Patent application number | Description | Published |
20080217672 | INTEGRATED CIRCUIT HAVING A MEMORY - An integrated circuit having a memory arrangement including capacitor elements and further capacitor elements is disclosed. One embodiment provides a substrate layer with contact pads and further contact pads; the capacitor elements being disposed in a first level on the substrate layer and connected with the contact pads; the further capacitor elements being disposed in a second level above the first level; contact elements being disposed between the capacitor elements and connected with the further contact pads; the further capacitor elements being disposed above the contact elements and being connected with the contact elements. | 09-11-2008 |
20080253160 | INTEGRATED CIRCUIT HAVING A MEMORY CELL ARRAY AND METHOD OF FORMING AN INTEGRATED CIRCUIT - An integrated circuit having a memory cell array and a method of forming an integrated circuit is disclosed. One embodiment provides bitlines running along a first direction, wordlines running along a second direction substantially perpendicular to the first direction, active areas and bitline contacts. The bitline contacts are arranged in columns extending in the second direction and in rows extending in the first direction. A distance between neighboring bitlines is DL, and a distance between neighboring bitline contacts is DC, DC being measured parallel to the first direction. The following relation holds: 1/2.25≦DL/DC≦1/1.75. | 10-16-2008 |
20080308870 | INTEGRATED CIRCUIT WITH A SPLIT FUNCTION GATE - An integrated circuit is disclosed. One embodiment provides a field-effect transistor including a gate electrode, a channel region and a first source/drain region. The gate electrode may include a main section determining a first flat band voltage between the gate electrode and the channel region and a first lateral section that is in contact with the main section and that determines a second flat band voltage between the gate electrode and the first source/drain region. The first and second flat band voltages differ by at least 0.1 eV. | 12-18-2008 |
20090098701 | Method of manufacturing an integrated circuit - The present invention provides a method of manufacturing an integrated circuit comprising the steps of: providing a semiconductor substrate, etching at least one trench into a surface of said semiconductor substrate, performing an ion implantation step, wherein a direction of said ion implantation step is parallel to a vertical centre line of said trench, and performing a single oxidation step to form a first oxide layer with a first layer thickness covering a bottom of said at least one trench and a second oxide layer with a second layer thickness covering the sidewalls of said at least one trench, wherein said first layer thickness differs from said second layer thickness. | 04-16-2009 |
20090302380 | Word Line to Bit Line Spacing Method and Apparatus - In one embodiment, a memory cell includes a bit line arranged in a semiconductor substrate and a bit line contact region arranged adjacent the bit line. A word line is arranged above the bit line contact region in a trench formed in the semiconductor substrate. A generally U-shaped insulating layer is arranged in a bottom region of the trench and separates the bit line and the bit line contact region from the word line. | 12-10-2009 |
20100090264 | INTERCONNECT STRUCTURE FOR SEMICONDUCTOR DEVICES - One embodiment relates to an integrated circuit formed on a semiconductor body having interconnect between source/drain regions of a first and second transistor. The interconnect includes a metal body arranged underneath the surface of the semiconductor body. A contact element establishes electrical contact between the metal body and the source/drain regions of the first and second transistor. The contact element extends along a connecting path between the source/drain regions of the first and second transistors. Other methods, devices, and systems are also disclosed. | 04-15-2010 |
20100096669 | MEMORY CELL ARRAY COMPRISING WIGGLED BIT LINES - An integrated circuit including a memory cell array comprises transistors being arranged along parallel active area lines, bitlines, the bitlines being arranged so that an individual one intersects a plurality of the active area lines to form bitline-contacts, respectively, the bitlines being formed as wiggled lines, wordlines being arranged so that an individual one of the wordlines intersects a plurality of the active area lines, and an individual one of the wordlines intersects a plurality of the bitlines, wherein neighboring bitline-contacts, each of which is connected to one of the active area lines, are connected with different bitlines. | 04-22-2010 |
20100097835 | 4 F2 MEMORY CELL ARRAY - An integrated circuit including a memory cell array comprises active area lines, bitlines, the bitlines being arranged so that an individual one intersects a plurality of the active area lines to form bitline-contacts, respectively, the bitlines being arranged at a bitline pitch, wordlines being arranged so that an individual one of the wordlines intersects a plurality of the active area lines, and an individual one of the wordlines intersects a plurality of the bitlines, the wordlines being arranged at a wordline pitch, wherein neighboring bitline-contacts, each of which is connected to one of the active area lines, are connected with different bitlines, and the bitline pitch is different from the wordline pitch. | 04-22-2010 |