Ming-Tsung Wu
Ming-Tsung Wu, Hualien County TW
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20100276807 | FABRICATION OF METAL FILM STACKS HAVING IMPROVED BOTTOM CRITICAL DIMENSION - A method of fabricating metal film stacks is described that reduces or eliminates adverse effects of photolithographic misalignments. A bottom critical dimension is increased by removal of a bottom titanium nitride barrier. | 11-04-2010 |
20100295147 | ISOLATION STRUCTURE AND FORMATION METHOD THEREOF - An isolation structure comprising a substrate is provided. A trench is in the substrate. A sidewall of the trench has a first inclined surface and a second inclined surface. The first inclined surface is located on the second inclined surface. The slope of the first inclined surface is different from the slope of the second inclined surface. A length of the first inclined surface is greater than 15 nanometers. | 11-25-2010 |
20120094494 | METHODS FOR ETCHING MULTI-LAYER HARDMASKS - A method to further adjust the final CD of a material to be etched during an etching process, and after a photolithographic patterning process can include patterning a semiconductor substrate using a mask layer. The mask layer can comprise a hardmask material having a protruding feature with an initial width. A first plasma comprising carbon and fluorine can be introduced into a chamber, where residual carbon and fluorine is deposited on at least the chamber wall. A portion of the mask layer can then be removed with a second plasma incorporating the residual carbon and fluorine, whereby remaining hardmask material forms a feature pattern where the protruding feature has a final width different from the initial width. The feature pattern can then be transferred to the semiconductor substrate using the final width of the at least one protruding feature provided by the remaining hardmask material. | 04-19-2012 |
Ming-Tsung Wu, Shoufong Township TW
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20100176481 | Memory Device and Manufacturing Method Thereof - A memory device and a manufacturing method thereof are provided. The manufacturing method of memory device includes the following steps. Firstly, a substrate having a substrate surface is provided. Next, at least two memory units separated via a space are formed on the substrate. Then, an insulating layer covering the memory units and the substrate surface is formed. After that, a mask layer only covering the bottom of the insulating layer is formed on the insulating layer. Afterwards, the part of the insulating layer partially covered by the mask layer is etched. Then, the mask layer is removed. Next, the part of the insulating layer where the mask layer is removed is etched. Lastly, a protecting layer is formed on the memory units and in the space between the memory units. | 07-15-2010 |
20120115304 | ISOLATION STRUCTURE AND FORMATION METHOD THEREOF - An isolation structure comprising a substrate is provided. A trench is in the substrate. A sidewall of the trench has a first inclined surface and a second inclined surface. The first inclined surface is located on the second inclined surface. The slope of the first inclined surface is different from the slope of the second inclined surface. A length of the first inclined surface is greater than 15 nanometers. | 05-10-2012 |
Ming-Tsung Wu, Taoyuan County TW
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20100053095 | Method Capable of Preventing Mistakenly Triggering a Touch panel - To perform palm rejection, scan a plurality of areas on a touch panel to detect a plurality of triggered areas within the plurality of areas. Then detect which of the triggered areas are next to one another to determine a plurality of blocks. If the plurality of blocks contain a block with an overlarge area, then eliminate the block with the overlarge area, and generate a current coordinate according to a block with a smaller area which may be triggered by a finger or stylus. | 03-04-2010 |
20100053113 | Electromagnetic Stylus for Operating a Capacitive Touch Panel - When a user moves an electromagnetic stylus to a capacitive touch panel, a transceiving winding will detect the frequency of the capacitive touch panel. A synchronizing winding will oscillate to generate a signal having a frequency similar to that of the capacitive touch panel. An oscillator will amplify the signal generated by the synchronizing winding. A circuit board will process the signal amplified by the oscillator. Finally the transceiving winding will emit a wireless signal with a frequency similar to that of the capacitive touch panel to interfere with the electric (magnetic) field of the capacitive touch panel so as to detect a triggered coordinate of the capacitive touch panel. | 03-04-2010 |
20100164899 | MATRIX RESISTIVE TOUCH DEVICE - A matrix resistive touch device includes a first substrate, a spacer layer, and a second substrate. The first substrate is used for detecting a position of an input point in a first direction. The second substrate is used for detecting the position of the input point in a second direction. The first substrate has a conductive layer. The conductive layer has a voltage difference in the first direction. The second substrate has a plurality of electrodes. The plurality of electrodes is perpendicular to the second direction. The spacer layer is located between the first substrate and the second substrate for separating the conductive layer and the plurality of electrodes. | 07-01-2010 |
Ming-Tsung Wu, Taipei TW
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20100156327 | Portable Electronic Device with Touch Illumination Function and Touch Illumination Method Thereof - A portable electronic device with a touch illumination function and a touch illumination method thereof are provided. The portable electronic device with the touch illumination function includes an input module, a touch sensor, and an illumination module. The touch sensor is disposed around the input module, senses a touch motion of the input module, and generates a touch signal according to the touch motion. The illumination module is disposed around the input module, coupled with the touch sensor, and controls the illumination module to generate a light source to illuminate the input module according to the touch signal. | 06-24-2010 |
Ming-Tsung Wu, Hsinchu TW
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20100000969 | Patterning method - A patterning method is provided. First, a substrate having an objective material layer thereon is provided. Thereafter, a mask layer is formed on the objective material layer. Afterwards, a patterned layer is formed over the mask layer, wherein a material of the patterned layer includes a metal-containing substance. Then, the mask layer is patterned to form a patterned mask layer. Further, the objective material layer is patterned, using the patterned mask layer as a mask. | 01-07-2010 |
Ming-Tsung Wu, Zhubei City TW
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20140167206 | SHALLOW TRENCH ISOLATION STRUCTURE AND METHOD OF MANUFACTURE - A semiconductor device includes a substrate and a first and second plurality of stack structures arranged over the substrate. The first and second plurality of stack structures are separated by a gap. The substrate includes a first trench between the structures of the first plurality of stack structures, a second trench between the structures of the second plurality of stack structures, and a third trench in the gap. A depth of the first trench is less than a depth of the third trench. | 06-19-2014 |
Ming-Tsung Wu, Zhubei TW
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20160133568 | Contact Structure for Nand Based Non-Volatile Memory Device and a Method of Manufacture - A NAND-based non-volatile memory contact structure includes a trench located adjacent to layered alternating conducting and insulating layers, the layers lining sides and bottom of the trench. A portion of the trench is removed to expose a surface in which electrical connections to the conducting layers are provided on one level. | 05-12-2016 |