Patent application number | Description | Published |
20080275181 | Block Copolymerized Polyimide Ink Composition for Printing - The object is to provide a polyimide ink composition having good printing properties and good continuous printing properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance. This object is accomplished by a polyimide ink composition for printing, comprising a mixed solvent containing an benzoic acid ester solvent and a glyme solvent, and a polyimide soluble in the mixed solvent; wherein the polyimide is obtained by polycondensing a polyimide oligomer with a tetracarboxylic dianhydride component(s) and/or a diamine component(s) having no siloxane bond in molecular skeleton thereof the polyimide oligomer being prepared by polycondensing a tetracarboxylic dianhydride component(s) and a diamine component(s) having siloxane bonds in molecular skeleton thereof in the presence of a base catalyst(s), or a mixed catalyst including a lactone(s) and/or an acidic compound(s) and a base(s); the content of the diamine component(s) having siloxane bonds based on the total diamine components being 15 to 85% by weight. | 11-06-2008 |
20090186295 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof - Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group. | 07-23-2009 |
20120097435 | PHOTOSENSITIVE MODIFIED POLYIMIDE RESIN COMPOSITION AND USE THEREOF - Disclosed are: a photosensitive modified polyimide resin composition having photo-fabrication property, which is excellent in the electric properties and adhesion as well as in the heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; a resin film formed from the composition; and a printed circuit board, flexible printed circuit board (FPC) and the like which comprises the film as an insulating protective film and/or interlayer insulation film. The photosensitive modified polyimide resin composition comprises a modified polyimide of a specific structure having a flexible structure such as polycarbonate; a photosensitizer; a curing agent; and a solvent. | 04-26-2012 |
20120097439 | MODIFIED POLYIMIDE AND METHOD FOR PRODUCING MODIFIED POLYIMIDE - The present invention discloses a method of producing a modified polyimide comprising a polycarbonate, which modified polyimide has excellent electric properties and adhesion as well as excellent heat resistance, flexibility, bending property, low warping, chemical resistance and storage stability; and the modified polyimide. Also disclosed are a composition comprising the modified polyimide and used thereof. According to the method in which an isocyanate-terminated oligomer comprising a polycarbonate component having excellent flexibility is allowed to react with a tetracarboxylic dianhydride to synthesize a tetracarboxylic dianhydride oligomer comprising the polycarbonate component and the thus obtained oligomer is then further allowed to react with an aromatic diamine and aromatic tetracarboxylic dianhydride to produce a polyimide block copolymer, by selecting the aromatic diamine from a wide range of selectable aromatic diamines, an excellent modified polyimide satisfying all of the above-described various characteristics can be produced. | 04-26-2012 |
Patent application number | Description | Published |
20090229870 | BLOCK COPOLYMERIZED POLYIMIDE INK COMPOSITION FOR PRINTING - The object is to provide a polyimide ink composition having good printing properties and good continuous printing properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance. This object is accomplished by a polyimide ink composition for printing, comprising a mixed solvent containing an benzoic acid ester solvent and a glyme solvent, and a polyimide soluble in the mixed solvent; wherein the polyimide is obtained by polycondensing a polyimide oligomer with a tetracarboxylic dianhydride component(s) and/or a diamine component(s) having no siloxane bond in molecular skeleton thereof, the polyimide oligomer being prepared by polycondensing a tetracarboxylic dianhydride component(s) and a diamine component(s) having siloxane bonds in molecular skeleton thereof in the presence of a base catalyst(s), or a mixed catalyst including a lactone(s) and/or an acidic compound(s) and a base(s); the content of the diamine component(s) having siloxane bonds based on the total diamine components being 15 to 85% by weight. | 09-17-2009 |
20110111351 | Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof - Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group. | 05-12-2011 |
20110127077 | BLOCK COPOLYMERIZED POLYIMIDE INK COMPOSITION FOR PRINTING - The object is to provide a polyimide ink composition having good printing properties and good continuous priming properties, which composition can be dried at a low temperature of not higher than 220° C., and which composition gives a coating film, after being dried, having excellent dimensional stability, heat resistance, low modulus of elasticity, flexibility, resistance to warping, chemical resistance, adhesiveness with substrates, and plating resistance. This object is accomplished by a polyimide ink composition for printing, comprising a mixed solvent containing an benzoic acid ester solvent and a glyme solvent, and a polyimide soluble in the mixed solvent; wherein the polyimide is obtained by polycondensing a polyimide oligomer with a tetracarboxylic dianhydride component(s) and/or a diamine component(s) having no siloxane bond in molecular skeleton thereof, the polyimide oligomer being prepared by polycondensing a tetracarboxylic dianhydride component(s) and a diamine component(s) having siloxane bonds in molecular skeleton thereof in the presence of a base catalyst(s), or a mixed catalyst including a lactone(s) and/or an acidic compound(s) and a base(s); the content of the diamine component(s) having siloxane bonds based on the total diamine components being 15 to 85% by weight. | 06-02-2011 |
Patent application number | Description | Published |
20090126271 | METHOD FOR GASIFYING SOLID FUEL WITH UNIFIED GAS PURIFICATION AND GASIFIER USING SAID METHOD - A function of absorbing CO | 05-21-2009 |
20090191104 | REACTOR-INTEGRATED SYPHON - In order to improve sealing properties between a downcomer | 07-30-2009 |
20100018121 | METHOD AND DEVICE FOR GASIFYING GASIFICATION FUEL - An object of the invention is to enhance gasification efficiency of flammable solid content when high fuel ratio fuel having fixed carbon content in large quantity is to be gasified. A material downcomer | 01-28-2010 |
20100050516 | FUEL GASIFICATION SYSTEM - A fuel gasification system including a gasification furnace including a fluidized bed formed by fluidizing reactant gas for gasifying fuel charged into gasification gas and flammable solid content, a combustion furnace for combustion of the flammable solid content into which the flammable solid content produced in the furnace is introduced together with bed material and that includes a fluidized bed formed by fluidizing reactant gas, a material separator such as hot cyclone that separates bed material from exhaust gas introduced from the combustion furnace, the separated bed material being fed through a downcorner to the gasification furnace, and a tar decomposing mechanism that heats the gasification gas produced in the furnace to decompose tar contained in the gasification gas. | 03-04-2010 |
20120167467 | METHOD FOR GASIFYING SOLID FUEL WITH UNIFIED GAS PURIFICATION AND GASIFIER USING SAID METHOD - A gasification process is divided into three processes: a gasification furnace for carrying out gasification process by pyrolysis and gasification (pyrolysis gasification phase, first process), a combustion furnace for burning char to obtain calcined active chemical (char combustion phase, second process) and a gas purification furnace for purifying gasified gas (gasified gas purification phase, third process). Through heat transmission by the fluid heat medium and chemical reactions in respective phases by the chemical, the gasification furnace is independently controlled to a low or medium temperature (773-1073 K) which is required for gasification and which enables absorption of CO | 07-05-2012 |
Patent application number | Description | Published |
20130024658 | MEMORY CONTROLLER AND SIMD PROCESSOR - Technology to suppress the drop in SIMD processor efficiency that occurs when exchanging two-dimensional data in a plurality of rectangular regions, between an external section and a plurality of processor elements in an SIMD processor, so that one rectangular region corresponds to one processor element. In the SIMD processor, an address storage unit in a memory controller is capable of setting N number of addresses Ai (i=1 through N) in an external memory by utilizing a control processor. A parameter storage unit is capable of setting a first parameter OSV, a second parameter W, and a third parameter L by utilizing a control processor. A data transfer unit executes the transfer of data between an external memory, and the buffers in N number of processor elements contained in the applicable SIMD processor, based on the contents of the address storage unit and the parameter storage unit. | 01-24-2013 |
20130024667 | ARITHMETIC AND CONTROL UNIT, ARITHMETHIC AND CONTROL METHOD, PROGRAM AND PARALLEL PROCESSOR - An attribute group storage unit acquires and holds attribute groups set to respective data blocks. A scenario determination unit determines respective transfer systems of the respective blocks between a memory of the lowest hierarchy and a memory of another hierarchy based on those attribute groups and a configuration of an arithmetic unit which is the parallel processor, and controls the transfer of the respective data blocks according to the determined transfer systems, and the parallel arithmetic operation corresponding to the transfer. Each of the attribute groups is necessary to determine the transfer systems, and includes one or more attributes not depending on the configuration of the parallel processor. The attribute groups of the write blocks are set assuming that each of the write blocks has already been located in the memory of another hierarchy, and is transferred to the memory of the lowest hierarchy. | 01-24-2013 |
20130080739 | SIMD PROCESSOR AND CONTROL PROCESSOR, AND PROCESSOR ELEMENT - To improve processing efficiency of a SIMD processor that divides two-dimensional data into blocks, each having a width of PE number N, to store the data in a local memory of each of PEs by a lateral direction priority method. | 03-28-2013 |