Patent application number | Description | Published |
20110073800 | Abrasive-free chemical mechanical polishing compositions - The aqueous abrasive-free composition is useful for chemical mechanical polishing of a patterned semiconductor wafer containing a nonferrous metal. The composition includes an oxidizer, an inhibitor for the nonferrous metal, 0 to 15 weight percent water soluble modified cellulose, 0 to 15 weight percent phosphorus compound, 0.005 to 5 weight percent of an acidic polymer, and water. The acidic polymer has a methacrylic acid portion having a carbon number of 4 to 250. The methacrylic acid portion includes either methacrylic acid or an acrylic acid/methacrylic acid copolymer. The acidic polymer including a segment from a mercapto-carboxylic acid chain transfer agent. | 03-31-2011 |
20110262861 | PHOTOSENSITIVE COMPOSITION - Photoresist compositions and methods suitable for depositing a thick photoresist layer in a single coating application are provided. Such photoresist layers are particularly suitable for use in chip scale packaging, for example, in the formation of metal bumps. | 10-27-2011 |
20130082089 | CURABLE FLUX COMPOSITION AND METHOD OF SOLDERING - A curable flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; a carboxylic acid; a fluxing agent represented by formula I: | 04-04-2013 |
20130082092 | Curable Amine, Carboxylic Acid Flux Composition And Method Of Soldering - A curable flux composition is provided, comprising, as initial components: a resin component having at least two oxirane groups per molecule; a carboxylic acid; and, an amine fluxing agent represented by formula I: | 04-04-2013 |
20130082093 | Amine, Carboxylic Acid Flux Composition And Method Of Soldering - A flux composition is provided, comprising, as initial components: a carboxylic acid; and, an amine fluxing agent represented by formula I: | 04-04-2013 |
20130082094 | POLYAMINE, CARBOXYLIC ACID FLUX COMPOSITION AND METHOD OF SOLDERING - A flux composition is provided, comprising, as initial components: a carboxylic acid; and, a polyamine fluxing agent represented by formula I: | 04-04-2013 |
20130082095 | Flux Composition And Method Of Soldering - A flux composition is provided, comprising, as an initial component: a carboxylic acid; and, a fluxing agent represented by formula I: | 04-04-2013 |
20140107267 | FLUOROALKYL PHOSPHONATE COMPOSITION - The present invention is a composition comprising an aqueous dispersion of a binder and a salt of the following fluoroalkyl phosphonic acid: | 04-17-2014 |
20140235772 | ALKOXYLATED FLUOROALKYLPHOSPHATE COMPOSITION - The present invention relates to a composition comprising an aqueous dispersion of a binder and a salt of the following fluoroalkyl phosphate: | 08-21-2014 |