Noriyuki Kobayashi
Noriyuki Kobayashi, Nirasaki-Shi JP
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20090111275 | PLASMA ETCHING METHOD AND STORAGE MEDIUM - A plasma etching method that can prevent residues from becoming attached to bottoms and sides of via holes and trenches. An interlayer insulation film formed of C | 04-30-2009 |
20090137127 | PLASMA ETCHING METHOD AND STORAGE MEDIUM - A plasma etching method that can increase the selection ratio of a stop layer to an interlayer insulation film. The plasma etching method is carried out on a substrate that has the interlayer insulation film formed of CwFx (x and w are predetermined natural numbers) and a stop layer that stops etching and is exposed at the bottom of a hole or a trench formed in the interlayer insulation film. The interlayer insulation film and the stop layer are exposed at the same time to plasma generated from CyFz (y and z are predetermined natural numbers) gas and hydrogen-containing gas. | 05-28-2009 |
20100126668 | PLASMA PROCESSING APPARATUS AND METHOD - An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching. | 05-27-2010 |
20110214815 | PLASMA PROCESSING APPARATUS AND METHOD - An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency, and a second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber to generate plasma of the process gas so as to perform plasma etching. | 09-08-2011 |
20110272097 | PLASMA PROCESSING APPARATUS AND METHOD - A plasma etching apparatus includes an upper electrode and a lower electrode, between which plasma of a process gas is generated to perform plasma etching on a wafer W. The apparatus further comprises a cooling ring disposed around the wafer, a correction ring disposed around the cooling ring, and a variable DC power supply directly connected to the correction ring, the DC voltage being preset to provide the correction ring with a negative bias, relative to ground potential, for attracting ions in the plasma and to increase temperature of the correction ring to compensate for a decrease in temperature of a space near the edge of the target substrate due to the cooling ring. | 11-10-2011 |
20120145324 | PLASMA PROCESSING APPARATUS AND METHOD - An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching. | 06-14-2012 |
20120309203 | PLASMA ETCHING METHOD AND STORAGE MEDIUM - A plasma etching method that can increase the selection ratio of a stop layer to an interlayer insulation film. The plasma etching method is carried out on a substrate that has the interlayer insulation film formed of CwFx (x and w are predetermined natural numbers) and a stop layer that stops etching and is exposed at the bottom of a hole or a trench formed in the interlayer insulation film. The interlayer insulation film and the stop layer are exposed at the same time to plasma generated from CyFz (y and z are predetermined natural numbers) gas and hydrogen-containing gas. | 12-06-2012 |
20140124139 | PLASMA PROCESSING APPARATUS AND METHOD - A plasma processing apparatus includes a first and second electrodes disposed on upper and lower sides and opposite each other within a process container, a first RF power application unit and a DC power supply both connected to the first electrode, and second and third radio frequency power application units both connected to the second electrode. A conductive member is disposed within the process container and grounded to release through plasma a current caused by a DC voltage applied from the DC power supply. The conductive member is supported by a first shield part around the second electrode and laterally protruding therefrom at a position between the mount face of the second electrode and an exhaust plate for the conductive member to be exposed to the plasma. The conductive member is grounded through a conductive internal body of the first shield part. | 05-08-2014 |
20140326409 | PLASMA PROCESSING APPARATUS AND METHOD - An apparatus includes an upper electrode and a lower electrode for supporting a wafer disposed opposite each other within a process chamber. A first RF power supply configured to apply a first RF power having a relatively higher frequency is connected to the upper electrode. A second RF power supply configured to apply a second RF power having a relatively lower frequency is connected to the lower electrode. A variable DC power supply is connected to the upper electrode. A process gas is supplied into the process chamber while any one of application voltage, application current, and application power from the variable DC power supply to the upper electrode is controlled, to generate plasma of the process gas so as to perform plasma etching. | 11-06-2014 |
Noriyuki Kobayashi, Ichinomiya-City JP
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20090277163 | EXHAUST GAS PURIFICATION DEVICE - An exhaust gas purification device includes an exhaust pipe defining an exhaust passage, a first SO | 11-12-2009 |
Noriyuki Kobayashi, Kawasaki JP
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20090006381 | INFORMATION SEARCH DEVICE, INFORMATION SEARCH METHOD, AND INFORMATION SEARCH PROGRAM - A systematic problem search unit searches information about a systematic problem that is a common problem to a plurality of projects, using a conditional expression for searching the information about the systematic problem based on one of or a plurality of a count by which the information about the systematic problem is stored in the retrospect storage unit, a count by which a trial improvement plan linked to the systematic problem is stored in the retrospect storage unit, and information indicating whether the stored improvement plan is stored in the retrospect storage unit, as a conditional expression indicating a condition for extracting the information about the systematic problem. a systematic problem output unit outputs a search result in the systematic problem search procedure to each of or one of a predetermined storage unit and a predetermined output unit. | 01-01-2009 |
20090175615 | LOCATION DETERMINATION METHOD - A storage medium having recorded therein a location determination program for causing a computer to execute the following steps: storing detection information including information on a detected object and the date and time on which the object was detected, and location information for that owner; determining a last detection date and time which represents the date and time on which the specified object was last detected based on the detection information; identifying an object that is owned by someone other than the owner of the object from among objects that were detected on the same date and time as the last detection date and time based on the last detection date and time as well as the detection information; and determining the location of the object based on the owner of the object. | 07-09-2009 |
Noriyuki Kobayashi, Susono-Shi JP
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20090029234 | Method of manufacturing membrane electrode assembly, and membrane electrode assembly - A method of manufacturing a membrane electrode assembly for a fuel cell includes: producing a gas diffusion layer powder that is used to form a gas diffusion layer; forming a catalyst layer on an electrolyte membrane; and forming the gas diffusion layer on the catalyst layer by depositing the gas diffusion layer powder on the catalyst layer. | 01-29-2009 |
20120038373 | APPARATUS FOR ESTIMATING FUEL-CELL HYDROGEN CONCENTRATION AND FUEL CELL SYSTEM - A fuel cell system includes a fuel cell, an impedance measuring instrument, and a control device. The control device is connected to the impedance measuring instrument. The impedance measuring instrument measures the impedance of the fuel cell according to the AC impedance method. The control device stores in advance a reference value corresponding to a reference hydrogen concentration. The control device compares the real part Z′ of impedance acquired via the impedance measuring instrument against the reference value. When Z′ is equal to or greater than the reference value, the control device estimates the hydrogen concentration of the fuel cell to be equal to or less than the reference hydrogen concentration. | 02-16-2012 |
Noriyuki Kobayashi, Kawasaki-Shi JP
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20080309970 | IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, PROGRAM AND STORAGE MEDIUM - An image processing apparatus capable of outputting image data by a plurality of output methods includes storing image data, managing output restriction information corresponding to a predetermined region of the stored image data, executing output restriction processing of the image data corresponding to the predetermined region based on the output restriction information of one of the plurality of output methods, selecting one of the plurality of output methods when the image data is output, and outputting the image data on which the output restriction processing is executed by the selected output method. | 12-18-2008 |
20110170130 | INFORMATION PROCESSING APPARATUS AND ITS CONTROL METHOD - An information processing apparatus manages distributed processing by a plurality of devices which are connected to a computer network and have a power-saving mode. The apparatus includes a retriever, arranged to retrieve device information and operation states of the plurality of devices, and a selector, arranged to select target devices of the distributed processing based on at least one of the device information and operation states. | 07-14-2011 |
Noriyuki Kobayashi, Kanagawa JP
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20080307373 | Apparatus, method and computer program for managing circuit optimization information - A circuit optimization information management apparatus provides information to be used when a circuit parameter optimization program is executed to design an integrated circuit. The apparatus includes an accumulator for registering information relating to a candidate of a circuit type used in a design target circuit, a simulation test bench circuit corresponding to the circuit type, a simulation test input waveform and a circuit performance evaluation function for evaluating simulation results, and a feeder for selecting, in response to selection of the circuit type used in the design target circuit, information relating to the test bench circuit, the test input waveform and the performance evaluation function, corresponding to the selected circuit type registered in the accumulator and feeding the selected information to the circuit parameter optimization program. | 12-11-2008 |
20130083505 | WIRING BOARD, CONNECTOR AND ELECTRONIC APPARATUS - Disclosed herein is a wiring board including: a differential-line pair including two lines for transmitting differential signals; and two connection pads each electrically connected to one of the two lines pertaining to one of the differential-line pairs, wherein a plurality of the differential-line pairs are laid out side by side; a plurality of the connection pads are provided to form a plurality of columns; and on each of the columns of the connection pads, any two the connection pads electrically connected to the lines pertaining to the same differential-line pair are provided at locations adjacent to each other on the same one of the columns. | 04-04-2013 |
Noriyuki Kobayashi, Shizuoka-Ken JP
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20080230984 | SHEET MATERIAL STACKING APPARATUS AND METHOD OF STACKING SHEET MATERIAL - The present invention provides a sheet material stacking apparatus that includes a sheet material stacking base on which sheet materials induced by a sheet material conveying unit are stacked, a first guide member disposed along the conveyance direction of the sheet materials to the sheet material stacking base and sorts the end surfaces at one end with respect to the width direction thereof, a second guide member which is disposed in parallel and opposite to the first guide member having the sheet material stacking base therebetween, a pusher that constitutes at least a portion of the first guide member and is displaced between a reference position in which the distance to the second guide member is equal to the width of the sheet material and a separating position in which the distance to the second guide member is larger than the width of the sheet material, and a driving unit that displaces the pusher and places side by side both ends of the sheet materials in the axis direction. | 09-25-2008 |
Noriyuki Kobayashi, Gunma JP
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20110165000 | Hermetic Compressor - There is provided a hermetic compressor which has a simplified structure and can satisfactorily separate a lubricating oil from a refrigerant and efficiently discharge the refrigerant from a hermetic container. A discharge passage ( | 07-07-2011 |
Noriyuki Kobayashi, Tokushima-Shi JP
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20120000998 | Low hygroscopic aripiprazole drug substance and processes for the preparation thereof - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period. | 01-05-2012 |
20120016123 | Low hygroscopic aripiprazole drug substance and processes for the preparation thereof - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period. | 01-19-2012 |
20120077821 | LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the aripiprazole anhydride crystals is stored for an extended period. | 03-29-2012 |
20120315302 | LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period. | 12-13-2012 |
20120316179 | LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period. | 12-13-2012 |
20120316180 | LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous Aripiprazole crystals is stored for an extended period. | 12-13-2012 |
Noriyuki Kobayashi, Shiga-Ken JP
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20120189862 | STRETCH PACKAGING FILM - There is provided a novel chlorine-free stretch packaging film which has good packaging workability, packaging finish, elastic recovery, bottom sealing stability and transparency, hardly suffers from occurrence of tearing thereof and breakage when used in a low temperature condition, and is excellent in storage stability as pellets and economy. The stretch packaging film of the present invention comprises a layer X comprising a resin composition X which comprises, as main components, a propylene-ethylene random copolymer (A) which has an ethylene content of not less than 5% by mass and satisfies the condition that a single peak is observed in a crystallization curve of the component (A), and the peak temperature is not higher than 70° C. (condition (1)), and a crystalline polypropylene-based resin (B) which satisfies the condition that among peaks observed in a crystallization curve of the component (B), the maximum peak temperature is higher than 70° C. (condition (2)), wherein a mass ratio of the component (A) to the component (B) ((A):(B)) is 8:2 to 2:8. | 07-26-2012 |
Noriyuki Kobayashi, Isesaki-Shi JP
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20120294736 | Fluid Machine - Provided is a fluid machine which can be produced with a reduced weight and size at a reduced production cost. The fluid machine ( | 11-22-2012 |
20120308378 | Fluid Machine - Provided is a fluid machine which can be produced to have an increased weld strength and an increased reliability, at a reduced production cost. A first and a second shells ( | 12-06-2012 |
20120308410 | Fluid Machine - [Purpose] To provide a fluid machine improved in lubrication performance and reliability. | 12-06-2012 |
Noriyuki Kobayashi, Nagoya-City JP
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20130014539 | VAPOR VALVE ADSORPTION REFRIGERATOR AND ADSORPTION REFRIGERATORAANM Kobayashi; NoriyukiAACI Nagoya-cityAACO JPAAGP Kobayashi; Noriyuki Nagoya-city JPAANM Sumiya; TadayoshiAACI Nagoya-cityAACO JPAAGP Sumiya; Tadayoshi Nagoya-city JP - A vapor valve includes a partitioning member for partitioning a space containing gaseous vapor into two spaces, wherein a communication mouth for communicating the two spaces with each other is formed at the partitioning member; and a valve element for opening and closing the communication mouth, wherein the valve element is formed by a board for opening and closing the communication mouth in accordance with a pressure difference between the two spaces, a slanted board portion sloping with respect to a horizontal direction and having a shape of a board is formed at the partitioning member, and the communication mouth makes a hole penetrating both sides of the slanted board portion. | 01-17-2013 |
Noriyuki Kobayashi, Tokyo JP
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20130194490 | LENS HOLDER DRIVING DEVICE CAPABLE OF EASILY MOUNTING UPPER ELASTIC MEMBER TO OUTER YOKE - A lens holder driving device includes a lens holder in which a lens assembly is mounted, a driving coil fixed to the lens holder at outside circumference thereof, a magnet opposite to the driving coil, a yoke including the magnet, an elastic member supporting the lens holder in a direction of an optical axis shiftably, and a base disposed at a lower side of the lens holder. The yoke includes an outer yoke including the magnet at an inner wall surface thereof. The elastic member includes an upper elastic member disposed at an upper side of the lens holder. The upper elastic member is mounted to the inner wall of the outer yoke in a state where the upper elastic member is positioned and fitted to a spacer. | 08-01-2013 |
Noriyuki Kobayashi, Nagahama-Shi JP
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20130344346 | STRETCH PACKAGING FILM - There is provided a packaging film which has a good suitability for use in an automatic packaging machine, and is free from occurrence of sagging even when stored in a low-temperature condition for a long period of time as well as hardly suffers from occurrence of whitening when subjected to high stretch packaging. The stretch packaging film of the present invention comprises a laminated film having at least three layers comprising opposite surface layers each comprising an ethylene-based resin (A) as a main component and an intermediate layer comprising a propylene-based resin (C) and a propylene-based resin (B) which respectively satisfy specific conditions, at a specific compounding ratio, and having a heat of crystallization (ΔHc) of 10 to 60 J/g as measured at a temperature drop rate of 10° C./min using a differential scanning calorimeter (DSC) and a storage elastic modulus (E′) at 20° C. of 100 MPa to 1 GPa as measured with respect to the laminated film at an oscillation frequency of 10 Hz and a distortion of 0.1% by a dynamic viscoelasticity measuring method. | 12-26-2013 |
Noriyuki Kobayashi, Tokushima JP
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20140030523 | LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period. | 01-30-2014 |
20140309236 | LOW HYGROSCOPIC ARIPIPRAZOLE DRUG SUBSTANCE AND PROCESSES FOR THE PREPARATION THEREOF - The present invention provides low hygroscopic forms of aripiprazole and processes for the preparation thereof which will not convert to a hydrate or lose their original solubility even when a medicinal preparation containing the anhydrous aripiprazole crystals is stored for an extended period. | 10-16-2014 |