Patent application number | Description | Published |
20150042599 | CAPACITIVE SENSING USING A MATRIX ELECTRODE PATTERN - An electrode matrix that is used for capacitive sensing may be integrated into a display panel of an input device. In one embodiment, source drivers may be mounted on the display panel which drive the display signals and capacitive sensing signals into the display panel. In one embodiment, the capacitive sensing signals may be routed on wires or lines that are interleaved on the same layer as the source lines used for setting a voltage on the pixels in the display panel during display updating. Using the interleaved wires, the source drivers may drive the capacitive sensing signals in parallel to a plurality of the electrodes in the matrix in a predefined pattern that spans one or more touch cycles. | 02-12-2015 |
20150042600 | CAPACITIVE SENSING USING A MATRIX ELECTRODE PATTERN - An electrode matrix that is used for capacitive sensing may be integrated into a display panel of an input device. In one embodiment, source drivers may be mounted on the display panel which drive the display signals and capacitive sensing signals into the display panel. In one embodiment, the capacitive sensing signals may be routed on traces or lines that are interleaved on the same layer as the source lines used for setting a voltage on the pixels in the display panel during display updating. Using the interleaved traces, the source drivers may drive the capacitive sensing signals in parallel to a plurality of the electrodes in the matrix in a predefined pattern that spans one or more sensing cycles. | 02-12-2015 |
20150091587 | MATRIX SENSOR FOR IMAGE TOUCH SENSING - Embodiments described herein include a display device having a capacitive sensing device, a processing system and a method for detecting presence of an input object using a capacitive sensing device. In one embodiment, the display device includes a plurality of sensor electrodes, a field shaping electrode, and a processing system. Each sensor electrode includes at least one common electrode. Dimensions of each sensor electrode correspond to dimension of pixel elements of the display device. The field shaping electrode is disposed between two of the plurality of sensor electrodes. Dimensions of the field shaping electrode correspond to the dimension of pixel elements of the display device. The field shaping electrode is laterally spaced apart from the two sensor electrodes a distance corresponding to dimensions of the pixel elements. The processing system is coupled to the sensor electrodes and the field shaping electrode. The processing system is configured to, in a first processing mode, drive a transmitter signal onto a first sensor electrode of the sensor electrodes and receiving a resulting signal with the first sensor electrode of the sensor electrodes comprising effects corresponding to the transmitter signal. | 04-02-2015 |
20150091842 | MATRIX SENSOR FOR IMAGE TOUCH SENSING - Embodiments described herein include a display device having a capacitive sensing device, a processing system and a method for detecting presence of an input object using a capacitive sensing device, all of which include a grid electrode for improved absolute sensing. Other embodiments include a display device having a capacitive sensing device, a processing system and a method for detecting presence of an input object using a capacitive sensing device, wherein the capacitive sensing device includes a matrix of discrete sensor electrodes. | 04-02-2015 |
20150091848 | TARGETED TRANSCAPACITANCE SENSING FOR A MATRIX SENSOR - Embodiments described herein include a display device having a capacitive sensing device, a processing system and a method for detecting presence of an input object using a capacitive sensing device. In one embodiment, the display device includes a plurality of sensor electrodes arranged in a matrix. The processing system performs absolute capacitive sensing with the matrix of sensor electrodes. When an area of interest is detected using the absolute capacitive sensing techniques, the processing system performs targeted transcapacitance sensing using a selected subset of the sensor electrodes in the area of interest. | 04-02-2015 |
Patent application number | Description | Published |
20090209107 | METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING FEATURES WITHIN A MASK AND A SELECTIVE REMOVAL PROCESS - A method of forming an electronic device can include forming a patterned mask layer overlying a underlying layer such that the mask layer has a first feature, a second feature, and a third feature, and the first feature is between the second feature and the third feature. The first feature can be spaced apart from the second feature by a first opening in the mask layer, and can be spaced apart from the third feature by a second opening in the mask layer. The method can further include selectively removing portions of the underlying layer under the first opening, the second opening, the second feature, and the third feature, and also removing the second feature and the third feature while leaving substantially all of the first feature and a significant portion of the underlying layer under the first feature. | 08-20-2009 |
20110195348 | METHOD AND SYSTEM FOR AUTOMATED GENERATION OF MASKS FOR SPACER FORMATION FROM A DESIRED FINAL WAFER PATTERN - Methods and systems for generating masks for spacer formation are disclosed. As a part of a disclosed method, a predefined final wafer pattern is accessed, areas related to features in the predefined final wafer pattern are identified and a template mask is formed based on the identified areas for forming spacers on a wafer. Subsequently, a mask is formed for use in the removal of portions of the spacers to form an on wafer pattern that corresponds to the predefined final wafer pattern. | 08-11-2011 |
20140220786 | METHODS FOR OPTICAL PROXIMITY CORRECTION IN THE DESIGN AND FABRICATION OF INTEGRATED CIRCUITS - A method of manufacturing an optical lithography mask includes providing a patterned layout design comprising a plurality of polygons, correcting the patterned layout design using optical proximity correction (OPC) by adjusting widths and lengths of one or more of the plurality of polygons, to generate a corrected patterned layout design, converting the corrected patterned layout design into a mask writer-compatible format, to generate a mask writer-compatible layout design comprising the plurality of polygons, and biasing each polygon in the plurality of polygons with a bias that accounts for large-scale density values of the patterned layout design, to generate a biased, mask writer-compatible layout design. | 08-07-2014 |