Patent application number | Description | Published |
20090315649 | DIFFERENTIAL TRANSMISSION LINE INCLUDING TWO TRANSMISSION LINES PARALLEL TO EACH OTHER - In a differential transmission line, a substrate has first and second surfaces parallel to each other, and a first grounding conductor is formed on the second surface of the substrate. A dielectric layer is formed on the first grounding conductor, and a second grounding conductor is formed on the dielectric layer. First and the second signal conductors are formed to be parallel to each other on the first surface of the substrate. The first signal conductor and the first and second grounding conductors constitutes a first transmission line, and the second signal conductor and the first and second grounding conductors constitutes a second transmission line. A slot is formed in the first grounding conductor to sterically intersect with the first and second signal conductors and to be orthogonal to a longitudinal direction thereof, and a connecting conductor is formed for connecting the first grounding conductor with the second grounding conductor. | 12-24-2009 |
20100019976 | ANTENNA DEVICE - In order to reduce waveform distortion caused by higher harmonic components of rectangular waveforms reduced as compared with fundamental frequency component when a wireless digital signal is directly and wirelessly transmitted and received by baseband transmission, an antenna apparatus includes a dielectric substrate including a ground conductor formed on a back surface thereof, and a radiation conductor formed on a front surface of the dielectric substrate. Upon directly transmitting and receiving a wireless digital signal via a feed point of the radiation conductor, formation of notched portions at sides of the radiation conductor, which intersect an electric field plane defined by an electric field when the antenna apparatus is excited, leads to reduction in the waveform distortion of waveform of the transmitted wireless digital signal. | 01-28-2010 |
20100171574 | MICROSTRIP LINE - A microstrip line is constituted by including a grounding conductor and a strip conductor with a dielectric substrate being sandwiched between the grounding conductor and the strip conductor. The microstrip line includes a conductor section having at least one groove formed to sterically intersect the strip conductor, thereby exhibiting a substantially more uniform passing characteristic as compared with a prior art microstrip line. | 07-08-2010 |
20100265684 | INTERPOSER SUBSTRATE AND INCLUDING CAPACITOR FOR ADJUSTING PHASE OF SIGNAL TRANSMITTED IN SAME INTERPOSER SUBSTRATE - In an interposer substrate, a plating stub conductor and a ground conductor form a capacitor, and a plating stub conductor and the ground conductor form a capacitor. Capacitances of the capacitors are adjusted so that a phase difference between signals transmitted by a differential transmission using a signal line including a connection wiring conductor and a signal line including a connection wiring conductor is equal to 180 degrees. | 10-21-2010 |
20110128090 | STRIPLINE - A strip conductor is provided on a dielectric board, and a ground conductor facing the strip conductor in a thickness direction of the dielectric board is provided on a surface of the dielectric board. The ground conductor is provided with a plurality of holes penetrating therethrough along the thickness direction of the dielectric board. This structure accomplishes a microstrip line that can obtain consistent passing frequency characteristics. | 06-02-2011 |
Patent application number | Description | Published |
20090078329 | FLUID FLOW PASSSAGE STRUCTURE AND MANUFACTURING METHOD THEREOF - A fluid flow passage structure and a manufacturing method therefor are provided, in which fluid flow passages can be easily produced employing a simple structure and process, while also being suitable for reducing the weight thereof. Wire members having a predetermined pattern are disposed between a first block member and a second block member. Airtight and fluidtight hermetic fluid flow passages are formed between such members, by forming the first block member, the second block member, and the wire members together as an integral structure. | 03-26-2009 |
20090098407 | LAMINATED STRUCTURE FOR A FLUID - A laminated structure is formed by stacking a first block member, an intermediate member, and a second block member together in this order, and then mutually joining each of the members. Further, by setting the elastic constant of the intermediate member to be greater than the elastic constants of the first block member and the second block member, deformation of grooves, which are formed in the first block member, is minimized. | 04-16-2009 |
20090139646 | BONDING METHOD AND APPARATUS THEREFOR - A nitrogen gas tank, a rotary pump and a mechanical booster pump are connected to a bonding vessel that constitutes a bonding apparatus for carrying out diffusion bonding, the apparatus further comprising a pressure sensor. A nitrogen gas atmosphere is formed inside the bonding vessel, and under control operations of a control circuit, a nitrogen introduction rate is controlled so that a pressure is substantially fixed at a predetermined pressure between 3-10 | 06-04-2009 |
20090140196 | FLUID PRESSURE DEVICE AND MANUFACTURING METHOD FOR FLUID PRESSURE DEVICE - A manufacturing method for a fluid pressure device and a fluid pressure device are provided, in which joints are diffusion bonded to a valve body. In the fluid pressure device, the joints are inserted into an inlet port and an outlet port formed in the valve body, and heating is performed to generate a temperature difference between the valve body and the joints, whereupon by diffusion bonding of the joints into a wall of the valve body in which the inlet port and the outlet port are formed, both members are bonded. | 06-04-2009 |
Patent application number | Description | Published |
20120256966 | STORAGE MEDIUM, INFORMATION PROCESSING APPARATUS, INFORMATION PROCESSING SYSTEM AND INFORMATION PROCESSING METHOD - One of a plurality of areas is displayed as a display area on a display device, and based on an input from an input section, an object included in the display area is determined as a target to be moved, and when a predetermined movement is detected by a movement sensor, the currently displayed display area is switched to an area different from the currently displayed display area, and the area is displayed on the display device together with the object determined as a target to be moved. | 10-11-2012 |
20120257021 | INFORMATION PROCESSING APPARATUS, STORAGE MEDIUM, INFORMATION PROCESSING METHOD AND INFORMATION PROCESSING SYSTEM - A game apparatus includes a CPU, and in a mode of examining a flower based on an imaged image, the CPU activates two outward cameras to allow a user to image a flower. The CPU obtains color information, shape information and a size of the imaged flower from the imaged image. A shape category is obtained from the shape information, and with the shape category, data for search included in a database for search is filtered. Then, by comparing color information, shape information, and the size of the imaged flower with the data for search to be used, a score of a degree of approximation of the color information and scores of the degree of matching of the shape information and size, etc. are obtained. Then, images of flowers as candidates are presented in the descending order of the score (similarity level). | 10-11-2012 |
20130050237 | INFORMATION PROCESSING APPARATUS, STORAGE MEDIUM, INFORMATION PROCESSING METHOD AND INFORMATION PROCESSING SYSTEM - An example of a game apparatus includes a CPU, and in a mode of examining a flower based on an imaged image, the CPU activates two outward cameras to thereby display an imaging screen on a stereoscopic LCD and a lower LCD. In the center of an upper screen displayed on the stereoscopic LCD, a designation image for adjusting a position and a size of an object to be imaged is displayed. Also, on the upper screen, a through image imaged by the outward camera is displayed, and the designation image is displayed in front of the through image. At this time, the designation image is displayed in a complementary color of a color of the through image. | 02-28-2013 |
Patent application number | Description | Published |
20100004087 | POWER TRANSMISSION DEVICE AND METHOD OF PRODUCING THE SAME - The power transmission device has an internally meshing planetary gear mechanism that has an input shaft, an eccentric body provided on the input shaft, an externally toothed gear eccentrically oscillating via the eccentric body, and an internally toothed gear with which the externally toothed gear internally meshes. The externally toothed gear is assembled to the internally toothed gear in an interference fit. | 01-07-2010 |
20100206110 | OUTPUT GEAR-EQUIPPED REDUCTION DEVICE AND METHOD OF ASSEMBLING THE SAME - The output gear-equipped reduction device has an output flange for taking out rotation reduced by a reduction mechanism, an output shaft provided on the output flange and having a smaller diameter than the output flange, and an output gear provided on the output shaft and having an addendum circle greater than the diameter of the output shaft. The output flange, the output shaft, and the output gear are integrally formed as an output flange section, an output shaft section, and an output gear section of a single output member in that order in the axial direction with the above-stated dimensional relationship maintained. The integral output member is supported at the output shaft section by a casing via bearing means. | 08-19-2010 |
20110265593 | REDUCTION GEAR FOR WIND POWER GENERATION EQUIPMENT AND INSTALLATION METHOD THEREOF - A reduction gear for wind power generation equipment includes a motor, an orthogonal cogwheel mechanism, a final-stage reduction mechanism, and an output pinion that are disposed on a power transmission path in this order; and a casing that accommodates the orthogonal cogwheel mechanism and the final-stage reduction mechanism and is capable of being separated into a high-speed casing body and a low-speed casing body between the orthogonal cogwheel mechanism and the final-stage reduction mechanism while confining a lubricant therein. | 11-03-2011 |
20110269554 | POWER TRANSMISSION DEVICE AND JOINT UNIT OF POWER TRANSMISSION DEVICE - A power transmission device which transmits power between a first member and a second member, the first member has a hollow portion, the first member and the second member are fitted to each other by interference fitting by setting the external diameter of the second member so as to have a slightly larger size than the internal diameter of the hollow portion of the first member, and the surface of at least one of an inner periphery of the hollow portion of the first member and an outer periphery of the second member is subjected to a surface treatment in which slipping occurs when an excessive torque exceeding a predetermined value is applied, and the slipping stops and the original torque transmission to be performed in the power transmission device is performed again between the first member and the second member when the excessive torque is eliminated. | 11-03-2011 |
20120267210 | SPEED REDUCER USED FOR WIND POWER GENERATION FACILITY - A speed reducer used for a wind power generation facility includes a two-stage reduction mechanism of at least a front stage reduction mechanism and a rear stage reduction mechanism; a coupling that is arranged between the front stage reduction mechanism and the rear stage reduction mechanism and has a torque limiter mechanism which does not transfer a torque exceeding a predetermined value; and an oil seal that partitions and seals a space where the front stage reduction mechanism is accommodated and a space where the coupling is accommodated. The front stage reduction mechanism is separable from the coupling in a sealed state by the oil seal. | 10-25-2012 |
Patent application number | Description | Published |
20080253811 | DEVELOPING DEVICE, PROCESS UNIT, AND IMAGE FORMING APPARATUS - A developing apparatus, comprises an endless belt shaped donor member; a developer supporting member to carry developer including toner and magnetic carrier and to form a toner layer on the donor member; a first supporting member arranged in the inside of the donor member with a predetermined gap against the developer supporting member and to strain the donor member; a second supporting member arranged in the inside of the donor member with a predetermined gap against the developer supporting member and to strain the donor member; a toner supply bias applying section to apply onto the first supporting member a toner supply bias for supplying toner from the developer supporting member to the donor member; and a toner recovery bias applying section to apply onto the second supporting member a toner recovery bias for recovering toner from the donor member to the developer supporting member. | 10-16-2008 |
20100086323 | IMAGE FORMING APPARATUS - An image forming apparatus includes: a supplying section for supplying developer; a first developing roller including plural magnetic poles and a first sleeve arranged rotatable to the first developing roller; a second developing roller including plural magnetic poles and a second sleeve arranged rotatable to the second developing roller, the second developing roller arranged adjacent to the first developing roller and parallel to the same; an electrode arranged between the first and second developing rollers; and a voltage applying unit for applying bias voltages each having different electric potential corresponding to the first developing roller, the second developing roller and the electrode, wherein an absolute value of the bias voltage to be applied to the electrode is larger than that of the bias voltage to be applied to the first developing roller and smaller than that of the bias voltage to be applied to the second developing roller. | 04-08-2010 |
20100266297 | IMAGE FORMING APPARATUS AND IMAGE CARRIER UNIT - Disclosed is an image forming apparatus including a toner reallocation electrode to carry out a reallocation of a toner of a toner image, a toner detection section to detect a toner amount of the toner image and a control section to calculate a toner amount adhered to the toner reallocation electrode or a density distribution of the toner image based on the detected toner amount and to control an AC component of an applied voltage based on the calculated toner amount or density distribution, and the control section decides a maximum value of the AC component of the applied voltage based on the toner amount or decides a minimum value of the AC component of the applied voltage based on the density distribution, and the control section controls the AC component within a control range of smaller than or equal to the decided maximum value or greater than or equal to the decided minimum value. | 10-21-2010 |
20110097115 | Carrier Removing Device and Image Forming Apparatus - A carrier removing apparatus, including: an electrode, having a plurality of openings through which a carrier passes, disposed to oppose an image carrier, and a power source to apply a voltage onto the electrode so as to separate the carrier on the image carrier from the image carrier, wherein the electrode has a surface along a surface of the image carrier. | 04-28-2011 |
20110170913 | Image Forming Apparatus - The present invention realizes an image forming apparatus which is equipped with a carrier recovery section of simple configuration and for which maintenance is not required, the apparatus includes: a photoconductive drum; a developing device to develop a latent image formed on the photoconductive drum by a two-component developer containing a toner and a magnetic carrier, and a carrier recovery section which is equipped with a recovery roller, wherein the carrier recovery roller includes a rotatable sleeve, and a magnet roller that is installed inside the sleeve and provided with a plurality of fixed magnetic poles including a main pole to recover the magnetic carrier adhered onto the photoconductive drum and a separating pole to separate the magnetic carrier from the recovery roller, wherein a separating member is disposed at such a position that is opposite to the sleeve at a prescribed distance in a non-contact state. | 07-14-2011 |
20110274468 | DEVELOPING DEVICE - Provided is a developing device which can prevent the occurrence of a phenomenon of an excessive increase of a developer quantity in a developer standby space, thereby acquiring a stable image. The developing device comprises a developer agitation-transfer unit, a developer roller, a developer feeding roller, a developer guide member and a space forming member. The developing device is characterized in that the developer feeding roller rotates to transfer the developer transferred by the agitation-transfer means, upward from the clearance between the developer feeding roller and the developer guide member, and in that, when the developer standby space formed in the device is filled with the developer transferred by the developer feeding roller, the developer feeding roller is rotated to carry the developer, which overflows from the developer standby space, and to move the same in the direction away from the developer roller, so that the developer is once discharged from the developer standby space. | 11-10-2011 |
20110299892 | DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - A developing device, includes a developer agitating member, an upstream side developing miler, and a downstream side developing roller; wherein the toner in the developer handed over from the upstream side developing roller to the downstream side developing roller has a volume average particle size larger than a volume average particle size of the toner in the developer conveyed by the upstream side developing roller to the facing position between the upstream side developing roller and the photoreceptor. | 12-08-2011 |
20120093527 | IMAGE FORMING APPARATUS - In an image forming apparatus including an image carrier, a developing device which uses a developer including a toner and a carrier and to develop the electrostatic latent image and forms a visible toner image, plural toner supplying devices each of which supplies the toner in which mass ratio of an additive against the toner is different, and a control section which controls a ratio of a toner supplying amount to be supplied from each of the plural toner supplying devices, under a condition that toner consumption per a single print is low, the control section is configured to increase the toner supplying ratio of the toner including a high ratio of the additive, and under a condition that the toner consumption per the single print is high, the control section is configured to decrease the toner supplying ratio of the toner including a high ratio of the additive. | 04-19-2012 |
20120141178 | LUBRICANT SUPPLYING DEVICE AND IMAGE FORMING APPARATUS - A lubricant supplying device that supplies a lubricant to the surface of an image carrier has a cloud generating section that generates a cloud in which particles of the lubricant are mixed with air and a conveying section that classifies the particles of the lubricant present in the cloud generated by the cloud generating section into small particles with sizes smaller than a prescribed size and large particles with sizes larger than or equal to the prescribed size, and conveys the classified small particles toward the image carrier, and has a lubricant supplying member that holds a lubricant, a contacting member that contacts the lubricant supplying member and causes the lubricant carried by the lubricant supplying member to fly off in the direction of the image carrier, and a leveling member that contacts the image carrier and levels the adhered lubricant. | 06-07-2012 |
20140348525 | IMAGE FORMING APPARATUS AND METHOD OF FORMING AN IMAGE - An image forming apparatus includes: an image forming section including a light exposure section configured to expose an image bearing member to light to form an electrostatic latent image, the image forming section being configured to form a toner image on the image bearing member, and to form an image on a recording sheet by transferring the toner image onto the recording sheet; an estimation section configured to estimate a density lowering position on the basis of image data of an image formed by the image forming section, the density lowering position being a position where decrease in image density relative to a predetermined image density is caused in the image; and a control section configured to increase a light exposure amount at the density lowering position estimated by the estimation section on the image bearing member to an amount greater than a predetermined light exposure amount. | 11-27-2014 |
Patent application number | Description | Published |
20090178969 | POLYMER SEPARATION MEMBRANE AND PROCESS FOR PRODUCING THE SAME - The invention provides a polymer separation membrane that is excellent in separating characteristics, a permeating ability, a chemical strength (particularly chemical resistance) and a physical strength, and also excellent in a stain resistance, and a producing method therefor. The fluorinated resin-type polymer separation membrane includes a layer having a three-dimensional network structure, and a layer having a spherical structure, wherein the layer of three-dimensional network structure is formed by a fluorinated resin-type polymer composition containing a hydrophilic polymer, and the hydrophilic polymer is a substantially water-insoluble hydrophilic polymer containing at least one of a cellulose ester, an aliphatic vinyl ester, vinylpyrrolidone, ethylene oxide and propylene oxide as a polymerization component. The polymer separation membrane is applicable as a filtration membrane for water treatment, a battery separator, a charged membrane, a fuel cell membrane or a blood cleaning filtration membrane. | 07-16-2009 |
20100000937 | FLUORORESIN POLYMER SEPARATION MEMBRANE AND PROCESS FOR PRODUCING THE SAME - A fluorine resin polymer separation membrane and a manufacturing method of the same, which are excellent in a virus-eliminating property, further excellent in water permeability, chemical strength (chemical resistance), physical strength, and an antifouling property, and particularly suitable for practicable use as a filtration membrane for the elimination of viruses, are provided. A fluorine resin polymer separation membrane includes a layer having a three-dimensional network structure and a layer having a spherical structure, in which the layer having a three-dimensional network structure does not substantially contain micro-voids having a void diameter of 5 μm or more, and the fluorine resin polymer separation membrane has filtration performance represented by the elimination rate of 80% or more of dextran having molecular weight of 75,000. The layer having a three-dimensional network structure is formed by the solidification with a polymer solution containing a fluorine resin polymer and cellulose ester. | 01-07-2010 |
20100190222 | LACTIC ACID PRODUCTION METHOD - Disclosed is a lactic acid production method by separating lactic acid produced in a culture solution by means of the fermentation culture of a microorganism. Specifically disclosed is a lactic acid production method, which comprises: a step (A) of filtering the culture solution through a nano-filtration membrane; and a step (B) of distilling a lactic-acid-containing solution produced in the step (A) under a pressure ranging from 1 Pa to the atmospheric pressure (inclusive) at a temperature ranging from 25 to 200° C. (inclusive) to collect lactic acid. The method can effectively remove an inorganic salt dissolved in a fermentation culture solution or contained in the fermentation culture solution in the form of a poorly soluble solid material by a simple manipulation, enables to prevent the racemization or oligomerization of lactic acid during the process of producing lactic acid, and therefore can produce lactic acid in a high yield. | 07-29-2010 |
Patent application number | Description | Published |
20090129255 | RECORDING METHOD, MASTER FOR OPTICAL DISK, AND OPTICAL RECORDING MEDIUM - A recording method whereby an inorganic resist made of an incomplete oxide of a transition metal is formed as a film onto a substrate and a latent image corresponding to pits is formed onto the inorganic resist by exposure. The exposure is performed by a laser beam whose intensity has been modulated by a pulse signal whose pulse height decreases in a rear portion in a length direction of the pit, thereby forming a format of a track pitch smaller than a recording beam diameter(track pitch/exposure beam diameter=0.333 to 0.833). | 05-21-2009 |
20120128917 | MANUFACTURING METHOD OF MASTER DISC FOR OPTICAL DISC, AND MASTER DISC FOR OPTICAL DISC - An inorganic resist layer made of an incomplete oxide of a transition metal is formed as a film onto a substrate by a sputtering method. A single element or alloy of the transition metal, or an oxide of them is used as a target material. Oxygen or nitrogen is used as a reactive gas. Oxygen concentration of the inorganic resist layer is made different in the thickness direction by changing a reactive gas ratio or a film forming power. A master disc (for an optical disc) in which fine concave/convex patterns such as pits, grooves, and the like have been formed by exposing and developing the inorganic resist layer is formed. Since sensitivity rises with an increase in oxygen concentration, the sensitivity can be made different in the thickness direction of the inorganic resist layer and the concave/convex shapes of different depths can be formed on the same disc. | 05-24-2012 |
20130308435 | OPTICAL INFORMATION RECORDING MEDIUM, AND METHOD OF MANUFACTURING THE SAME - An optical information recording medium has: a substrate; one, two or more information signal layers which is formed on the substrate; and a protective layer which is formed on the one, two or more information signal layers. The surface of the protective layer is a reading surface on which light for recording or playing back an information signal in the information signal layer is radiated, and, in the reading surface, a plurality of subwavelength structures is formed. | 11-21-2013 |
Patent application number | Description | Published |
20120285929 | PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid. | 11-15-2012 |
20130101942 | METHOD FOR FORMING RESIST PATTERN, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A resist pattern-forming method capable of forming a resist pattern excellent in pattern collapse resistance in the case of development with the organic solvent in multilayer resist processes. The method has the steps of: (1) providing a resist underlayer film on a substrate using a composition for forming a resist underlayer film; (2) providing a resist film on the resist underlayer film using a photoresist composition; (3) exposing the resist film; and (4) developing the exposed resist film using a developer solution containing no less than 80% by mass of an organic solvent, in which the composition for forming a resist underlayer film contains (A) a component that includes a polysiloxane chain and that has a carboxyl group, a group that can generate a carboxyl group by an action of an acid, an acid anhydride group or a combination thereof. | 04-25-2013 |
20130344249 | DIRECTED SELF-ASSEMBLY COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD - A directed self-assembly composition for pattern formation, includes two or more kinds of polymers. The two or more kinds of polymers each do not have a silicon atom in a main chain thereof. At least one of the two or more kinds of polymers has a group binding to the polymerizing end of the main chain and having a hetero atom. | 12-26-2013 |
20140093826 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND - A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R | 04-03-2014 |
20140220783 | PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION - A pattern-forming method includes providing a resist underlayer film on a substrate using a resist underlayer film-forming composition. The resist underlayer film-forming composition includes a first polymer having a glass transition temperature of 0 to 180° C. A silicon-based oxide film is provided on a surface of the resist underlayer film. A resist pattern is provided on a surface of the silicon-based oxide film using a resist composition. The silicon-based oxide film and the resist underlayer film are sequentially dry-etched using the resist pattern as a mask. The substrate is dry-etched using the dry-etched resist underlayer film as a mask. | 08-07-2014 |
20140238956 | DIRECTED SELF-ASSEMBLING COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A directed self-assembling composition for pattern formation includes a block copolymer. The block copolymer includes a polystyrene block having a styrene unit, and a polyalkyl (meth)acrylate block having an alkyl (meth)acrylate unit. The block copolymer has a group that is bound to at least one end of a main chain of the block copolymer and that includes a hetero atom. | 08-28-2014 |
20140248563 | COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER - A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R | 09-04-2014 |
20140371466 | PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - Providing a method for forming a pattern capable of forming a resist underlayer film that can be easily removed using an alkali liquid while maintaining etching resistance is objected to. Provided by the present invention is a method for forming a pattern, the method including: (1) forming a resist underlayer film on a substrate using a composition for forming a resist underlayer film containing a compound having an alkali-cleavable functional group; (2) forming a resist pattern on the resist underlayer film; (3) forming a pattern on the substrate by dry etching of the resist underlayer film and the substrate, using the resist pattern as a mask; and (4) removing the resist underlayer film with an alkali liquid. | 12-18-2014 |
20140377707 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND - A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R | 12-25-2014 |
20150093508 | COMPOSITION FOR PATTERN FORMATION AND PATTERN-FORMING METHOD - A composition for pattern formation includes a block copolymer that includes a block represented by formula (I) and a block represented by formula (II). R | 04-02-2015 |
20150187581 | BASE FILM-FORMING COMPOSITION, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD - A base film-forming composition includes a compound including a group capable of reacting with Si—OH or Si—H, and a solvent. The base film-forming composition is for forming a base film provided between a layer including a silicon atom and a directed self-assembling film in a directed self-assembly lithography process. The receding contact angle of the base film for pure water is no less than 70° and no greater than 90°. The compound is preferably represented by formula (1). In the formula (1), A represents a linking group having a valency of (m+n); D represents a monovalent organic group having at least 10 carbon atoms; E represents the group capable of reacting with Si—OH or Si—H; and m and n are each independently an integer of 1 to 200. | 07-02-2015 |
20150191829 | PATTERN-FORMING METHOD - A pattern-forming method includes providing a metal-containing film directly or indirectly on a substrate. A directed self-assembling film is provided directly or indirectly on the metal-containing film such that a plurality of phases of the directed self-assembling film is formed. At least a part of the plurality of phases of the directed self-assembling film is removed such that a pattern of the directed self-assembling film is formed. The metal-containing film and the substrate are sequentially etched using the pattern of the directed self-assembling film as a mask. | 07-09-2015 |
20150225601 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a block copolymer and a solvent. The block copolymer is capable of forming a phase separation structure through directed self-assembly. The block copolymer includes a first block and a second block. The first block includes a first repeating unit which includes at least two silicon atoms. The second block includes a second repeating unit which does not include a silicon atom. A sum of the atomic weight of atoms constituting the first repeating unit is no greater than 700. | 08-13-2015 |
20150252216 | PATTERN-FORMING METHOD AND DIRECTED SELF-ASSEMBLING COMPOSITION - A pattern-forming method includes providing a coating film using a composition that includes: a first polymer which is a block copolymer; and a second polymer having a surface free energy lower than a surface free energy of the first polymer, such that the second polymer is unevenly distributed to be localized into a superficial layer region of the coating film. Phase separation is caused in the coating film along a direction substantially perpendicular to a thickness direction of the coating film such that at least a part of the coating film is converted into a directed self-assembling film which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed. | 09-10-2015 |
20150253663 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers, and an acid generator. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes an acid-labile group in a side chain thereof. The acid generator generates an acid upon application of energy. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure. | 09-10-2015 |
20150253671 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a polymer or a polymer set including a plurality of polymers. The polymer or the polymer set is capable of forming a phase separation structure through directed self-assembly. The polymer or at least one polymer in the polymer set includes a crosslinkable group in a side chain thereof. A pattern-forming method includes providing a directed self-assembling film on a substrate using the composition. The directed self-assembling film includes a phase separation structure. | 09-10-2015 |
20150277223 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD - A composition for pattern formation includes a block copolymer and a solvent. The block copolymer includes a group including a reactive group on at least one end of a main chain of the block copolymer. A pattern-forming method includes providing a directed self-assembling film directly or indirectly on a substrate using the composition. The directed self-assembling film includes a phase separation structure which includes a plurality of phases. A part of the plurality of phases of the directed self-assembling film is removed. | 10-01-2015 |
20150301445 | COMPOSITION FOR BASE, AND DIRECTED SELF-ASSEMBLY LITHOGRAPHY METHOD - A composition for a base of a directed self-assembling film includes a compound including an oxo acid group, and a solvent. The compound is preferably represented by formula (1). A represents an organic group having 10 or more carbon atoms and having a valency of n. B represents an oxo acid group. n is an integer of 1 to 200. In a case where n is 2 or greater, a plurality of Bs are identical or different. | 10-22-2015 |
Patent application number | Description | Published |
20120129353 | METHOD FOR PATTERN FORMATION, METHOD AND COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND RESIST UNDERLAYER FILM - Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask. | 05-24-2012 |
20120181251 | PATTERN FORMING METHOD AND RESIST UNDERLAYER FILM-FORMING COMPOSITION - A pattern-forming method includes forming a resist underlayer film on a substrate using a resist underlayer film-forming composition. The resist underlayer film-forming composition includes a base component, and a crosslinking agent. The crosslinking agent has a partial structure represented by a following general formula (i). X represents an oxygen atom, a sulfur atom, or —NR—. R represents a hydrogen atom, an alkyl group having 1 to 9 carbon atoms, or an aryl group having 6 to 30 carbon atoms. n | 07-19-2012 |
20120183908 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 07-19-2012 |
20120252217 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND METHOD FOR FORMING PATTERN - A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, | 10-04-2012 |
20120270157 | RESIST UNDERLAYER FILM-FORMING COMPOSITION AND METHOD FOR FORMING PATTERN - A resist underlayer film-forming composition includes a polymer including a structural unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of from 3000 to 10000, and a solvent. Each of R | 10-25-2012 |
20130130179 | POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD - A polysiloxane composition includes a polysiloxane, and a first compound. The first compound includes a nitrogen-containing heterocyclic ring structure, and a polar group, an ester group or a combination thereof. A pattern-forming method includes coating the polysiloxane composition on a substrate to be processed to provide a silicon-containing film. A resist composition is coated on the silicon-containing film to provide a resist coating film. The resist coating film is selectively irradiated with a radioactive ray through a photomask to expose the resist coating film. The exposed resist coating film is developed to form a resist pattern. The silicon-containing film and the substrate to be processed are sequentially dry etched using the resist pattern as a mask. | 05-23-2013 |
20130273476 | PATTERN-FORMING METHOD, RESIST UNDERLAYER FILM, AND COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A pattern-forming method includes: (1) a resist underlayer film-forming step of providing a resist underlayer film on an upper face side of a substrate by coating a resist underlayer film-forming composition containing a resin having a phenolic hydroxyl group; (2) a resist pattern-forming step of forming a resist pattern on an upper face side of the resist underlayer film; (3) a pattern-forming step of dry etching at least the resist underlayer film and the substrate, with the aid of the resist pattern as a mask to form a pattern on the substrate; and (4) a resist underlayer film-removing step of removing the resist underlayer film on the substrate with a basic solution, in the order of (1) to (4). | 10-17-2013 |
20130310514 | RESIST UNDERLAYER FILM-FORMING COMPOSITION - A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R | 11-21-2013 |
20130341304 | RESIST UNDERLAYER FILM-FORMING COMPOSITION, PATTERN-FORMING METHOD AND RESIST UNDERLAYER FILM - A resist underlayer film-forming composition includes a polymer having a glass transition temperature (Tg) of 0 to 180° C. The resist underlayer film-forming composition is used for a multilayer resist process. The multilayer resist process includes forming a silicon-based oxide film on a surface of a resist underlayer film, and subjecting the silicon-based oxide film to wet etching. | 12-26-2013 |
20140048512 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM AND PATTERN-FORMING METHOD - A composition for forming a resist underlayer film includes a polymer having a repeating unit represented by a following formula (1), and a solvent. R | 02-20-2014 |
20140134544 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 05-15-2014 |
20150050600 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 02-19-2015 |
20150160556 | RESIST PATTERN-FORMING METHOD - A resist pattern-forming method includes applying a resist underlayer film-forming composition to a substrate to form a resist underlayer film. The resist underlayer film-forming composition includes (A) a polysiloxane. A radiation-sensitive resin composition is applied to the resist underlayer film to form a resist film. The radiation-sensitive resin composition includes (a1) a polymer that changes in polarity and decreases in solubility in an organic solvent due to an acid. The resist film is exposed. The exposed resist film is developed using a developer that includes an organic solvent. | 06-11-2015 |
20150197664 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM - A composition for forming a resist underlayer film includes (A) a compound. The compound (A) includes a group represented by formula (1). R represents a monovalent organic group having 1 to 30 carbon atoms. The monovalent organic group represented by R does not include an oxygen atom at an end of the side adjacent the sulfur atom. * represents a bonding hand. The compound (A) preferably includes a ring which is an aromatic ring, a heteroaromatic ring, or a combination thereof. The bonding hand denoted by * in the group represented by the formula (1) is preferably linked directly or via an oxygen atom to the ring. | 07-16-2015 |
Patent application number | Description | Published |
20120301824 | LAYERED STRUCTURE AND PHOTOSENSITIVE DRY FILM TO BE USED THEREFOR - In a layered structure having at least a substrate and a photosensitive resin layer or cured film layer formed on the substrate and containing an inorganic filler, the content of the inorganic filler in the photosensitive resin layer or cured film layer is low on the side contacting the substrate and high on the surface side away from the substrate, so that a linear thermal expansion coefficient of the photosensitive resin layer or cured film layer as a whole is maintained as low as possible. Preferably, the inorganic filler content in the layer gradually increases continuously obliquely or stepwise from the side contacting the substrate to the surface side away from the substrate. A photosensitive dry film containing the above-mentioned photosensitive resin layer is suitable for use as a solder resist or an interlayer resin insulation layer of a printed wiring board. | 11-29-2012 |
20120301825 | LAYERED STRUCTURE AND PHOTOSENSITIVE DRY FILM TO BE USED THEREFOR - In a layered structure having at least a substrate and a photosensitive resin layer or cured film layer formed on the substrate and containing an inorganic filler, the content of the inorganic filler in the photosensitive resin layer or cured film layer is lower in a surface layer region away from the substrate than in other region, so that a linear thermal expansion coefficient of the layer as a whole is maintained as low as possible. Preferably, the photosensitive resin layer or cured film layer comprises at least two layers having different inorganic filler contents, wherein the inorganic filler content in the layer on the surface side away from the substrate is lower than the inorganic filler content in the other layer. A photosensitive dry film containing the photosensitive resin layer is suitable for use as a solder resist or an interlayer resin insulation layer of a printed wiring board. | 11-29-2012 |
20150185603 | LAYERED STRUCTURE AND PHOTOSENSITIVE DRY FILM TO BE USEDTHEREFOR - In a layered structure having at least a substrate and a photosensitive resin layer or cured film layer formed on the substrate and containing an inorganic filler, the content of the inorganic filler in the photosensitive resin layer or cured film layer is low on the side contacting the substrate and high on the surface side away from the substrate, so that a linear thermal expansion coefficient of the photosensitive resin layer or cured film layer as a whole is maintained as low as possible. Preferably, the inorganic filler content in the layer gradually increases continuously obliquely or stepwise from the side contacting the substrate to the surface side away from the substrate. A photosensitive dry film containing the above-mentioned photosensitive resin layer is suitable for use as a solder resist or an interlayer resin insulation layer of a printed wiring board. | 07-02-2015 |
Patent application number | Description | Published |
20100092879 | PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART - To provide a photosensitive resin composition in which a hardened film obtained from the photosensitive resin composition has properties comparable to those of a film hardened at a high temperature, a method for manufacturing a patterned hardened film using the photosensitive resin composition, and an electronic part. The photosensitive resin composition includes (a) a polybenzoxazole precursor having a repeating unit represented by a general formula (I): | 04-15-2010 |
20100159217 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERNS, AND ELECTRONIC PARTS - A heat resistant negative-type photosensitive resin composition which is good in sensitivity and resolution, a method for producing a pattern capable of obtaining the pattern which is excellent in sensitivity, resolution and heat resistance and has a good shape, and a highly reliable electronic part having the pattern having a good shape and property are provided. A crosslinking agent capable of crosslinking or polymerizing by an action of an acid includes a compound having at least one methylol group or alkoxyalkyl group in a molecule, in the negative-type photosensitive resin composition. | 06-24-2010 |
20100258336 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, ELECTRONIC COMPONENT - Provided are a positive photosensitive resin composition that is developable in an alkaline aqueous solution and gives a good shaped pattern that is excellent in heat resistance and mechanical property, a method for producing the pattern and an electronic component. The positive photosensitive resin composition contains (a) polybenzoxazole or a polybenzoxazole precursor polymer having a structural unit represented by either a general formula (1) or (2) and satisfying conditions (i) and/or (ii), (b) a compound that generates an acid by being irradiated with active light ray and (c) a compound having a structure represented by a general formula (3) crosslinkable or polymerizable with said component (a). | 10-14-2010 |
20110171436 | NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND ELECTRONIC PARTS - A negative-type photosensitive resin composition which is good in sensitivity and resolution, a pattern forming method by the use thereof wherein a pattern which can be developed in an alkali aqueous solution, is excellent in sensitivity, resolution and heat resistance and has a good shape is obtained, and highly reliable electronic parts are provided. The negative-type photosensitive rein composition includes (a) a polymer that has a phenolic hydroxyl group at a terminal and is soluble in the alkali aqueous solution, (b) a compound that generates an acid by irradiating active light, and (c) a compound that can be crosslinked or polymerized by an action of the acid. | 07-14-2011 |
20120288798 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM AND ELECTRONIC COMPONENT - A positive photosensitive resin composition including: | 11-15-2012 |
20120328856 | PHOTOSENSITIVE RESIN COMPOSITION AND CIRCUIT FORMATION SUBSTRATE USING THE SAME - A photosensitive resin composition for an interlayer insulating film or a protective film of a substrate for circuit formation, which includes a polymer (a) having a structural unit shown by the formula (A) and a compound (b) which generates a radical when irradiated with active rays and has a structure shown by the following formula (B). | 12-27-2012 |
20130143011 | PHOTOSENSITIVE RESIN COMPOSITION - A photosensitive resin composition including: (a) a polyamide acid; (b) a compound (b1) having 4 or more of a methylol group, a methoxymethyl group and the both thereof, or a compound (b2) represented by the following formula (2); and (c) a photopolymerization initiator. | 06-06-2013 |
Patent application number | Description | Published |
20090162457 | RESVERATROL AND/OR GRAPE LEAF EXTRACT AS I. A. ENDURANCE IMPROVER, ANTI-AGING AGENT, MUSCLE STRENGTH IMPROVER - To provide an endurance improver, anti-fatigue agent and anti-aging agent having an ingredient taken for long years as a food, having high safety, easily available, and excellent in processability. An endurance improver, anti-fatigue agent, muscle strength improver, motor performance enhancer and anti-aging agent containing resveratrol and/or grape leaf extract as an effective ingredient. | 06-25-2009 |
20120010285 | AGENT FOR PROMOTING ENERGY CONSUMPTION - Provision of a pharmaceutical product, a quasi-drug, a food, a beverage, a pet food, a feed, and others which are highly safe, have excellent action of promoting energy consumption, promoting fat burning, promoting carbohydrate burning, or improving an effect of exercise, and which are effective for the prevention or amelioration of obesity or metabolic syndrome or the improvement of motor functions. | 01-12-2012 |
Patent application number | Description | Published |
20120057808 | IMAGE PROCESSING APPARATUS AND METHOD FOR CONTROLLING IMAGE PROCESSING APPARATUS - An image processing apparatus for applying film grain effects on an image of received image data includes a generating unit configured to generate, on the basis of pixel values randomly read from grain data including a plurality of pixel values, a basic grain image having a certain size larger than the grain data; a resizing unit configured to resize the basic grain image generated by the generating unit to have the same size as the received image data; and a combining unit configured to combine the basic grain image resized by the resizing unit with the received image data. | 03-08-2012 |
20130121578 | IMAGE PROCESSING APPARATUS AND CONTROL METHOD THEREFOR - An apparatus comprises a unit which stores a size and scene information for each of a plurality of divided areas obtained by dividing an input image, a unit which obtains a plurality of scene-based images by processing the input image based on the scene information of the plurality of divided areas, a unit which determines composite ratios of the plurality of scene-based images by determining, for each of the plurality of divided areas, a transition pattern of a composite ratio from a first composite ratio within the divided area to a second composite ratio within an area other than the divided area based on the size of the divided area, and a unit which composites the plurality of scene-based images in correspondence with the plurality of the divided areas, in accordance with the determined composite ratios. | 05-16-2013 |
20150036878 | IMAGE PROCESSING APPARATUS AND IMAGE PROCESSING METHOD - There is provided an image processing apparatus for composing a plurality of images captured while changing an exposure amount, including a displacement detection means for detecting a displacement amount between the plurality of images, a correction means for correcting a displacement between the images based on the displacement amount detected by the displacement detection means, a moving object region detection means for detecting a moving object region from the plurality of images for which the displacement has been corrected, an image composition means for composing the plurality of images for which the displacement has been corrected, and a moving object processing means for replacing a region corresponding to the moving object region of the composite image composed by the image composition means by an image obtained by performing weighted addition of the plurality of images. | 02-05-2015 |
Patent application number | Description | Published |
20110056833 | PRECAST GEL FOR ELECTROPHORESIS, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME - This invention relates to a precast gel for electrophoresis comprising a support filled with an aqueous gel prepared by polymerizing an aqueous solution comprising a radically polymerizable monomer, a crosslinkable monomer, a buffer, a redox initiator comprising an oxidizer/reducer, and a photo sensitizer and having a pH level of 6.0 to 7.5 via light application. The slab gel for electrophoresis of the present invention can produce a precast gel for electrophoresis within a shorter period of time and in an easier manner than is possible with conventional techniques. Accordingly, the present invention enables production of a high-quality precast gel for electrophoresis in terms of productivity, cost, and quality, and the industrial applicability thereof is remarkable. | 03-10-2011 |
20120234669 | PRECAST GEL FOR ELECTROPHORESIS, METHOD FOR PRODUCING THE SAME, AND USE OF THE SAME - This invention relates to a precast gel for electrophoresis comprising a support filled with an aqueous gel prepared by polymerizing an aqueous solution comprising a radically polymerizable monomer, a crosslinkable monomer, a buffer, a redox initiator comprising an oxidizer/reducer, and a photo sensitizer and having a pH level of 6.0 to 7.5 via light application. The slab gel for electrophoresis of the present invention can produce a precast gel for electrophoresis within a shorter period of time and in an easier manner than is possible with conventional techniques. Accordingly, the present invention enables production of a high-quality precast gel for electrophoresis in terms of productivity, cost, and quality, and the industrial applicability thereof is remarkable. | 09-20-2012 |