Patent application number | Description | Published |
20100195196 | LASER BEAM AMPLIFIER AND LASER APPARATUS USING THE SAME - A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point. | 08-05-2010 |
20110309271 | SPECTRAL PURITY FILTER AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS PROVIDED WITH THE SPECTRAL PURITY FILTER - A spectral purity filter may include: a plurality of segments that each includes a mesh in which an array of apertures of an aperture size at or below a predetermined size is formed and which has electroconductivity; and a frame that supports the plurality of the segments at least at a periphery thereof. | 12-22-2011 |
20130250402 | LASER BEAM AMPLIFIER AND LASER APPARATUS USING THE SAME - A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point. | 09-26-2013 |
20140319388 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS - A laser apparatus may include a master oscillator configured to output a pulse laser beam, an amplifier disposed in a light path of the pulse laser beam, a wavelength selection element disposed in the light path of the pulse laser beam and configured to transmit light of a selection wavelength at higher transmittance than transmittance of light of other wavelengths, and a controller configured to change the selection wavelength of the wavelength selection element. | 10-30-2014 |
Patent application number | Description | Published |
20090314967 | EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser. | 12-24-2009 |
20100140512 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet (EUV) light source apparatus in which a location or posture shift of an EUV collector mirror can be detected. The apparatus includes: a chamber; a target supply mechanism for supplying a target material into the chamber; a driver laser for irradiating the target material with a laser beam to generate plasma; a collector mirror having a first focal point and a second focal point, for reflecting light, which is generated at the first focal point, toward the second focal point; a splitter optical element provided in an optical path of the light reflected by the collector mirror, for splitting a part of the light reflected by the collector mirror; and an image sensor provided in an optical path of the light split by the splitter optical element, for detecting a profile of the light split by the splitter optical element. | 06-10-2010 |
20100171049 | Extreme ultraviolet light source apparatus - An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector. | 07-08-2010 |
20100176310 | Extreme ultra violet light source apparatus - An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated. | 07-15-2010 |
20110180734 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector. | 07-28-2011 |
20130240762 | EXTREME ULTRA VIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser. | 09-19-2013 |
Patent application number | Description | Published |
20080267816 | Optical element contamination preventing method and optical element contamination preventing device of extreme ultraviolet light source - Solid tin (Sn) is used as a target, a CO | 10-30-2008 |
20090020234 | SLIDING SCREEN DOOR - The present invention is constructed such that in a sliding screen door in which a net is formed to be capable of expansion and contraction by being alternately folded back in a reverse direction, and is formed to be capable of freely opening and closing by horizontal pulling, a net guide for guiding the aforementioned net is formed to be able to form the net guide into a straight line-shape in a condition of being led out from a frame member, and a movement of a net-holding member that follows the net guide is made smooth, and many of the guiding elements form the net guide | 01-22-2009 |
20090159222 | HOLDING MEMBER FOR WINDOW SCREEN - [Object] To provide a holding member for a net for a screen door effective for fixing a net for a screen door having fine filaments and a fine mesh compared with a known insect protection net to a frame body for use in a screen door. | 06-25-2009 |
20090266495 | FOLDABLE SCREEN DEVICE - In a folding screen device pulled in the lateral direction, the widthwise dimension limit of the screen device in the opening and closing direction of the screen is eliminated. A plurality of screen units include movable vertical frame members attached to both ends of a screen expandable in an accordion manner. The vertical frame members are slidable along a lateral frame member of a building opening. Screen guides in the screen units move out and into the interior of the vertical frame member through upper and lower ends thereof in a bent state, and are led along upper and lower ends of the screen in an extended state. A parallel movement mechanism causes the vertical frame members to move in parallel during opening and closing of the screen. The screen units can be arranged in parallel in the building opening by connecting adjacent vertical frame members of the screen units. | 10-29-2009 |
20100025231 | Method for cleaning optical element of EUV light source device and optical element cleaning device - A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO | 02-04-2010 |
20120298134 | METHOD FOR CLEANING OPTICAL ELEMENT OF EUV LIGHT SOURCE DEVICE AND OPTICAL ELEMENT CLEANING DEVICE - A method for cleaning an optical element of an extreme ultraviolet light source device for removing, from the optical element in a chamber, scattered matter generated together with extreme ultraviolet light by plasma formed through laser beam excitation of a target in the chamber, the method which comprises: making the scattered matter generated by the plasma no larger than nanosize by using solid tin as the target and using a CO | 11-29-2012 |
Patent application number | Description | Published |
20120228525 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - Systems and methods are provided in which an extreme ultraviolet (EUV) light generation apparatus used with a laser apparatus is configured to detect an image of a laser beam by which a target has been irradiated. The EUV light generation apparatus may also be configured to control the position at which a laser beam is to be focused and the position of a target, based on the detection result. | 09-13-2012 |
20120305809 | APPARATUS AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - An apparatus for generating extreme ultraviolet light is used with a first laser device for outputting a first laser beam. The apparatus includes a second laser device for outputting a second laser beam, a beam adjusting unit for causing beam axes of the first and second laser beams to substantially coincide with each other, a chamber, a target supply unit for supplying target materials into the chamber, a laser beam focusing optical system for focusing the first laser beam on the target material for plasma generation, an optical detection system for detecting the second laser beam and light from plasma, a focus position correction mechanism for correcting a first laser beam focusing position, and a target supply position correction mechanism for correcting a target material supplying position, and a controller for the focus position correction mechanism and the target supply position correction mechanism based on the optical detection system's detection. | 12-06-2012 |
20130015319 | OPTICAL DEVICE, LASER APPARATUS INCLUDING THE OPTICAL DEVICE, AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM INCLUDING THE LASER APPARATUSAANM Moriya; MasatoAACI Oyama-shiAACO JPAAGP Moriya; Masato Oyama-shi JPAANM Wakabayashi; OsamauAACI Hiratsuka-shiAACO JPAAGP Wakabayashi; Osamau Hiratsuka-shi JP - An optical device may include a mirror for respectively reflecting and transmitting parts of a first laser beam as first reflected and first transmitted beams, and for respectively transmitting and reflecting parts of a second laser beam as second transmitted and second reflected beams; an optical system disposed so that the first and second laser beams are such that beam paths of the first transmitted and second reflected beams are parallel or substantially coincide, or such that beam paths of the first reflected and second transmitted beams are parallel or substantially coincide; first and second measuring units configured to respectively measure a beam parameter of the first transmitted or first reflected beams, and of the second reflected or second transmitted beams; and first and second adjusting units configured to adjust the first and second laser beams based on measurement results by the measuring units. | 01-17-2013 |
20130037693 | OPTICAL SYSTEM AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION SYSTEM INCLUDING THE OPTICAL SYSTEM - An optical system used with a laser apparatus may include a focusing optical system, a beam splitter, and an optical sensor. The focusing optical system has one or more focus, for focusing a laser beam outputted from the laser apparatus. The beam splitter is disposed between the focusing optical system and the one or more focus of the focusing optical system. The optical sensor is disposed on a beam path of a laser beam split by the beam splitter. | 02-14-2013 |
20130048886 | CHAMBER APPARATUS AND EXTREME ULTRAVIOLET (EUV) LIGHT GENERATION APPARATUS INCLUDING THE CHAMBER APPARATUS - A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter. | 02-28-2013 |
20130105713 | EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS | 05-02-2013 |
20130119232 | SYSTEM AND METHOD FOR GENERATING EXTREME ULTRAVIOLET LIGHT - A system for generating extreme ultraviolet light may include a chamber, a target supply device configured to supply a target material into the chamber, a laser apparatus configured to output a laser beam to irradiate the target material, a wavefront adjuster configured to adjust a wavefront of the laser beam, an imaging optical system configured to focus the laser beam reflected by the target material, an image detector configured to capture an image of the laser beam focused by the imaging optical system, and a controller configured to control the wavefront adjuster based on the captured image. | 05-16-2013 |
20140348188 | LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM - A laser apparatus may include a master oscillator, an optical unit provided in a beam path of a laser beam from the master oscillator, a beam adjusting unit provided upstream from the optical unit in a beam path of the laser beam and configured for adjusting at least one of a beam path and a wavefront of the laser beam, a first detection unit provided between the beam adjusting unit and the optical unit in a beam path of the laser beam and configured for detecting the laser beam, a second detection unit provided downstream from the optical unit in a beam path of the laser beam and configured for detecting the laser beam, and a controller configured for controlling the beam adjusting unit based on outputs from the first and second detection units. | 11-27-2014 |