Patent application number | Description | Published |
20110141480 | POSITION-MEASURING DEVICE - A position-measuring device, for ascertaining the position of two objects which are disposed in a manner allowing movement relative to each other in at least one measuring direction, includes a light source, as well as a splitting device by which a light beam, provided by the light source, is split into two or more partial beams of rays. The partial beams of rays traverse at least two partial-beam paths. Interfering partial beams of rays from the partial-beam paths strike a plurality of opto-electronic detector elements, so that displacement-dependent position signals are ascertainable via the detector elements. The light source takes the form of a semiconductor laser having a fiber-grating feedback device. | 06-16-2011 |
20130194584 | Position-Measuring Device and System Having a Plurality of Position-Measuring Devices - In position-measuring devices and a systems having a plurality of position-measuring devices for determining the position of an object in several spatial degrees of freedom, the plurality of optical position-measuring devices scan the object from a single probing direction, and the probing direction coincides with one of the two main axes of motion. | 08-01-2013 |
20130208287 | System Having a Plurality of Scanning Units of a Position Measuring Device - In a system for detecting the position of an object in relation to a reference system, the object is arranged so as to be movable in relation to the reference system along at least two orthogonal first and second main movement axes. To record the position of the object in relation to the reference system, a position measuring device includes at least two two-dimensional measuring standards situated along the first main movement axis, and four scanning units for an optical scanning of these measuring standards. In addition, at least four additional supplementary scanning units are provided, which are situated between the four scanning units along the first main movement axis. | 08-15-2013 |
20130212854 | System and Method for Positioning a Processing Tool in Relation to a Workpiece - In a system and a method for positioning a processing tool in relation to a workpiece, an object alignment mark and the workpiece are situated on a first object. In addition, a workpiece alignment mark is situated on the workpiece. The processing tool via which the object alignment mark is detectable is situated on a second object, which is disposed so as to be displaceable along at least one movement direction in relation to the first object. Furthermore, an alignment sensor is disposed thereon, with whose aid the object alignment mark and the workpiece alignment mark are detectable. In addition, a scannable measuring standard, which extends along the at least one movement direction, is disposed on the second object. At least two scanning units for scanning the measuring standard are situated on the first object in order to thereby determine the relative position between the first and the second object along the movement direction, the two scanning units having a defined offset. | 08-22-2013 |
20130235390 | Position-Measuring Device and System Having Such a Position-Measuring Device - A position-measuring device, as well as a system having such a position-measuring device, is used for determining the position of a first object relative to a second object, the first and the second object being movable relative to one another along at least two measuring directions. The position-measuring device has an optical unit that is linked to one of the two objects and includes at least one light source, a detector system, as well as further optical elements in a defined configuration. In addition, the position-measuring device includes a measuring standard-reflector unit, which is provided on the other object, and has at least two differently formed regions in one track that are optically scannable by the optical unit for position sensing. The different formation of the regions makes switching among the various measuring directions possible during position sensing, and positional signals can be generated by the optical unit relative to the relative movement of the two objects for each measuring direction. | 09-12-2013 |
20130335750 | Position-Measuring Device - A position-measuring device is used to detect the relative position of two machine components that are disposed in a manner allowing movement relative to each other at least along a first and a second main direction of motion in a displacement plane. The device includes at least one measuring standard, which is mounted on a first machine component. At least six scanning units are mounted on a second machine component, and are used for the optical scanning of the measuring standard in at least two measuring directions in the displacement plane. At least two scanning units are assigned to each measuring direction. The scanning units of each respective measuring direction in the displacement plane are disposed non-centrosymmetrically in relation to a center of the second machine component. | 12-19-2013 |
20140132964 | OPTICAL POSITION MEASURING INSTRUMENT - An optical position measuring instrument including a first scale having a first graduation, wherein the first scale is disposed movable in a first measuring direction, and at a first defined position in the first measuring direction, the first scale includes a spatially limited first marking that differs from the first graduation. The optical position measuring instrument further including a second scale having a second graduation, wherein the second scale is disposed movable in a second measuring direction, and at a second defined position, the second scale includes a second reference marking that is usable for generating at least one reference signal at a reference position of the second scale only if the first scale is located in the first defined position. | 05-15-2014 |
20140176962 | Interferometer - An interferometer includes a light source and a beam splitter, via which the beam of rays emitted by the light source is split into a measurement beam and a reference beam. The measurement beam propagates in a measuring arm extending in a first direction between the beam splitter and a measuring reflector. The measuring reflector brings about an offset perpendicular to the direction of incidence between the measurement beam falling on it and the measurement beam reflected back by it. In a reference arm extending in a second direction, the reference beam propagates between the beam splitter and a reference reflector. In addition, the interferometer has a detector system, to which the superposed and recombined measurement beam and reference beam are able to be supplied, and via which a distance-dependent interference signal with respect to the position of the measuring reflector is able to be generated. The measuring reflector in each case includes at least one transmission grating as well as a reflector element. | 06-26-2014 |
20140185057 | Optical Position-Measuring Device - An optical position-measuring device is adapted to detect the position of an object in several spatial degrees of freedom. The object is disposed in a manner allowing it to move at least along a first direction of movement and along a second direction of movement. The position-measuring device includes at least one light source and at least one first and second measuring standard which are located on the object, extend along a first extension direction and a second extension direction and include graduation regions disposed periodically along the first and second extension directions. In addition, a scanning plate is provided, into which at least first and second retroreflector elements are integrated, the first retroreflector element extending parallel to the first extension direction and the second retroreflector element extending parallel to the second extension direction, and via which, sub-beams that fall on them from the first and second measuring standard, are reflected back in the direction of the respective measuring standard. From superposed sub-beams, a detector system is able to generate position signals at least with respect to the movement of the object along the first and second direction of movement. | 07-03-2014 |