Patent application number | Description | Published |
20090133256 | MANUFACTURING METHOD OF LIQUID EJECTION HEAD - A manufacturing method of a liquid ejection head provided with a flow passage communicating with an ejection outlet for ejecting liquid includes steps of preparing a substrate on which a flow passage wall forming member for forming a part of a wall of the flow passage and a solid layer having a shape of a part of the flow passage contact each other, wherein the flow passage wall forming member has a height, from a surface of the substrate, substantially equal to that of the solid layer; providing on the solid layer a pattern having a shape of another part of the flow passage; providing a coating layer, for forming another part of the wall of the flow passage, so as to coat the pattern; providing the ejection outlet to the coating layer; and forming the flow passage by removing the solid layer and the pattern. | 05-28-2009 |
20090136875 | MANUFACTURING METHOD OF LIQUID EJECTION HEAD - A manufacturing method of a liquid ejection head including an ejection outlet forming member provided with an ejection outlet for ejecting liquid and a flow passage communicating with the ejection outlet is constituted by the steps of: preparing a substrate on which a flow passage wall forming member for forming a part of a wall of the flow passage and a solid layer having a shape of a part of the flow passage contact each other, wherein the flow passage wall forming member has a height, from a surface of the substrate, substantially equal to that of the solid layer; providing a first layer, on the solid layer and the flow passage wall forming member, formed of a negative photosensitive resin material for forming another part of the wall of the flow passage; exposing to light a portion of the first layer correspondingly to the another part of the wall of the flow passage; providing a second layer, on the exposed first layer, formed of a negative photosensitive resin material to constitute the ejection outlet forming member; exposing to light a portion of the second layer correspondingly to the ejection outlet forming member; and forming the ejection outlet and another part of the flow passage by removing unexposed portions of the first layer and the second layer. | 05-28-2009 |
20090183368 | METHOD OF MANUFACTURING INK JET RECORDING HEAD - A method of manufacturing an ink jet recording head includes the steps of: forming an adhesive layers and the side walls of a flow path on a substrate; pasting a dry film, which is a part of a flow path forming member, on the side walls; and forming discharge ports in the layer. | 07-23-2009 |
20090302502 | PROCESS OF PRODUCING LIQUID DISCHARGE HEAD - Provided is a process of producing a liquid discharge head having a substrate, a passage-forming member, and a patterned layer. The process includes providing a resin layer on a substrate; providing a resist pattern on the resin layer for patterning the resin layer; forming a patterned layer by patterning the resin layer using the resist pattern as a mask; providing a layer for forming a passage pattern having a shape of passage on the resist pattern lying on the patterned layer; forming a passage pattern by patterning the layer for forming a passage pattern; removing the resist pattern; providing a passage-forming member so as to cover the passage pattern and the patterned layer; and removing the passage pattern to give the passage. | 12-10-2009 |
20100003773 | METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD - A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure. | 01-07-2010 |
20100147793 | METHOD FOR PRODUCING LIQUID DISCHARGE HEAD - The present invention provides a method for producing a liquid discharge head including a silicon substrate having, on a first surface, energy generating elements, and a supply port penetrating the substrate from the first surface to a second surface, which is a rear surface of the first surface of the substrate. The method includes the steps of: preparing the silicon substrate having a sacrifice layer at a portion on the first surface where the ink supply port is to be formed and an etching mask layer having a plurality of openings on the second surface, the volume of a portion of the sacrifice layer at a position corresponding to a portion between two adjacent said openings being smaller than the volume of a portion of the sacrifice layer at a position corresponding to the opening; etching the silicon substrate from the plurality of openings and etching the sacrifice layer. | 06-17-2010 |
20100212159 | LIQUID DISCHARGE HEAD AND MANUFACTURING METHOD THEREOF - An object of the invention is to provide a method of manufacturing a liquid discharge head in which a distance from a discharge opening and an energy generating element is uniform, simply and with good precision. | 08-26-2010 |
20100233630 | METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD - A method for manufacturing a liquid discharge head that includes a flow path wall member which forms a wall of a flow path communicating with a discharge port for discharging a liquid and a substrate which forms the flow path in contact with the flow path wall member includes providing a first layer, which is made of a photosensitive resin on the substrate, for forming a pattern having a shape of the flow path, providing a second layer which is capable of absorbing light within a photosensitive wavelength range of the photosensitive resin and has a shape corresponding to the shape of the flow path, on the first layer so as to come into contact with the first layer, performing patterning of the first layer which includes exposure of the first layer with the light using the second layer as a mask, and forming the pattern from the first layer, providing a cover layer which is made of a photosensitive resin and serves as the flow path wall member so as to cover the second layer and the pattern, forming the discharge port on the cover layer by performing patterning of the cover layer which includes exposure of the cover layer with the light, and forming the flow path by removing the second layer and the pattern. | 09-16-2010 |
20110107598 | LIQUID EJECTION HEAD AND METHOD FOR MANUFACTURING LIQUID EJECTION HEAD - A liquid ejection head and a method of forming the same. The liquid ejection head includes a substrate, an ejection port, a liquid channel, and a supply port. The substrate has, above one side thereof, an energy generating element configured to generate energy used to eject liquid. The ejection port, from which a liquid is ejected, is located at a position corresponding to the energy generating element. The liquid channel communicates with the ejection port and penetrates the substrate from the one side to another side of the substrate. The supply port communicates with the liquid channel. The substrate has a projecting layer extending inward of an inner peripheral portion of an opening in the supply port in the one side, and the projecting layer and the energy generating element are formed of the same material. | 05-12-2011 |
20110148960 | LIQUID EJECTION HEAD, METHOD FOR EVALUATION OF LIQUID EJECTION HEAD, AND LIQUID EJECTION APPARATUS HAVING LIQUID EJECTION HEAD - The opening area and shape of ejection orifices provided in an ejection orifice member influence the amount of liquid droplet. Therefore, it is necessary to check the opening area and shape of the ejection orifices in detail. For this purpose, in a liquid ejection head having ejection orifices used for ejecting liquid using energy generated by energy generating elements and a dummy ejection orifice having the same shape as the ejection orifices and not used for ejection of liquid, an examination member is provided at a position facing the dummy ejection orifice. | 06-23-2011 |
20120206535 | METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD - A method for manufacturing a liquid discharge head provided with a substrate which has a layer made of silicon nitride and with a discharge port forming member which is disposed above the layer made of silicon nitride and has a discharge port for discharging liquid. The method includes providing a photosensitive layer that is to be the discharge port forming member above the layer made of silicon nitride, and forming the discharge port by exposing the photosensitive layer to i-line. The layer made of silicon nitride has a refractive index of 2.05 or more to light of a wavelength of 633 nm and irradiation with the i-line is performed in the exposure. | 08-16-2012 |
20130017496 | METHOD FOR MANUFACTURING RECORDING HEADAANM Matsumoto; KeijiAACI Yokohama-shiAACO JPAAGP Matsumoto; Keiji Yokohama-shi JPAANM Asai; KazuhiroAACI Kawasaki-shiAACO JPAAGP Asai; Kazuhiro Kawasaki-shi JPAANM Honda; TetsuroAACI Oita-shiAACO JPAAGP Honda; Tetsuro Oita-shi JPAANM Uohashi; KunihitoAACI Yokohama-shiAACO JPAAGP Uohashi; Kunihito Yokohama-shi JPAANM Koyama; ShujiAACI Kawasaki-shiAACO JPAAGP Koyama; Shuji Kawasaki-shi JPAANM Ohsumi; MasakiAACI Yokosuka-shiAACO JPAAGP Ohsumi; Masaki Yokosuka-shi JP - A method for manufacturing a recording head including forming a flow-channel side-wall forming layer which contains a photosensitive resin, on a substrate having ejection energy generating elements and wiring thereon; exposing the flow-channel side-wall forming layer to light, and optically determining a flow channel; forming a shape stabilizing layer which contains a photosensitive resin; forming an ejection orifice forming layer which contains a photopolymerization initiator and a negative photosensitive resin; exposing the ejection orifice forming layer to light, and optically determining an ejection orifice; and developing the ejection orifice forming layer, shape stabilizing layer, and flow-channel side-wall forming layer, in the order named. The photosensitive resin in the shape stabilizing layer is a material to be cured by a component that is produced upon the exposure of the ejection orifice forming layer and derives from the photopolymerization initiator. | 01-17-2013 |
20130027468 | LIQUID EJECTING HEAD AND METHOD FOR MANUFACTURING THE SAME - A liquid ejecting head including a liquid ejecting port for ejecting a liquid and nozzle layer having a liquid channel communicating with the liquid ejecting port, wherein the nozzle layer has two layers, and a first layer which is a layer at the side of the liquid channel among the two layers has a resin film-formed with an acid and has a smaller static contact angle of water as compared with a second layer which is the other layer. | 01-31-2013 |
20130029056 | METHOD FOR MANUFACTURING LIQUID EJECTING HEAD - A method for manufacturing a liquid ejecting head including an orifice plate having an ejecting orifice and a liquid channel, and a substrate having a liquid ejecting energy generating element and a liquid supply port, the method including: (1) forming a liquid channel mold of a soluble resin dissolved in (6) on the substrate; (2) coating the liquid channel mold with a photosensitive resin layer having a refractive index of n at an exposure wavelength used in (4); (3) forming an antireflective film having a refractive index of ānā0.2 or more to ān+0.2 or less at the exposure wavelength used in (4) on the photosensitive resin layer; (4) exposing and developing the photosensitive resin layer and antireflective film to form the ejecting orifice; (5) forming the liquid supply port on the substrate; and (6) dissolving and removing the liquid channel mold from the liquid supply port. | 01-31-2013 |
20130330673 | PROCESS FOR PRODUCING EJECTION ORIFICE FORMING MEMBER AND LIQUID EJECTION HEAD - A process for producing an ejection orifice forming member including the steps of forming a laminate including a first negative photosensitive resin layer that contains a first photoacid generator, and a second negative photosensitive resin layer that is formed on the first negative photosensitive resin layer and contains a second photoacid generator; forming a first latent image and a second latent image on the first negative photosensitive resin layer and the second negative photosensitive resin layer, respectively, by collectively subjecting the first negative photosensitive resin layer and the second negative photosensitive resin layer to exposure; performing a heat treatment after the exposure; and forming the ejection orifice by a development treatment. The first photoacid generator in the first latent image has an acid diffusion length greater than the acid diffusion length of the second photoacid generator in the second latent image. | 12-12-2013 |
20140024148 | METHOD OF MANUFACTURING SUBSTRATE OF LIQUID EJECTION HEAD - A method of manufacturing a substrate of a liquid ejection head including: forming a plurality of recesses in a silicon wafer; etching the silicon wafer with etchant to form a depression and a plurality of through holes formed from the plurality of the recesses in the depression; and manufacturing a plurality of substrates of the liquid ejection head from the silicon wafer by dividing the silicon wafer on the basis of through holes. | 01-23-2014 |
20140199481 | METHOD FOR FORMING CHEMICAL LAYER AND APPARATUS FOR FORMING CHEMICAL LAYER - A method for forming a chemical layer on a surface of a substrate by rotationally applying a chemical, including spraying a chemical-removing solvent to a region where a filamentously entangled chemical is generated when excess of the chemical discharged to the outside of the substrate during rotational application of the chemical becomes solidified. | 07-17-2014 |
20140212997 | PROCESS FOR PRODUCING SUBSTRATE FOR LIQUID EJECTION HEAD AND PROCESS FOR PROCESSING SILICON SUBSTRATE - A process for producing a substrate for a liquid ejection head in which a depressed portion is formed on a second surface that is a surface opposite to a first surface of a silicon substrate having an element formation region on the first surface with a peripheral side region left, the process including the steps of (1) forming an etching mask layer covering the second surface of the silicon substrate; (2) subjecting the etching mask layer and the silicon substrate to laser abrasion processing to form a pattern opening that does not pass through the silicon substrate; and (3) performing a wet etching process to the silicon substrate where the pattern opening is formed from a side of the second surface to form the depressed portion. The depressed portion is formed over a center side region including a position corresponding to the element formation region. | 07-31-2014 |