Patent application number | Description | Published |
20080223294 | Flooding Chamber For Coating Installations - The invention relates to a flooding chamber for coating installations, with which shorter flooding times, and therewith shorter clock cycles, can be attained. Two flooding means are therein utilized, between which a substrate is disposed symmetrically. The flooding means direct a gas jet directly onto the substrate. Hereby the substrate is fixed between the flooding means. | 09-18-2008 |
20100025370 | REACTIVE GAS DISTRIBUTOR, REACTIVE GAS TREATMENT SYSTEM, AND REACTIVE GAS TREATMENT METHOD - A reactive gas distributor for a reactive gas treatment system is provided, comprising a housing, a reactive gas inlet provided at one side of the housing and fluidly connectable to a remote plasma source, and a plurality of reactive gas outlets at another side of the housing and arranged in a pattern. | 02-04-2010 |
20110100799 | SPUTTER DEPOSITION SYSTEM AND METHOD - A sputter deposition system adapted for depositing a thin film onto a substrate surface is provided. The system includes a cathode assembly having at least two cathode targets opposing the substrate surface and adapted for providing cathode material for forming the thin film. A plasma source is adapted for generating a plasma for sputtering cathode material off the at least two cathode targets. A magnetic field generator is adapted for providing a magnetic field which is controllable independently of the plasma source such that such that a difference between high deposition rate portions and low deposition rate portions is compensated by the action of the magnetic field on charged particle movements. | 05-05-2011 |
20120012458 | MAGNET ARRANGEMENT FOR A TARGET BACKING TUBE, TARGET BACKING TUBE INCLUDING THE SAME, CYLINDRICAL TARGET ASSEMBLY AND SPUTTERING SYSTEM - The disclosure relates to a magnet arrangement for a sputtering system, wherein the magnet arrangement is adapted for a rotatable target of a sputtering system and includes: a first magnet element extending along a first axis; a second magnet element being disposed around the first magnet element symmetrically to a first plane; wherein the second magnet element includes at least one magnet section intersecting the first plane; and wherein a magnetic axis of the at least one magnet section is inclined with respect to a second plane being orthogonal to the first axis. Further, the disclosure relates to a target backing tube for a rotatable target of a sputtering system, a cylindrical rotatable target for a sputtering system, and a sputtering | 01-19-2012 |
20120107504 | EVAPORATION SYSTEM AND METHOD - A deposition system is provided which is adapted for depositing a thin film onto a substrate. The deposition system includes a substrate carrier adapted for carrying the substrate and at least one tilted evaporator crucible. The at least one tilted evaporator crucible is adapted for directing evaporated deposition material towards the substrate in a main emission direction. The main direction emission of the tilted evaporator crucible is different from a direction normal to the substrate. | 05-03-2012 |
20130284590 | SYSTEMS AND METHODS FOR FORMING A LAYER OF SPUTTERED MATERIAL - The present disclosure describes a method of coating a substrate, the method including forming a layer of sputtered material on the substrate. Forming the layer of sputtered material may include: sputtering material from at least one rotatable target over the substrate; varying the relative position between the at least one target and the substrate. In addition, the present disclosure describes varying the distance between a target and a substrate during the sputter process. The present disclosure further describes a system for coating a substrate. | 10-31-2013 |
Patent application number | Description | Published |
20090114528 | SPUTTER COATING DEVICE AND COATING METHOD - A magnet/target assembly | 05-07-2009 |
20130171757 | ADVANCED PLATFORM FOR PASSIVATING CRYSTALLINE SILICON SOLAR CELLS - The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers. | 07-04-2013 |
20130199891 | DYNAMIC LOAD LOCK WITH CELLULAR STRUCTURE FOR DISCRETE SUBSTRATES - A dynamic load lock chamber that includes a plurality of actuators positioned along its length to achieve a desired pressure gradient from an atmospheric pressure side to a processing pressure side of the chamber is provided. The chamber includes a transport belt continuously running through the chamber to transport substrates from the atmospheric pressure side to the processing pressure side of the chamber, if situated on an inlet side of a production line, and from the processing pressure side to the atmospheric pressure side of the chamber, if positioned on an outlet side of the production line. Separation mechanisms may be attached to the belt to separate discrete regions within the chamber into a plurality of discrete volumes. Substrates may be disposed between the separation mechanisms, such that separation between adjacent pressure regions within the chamber is maintained as the substrates are transported through the chamber. | 08-08-2013 |
20140332369 | MULTIDIRECTIONAL RACETRACK ROTARY CATHODE FOR PVD ARRAY APPLICATIONS - A cathode assembly for a sputter deposition apparatus and a method for coating a substrate is provided. The cathode assembly has a coating side for coating on a substrate. Further, the cathode assembly includes a rotary target assembly adapted for rotating a target material around a rotary axis; at least a first magnet having an inner magnet pole and at least one outer magnet poles and being adapted for generating one or more plasma regions. The cathode assembly has a first angular coordinate for a magnet pole, the magnet pole being provided for the coating side, and a second angular coordinate for a further magnet pole, the magnet pole being provided for the coating side; wherein the first angular coordinate and the second angular coordinate define an angle a larger than about 20 degrees and smaller than about 160 degrees. | 11-13-2014 |
20150214018 | METHOD FOR COATING A SUBSTRATE AND COATER - A method for coating a substrate by means of a cathode arrangement including at least two rotatable cathodes is disclosed. The method includes rotating at least one of the at least two rotatable cathodes in a first direction, and, at the same time, rotating at least one of the at least two rotatable cathodes in a second direction. The first direction is opposite to the second direction. Furthermore, a controller for controlling a coating process is disclosed. Furthermore, a coater for coating a substrate is disclosed. The coater includes a cathode arrangement with at least two rotatable cathodes and a controller as disclosed herein. | 07-30-2015 |
20160043319 | ACTIVELY-ALIGNED FINE METAL MASK - The embodiments described herein generally relate to active alignment of a fine metal mask. The fine metal mask is connected with a frame through a plurality of microactuators. The microactuators can act on the fine metal mask to stretch the mask, reposition the mask or both. In this way, the position and size of the fine metal mask can be maintained in relation to the substrate. | 02-11-2016 |
Patent application number | Description | Published |
20090071909 | Washbox - Exemplary systems and methods relating to washboxes are described. | 03-19-2009 |
20100096339 | Water Denitrification - The described implementations relate to water denitrification. One method obtains nitrate levels in influent and effluent of a moving bed media filter and determines carbon levels in the effluent. The method also doses carbon feedstock into the influent based on both the nitrate levels and the carbon levels. | 04-22-2010 |
20110100888 | WASHBOX - Exemplary systems and methods relating to washboxes are described. | 05-05-2011 |
20110100925 | WASHBOX - Exemplary systems and methods relating to washboxes are described. | 05-05-2011 |
20130118990 | WASHBOX - Exemplary systems and methods relating to washboxes are described. | 05-16-2013 |
20140353247 | WATER DENITRIFICATION - The described implementations relate to water denitrification. One method obtains nitrate levels in influent and effluent of a moving bed media filter and determines carbon levels in the effluent. The method also doses carbon feedstock into the influent based on both the nitrate levels and the carbon levels. | 12-04-2014 |
20150157965 | COMPARTMENTALLY EXPANDABLE ROTATING BELT FILTER FOR ENERGY USE REDUCTION - The present technology relates generally to fluid filtration systems. In particular, several embodiments are directed toward compartmentally expandable rotating belt filters and associated systems and methods. In some embodiments, for example, a filtering system for contaminated fluid includes a first fluid filtering chamber having a first filter belt movably positioned therein and a second fluid filtering chamber having a second filter belt movably positioned therein. The first filter belt can be operable in parallel with the second filter belt. The system can further include a sensor configured to sense a condition related a volume of the contaminated fluid, a speed of flow of the contaminated fluid, or a level of contaminants in the contaminated fluid. A controller can be configured to initiate, stop, or adjust fluid flow to the first fluid filtering chamber and second fluid filtering chamber individually in response to the sensed condition. | 06-11-2015 |
20150203364 | INTEGRAL MEDIA RECONDITIONING AND RECOVERY SYSTEM - The present technology is directed generally to media reconditioning and/or recovery systems for use in fluid filtration. In some embodiments, a reconditioning system includes an additive source configured to inject an additive into a fluid filtration chamber for media reconditioning. In several embodiments, a controller controls the timing, sequence, amount, and/or duration of additive injection. The additive can be selected to achieve a desired filtration outcome. In some embodiments, the system further includes a recovery component configured to redirect and capture the filtered media. | 07-23-2015 |