Masahiro Numakura
Masahiro Numakura, Nirasaki JP
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20100268364 | SUBSTRATE RECEIVING METHOD AND CONTROLLER - A substrate receiving method in a substrate processing system includes: a processing process of transferring a plurality of unprocessed substrates accommodated in a first substrate storage container to a substrate processing chamber in sequence and performing a plasma process on the unprocessed substrates in the substrate processing chamber; a retreating process of retreating the plasma-processed substrates temporarily to a second substrate storage container by transferring the plasma-processed substrates to the second substrate storage container in sequence; a determining process of determining whether or not the last unprocessed substrate is unloaded from the first substrate storage container; and a re-accommodating process of transferring and re-accommodating the plurality of the processed substrates accommodated in the second substrate storage container into the first substrate storage container in sequence when a substrate decided as the last unprocessed substrate is unloaded in the determining process. | 10-21-2010 |
Masahiro Numakura, Nirasaki City JP
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20100004785 | CONTROL DEVICE AND CONTROL METHOD OF PLASMA PROCESSING SYSTEM, AND STORAGE MEDIUM STORING CONTROL PROGRAM - In a control device of a plasma processing system, a communication unit is configured to receive processing information related to a carrier of a next processing lot. A determination unit is configured to determine whether the processing information received by the communication unit has pre-treatment information related to one of the plasma processing devices. When it is determined that the processing information has the pre-treatment information by the determination unit, a generation unit is configured to generate an object for declaring execution of the pre-treatment for the carrier of a next processing lot if a desired condition of transferring of the carrier is satisfied. In addition, if the object is generated by the generation unit, a process executing control unit is configured to start the pre-treatment for the target object in the carrier of a next processing lot without any notification that the carrier reaches a destination plasma processing device. | 01-07-2010 |
20100089423 | CLEANING METHOD AND STORAGE MEDIUM - A cleaning method is provided to clean processing chambers of a substrate processing apparatus for transferring substrates included in each of lots to the processing chambers on a lot basis and processing the substrates in the processing chambers simultaneously. The cleaning method includes checking whether a lot is switched to another lot to which different cleaning conditions are applied prior to the processing in the processing chambers, performing a cleaning process on the processing chambers under cleaning conditions of a previous lot by transferring cleaning substrates into the processing chambers when it is determined that a lot is switched to another lot to which different cleaning conditions are applied, and omitting the cleaning process of the processing chambers when it is determined that a lot is switched to another lot to which the same cleaning conditions are applied. | 04-15-2010 |
Masahiro Numakura, Yamanashi JP
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20090076647 | DEVICE FOR CONTROLLING PROCESSING SYSTEM, METHOD FOR CONTROLLING PROCESSING SYSTEM AND COMPUTER-READABLE STORAGE MEDIUM STORED PROCESSING PROGRAM - A processing system includes process modules, load lock modules, an equipment controller, and a machine controller. The equipment controller controls transfer and processing of wafers in the processing system. A transfer destination determining portion determines the transfer destination of each wafer such that each wafer is sequentially transferred to a normally operating process module. When an abnormality occurs in a process module, an evacuation portion temporarily evacuates to a cassette stage the wafer determined is to be transferred to the abnormal process module and that has not yet been transferred to the abnormal process module. When a new transfer destination of the evacuated wafer is determined, if a process that is performed immediately before processing the evacuated wafer in the processing module as the new transfer destination satisfies a predetermined condition, a transfer inhibition portion inhibits the transfer of the evacuated wafer to the new transfer destination. | 03-19-2009 |
20090076648 | SYSTEM, METHOD AND STORAGE MEDIUM FOR CONTROLLING A PROCESSING SYSTEM - A processing system includes process modules, load lock modules, an equipment controller, and a machine controller. The equipment controller controls transfer and processing of wafers in the processing system. A transfer destination determining portion determines the transfer destination of each wafer such that each wafer is sequentially transferred to a normally operating process module. When an abnormality occurs in a process module, an evacuation portion temporarily evacuates to a cassette stage the wafer determined to be transferred to the abnormal process module and that has not yet been transferred to the abnormal process module. When an error of the abnormal process module is dealt with, a transfer destination change portion changes the transfer destination of a wafer scheduled to be first transferred from the cassette case, to the transfer inhibition-released process module. When the error of the transfer-inhibited processing chamber is released, the transfer route is optimized. | 03-19-2009 |
20090269171 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE TRANSFER METHOD ADOPTED THEREIN - As an interrupt start button is depressed while control, under which product wafers Wp and dummy wafers Wd are transferred in an order defined in a normal transfer pattern, is repeatedly executed, a decision is made based upon wafer transfer history as to whether or not the most recent transfer pattern cycle has ended. If the cycle is determined to have ended, the operation immediately proceeds to the subsequent cycle to transfer interrupt wafers Wf and Wd in an order defined in the interrupt transfer pattern achieved by replacing Wp in the normal transfer pattern with Wf, whereas if the cycle is determined to be incomplete, the wafer transfer based upon the normal transfer pattern is carried on until the cycle ends and then the operation proceeds to the next cycle to transfer Wf and Wd in the order defined in the interrupt transfer pattern. | 10-29-2009 |
Masahiro Numakura, Nirasaki-Shi JP
Masahiro Numakura, Miyagi-Gun JP
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20080228311 | SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD FOR THE APPARATUS, AND PROGRAM FOR IMPLEMENTING THE METHOD - A substrate processing apparatus, according to which inspection of various devices in the substrate processing apparatus can be carried out with improved reliability, while reducing the burden on a user. A processing chamber processes semiconductor wafers therein. A transfer chamber transfers the semiconductor wafers. A FOUP (front opening unified pod) houses a plurality of dummy wafers for inspection of the processing chamber or the transfer chamber. A CPU causes an HDD (hard disk drive) to store a housing state relating to the arrangement of the dummy wafers in the FOUP before replacement of dummy wafers in the FOUP and that after the replacement as dummy wafer setup information. | 09-18-2008 |