Patent application number | Description | Published |
20080232675 | SYSTEM FOR SEARCH AND ANALYSIS OF SYSTEMATIC DEFECTS IN INTEGRATED CIRCUITS - Disclosed is a method of locating systematic defects in integrated circuits. The invention first performs a preliminary extracting and index processing of the circuit design and then performs feature searching. When performing the preliminary extracting and index processing the invention establishes a window grid for the circuit design and merges basis patterns with shapes in the circuit design within each window of the window grid. The invention transforms shapes in a each window into feature vectors by finding intersections between the basis patterns and the shapes in the windows. Then, the invention clusters the feature vectors to produce an index of feature vectors. After performing the extracting and index processing, the invention performs the process of feature searching by first identifying a defect region window of the circuit layout and similarly merging basis patterns with shapes in the defect region window. This merging process can include rotating and mirroring the shapes in the defect region. The invention similarly transforms shapes in the defect region window into defect vectors by finding intersections between basis patterns and the shapes in the defect region. Then, the invention can easily find feature vectors that are similar to the defect vector using, for example, representative feature vectors from the index of feature vectors. Then, the similarities and differences between the defect vectors and the feature vectors can be analyzed. | 09-25-2008 |
20080244503 | System for Coloring a Partially Colored Design in an Alternating Phase Shift Mask - A method of designing an alternating phase shifting mask for projecting an image of an integrated circuit design. Phase units are binary colorable within each unit of the hierarchical circuit design, e.g., cell, an array, a net, or array of nets and/or cells, the phase shapes. The assignment of phases or colors within a hierarchical unit will be correctly binary colored to satisfy the lithographic, manufacturability and other design rules, referred to collectively as coloring rules. During assembly with other units, the coloring of phases in a hierarchical unit may change (e.g., be reversed or flipped), but the correct binary colorability of a hierarchical unit is preserved, which simplifies assembly of the integrated circuit layout. | 10-02-2008 |
20080247633 | SYSTEM FOR GENERATING A SET OF TEST PATTERNS FOR AN OPTICAL PROXIMITY CORRECTION ALGORITHM - A system of synthesizing layout patterns to test an optical proximity correction algorithm. The method comprises the steps of: embodying Walsh patterns in a set of Walsh pattern matrices; processing groups of matrices from the set of Walsh pattern matrices to form a set of test matrices; mapping the set of test matrices to a test pattern set. | 10-09-2008 |
20090019415 | STAGE MITIGATION OF INTERCONNECT VARIABILITY - The present invention provides a method, system and program product for mitigating effects of interconnect variability during a design stage of a chip. Under the technique of the present invention, a global and detailed routing of interconnects of the chip are determined. Thereafter, a dummy fill estimation and a grid based metal density estimation are performed. Then, based on a CMP model, a variable map of metal thicknesses is obtained. Based on the variable map, wiring nets of the chip that are sensitive to metal variability (e.g., that fail to meet timing closure due to metal thickness loss/gain in the CMP process) are identified. These wiring nets are then re-routed for optimization of the chip. | 01-15-2009 |
20090089726 | Layout Quality Gauge for Integrated Circuit Design - A method for layout design includes steps or acts of: receiving a layout for design of an integrated circuit chip; designing mask shapes for the layout; transmitting the mask shapes to a litho simulator for generating wafer shapes; receiving the wafer shapes; calculating electrically equivalent gate lengths for the wafer shapes; analyzing the gate lengths to check for conformity against a threshold value, wherein the threshold value represents a desired value of electrically equivalent gate lengths; placing markers on the layout at those locations where the gate length violates the threshold value; and generating a histogram of gate lengths for comparing layouts for electrically equivalent gate lengths for layout quality. | 04-02-2009 |
20090171644 | CA RESISTANCE VARIABILITY PREDICTION METHODOLOGY - A methodology for obtaining improved prediction of CA resistance in electronic circuits and, particularly, an improved CA resistance model adapted to capture larger than anticipated “out of spec” regime. In one embodiment, a novel bucketization scheme is implemented that is codified to provide a circuit designer with considerably better design options for handling large CA variability as seen through the design manual. The tools developed for modeling the impact of CA variable resistance phenomena provide developers with a resistance model, such as conventionally known, modified with a new CA model Basis including a novel CA intrinsic resistance model, and, a novel CA layout bucketization model. | 07-02-2009 |
20090180711 | RENDERING A MASK USING COARSE MASK REPRESENTATION - A method, system and computer program product for rendering a mask are disclosed. A method of rendering a mask may comprise: providing an initial mask design for a photolithographic process, the initial mask design including polygons; initially rendering the initial mask design as a coarse mask representation in a pixel based image calculation; identifying an overhang portion; and rendering the overhang portion using a set of subpixels whose artifacts from spatial-localization lie outside a practical resolution of a pseudo lens having a numerical aperture larger than that of a projection lens used in the photolithographic process; and updating the initial rendering based on the overhang portion rendering. | 07-16-2009 |
20090204930 | IPHYSICAL DESIGN SYSTEM AND METHOD - A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency. | 08-13-2009 |
20090235215 | GRIDDED GLYPH GEOMETRIC OBJECTS (L3GO) DESIGN METHOD - A method of gridded glyph geometric objects (L3GO) integrated circuit (IC) design, wherein at least one inter-level connect in a L3GO circuit design is represented as a point matrix glyph (PMG) on a L3GO grid. Each PMG connects a pair of conductors on the next adjacent (above and below) layer and includes an array (one or two dimensional) of point glyphs contained within a cage. The point glyphs may have uniform size and may be on minimum pitch. Each PMG may also include a flange on the above and below layer. A default flange insures adequate coverage of cut shapes represented by the point glyphs. | 09-17-2009 |
20100242000 | USING LAYOUT ENUMERATION TO FACILITATE INTEGRATED CIRCUIT DEVELOPMENT - A method for using layout enumeration to facilitate integrated circuit development includes defining an initial set of design ground rules represented in a notation compatible with a coarse placement grid, for a given layer(s) of an integrated circuit device; defining an initial region of interest for the integrated circuit device; enumerating, according to the initial set of design ground rules, each legal design layout for a given layer of the integrated circuit device in the initial region of interest; running a manufacturing simulation of the enumerated legal design layout data and, responsive to determining one or more failing layouts resulting therefrom, further determining whether the failing layouts may be eliminated by changes in technology parameters and/or updated ground rules. Upon eliminating the one or more failing layouts for the initial region of interest, expanding the initial region of interest and repeating the enumerating, manufacturing simulation, and triage assessment. | 09-23-2010 |
20110289472 | LAYOUT QUALITY EVALUATION - A method for quantifying and improving layout quality of an IC is disclosed. The method includes receiving a drawn layout and placing essentially one dimensional measurement markers (chords) at various location in the drawn layout. This placement is done in such manner that contours of shapes in the drawn layout intersect a chord in at least two places. The length of the chord is defined as its portion delimited by the intersections, and a measurement of the chord is defined as obtaining its length. The drawn layout is subjected, with the exception of the chords, to a patterning simulation at a selected processing point. Following the simulation the chords are measured and the obtained lengths associated with the drawn layout and the processing point. The patterning simulation may be carried out at a variety processing points and the chord lengths following each simulation are associated with the respective processing point. The sets of lengths obtained at the various processing points are used to quantitatively evaluate the layout quality, to improve the layout quality and tune the processing window. | 11-24-2011 |
20120167029 | PHYSICAL DESIGN SYSTEM AND METHOD - A design system for designing complex integrated circuits (ICs), a method of IC design and program product therefor. A layout unit receives a circuit description representing portions in a grid and glyph format. A checking unit checks grid and glyph portions of the design. An elaboration unit generates a target layout from the checked design. A data prep unit prepares the target layout for mask making. A pattern caching unit selectively replaces portions of the design with previously cached results for improved design efficiency. | 06-28-2012 |
20120311514 | Decentralized Dynamically Scheduled Parallel Static Timing Analysis - A method for performing a parallel static timing analysis in which multiple processes independently update a timing graph without requiring communication through a central coordinator module. Local processing queues are used to reduce locking overhead without causing excessive load imbalance. A parallel analysis is conducted on a circuit design represented by a timing graph formed by a plurality of interconnected nodes, the method including: using a computer for creating a shared work queue of ready to process independent nodes; assigning the independent nodes from the work queue to at least two parallel computation processes, simultaneously performing node analysis computations thereof; and modifying the circuit design by updating values of the processed independent nodes obtained from the node analysis, the at least two parallel computation processes independently updating the shared work queue to process a new plurality of independent nodes. | 12-06-2012 |
20120311515 | Method For Performing A Parallel Static Timing Analysis Using Thread-Specific Sub-Graphs - A method for efficient multithreaded analysis of a timing graph is described. The method is applicable to multithreaded common path pessimism removal, critical path traversing for timing report generation, and other types of analysis requiring traversal of sub-graphs of timing graph. In order to achieve high efficiency and scalability for parallel multithreaded execution, the number of access locks is minimized. One parent computation thread and multiple child threads are employed. The parent computational thread identifies the tasks for analysis and distributes them among child threads. Each child thread identifies a sub-graph to be analyzed, creates a thread-specific replica of the identified sub-graph, and performs the analysis required. After completing the analysis, the child thread transfers the results back to the main timing graph and waits for next task. As all data structures of each child thread are accessed only by the child thread owing them, no access locks are required for construction and processing of thread specific graph replica of the timing sub-graph. The construction of each thread specific graph replica is performed by the child thread without locking the main timing graph data structures. Access locks are used only for transferring results of the analysis back to the main timing graph where the results computed by all child threads are combined together. | 12-06-2012 |