Patent application number | Description | Published |
20080248427 | Composition for Coating over a Photoresist Pattern Comprising a Lactam - The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure (1) | 10-09-2008 |
20090053652 | PHOTORESIST COMPOSITIONS - Photoresist compositions are disclosed. | 02-26-2009 |
20090317739 | Composition for Coating over a Photoresist Pattern - The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1), | 12-24-2009 |
20100183851 | Photoresist Image-forming Process Using Double Patterning - A process for forming a double photoresist pattern is disclosed. | 07-22-2010 |
20120219919 | Composition for Coating over a Photoresist Pattern Comprising a Lactam - The present invention relates to an aqueous coating composition for coating a photoresist pattern comprising a polymer containing a lactam group of structure ( | 08-30-2012 |
20130233827 | METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS - The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer. | 09-12-2013 |
20140151330 | METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS - The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer. | 06-05-2014 |
20140342290 | COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCESSES THEREOF - The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; | 11-20-2014 |