| Patent application number | Description | Published |
|---|
| 20080241022 | Reactor for Generating Moisture and Moisture Generating and Feeding Apparatus for Which the Reactor is Employed - A reactor for generating moisture, with which hydrogen and oxygen fed into the reactor contact with a platinum coating catalyst layer to activate reactivity so that hydrogen and oxygen react under conditions of non-combustion, wherein the reactor includes a cooler comprising a heat dissipation body substrate in which a heater insertion hole is made in the center to fix to the outer surface of the reactor structural component on the outlet side and a cooler on the outlet side made up of a plural number of heat dissipation bodies installed vertically in parallel on the part excluding the area where the afore-mentioned heater insertion hole of the heat dissipation body substrate exists, and a part of the heater to heat the reactor is inserted in the heater insertion hole so as to fix to the outer surface of the reactor structural component on the outlet side. | 10-02-2008 |
| 20080257415 | Method for Water Hammerless Opening of Fluid Passage,and Method for Supplying Chemical Solutions and Device for Water Hammerless Opening for Which the Method is Used - The water hammerless opening device comprises an actuator operating type valve installed on the fluid passage, an electro-pneumatic conversion device to supply the 2-step actuator operating pressure Pa to the afore-mentioned actuator operating type valve, a vibration sensor removably fixed to the pipe passage on the upstream side of the actuator operating type valve, and a tuning box to which the vibration detecting signal Pr detected by the vibration sensor is inputted, through which the control signal Sc to control the step operating pressure Ps′ of the afore-mentioned 2-step actuator operating pressure Pa is outputted to the electro-pneumatic conversion device, and with which the 2-step actuator operating pressure Pa, of the step operating pressure Ps′ which makes the vibration detecting signal Pr nearly zero, is outputted from the electro-pneumatic conversion by adjusting the control signal Sc. | 10-23-2008 |
| 20090009297 | System for recording valve actuation information - The present invention provides a system for recording valve actuation information that enables to figure out the actual operation condition of each individual valve without checking plural valves individually, and the valves do not have to be wired, and the structure of the system is simple. | 01-08-2009 |
| 20090020721 | Valve for Vacuum Exhaustion System - The invention provides a valve and a method of operating the valve that makes it possible to reduce the diameter of the vacuum exhaustion pipings to make the facility for the vacuum exhaustion system small, which results in lower costs and shortens vacuum exhaustion time, and also which can prevent corrosion, cloggings, and seal leakages inside the piping system caused by the accumulation of substances produced by the decomposition of gas flowing through the pipings. In particular, in accordance with the present invention, an aluminum passivation is applied on the piping parts, i.e. the valve and others, that are used in the vacuum exhaustion system so as to inhibit gas decomposition caused by temperature rise at the time of baking so that components for reduction in the diameter size in the vacuum exhaustion system are provided. Thus, corrosion, cloggings and seat leakages caused by gas decomposition are prevented. | 01-22-2009 |
| 20090032115 | VACUUM THERMAL INSULATING VALVE - The present invention provides a vacuum thermal insulating valve that may be used at high temperature in gas supply systems or gas exhaust systems, and also may be made substantially small and compact in size owing to its excellent thermal insulating performance. With a vacuum thermal insulating valve comprising a valve equipped with a valve body and an actuator, and a vacuum thermal insulating box that houses the valve, the afore-mentioned vacuum thermal insulating box S is formed by a square-shaped lower vacuum jacket S | 02-05-2009 |
| 20090146089 | PRESSURE TYPE FLOW RATE CONTROL REFERENCE AND CORROSION RESISTANT PRESSURE TYPE FLOW RATE CONTROLLER USED FOR THE SAME - A pressure type flow rate control reference which allows performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. | 06-11-2009 |
| 20090165534 | METHOD AND APPARATUS FOR TESTING LEAKAGE OF PIPE PASSAGE - A method for testing leakage of a pipe passage employs a flow rate of gas used in testing supplied to the inside of a pipe passage undergoing testing hermetically sealed on one side while detecting flow rate with a flow measuring device and pressure with a pressure detector, and detecting temperature of the gas used, and inputting the detected values of pressure, flow rate and temperature into a computation treatment apparatus, and internal capacity V | 07-02-2009 |
| 20090171507 | GASKET TYPE ORIFICE AND PRESSURE TYPE FLOW RATE CONTROL APPARATUS FOR WHICH THE ORIFICE IS EMPLOYED - An orifice changeable pressure type flow rate control apparatus comprises a valve body of a control valve for a pressure type flow rate control apparatus installed between an inlet side fitting block provided with a coupling part of a fluid supply pipe and an outlet side fitting block provided with a coupling part of a fluid takeout pipe; a fluid inlet side of the valve body and the inlet side fitting block, and a fluid outlet side of the valve body and the outlet side fitting block are detachably and hermitically connected respectively so a flow passage for gases through the control valve is formed; and, a gasket type orifice for a pressure type flow rate control apparatus is removably inserted between a gasket type orifice insertion hole provided on the outlet side of the valve body and a gasket type orifice insertion hole of the outlet side fitting block. | 07-02-2009 |
| 20090255587 | METHOD FOR WATER HAMMERLESS OPENING OF FLUID PASSAGE, AND METHOD FOR SUPPLYING CHEMICAL SOLUTIONS AND DEVICE FOR WATER HAMMERLESS OPENING FOR WHICH THE METHOD IS USED - The water hammerless opening device comprises an actuator operating type valve installed on the fluid passage, an electro-pneumatic conversion device to supply the 2-step actuator operating pressure Pa to the afore-mentioned actuator operating type valve, a vibration sensor removably fixed to the pipe passage on the upstream side of the actuator operating type valve, and a tuning box to which the vibration detecting signal Pr detected by the vibration sensor is inputted, through which the control signal Sc to control the step operating pressure Ps′ of the afore-mentioned 2-step actuator operating pressure Pa is outputted to the electro-pneumatic conversion device, and with which the 2-step actuator operating pressure Pa, of the step operating pressure Ps′ which makes the vibration detecting signal Pr nearly zero, is outputted from the electro-pneumatic conversion by adjusting the control signal Sc. | 10-15-2009 |
| 20090292399 | METHOD FOR DETECTING MALFUNCTION OF VALVE ON THE DOWNSTREAM SIDE OF THROTTLE MECHANISM OF PRESSURE TYPE FLOW CONTROL APPARATUS - With a pressure type flow control apparatus, a valve on the downstream side of a throttle mechanism is released and a flow rate setting value Qe inputted to the pressure type flow control apparatus is changed to detect the magnitude ΔV of change of a flow rate output signal Qo from the pressure type flow control apparatus while the flow rate setting value Qe is changed, so that normal functioning of the releasing operations of the valve on the downstream side of the throttle mechanism is confirmed when the magnitude ΔV of change of the flow rate output signal Qo is above the predetermined value. If the releasing operations are malfunctioning, the magnitude ΔV of changes is found to be below the predetermined value. | 11-26-2009 |
| 20100012026 | EVAPORATION SUPPLY APPARATUS FOR RAW MATERIAL AND AUTOMATIC PRESSURE REGULATING DEVICE USED THEREWITH - An evaporation supply apparatus for raw material used in semiconductor manufacturing includes a source tank in which a raw material is pooled; a flow rate control device that supplies carrier gas at a regulated flow rate into the source tank; a primary piping path for feeding mixed gas G | 01-21-2010 |
| 20100127196 | PIEZOELECTRIC DRIVEN CONTROL VALVE - Stable flow control is made possible even under high-temperature environments by relieving tensional force applied to a piezoelectric element when a piezoelectric actuator is retracted. Thus, a piezoelectric driven control valve includes: a body having a valve seat; a metal diaphragm to contact with and separate from the valve seat; an actuator box supported ascendably and descendably on the body; a split base fixed to the body; a disc spring pressing and urging the actuator box downward to bring the metal diaphragm into contact with the valve seat; and a piezoelectric actuator housed inside the actuator box and that extends upward with application of voltage to press the actuator box upward against the elastic force of the disc spring, and a precompression mechanism, for applying a compression force constantly to piezoelectric elements in the piezoelectric actuator, provided between the split base and the piezoelectric actuator. | 05-27-2010 |
| 20100139775 | FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS - A pressure type flow control device enabling a reduction in size and an installation cost by accurately controlling the flow of a fluid in a wide flow range. Specifically, the flow of the fluid flowing in an orifice ( | 06-10-2010 |
| 20100143239 | METHOD FOR PARALLEL OPERATION OF REACTORS THAT GENERATE MOISTURE - The method for parallel operation of moisture generating reactors according to the present invention operates so that an orifice, provided with an orifice hole having a predetermined opening diameter, is disposed on a mixed-gas inlet side of each of a plurality of moisture generating reactors connected in parallel with each other, and mixed gas G consisting of hydrogen and oxygen is supplied from a mixer to each of the moisture generating reactors through each orifice, and the flows of moisture generated by the moisture generating reactors are combined, and the resulting combined moisture is supplied to an apparatus that uses high-purity water. Thus, a need to increase the amount of high-purity water supply is met by allowing a plurality of moisture generating reactors to perform a parallel water generating operation by branching off a mixed gas consisting of H | 06-10-2010 |
| 20100192854 | GAS SUPPLY SYSTEM FOR SEMICONDUCTOR MANUFACTRUING FACILITIES - A gas supply system includes a main gas supply line; a vent gas supply line; a plurality of gas supply mechanisms disposed in middle of both gas supply lines; a pressure type flow-rate control system disposed on an inlet side of the main gas supply line so a flow of carrier gas is supplied to the main gas supply line; a pressure control system disposed on an inlet side of the vent gas supply line, a carrier gas having a predetermined pressure is supplied to the vent gas supply line while the pressure control system performs a pressure adjustment, a gas pressure of the main gas supply line detected downstream from an orifice of the pressure type flow-rate control system and a gas pressure of the vent gas supply line are compared, and the gas pressure of the vent gas supply line is adjusted so a difference therebetween becomes zero. | 08-05-2010 |
| 20100207044 | CAM VALVE - In a step motor driven cam valve a stem freely ascends and descends within a body having an in-flow passage, an out-flow passage, a valve chamber, and a valve seat. The stem is descended by an actuator, composed of a step motor and a cam mechanism located at a position above the stem, that changes a rotational motion of the step motor to a linear motion and transmits the linear motion to the stem. A diaphragm within a valve chamber or a valve body at a lower end part of the stem rests on the valve seat. A lift support mechanism that supports the actuator to freely ascend and descend is arranged at a bonnet that covers the valve chamber. A height fine-adjustment mechanism, arranged at the lift supporting mechanism, finely adjusts the height of the actuator relative to the stem so as to perform zero-point adjustment of the valve. | 08-19-2010 |
| 20100229976 | FLOW RATE RATIO VARIABLE TYPE FLUID SUPPLY APPARATUS - A flow rate ratio variable type fluid supply apparatus includes a flow rate control system supplying gas of flow rate Q that is diverted to first flow diverting pipe passage and second flow diverting pipe passage with prescribed flow rates Q | 09-16-2010 |
| 20100294964 | NORMALLY OPEN TYPE PIEZOELECTRIC ELEMENT DRIVEN METAL DIAPHRAGM CONTROL VALVE - A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable. | 11-25-2010 |
| 20110042595 | PIEZOELECTRIC ELEMENT DRIVEN METAL DIAPHRAGM CONTROL VALVE - A control valve has a body that forms a valve chamber and a valve seat, a metal diaphragm installed inside the valve chamber and making contact with and departing from the valve seat, an actuator box fixed to the side of the body, a piezoelectric element installed inside the actuator box to thrust the metal diaphragm through mediation of a metal diaphragm presser by elongating downward when voltage is applied, a conical spring mechanism that absorbs elongation of the piezoelectric element at the time when the metal diaphragm makes contact with the valve seat and a prescribed thrust is applied to the valve seat and the like, and a preload mechanism that applies upward compressive force to the piezoelectric element all the time wherein the compressive force applied to the piezoelectric element is externally adjustable. | 02-24-2011 |
| 20110094596 | Apparatus and method of dividing and supplying gas to a chamber from a gas supply apparatus equipped with flow-rate control system - The present-invention supplies a quantity Q of gas while dividing at flow rate ratio Q1/Q2 from a gas supply facility equipped with a flow controller. A a total quantity Q=Q1+Q2 of gas is supplied into a chamber at flow rate Q1 and Q2 through shower plates fixed to ends of branch supply lines by providing open/close valves with a plurality of branch supply lines GL | 04-28-2011 |
| 20110100483 | GAS SUPPLY APPARATUS EQUIPPED WITH VAPORIZER - An energy-saving, downsized gas supply apparatus equipped with a vaporizer is provided, wherein the gas supply apparatus is capable of stably and easily performing highly accurate gas flow rate control without requiring rigorous temperature control on the vaporizer side. The present invention pertains to a gas supply apparatus equipped with a vaporizer that includes (a) a liquid receiving tank; (b) a vaporizer that vaporizes liquid; (c) a high-temperature type pressure type flow rate control device that adjusts a flow rate of a vaporized gas; and (d) heating devices that heat the vaporizer, the high-temperature type pressure type flow rate control device, and desired portions of pipe passages connected to the vaporizer and the high-temperature type pressure type flow rate control device. | 05-05-2011 |
| 20110108138 | PRESSURE CONTROL VALVE DRIVING CIRCUIT FOR PRESSURE TYPE FLOW RATE CONTROL DEVICE WITH FLOW RATE SELF-DIAGNOSIS FUNCTION - A pressure control valve piezoelectric element driving circuit is provided for a pressure type flow rate control device provided with a flow rate self-diagnosis function for comparing initial pressure drop characteristics data measured and with pressure drop characteristics data in a flow rate diagnosis which are measured under conditions that are the same for both measurements to detect malfunction in flow rate control from a difference between both characteristics data, wherein a first discharge circuit slowly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a step-down command signal from a CPU, through a step-down command circuit to step down the voltage, and a second discharge circuit that rapidly discharges a piezoelectric element driving voltage applied to the piezoelectric element according to a high-speed step-down command signal from the CPU, through a high-speed step-down command circuit to step down the voltage. | 05-12-2011 |
| 20110120566 | DISCONTINUOUS SWITCHING FLUID FLOW RATE CONTROL METHOD USING PRESSURE TYPE FLOW RATE CONTROL DEVICE - A fluid flow rate control method is provided that uses a flow rate range variable type pressure type flow rate control device provided with at least two or more parallel fluid passages disposed between the downstream side of a control valve of the control device and a fluid supply pipe passage, and orifices having different fluid flow rate characteristics are respectively interposed in parallel fluid passages to pass fluid in a first flow rate region through one orifice for flow rate control, and to pass fluid in a second flow rate region through at least another orifice for flow rate control. Flow rate characteristics of the respective orifices are selected so that a maximum controllable flow rate of fluid in the first flow rate region at low flow rate is smaller than 10% of a maximum controllable flow rate in the second flow rate region at high flow rate. | 05-26-2011 |
| 20110121217 | SOLENOID VALVE - There is provided a solenoid valve that realizes space-saving by reducing the size of a dedicated driving power source. There is provided a solenoid valve capable of instantaneously opening and closing that includes an electric double layer capacitor having a low direct current internal resistance and a low equivalent series resistance as a motive power supply. The electric double layer capacitor has single-cell electrical properties including a capacitance of 1 to 5 F, a rated voltage of 21 to 2.7 V, a direct current internal resistance of 0.01 to 0.1 Ω, and an equivalent series resistance at 1 KHz of 0.03 to 0.09 Ω, and includes a polarizable electrode made of glassy carbon having a specific surface area of 1 to 500 m | 05-26-2011 |
| 20110139271 | AUTOMATIC PRESSURE REGULATOR FOR FLOW RATE REGULATOR - The invention prevents overshoot from occurring in flow rate on the output side of a flow rate regulator when output flow rate is changed or the gas type distributed is changed. Thus, an automatic pressure regulator is provided to supply gas pressure to a flow rate regulator that includes a piezoelectric element driving type pressure regulating valve, a control pressure detector provided on the output side of the pressure regulating valve, and a controller to which a detected value P | 06-16-2011 |
| 20120031500 | FLUID CONTROL APPARATUS - To provide a fluid control apparatus capable of reducing the space, while reducing the cost. | 02-09-2012 |
| 20120074339 | REGULATING VALVE DEVICE - [Problem] To provide a regulating valve device having a valve element opened or closed by a working fluid. | 03-29-2012 |
| 20120082596 | Reactor for Moisture Generation - A reactor for moisture generation generates high-purity moisture at a catalytic reaction temperature that is lower than an ignition point of hydrogen gas and oxygen gas so hydrogen and oxygen gas are supplied into the reactor having a platinum catalyst layer to catalyze the reaction of the gases without combustion, wherein the reactor maintains high adhesion strength for a long time of the platinum catalyst layer to a barrier layer provided between the base material and the platinum catalyst layer. The reactor includes a reactor main body that has a gas inlet and a moisture outlet, and the Y | 04-05-2012 |
| 20120223265 | CAM CONTROL VALVE - A cam control valve includes a valve casing having a fluid passage and valve seat, a valve disc seated on the valve seat to open and close the fluid passage, a valve stem holding down the valve disc so it contacts the valve seat, a cam acting on the valve stem to hold it down, a motor rotating the cam, a motor holder holding the motor, a supporting frame fixed to the valve casing and supporting the motor holder so it moves vertically, an elastic member biasing the motor holder towards spacing from an upper side portion of the supporting frame, and height adjustable screws suspending the motor holder from the supporting frame, and adjusting a height of the motor holder with respect to the supporting frame, wherein the height adjustable screws are slidably inserted into the upper side portion of the supporting frame and screwed into the motor holder. | 09-06-2012 |
| 20120234406 | PRESSURE TYPE FLOW RATE CONTROL REFERENCE AND CORROSION RESISTANT PRESSURE TYPE FLOW RATE CONTROLLER USED FOR THE SAME - A pressure type flow rate control reference allows the performance of flow rate calibrations of a flow rate controller on all types of gases, including corrosive gases, at low costs, and also has excellent flow rate control accuracy. The pressure type flow rate control reference includes a pressure controller for adjusting the pressure of a calibration gas from a calibration gas supply source, a first volume provided on the downstream side of a pressure controller, a first connection mouth of an uncalibrated flow rate controller provided on the downstream side of the first volume, a reference pressure type flow rate controller connected to a second connection mouth on the downstream side of the uncalibrated flow rate controller, a second volume provided on the downstream side of a reference pressure type flow rate controller, and an evacuation device provided on the downstream side of the second volume. | 09-20-2012 |
| 20120241023 | CONTROL VALVE DEVICE - A control valve device develops opening/closing accuracy of a valve assembly. The valve head | 09-27-2012 |
| 20120273061 | Piezoelectrically Driven Valve and Piezoelectrically Driven Flow Rate Control Device - A piezoelectrically driven valve and a piezoelectrically driven fluid control device are provided that may control a fluid even if the temperature of the fluid is higher than an operating temperature range of a piezoelectric actuator. The piezoelectrically driven valve includes a valve element for opening and closing a fluid passage, a piezoelectric actuator for driving the valve element by utilizing extension of a piezoelectric element, and a radiation spacer that lifts and supports the piezoelectric actuator away from the fluid passage, and radiates heat that is transferred from fluid flowing in the fluid passage to the piezoelectric actuator, and preferably further includes a support cylinder that houses and supports both of the piezoelectric actuator and the radiation spacer, wherein the support cylinder is made of a material with the same thermal expansion coefficient as that of the radiation spacer, at least at a portion for housing the radiation spacer. | 11-01-2012 |
| 20120298220 | PRESSURE TYPE FLOW RATE CONTROL DEVICE - A pressure type flow rate control device provides flow rate control for gas at 100-500° C. with an error not more than 1.0% F.S. The pressure type flow rate control device includes a valve body with a fluid passage, a valve portion interposed in the passage, a valve drive unit driving the valve portion to open/close the passage, a restriction mechanism on the downstream side of the valve portion in the passage, a temperature detector detecting gas temperature between the valve portion and restriction mechanism, a pressure detector detecting gas pressure between the valve portion and restriction mechanism, and an arithmetic control device controlling flow rate of gas in the restriction mechanism based on values detected by the temperature detector and the pressure detector, wherein the temperature detector is inserted in an attachment hole of the valve body at a position just above an outlet side fluid passage. | 11-29-2012 |
| 20130000737 | METHOD FOR WATER HAMMERLESS OPENING OF FLUID PASSAGE, AND METHOD FOR SUPPLYING CHEMICAL SOLUTIONS AND DEVICE FOR WATER HAMMERLESS OPENING FOR WHICH THE METHOD IS USED - The water hammerless opening device comprises an actuator operating type valve installed on the fluid passage, an electro-pneumatic conversion device to supply the 2-step actuator operating pressure Pa to the afore-mentioned actuator operating type valve, a vibration sensor removably fixed to the pipe passage on the upstream side of the actuator operating type valve, and a tuning box to which the vibration detecting signal Pr detected by the vibration sensor is inputted, through which the control signal Sc to control the step operating pressure Ps′ of the afore-mentioned 2-step actuator operating pressure Pa is outputted to the electro-pneumatic conversion device, and with which the 2-step actuator operating pressure Pa, of the step operating pressure Ps′ which makes the vibration detecting signal Pr nearly zero, is outputted from the electro-pneumatic conversion by adjusting the control signal Sc. | 01-03-2013 |
| 20130084059 | VAPORIZER - A vaporizer, capable of stabilizing the behavior of pressure inside the vaporizer, includes a chamber having an inlet and an outlet, a heating device that heats the inside of the chamber, a partition wall structure | 04-04-2013 |
| 20130186471 | CALIBRATION METHOD AND FLOW RATE MEASUREMENT METHOD FOR FLOW RATE CONTROLLER FOR GAS SUPPLY DEVICE - In a gas supply device supplying many different gases to a gas use portion through many flow rate controllers, a flow rate controller calibration unit includes a build-up tank with inner volume, an inlet side on-off valve and an outlet side on-off valve V | 07-25-2013 |
| 20130220433 | APPARATUS FOR DIVIDING AND SUPPLYING GAS AND METHOD FOR DIVIDING AND SUPPLYING GAS BY USE OF THIS APPARATUS - A gas dividing/supplying apparatus includes a pressure-type flow control system, a plurality of divided flow passages connected in parallel with each other and through which gas flowing from the pressure-type flow control system is divided and supplied to a process chamber, thermal-type mass flow sensors disposed in the divided flow passages, respectively, motor-operated valves disposed on a downstream side of the thermal-type mass flow sensors, respectively, and switching-type controllers that control opening and closing of the motor-operated valves, respectively, and, in the apparatus, the switching-type controllers perform switching between valve opening control for maintaining the motor-operated valves at a predetermined fixed valve opening degree based on a valve opening control command signal and divided flow control for regulating an opening degree of each of the motor-operated valves by feedback control based on a flow detection signal of the thermal-type mass flow sensor by a divided flow control command signal. | 08-29-2013 |
| 20130220451 | FLOW RATE RANGE VARIABLE TYPE FLOW RATE CONTROL APPARATUS - A pressure type flow rate control apparatus is provided wherein flow rate of fluid passing through an orifice is computed as Qc=KP | 08-29-2013 |
| 20130340837 | DEVICE AND METHOD FOR SUPPLYING GAS WHILE DIVIDING TO CHAMBER FROM GAS SUPPLYING FACILITY EQUIPPED WITH FLOW CONTROLLER - The invention supplies a quantity Q of gas while dividing at flow rate ratio Q | 12-26-2013 |
| 20140013838 | FLOW RATE MEASUREMENT DEVICE AND FLOW RATE MEASUREMENT METHOD FOR FLOW RATE CONTROLLER FOR GAS SUPPLY DEVICE - A flow rate measurement device includes a branched pipe passage having an inlet side end portion detachably joined in a branched manner to an upstream portion of on-off valve V | 01-16-2014 |
| 20140124064 | RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS - A raw material vaporizing and supplying apparatus includes a carrier gas supply source, a source tank storing raw material, a flow passage supplying carrier gas to an internal upper space portion of the source tank, an automatic pressure regulating device installed on the flow passage, controlling pressure in the internal upper space portion to a set pressure, another flow passage supplying mixed gas (a mixture of raw material steam and carrier gas) from the internal upper space portion to a process chamber, a flow control system installed on this other flow passage, and automatically regulates a flow rate of the mixed gas supplied to the process chamber to a set flow rate, and a constant temperature heating unit that heats the source tank, a portion of the automatic pressure regulating device, a portion of the flow control system, the pipe passage, and the other pipe passage, to a set temperature. | 05-08-2014 |
| 20140182692 | PRESSURE TYPE FLOW CONTROL SYSTEM WITH FLOW MONITORING - A pressure type flow control system with flow monitoring includes an inlet side passage, a control valve comprising a pressure-type flow control unit connected downstream of the inlet side passage, a thermal-type flow sensor connected downstream of the control valve, an orifice installed on a fluid passage connected downstream of the thermal-type flow sensor, a temperature sensor provided near the fluid passage between the control valve and orifice, a pressure sensor provided for the fluid passage between the control valve and orifice, an outlet side passage connected to the orifice, and a control unit comprising a pressure-type flow rate arithmetic and control unit to which a pressure signal from the pressure sensor and a temperature signal from the temperature sensor are input, and which computes a flow rate value of fluid flowing through the orifice, and outputs a control signal to a valve drive unit of the control valve. | 07-03-2014 |
| 20140190581 | RAW MATERIAL GAS SUPPLY APPARATUS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT - A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature. | 07-10-2014 |
| 20140216339 | RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS - A raw material vaporizing and supplying apparatus including a source tank in which a raw material is stored, a raw material gas supply channel through which raw material gas is supplied from an internal space portion of the source tank to a process chamber, a pressure type flow rate control system which is installed along the way of the supply channel, and controls a flow rate of the raw material gas which is supplied to the process chamber, and a constant temperature heating unit that heats the source tank, the supply channel, and the pressure type flow rate control system to a set temperature, wherein the raw material gas generated in an internal space portion of the source tank is supplied to the process chamber while the pressure type flow rate control system performs flow rate control. | 08-07-2014 |
| 20140230911 | PRESSURE TYPE FLOW CONTROL SYSTEM WITH FLOW MONITORING, AND METHOD FOR DETECTING ANOMALY IN FLUID SUPPLY SYSTEM AND HANDLING METHOD AT ABNORMAL MONITORING FLOW RATE USING THE SAME - A pressure type flow control system with flow monitoring includes an inlet, a control valve including a pressure flow control unit connected downstream of the inlet, a thermal flow sensor connected downstream of the control valve, an orifice installed on a fluid passage communicatively connected downstream of the thermal flow sensor, a temperature sensor provided near the fluid passage between the control valve and orifice, a pressure sensor provided for the fluid passage between the control valve and orifice, an outlet communicatively connected to the orifice, and a control unit including a pressure type flow rate arithmetic and control unit receiving a pressure signal from the pressure sensor and a temperature signal from the temperature sensor, and a flow sensor control unit to which a flow rate signal from the thermal flow sensor is input. | 08-21-2014 |
| 20140299206 | RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS EQUIPPED WITH RAW MATERIAL CONCENTRATION - An apparatus able to regulate a raw material concentration, in a mixed gas of carrier gas and raw material gas, accurately and stably to supply the mixed gas to a process chamber, with a flow rate controlled highly accurately, thereby detecting a vapor concentration of the raw material gas in the mixed gas easily and highly accurately and displaying the concentration in real time without using an expensive concentration meter, etc. | 10-09-2014 |
| 20140373935 | GAS BRANCHED FLOW SUPPLYING APPARATUS FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT - A gas branched flow supplying apparatus for semiconductor manufacturing equipment. An arithmetic and control unit | 12-25-2014 |
| 20150059859 | APPARATUS FOR DIVIDING AND SUPPLYING GAS AND METHOD FOR DIVIDING AND SUPPLYING GAS - An apparatus for dividing and supplying gas is provided with a flow rate control device, a plurality of divided flow passages of gas flowing from the flow rate control device, thermal-type mass flow sensors disposed to the divided flow passages, electrically-operated valves disposed on a downstream side of the thermal-type mass flow sensors, controllers that control the electrically-operated valves, and a flow ratio setting calculator that calculates a total flow rate, then calculates flow rates of the divided flow passages, and then inputs the calculated flow rates as set flow rates to each controllers. One of the divided flow passages with the highest set flow rate is put in an uncontrolled state, and opening degree for each of the rest divided flow passages is controlled, and then feedback control of the divided flow rate of each of the divided flow passages is implemented by each of the controllers. | 03-05-2015 |
