Patent application number | Description | Published |
20130337596 | Back Channel Etch Metal-Oxide Thin Film Transistor and Process - A method is provided for fabricating an organic light emitting diode (OLED) display. The method includes forming a thin film transistor (TFT) substrate including a first metal layer and a second metal layer. The method also includes depositing a first passivation layer over the second metal layer, and forming a third metal layer over a channel region and a storage capacitor region. The third metal layer is configured to connect to a first portion of the second metal layer that is configured to connect to the first metal layer in a first through-hole through a gate insulator and the first passivation layer. The method further includes depositing a second passivation layer over the third metal layer, and forming an anode layer over the second passivation layer. The anode is configured to connect to a second portion of the third metal layer that is configured to connect to the second metal layer in a second through-hole of the first passivation layer and the second passivation layer. | 12-19-2013 |
20140004704 | TFT Mask Reduction | 01-02-2014 |
20140042427 | Gate Insulator Loss Free Etch-Stop Oxide Thin Film Transistor - A method is provided for fabricating a thin-film transistor (TFT). The method includes forming a semiconductor layer over a gate insulator that covers a gate electrode, and depositing an insulator layer over the semiconductor layer, as well as etching the insulator layer to form a patterned etch-stop without losing the gate insulator. The method also includes forming a source electrode and a drain electrode over the semiconductor layer and the patterned etch-stop. The method further includes removing a portion of the semiconductor layer beyond the source electrode and the drain electrode such that a remaining portion of the semiconductor layer covers the gate insulator in a first overlapping area of the source electrode and the gate electrode and a second overlapping area of the drain electrode and gate electrode. | 02-13-2014 |
20140084292 | Connection to First Metal Layer in Thin Film Transistor Process - A method of connecting to a first metal layer in a semiconductor flow process. Disclosed embodiments connect to the first metal layer by etching a first portion of a viahole through an etch stop layer and a gate insulation layer to reach a first metal layer, depositing a second metal layer such that the second metal layer contacts the first metal layer within the viahole, and etching a second portion of the viahole through a first passivation layer and an organic layer to reach the second metal layer. | 03-27-2014 |
20140091390 | Protection Layer for Halftone Process of Third Metal - A thin-film transistor having a protection layer for a planarization layer. The protection layer prevents reduction of the planarization layer during an ashing process, thereby preventing the formation of a steeply tapered via hole through the planarization layer. In this manner, the via hole may be coated with a conductive element that may serve as a conductive path between a common electrode and the drain of the transistor. | 04-03-2014 |
20140118666 | Display with Column Spacer Structures Resistant to Lateral Movement - A display may have a color filter layer and a thin-film transistor layer. A layer of liquid crystal material may be located between the color filter layer and the thin-film transistor layer. Column spacers may be formed on the color filter layer to maintain a desired gap between the color filter and thin-film transistor layers. Support pads may be used to support the column spacers. Different column spacers may be located at different portions of the support pads to allow the support pad size to be reduced while ensuring adequate support. Lateral movement blocking structures such as circular rings may be used to prevent column spacer lateral movement. Subspacers located over pads may be used to create friction that retards lateral movement. Lateral movement may also be retarded by receiving column spacers in trenches or other recesses formed on a thin-film transistor layer. | 05-01-2014 |
20140120657 | Back Channel Etching Oxide Thin Film Transistor Process Architecture - A method is provided for fabricating a back channel etching (BCE) oxide thin film transistor (TFT) for a liquid crystal display. The method includes forming a first metal layer having a first portion and a second portion over a substrate, depositing a gate insulator over the first metal layer, and disposing a semiconductor layer over the gate insulator. The method also includes depositing a half-tone photoresist to cover a first portion of the semiconductor layer and the first portion of the first metal layer. The half-tone photoresist has a first portion and a second portion thicker than the first portion. The first portion has a via hole above the second portion of the first metal layer. The second portion of the half-tone photoresist covers the first portion of the first metal layer. The method further includes etching a portion of the gate insulator through the via hole such that the second portion of the first metal layer is exposed, removing the first portion of the half-tone photoresist while remaining the second portion of the half-tone photoresist, and etching to remove a second portion of the semiconductor layer that is not covered by the half-tone photoresist. | 05-01-2014 |
20140141565 | GATE INSULATOR UNIFORMITY - Embodiments of the present disclosure relate to display devices and methods for manufacturing display devices. Specifically, embodiments of the present disclosure employ an enhanced etching process to create uniformity in the gate insulator of thin-film-transistor (TFTs) by using an active layer to protect the gate insulator from inadvertent etching while patterning an etch stop layer. | 05-22-2014 |
20140327851 | Display Pixels with Improved Storage Capacitance - A display may include one or more display pixels in an array of pixels. A display pixel may include a storage capacitor chat stores a pixel data signal. The storage capacitor may be formed from a pixel electrode structure, a capacitor electrode structure, and a common electrode structure that is interposed between the pixel electrode structure and capacitor electrode structures. Each electrode structure may be formed from transparent conductive materials deposited on respective display layers. The pixel electrode structure and capacitor electrode structure may be electrically coupled by a conductive via structure that extends through the display layers without contacting the common electrode structure. The conductive via structure may contact underlying transistor structures such as a source-drain structure. | 11-06-2014 |
20140370655 | Gate Insulator Loss Free Etch-Stop Oxide Thin Film Transistor - A method is provided for fabricating a thin-film transistor (TFT). The method includes forming a semiconductor layer over a gate insulator that covers a gate electrode, and depositing an insulator layer over the semiconductor layer, as well as etching the insulator layer to form a patterned etch-stop without losing the gate insulator. The method also includes forming a source electrode and a drain electrode over the semiconductor layer and the patterned etch-stop. The method further includes removing a portion of the semiconductor layer beyond the source electrode and the drain electrode such that a remaining portion of the semiconductor layer covers the gate insulator in a first overlapping area of the source electrode and the gate electrode and a second overlapping area of the drain electrode and gate electrode. | 12-18-2014 |
20150054799 | Display Driver Circuitry For Liquid Crystal Displays With Semiconducting-Oxide Thin-Film Transistors - An electronic device may include a display having an array of display pixels on a substrate. The display pixels may be organic light-emitting diode display pixels or display pixels in a liquid crystal display. In an organic light-emitting diode display, hybrid thin-film transistor structures may be formed that include semiconducting oxide thin-film transistors, silicon thin-film transistors, and capacitor structures. The capacitor structures may overlap the semiconducting oxide thin-film transistors. Organic light-emitting diode display pixels may have combinations of oxide and silicon transistors. In a liquid crystal display, display driver circuitry may include silicon thin-film transistor circuitry and display pixels may be based on oxide thin-film transistors. A single layer or two different layers of gate metal may be used in forming silicon transistor gates and oxide transistor gates. A silicon transistor may have a gate that overlaps a floating gate structure. | 02-26-2015 |
20150055047 | Liquid Crystal Displays with Oxide-Based Thin-Film Transistors - An electronic device may include a display having an array of display pixels on a substrate. The display pixels may be organic light-emitting diode display pixels or display pixels in a liquid crystal display. In an organic light-emitting diode display, hybrid thin-film transistor structures may be formed that include semiconducting oxide thin-film transistors, silicon thin-film transistors, and capacitor structures. The capacitor structures may overlap the semiconducting oxide thin-film transistors. Organic light-emitting diode display pixels may have combinations of oxide and silicon transistors. In a liquid crystal display, display driver circuitry may include silicon thin-film transistor circuitry and display pixels may be based on oxide thin-film transistors. A single layer or two different layers of gate metal may be used in forming silicon transistor gates and oxide transistor gates. A silicon transistor may have a gate that overlaps a floating gate structure. | 02-26-2015 |
20150055051 | Displays With Silicon and Semiconducting Oxide Thin-Film Transistors - An electronic device may include a display having an array of display pixels on a substrate. The display pixels may be organic light-emitting diode display pixels or display pixels in a liquid crystal display. In an organic light-emitting diode display, hybrid thin-film transistor structures may be formed that include semiconducting oxide thin-film transistors, silicon thin-film transistors, and capacitor structures. The capacitor structures may overlap the semiconducting oxide thin-film transistors. Organic light-emitting diode display pixels may have combinations of oxide and silicon transistors. In a liquid crystal display, display driver circuitry may include silicon thin-film transistor circuitry and display pixels may be based on oxide thin-film transistors. A single layer or two different layers of gate metal may be used in forming silicon transistor gates and oxide transistor gates. A silicon transistor may have a gate that overlaps a floating gate structure. | 02-26-2015 |