Lansbergen
Adrianus Hendricus Lansbergen, Aw Zwolle NL
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20120128990 | AUTOXIDISABLE COATING COMPOSITION - An autoxidisable coating composition comprising i) 10 to 60 wt % of an autoxidisable material with: a) a number average molecular weight <4500 g/mol; b) optionally 1 to 20 carbohydrate units; c) a fatty acid content of ≧60 wt %; d) a viscosity at 100% solids in the range of from 0.05 to 5 Pa·s at 20+/−5° C. at a shear rate of 5000 s | 05-24-2012 |
Adrianus Jozefus Hendricus Lansbergen, Oosterbeek NL
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20090253859 | COATING COMPOSITION COMPRISING A REACTIVE DILUENT OF MALONATE - Coating composition comprising an oxidatively drying binder, such as an alkyd, and a reactive diluent. The diluent is an ester of malonic acid and an unsaturated mono-alcohol, e.g., geraniol, farnesol, citronellol and/or nerol. | 10-08-2009 |
20090306286 | COATING COMPOSITION COMPRISING A REACTIVE DILUENT OF POLYUNSATURATED ALCOHOL ESTER - Coating composition comprising an oxidatively drying binder and a reactive diluent. The diluent is an ester of a polyunsaturated alcohol, the ester being without chain-end double bonds. The alcohol can selected from the group comprising geraniol, nerol, citronellol, and farnesol. The ester can be a di-ester of a dicarboxylic acid, such as malonic acid or a polyester comprising at least one terminal malonate group. | 12-10-2009 |
Adrianus Jozephus Hendricus Lansbergen, Echt NL
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20150111051 | RESIN, COMPOSITION AND USE - There is described a low VOC, unsaturated alkyd resin obtained by reacting (A) to (E): (A) optionally from 0 to 30% w/w naturally occurring Rosin, comprising from 40 to 80 w/w parts per hundred of Rosin of an unsaturated mono carboxylic acid with at least one C | 04-23-2015 |
Adrianus Jozephus Henricus Lansbergen, Zwolle NL
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20140155514 | DRIER FOR ALKYD RESIN COMPOSITIONS - The invention relates to an alkyd resin composition comprising components: (A) at least an auto-oxidisable alkyd resin component comprising unsaturated fatty acid or its derivative, selected from: (i) alpha, beta-unsaturated ester-functional alkyd resin; (ii) combination of a alpha, beta-unsaturated ester functional material and an alkyd resin; and (iii) mixture of components (i) and (ii); Wherein the alkyd has an oil length of at least 20% unsaturated fatty acids; (B) a daylight photoinitiator; (C) a metal drier; and (D) optionally a liquid medium selected from the group consisting of an organic solvent, water, non-volatile diluent and mixtures thereof; wherein if the liquid medium is present and is: a) substantially based on organic solvent and/or diluent then the VOC is <300 g/l, or b) substantially based on water then the VOC is <100 g/l. | 06-05-2014 |
Marieke Lansbergen, Utrecht NL
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20150044138 | METHOD FOR IMPROVING FUNCTIONAL SYNAPTIC CONNECTIVITY - The invention relates to a composition comprising: (i) one or more of uridine and cytidine, or salts, phosphates, acyl derivatives or esters thereof; and (ii) a lipid fraction comprising at least one of docosahexaenoic acid (22:6; DHA), eicosapentaenoic acid (20:5; EPA) and docosapentaenoic acid (22:5; DPA), or esters thereof, for use in preserving or improving functional synaptic connectivity and/or preserving brain network organization in a subject in need thereof. | 02-12-2015 |
Remco Adrianus Gerardus Lansbergen, Heeze NL
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20150373806 | LIGHTING DEVICE AND LIGHTING SYSTEM - A lighting device comprising a first light source issuing a first beam and a second light source issuing a second beam. Said first and said second light source are dimmable and together issue light with a total light flux. At a mutually equal light flux of the first and the second beam, the glare level of the second beam is lower than the glare level of the first beam. The lighting device further comprises at least one (programmed) controller which, during operation, moderates said dim levels such that in at least a range of the illumination level a ratio of the dim level of the second beam to the dim level of the first beam increases in a gradual manner with increasing total light flux. | 12-24-2015 |
Robert Gabriël Maria Lansbergen, Schiedam NL
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20110032505 | Robot For In-Vacuum Use - A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular to the translational axis, and a second component rotates the shaft about the axis of symmetry and moves the shaft in a direction parallel to the axis of symmetry. The second component includes a gas bearing configured to introduce gas along a circumferential surface of the shaft and a scavenging seal configured to evacuate the gas introduced by the second component gas bearing. The robot substantially reduces, or eliminates the out-gassing of hydrocarbon molecules in a range from about 0 to 200 a.m.u., thus rendering the robot suitable for use in extreme ultra-violet (EUV) photolithography applications. | 02-10-2011 |
20130100430 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device. | 04-25-2013 |
Robert Gabriël Maria Lansbergen, Schiedam NL
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20110020104 | RAPID EXCHANGE DEVICE FOR LITHOGRAPHY RETICLES - Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED. | 01-27-2011 |
20110032505 | Robot For In-Vacuum Use - A robot positions a workpiece within a vacuum chamber of a lithographic apparatus. A first component of the robot is located within a vacuum chamber to position a workpiece along a translational axis. A shaft supports the first component such that an axis of symmetry of the shaft is perpendicular to the translational axis, and a second component rotates the shaft about the axis of symmetry and moves the shaft in a direction parallel to the axis of symmetry. The second component includes a gas bearing configured to introduce gas along a circumferential surface of the shaft and a scavenging seal configured to evacuate the gas introduced by the second component gas bearing. The robot substantially reduces, or eliminates the out-gassing of hydrocarbon molecules in a range from about 0 to 200 a.m.u., thus rendering the robot suitable for use in extreme ultra-violet (EUV) photolithography applications. | 02-10-2011 |
20130100430 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device. | 04-25-2013 |
20140144805 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus and a method to hold a patterning device configured to impart a beam of radiation with a pattern in its cross-section. The apparatus includes a base configured to support the patterning device and an inner cover couplable to the base. The inner cover includes a restraining mechanism that, upon an application of a force external to the inner cover, is configured to provide an in-plane force to the patterning device to restrain movement of the patterning device, the in-plane force being substantially parallel to a patterning surface of the patterning device. | 05-29-2014 |
Robertus Cornelis Wilhelmus Lansbergen, Amsterdam NL
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20080212582 | Wireless Audio Transmission System and Method - A system and method transmit a data stream from a source to a destination over a communication channel. A transmitter includes devices for processing inputs to assemble data packets for the data stream, and a multiplexer for assembling a data frame to be transmitted over the communication channel, in which each data frame has at least one fixed slot. The multiplexer sets at least one freely allocatable time slot in each data frame. Retransmission control devices connected to the multiplexer retransmit a specific data packet which is not properly received by the destination, using one of the freely allocatable slots. | 09-04-2008 |
Robertus Cornelis Wilhelmus Lansbergen, Amersterdam NL
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20090097445 | SYSTEM AND METHOD FOR INTERFERENCE IDENTIFICATION AND FREQUENCY ALLOCATION - A system for interference detection and identification, as well as frequency allocation is described. It contains interference detection means for detecting interference on wireless radio frequencies. The interference detection means comprising discrimination means ( | 04-16-2009 |