Patent application number | Description | Published |
20120228525 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result. | 09-13-2012 |
20120305809 | APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection. | 12-06-2012 |
20130015319 | OPTICAL DEVICE, LASER APPARATUS INCLUDING THE OPTICAL DEVICE, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUSAANM Moriya; MasatoAACI Oyama-shiAACO JPAAGP Moriya; Masato Oyama-shi JPAANM Wakabayashi; OsamauAACI Hiratsuka-shiAACO JPAAGP Wakabayashi; Osamau Hiratsuka-shi JP - An optical device may include a mirror for respectively reflecting and transmitting parts of a first laser beam as first reflected and first transmitted beams, and for respectively transmitting and reflecting parts of a second laser beam as second transmitted and second reflected beams; an optical system disposed so that the first and second laser beams are such that beam paths of the first transmitted and second reflected beams are parallel or substantially coincide, or such that beam paths of the first reflected and second transmitted beams are parallel or substantially coincide; first and second measuring units configured to respectively measure a beam parameter of the first transmitted or first reflected beams, and of the second reflected or second transmitted beams; and first and second adjusting units configured to adjust the first and second laser beams based on measurement results by the measuring units. | 01-17-2013 |
20130037693 | OPTICAL SYSTEM AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION SYSTEM INCLUDING THE OPTICAL SYSTEM - An optical system used with a laser apparatus may include a focusing optical system, a beam splitter, and an optical sensor. The focusing optical system has one or more focus, for focusing a laser beam outputted from the laser apparatus. The beam splitter is disposed between the focusing optical system and the one or more focus of the focusing optical system. The optical sensor is disposed on a beam path of a laser beam split by the beam splitter. | 02-14-2013 |
20130048886 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter. | 02-28-2013 |
20130105713 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS | 05-02-2013 |
20130119232 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image. | 05-16-2013 |
20140348188 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units. | 11-27-2014 |