Patent application number | Description | Published |
20080212051 | Lithographic apparatus and device manufacturing method - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 09-04-2008 |
20080273182 | Lithographic apparatus and device manufacturing method - A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system. | 11-06-2008 |
20090009734 | Lithographic apparatus and device manufacturing method - In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate. | 01-08-2009 |
20090161083 | Lithographic apparatus and device manufacturing method - The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed. | 06-25-2009 |
20090168032 | Lithographic apparatus and device manufacturing method - The use of electro wetting to control the behavior of immersion liquid within an immersion lithographic apparatus is disclosed. | 07-02-2009 |
20090168037 | Lithographic apparatus and device manufacturing method - An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate and a liquid supply system for supply liquid to the substrate. The apparatus is constructed and arranged to allow the liquid to flow off the substrate and over at least two edges of a top surface of the substrate table. The geometry of the edge may be optimized to reduce a static thickness of a layer of liquid on the top surface. | 07-02-2009 |
20090168042 | Lithographic apparatus and device manufacturing method - An immersion lithographic projection apparatus is disclosed. The apparatus includes a substrate table for holding a substrate, the substrate table being constructed and arranged to allow liquid to flow off the substrate and over an edge of a top surface of the substrate table, and a gutter for collecting the liquid flow under the edge. Several features for improving liquid retrieval are described. | 07-02-2009 |
20090296056 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which measures are taken to seal between the table and an edge of an object, in use, supported on the table. In particular, a capillary passage is formed between the object on the table and the table itself. A meniscus pinning feature and/or the presence of an overpressure at the radially inward side of the capillary passage holds the liquid in the passage and helps prevent it from advancing further radially inwardly. The features to perform this function may be associated with or formed in a member surrounding the object. The member may be thermally decoupled from a part of the table. | 12-03-2009 |
20090296065 | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap. | 12-03-2009 |
20090296068 | SUBSTRATE TABLE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A table is disclosed in which an opening is provided for the provision of immersion fluid onto a top surface of the table. In an embodiment, there are two such openings. The first of the openings surrounds a substrate support of the table and the second of the openings extends around an outer edge of the table. | 12-03-2009 |
20090303455 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 12-10-2009 |
20100045950 | LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. | 02-25-2010 |
20100053574 | Liquid Immersion Lithography System Comprising a Tilted Showerhead Relative to a Substrate - A liquid immersion lithography system includes projection optics (PL) and a showerhead ( | 03-04-2010 |
20100060868 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTUIRNG METHOD - A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table. | 03-11-2010 |
20100060870 | LITHOGRAPHIC APPARATUS, METHOD OF MANUFACTURING AN ARTICLE FOR A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed in which a specific coating is applied to a specific surface. The coating is made from at least 99 wt % of at least one of the following: a transition metal oxide; a poor metal oxide, sulfide or selenide; a compound with the formula ATiO | 03-11-2010 |
20100134769 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A difficulty of contamination interfering with a grid plate positional measurement system is addressed. In one embodiment contamination is prevented from coming into contact with the grating or the sensor. In an embodiment, surface acoustic waves are used to detach contamination from a surface of the grating or sensor. | 06-03-2010 |
20100149514 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 06-17-2010 |
20100157265 | FLUID HANDLING STRUCTURE, TABLE, LITHOGRAPHIC APPARATUS, IMMERSION LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHODS - A fluid handling structure comprising a conduit is described. The conduit is configured to supply fluid to (i) a space between a projection system and a substrate and/or substrate table, and/or (ii) a top surface of a substrate and/or substrate table radially outward of the space. The fluid comprises a fluid in a first phase and a fluid in a second phase. The conduit comprises at least two openings, a first phase fluid opening configured to allow passage of the first phase fluid and a second phase fluid opening configured to allow passage of the second phase fluid. There is also disclosed a table and a lithographic apparatus comprising such a conduit, as well as a method in which the conduit is used. | 06-24-2010 |
20100157277 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid confinement structure configured to contain a liquid in a space between a projection system and a substrate has a recess in its lower surface which is open to both a relatively low pressure source and a relatively high pressure source and through which liquid and/or gas from between the liquid confinement structure and the substrate is extracted. | 06-24-2010 |
20100165319 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high. | 07-01-2010 |
20100231875 | Lithographic Apparatus and Device Manufacturing Method - An immersion lithographic apparatus is provided with an electrode set to remove unwanted droplets of an immersion fluid from a particular surface. Unwanted droplets of immersion fluid may form on any number of different surfaces of the immersion apparatus, such as on a liquid barrier member. If allowed to evaporate and/or dry, these droplets may cause a problem such as uncontrolled heat loading of the apparatus and/or staining of the surface. An electrode set is provided on a surface where the droplets are likely to be formed. A controlled voltage is applied to the electrodes within the electrode set in order to electrostatically remove the droplets from the surface. | 09-16-2010 |
20100245791 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally. | 09-30-2010 |
20100283981 | IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered. | 11-11-2010 |
20100302518 | LITHOGRAPHIC APPARATUS - The invention relates to a lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, including a cooling system to cool a part of the lithographic apparatus, the cooling system including a droplet ejector to form droplets and fire the droplets towards a cooling surface of the part of the lithographic apparatus to cool the part by evaporation of the droplets. | 12-02-2010 |
20100321650 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate. | 12-23-2010 |
20100321653 | LITHOGRAPHIC APPARATUS - A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate. | 12-23-2010 |
20110013169 | SUBSTRATE TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS, METHOD OF USING A SUBSTRATE TABLE AND DEVICE MANUFACTURING METHOD - A cover is provided for a substrate table in an immersion lithographic apparatus that covers at least the gap between a substrate and a recess in a substrate table in which the substrate is received. | 01-20-2011 |
20110025994 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried. | 02-03-2011 |
20110051107 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate. | 03-03-2011 |
20110069289 | LITHOGRAPHIC APPARATUS, COVERPLATE AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle of immersion liquid with surfaces of the first and second objects defining the gap is less than 30°. | 03-24-2011 |
20110069297 | LITHOGRAPHIC APPARATUS, COVERPLATE AND DEVICE MANUFACTURING METHOD - A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module. | 03-24-2011 |
20110075118 | HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber. | 03-31-2011 |
20110149257 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which comprises, in cross-section, a feature, and an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature. | 06-23-2011 |
20110149258 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area. | 06-23-2011 |
20110194084 | FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing. | 08-11-2011 |
20110222032 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. | 09-15-2011 |
20110222033 | LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. | 09-15-2011 |
20110228238 | LITHOGRAPHIC APPARATUS, COVER FOR USE IN A LITHOGRAPHIC APPARATUS AND METHOD FOR DESIGNING A COVER FOR USE IN A LITHOGRAPHIC APPARATUS - A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure. | 09-22-2011 |
20110232878 | HEAT PIPE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter. | 09-29-2011 |
20110235008 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed in which a gas knife is shaped and a liquid removal device is positioned to improve removal of liquid from the surface of the substrate. | 09-29-2011 |
20110273675 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 11-10-2011 |
20110273695 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system. | 11-10-2011 |
20110285976 | LITHOGRAPHIC APPARATUS, FLUID HANDLING STRUCTURE FOR USE IN A LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus including a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of the substrate table and/or a substrate located in a recess of the substrate table, a cover having a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor, configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure. | 11-24-2011 |
20110299051 | FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING FLUID FLOW RATE AND A DEVICE MANUFACTURING METHOD - A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path. | 12-08-2011 |
20110310367 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 12-22-2011 |
20120008116 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 01-12-2012 |
20120008118 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 01-12-2012 |
20120069309 | FLUID HANDLING STRUCTURE, MODULE FOR AN IMMERSION LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially outward of the meniscus pinning feature to supply a fluid soluble in the immersion fluid which on dissolution into the immersion fluid lowers the surface tension of the immersion fluid. | 03-22-2012 |
20120113402 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate. | 05-10-2012 |
20120147353 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder. | 06-14-2012 |
20120154781 | SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface. | 06-21-2012 |
20120212725 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer. | 08-23-2012 |
20120229783 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate. | 09-13-2012 |
20120274920 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - A method of manufacturing a substrate holder for use in a lithographic apparatus, the method including providing a main body having a surface and a plurality of burls projecting from the surface and having end surfaces to support a substrate, providing a carrier surface adjacent the main body surface, and forming a conductive layer on at least part of the main body surface and an integral part on at least part of the carrier surface. | 11-01-2012 |
20130016332 | FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size. | 01-17-2013 |
20130189802 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD - A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface. | 07-25-2013 |
20140300883 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 10-09-2014 |
20140368804 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack. | 12-18-2014 |
20150015857 | LITHOGRAPHIC APPARATUS, DRYING DEVICE, METROLOGY APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is described in which a two-phase flow is separated into liquid-rich and gas-rich flows by causing the liquid-rich flow to preferentially flow along a surface. | 01-15-2015 |
20150029485 | SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - An object holder ( | 01-29-2015 |