Nga
Dinh Nga, Seoul KR
Patent application number | Description | Published |
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20150092789 | Method And Apparatus For Managing Data Transmission In A Communication Network - A manner of managing data transmission and operating-mode transitions in a communication network. A network node having a transmitter and receiver is selectively transitioned into a Transmit state, where the Transmit state is a condition wherein the transmitter is turned on for data transmission only during timeslots provided for by a PBW (pre-allocation bandwidth) and remains off otherwise. The PBW and clock drift allowance permits the receiver to remain off during all or most of the Transmit state. | 04-02-2015 |
Lemmy Nga, New South Wales AU
Patent application number | Description | Published |
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20100000538 | MASK ASSEMBLY, AND FRAME AND SWIVEL CONNECTOR THEREFOR - A mask assembly for use in providing a supply of air at positive pressure to the airways of a patient includes a frame and an elbow. The elbow is rotatable with respect to the frame when assembled. The frame includes an elbow-receiving portion. The elbow and elbow-receiving portion of the frame are adapted to include respective interlocking sealing portions and one of the elbow and elbow-receiving portion includes a flexible element that upon assembly flexes to introduce a preload that effects a seal between the respective interlocking sealing portions. | 01-07-2010 |
Lemmy Nga, Glenwood AU
Patent application number | Description | Published |
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20080276937 | MASK ASSEMBLY - A mask assembly adapted for use with a positive airway pressure device, includes a mask frame, an elbow assembly provided to the frame, a cushion provided to the frame, a forehead support assembly, and a neck to connect the frame to the forehead support assembly, wherein the neck includes a pair of side walls having a streamlined design that is made to look sleek and reduce or minimize obtrusiveness. The pair of side walls may take the form of a single wall or more than two walls. The mask frame may include a recessed port structure including at least one port having access to an interior of the frame which at least in part with the cushion defines a breathing chamber in communication with a nasal passage of the patient in use. The mask frame may also include a channel to receive the cushion. The channel is formed by an outer wall and an inner wall and the channel includes an inner surface having a bead to engage with an outer surface of an edge of the cushion. The forehead support assembly includes a forehead support and a forehead pad coupled to the forehead support. The elbow assembly includes an elbow connectable to the mask frame. A cover is releasably connectable to the elbow. The cover includes a venting area including a plurality of vent holes. | 11-13-2008 |
Lemmy Nga, Bella Vista AU
Patent application number | Description | Published |
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20120138061 | NASAL MASK SYSTEM - A mask system includes a frame ( | 06-07-2012 |
Lemmy Nga, Sydney AU
Patent application number | Description | Published |
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20140166018 | NASAL MASK SYSTEM - A forehead support for a respiratory mask includes a forehead support arm structured to extend from a frame and a forehead support pad provided to the arm. The forehead support pad includes upper headgear connectors adapted to engage upper headgear straps and a flexible region. The upper headgear connectors are constructed of a first material and the flexible region is constructed of a second material that is more flexible than the first material to allow adjustment of the distance of the forehead support pad from the patient's forehead in use. | 06-19-2014 |
20140174448 | NASAL MASK SYSTEM - A nasal cushion for a mask system includes a side wall defining a breathing chamber, an undercushion extending from the side wall, and a membrane that at least partially covers the undercushion. The membrane is adapted to seal along the nasal bridge, sides of nose, corners of nose, and upper lip of the patient's face in use. The undercushion is only provided along the side of nose, corner of nose, and upper lip regions of the cushion. The undercushion includes a flap or extending portion in each side of nose region that is wider than the other regions thereof and adapted to engage and provide a force into the sides of the patient's nose in use. | 06-26-2014 |
20150013675 | MASK ASSEMBLY - A mask assembly includes a mask frame including a lower portion and a neck extending from the lower portion, a cushion provided to the mask frame and adapted to contact a patient's face, a forehead support assembly provided to the neck of the mask frame, the forehead support assembly including a forehead support and a forehead pad provided to the forehead support, and an elbow assembly provided to the mask frame. The neck includes a pair of side walls spaced apart from one another along an entire length of the neck, the side walls providing an open space therebetween along the entire length of the neck that opens towards a front side of the mask assembly. The pair of side walls comprise an upper converging section wherein the pair of side walls converge towards one another in a downward direction. | 01-15-2015 |
Yiang Aun Nga, Singapore SG
Patent application number | Description | Published |
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20150187863 | INTEGRATED CIRCUITS INCLUDING A RESISTANCE ELEMENT AND GATE-LAST TECHNIQUES FOR FORMING THE INTEGRATED CIRCUITS - Integrated circuits with a resistance element and gate-last techniques for forming the integrated circuits are provided. An exemplary technique includes providing a semiconductor substrate that includes a shallow trench isolation (STI) structure disposed therein. A dummy gate electrode structure is patterned overlying semiconductor material of the semiconductor substrate, and a resistor structure is patterned overlying the STI structure. The dummy gate electrode structure and the resistor structure include a dummy layer overlying a metal capping layer. A gate dielectric layer underlies the metal capping layer. An interlayer dielectric layer is formed overlying the semiconductor substrate and the STI structure. End terminal recesses for the resistance element are concurrently patterned through the dummy layer of the resistor structure along with removing the dummy layer of the dummy gate electrode structure to form a gate electrode recess. Metal gate material is deposited in the end terminal recesses and a gate electrode recess. | 07-02-2015 |