zoom lens device at the wide-angle end are suitable values. | 02-12-2009 |
20090040625 | ZOOM LENS SYSTEM AND IMAGE PICKUP APPARATUS INCLUDING THE SAME - A zoom lens system includes, in order from an object side to an image side, first, second, third, and fourth lens units having positive, negative, positive, and positive optical powers, respectively. The first lens unit includes one negative lens element and two positive lens elements, and moves during zooming. The zoom lens system satisfies the following condition: | 02-12-2009 |
20100271496 | IMAGE PICKUP APPARATUS AND IMAGE CONVERSION METHOD - To reduce degradation of image quality occurring upon correction of an image shake, provided is an image pickup apparatus including: an image pickup optical system; an image pickup element for photoelectrically converting an image formed by the image pickup optical system; a processing unit for processing a taken image; a detection unit for detecting a shake of the image pickup apparatus; and an image stabilizing unit for decentering an image stabilizing lens unit formed as a part of the image pickup optical system based on a detection result from the detection unit. The processing unit performs the process by using an image restore filter corresponding to a position of the image stabilizing lens unit at a time of image taking. | 10-28-2010 |
Patent application number | Description | Published |
20140004715 | SILICON OXIDE FILM FORMING METHOD AND APPARATUS | 01-02-2014 |
20140011368 | METHOD AND APPARATUS OF FORMING CARBON FILM - According to an embodiment of present disclosure, a method of forming a carbon film on a substrate to be processed is provided. The method includes loading a substrate to be processed with a carbon film formed thereon into a processing chamber of a film forming apparatus (Process | 01-09-2014 |
20140080315 | METHOD OF FORMING LAMINATED FILM AND FORMING APPARATUS THEREOF - A method of forming a laminated film includes forming a silicon oxide film on a plurality of target objects loaded in a reaction chamber, and forming a silicon oxynitride film on the plurality of target objects by supplying a silicon source, an oxidizing agent and a nitride agent to the reaction chamber, wherein forming the silicon oxide film and forming the silicon oxynitride film are repeatedly performed for a predetermined number of times on the plurality of target objects to form a laminated film including the silicon oxynitride film and the silicon oxide film. | 03-20-2014 |
20140187024 | METHOD OF FORMING SEED LAYER, METHOD OF FORMING SILICON FILM, AND FILM FORMING APPARATUS - Provided is a method of forming a seed layer as a seed of a thin film on an underlayer, which includes: forming a first seed layer on a surface of the underlayer by heating the underlayer, followed by supplying an aminosilane-based gas onto the surface of the heated underlayer; and forming a second seed layer on the surface of the underlayer with the first seed layer formed thereon by heating the underlayer, followed by supplying a disilane or higher order silane-based gas onto the surface of the heated underlayer. | 07-03-2014 |
20140187025 | METHOD OF FORMING SILICON FILM AND FILM FORMING APPARATUS - Provided is a method of forming a film including a silicon film on a base, including: forming a seed layer on a surface of the base by heating the base and supplying an aminosilane-based gas onto the surface of the heated base; and forming the silicon film on the seed layer by heating the base and supplying a silane-based gas containing no amino group onto the seed layer of the surface of the heated base, wherein a molecule of the aminosilane-based gas used in forming a seed layer comprises two or more silicon atoms. | 07-03-2014 |
20140251209 | SUPPORT MEMBER AND SEMICONDUCTOR MANUFACTURING APPARATUS - A support member includes: a mounting unit having a first main surface and a second main surface, the first main surface being configured to mount a first object to be processed thereon and the second main surface being configured to mount a second object to be processed thereon; and a wall installed in a part of the outer peripheral portion along the outer periphery of the mounting unit, the wall having a first portion protruding in a vertical direction than the first object to be processed mounted on the first main surface of the mounting unit. The inner peripheral surface of the first portion of the wall is formed in a first shape that allows the first object to be processed to be held by the first portion of the wall. | 09-11-2014 |
20140284808 | STACKED SEMICONDUCTOR DEVICE, AND METHOD AND APPARATUS OF MANUFACTURING THE SAME - Provided is a method of manufacturing a stacked semiconductor device, which includes forming a stacked film on a semiconductor substrate, the stacked film including a plurality of silicon oxide films and a plurality of silicon nitride films, which are alternately arranged on top of each other, and the stacked film being obtained by repeatedly performing a series of operations of forming the silicon oxide film on the semiconductor substrate using one of triethoxysilane, octamethylcyclotetrasiloxane, hexamethyldisilazane and diethylsilane gases, and forming the silicon nitride film on the formed silicon oxide film; etching the silicon nitride films in the stacked film; removing carbons contained in the silicon oxide films, which are not removed in the etching, to reduce a concentration of the carbons; and forming electrodes in regions where the silicon nitride films are etched in the etching. | 09-25-2014 |
20140295675 | SILICON OXIDE FILM FORMING METHOD AND SILICON OXIDE FILM FORMING APPARATUS - A silicon oxide film forming method includes performing a set one or more times, the set including: a standby process in which a workpiece is accommodated into and recovered from a boat; a load process in which the workpiece accommodated in the boat is loaded into a reaction chamber; a silicon oxide film formation process in which a silicon oxide film is formed on the workpiece accommodated within the reaction chamber; and an unload process in which the workpiece having the silicon oxide film is unloaded from the reaction chamber. In at least one of the unload process, the standby process and the load process, a gas containing water vapor is supplied into the reaction chamber while an interior of the reaction chamber is heated. | 10-02-2014 |
Patent application number | Description | Published |
20090280334 | GAS-BARRIER MATERIAL, METHOD OF PRODUCING THE SAME AND GAS-BARRIER PACKING MATERIAL - A gas-barrier material comprising a polycarboxylic acid polymer (A) and a compound (B) having two ring structures (b) each of which forming an ether bond to carbon that forms a double bond with nitrogen and containing oxygen in the ether bond, wherein a crosslinked structure is formed by the reaction of a carboxyl group in the polycarboxylic acid polymer (A) with one of the ring structures (b) of the compound (B). The gas-barrier material features excellent gas-barrier property, retort resistance and flexibility, can be cured at a low temperature within short periods of time, and can be excellently produced. | 11-12-2009 |
20100015449 | COMPOSITION FOR FORMING GAS-BARRIER MATERIAL, GAS-BARRIER MATERIAL, A METHOD OF PRODUCING THE SAME, AND GAS-BARRIER PACKING MATERIAL - A composition for forming a gas-barrier material, comprising a polycarboxylic acid-type polymer (A) and at least a bifunctional alicyclic epoxy compound (B). The composition for forming a gas-barrier material features excellent gas-barrier property, retort resistance and flexibility, can be cured at a low temperature in a short period of time without affecting the plastic base material, and contributes to improving the productivity. | 01-21-2010 |
20110091743 | METHOD OF PRODUCING GAS-BARRIER LAMINATED MEMBER - A method of producing a gas-barrier laminated member having a gas-barrier layer formed by crosslinking the carboxyl groups of a polycarboxylic acid polymer with multivalent metal ions. The method comprises forming a layer (A) containing an alkaline compound of a multivalent metal on at least one surface of a plastic base material, applying a solution (b) obtained by dissolving a polycarboxylic acid polymer in a solvent containing at least water onto the layer (A) that contains the alkaline compound of the multivalent metal, and removing the solvent by a heat treatment so that a metal-ionically crosslinked structure is formed with the multivalent metal ions among the carboxyl groups in the solution (b). The gas-barrier laminated member has excellent adhesion to the base material, gas-barrier property, retort resistance and flexibility, and is efficiently produced by only being heated at a low temperature for a short period of time through a decreased number of simplified steps. | 04-21-2011 |
20110200836 | GAS-BARRIER MATERIAL HAVING EXCELLENT ANTI-BLOCKING PROPERTY AND METHOD OF PRODUCING THE SAME - A gas-barrier material having a gas-barrier layer which comprises a polycarboxylic acid polymer, the gas-barrier layer having a chemical bond stemming from an isocyanate group formed in the surface thereof, and the content of nitrogen being at least not less than 1 atom % per the total amount of carbon, oxygen and nitrogen in the surface layer. The gas-barrier material comprising a polycarboxylic acid polymer which is a high hydrogen-bonding polymer exhibits excellent anti-blocking property without dependent upon the degree of crosslinking. | 08-18-2011 |
20120219806 | GAS BARRIER LAMINATE AND A METHOD OF PRODUCING THE SAME - To provide a gas barrier laminate having a gas barrier layer obtained by crosslinking the carboxyl groups of a polycarboxylic acid-type polymer with polyvalent metal ions maintaining good productivity, the crosslinking being accelerated with polyvalent metal ions to exhibit more excellent gas barrier property. A gas barrier laminate comprising a layer (A) of a non-aqueous resin containing a metal element in the polymer skeleton thereof, and a layer (B) of a polycarboxylic acid-type polymer in which an ionic crosslinking is formed with a polyvalent metal among the carboxyl groups. | 08-30-2012 |
20120238696 | COATING COMPOSITION FOR UNDERCOATING - To provide a coating composition for undercoating which, in forming a gas-barrier layer having a crosslinked structure between a polycarboxylic acid type polymer and polyvalent metal ions by the heating at a low temperature for a short period of time, permits polyvalent metal ions to be easily and quickly fed into the polycarboxylic acid type polymer and, besides, into the whole gas-barrier layer. A coating composition containing, as chief components, a nonaqueous polyester polyol, an isocyanate compound, and an alkaline compound of a polyvalent metal that serves as an ion source for forming the crosslinked structure, wherein the nonaqueous polyester polyol contains a nonaqueous polyester polyol which contains a metal element in the resin skeleton thereof as an essential component, and the alkaline compound of the polyvalent metal has an average primary particle size in a range of 0.005 to 0.5 μm. | 09-20-2012 |
20130273374 | GAS BARRIER LAMINATE AND METHOD OF PRODUCING THE SAME - A gas barrier laminate having an undercoating (A) which comprises a main resin, an isocyanate type curing agent and an alkaline compound of a polyvalent metal; and a barrier layer (B) of a polycarboxylic acid polymer forming an ionic crosslinking due to the polyvalent metal among the carboxyl groups; formed on at least one surface of a plastic base material (P), wherein a region (b) free of the alkaline compound of the polyvalent metal is formed in the undercoating (A) on the side of the barrier layer (B), the content of nitrogen in the region (b) being larger than the content of nitrogen in the undercoating (A) other than the region (b), the gas barrier laminate having excellent gas barrier property, retort resistance, producibility as well as excellent flexibility without developing interlayer peeling even if it is folded and featuring excellent interlayer adhesion. | 10-17-2013 |
20150079405 | GAS BARRIER MATERIAL AND GAS BARRIER LAMINATE - A gas barrier material comprising a polycarboxylic acid polymer, and containing 0.10 to 1.4% by weight of a monovalent metal element, at least not less than 5.0% by weight of a polyvalent metal element, and 0.01 to 3.0% by weight of a nitrogen element per the total weight of nitrogen and carbon. The gas barrier material exhibits excellent gas barrier property, excellent waterproof property after the bend working and excellent appearance on the surface of the coating. | 03-19-2015 |
20150368498 | GAS BARRIER LAMINATE HAVING EXCELLENT WATER BARRIER PROPERTY - A gas barrier laminate | 12-24-2015 |