Patent application number | Description | Published |
20090005538 | Apoptosis-Inducing Agent for Prostate Cancer Cells - According to the present invention, an apoptosis-inducing agent for prostate cancer comprising REIC/Dkk-3 DNA or an REIC/Dkk-3 protein, and a therapeutic agent for prostate cancer and an agent for inhibiting prostate cancer metastasis that comprise such apoptosis-inducing agent are provided. | 01-01-2009 |
20100173404 | Partial fragment of REIC/Dkk-3 gene and cancer therapeutic agent comprising the same - This invention provides an inducer of apoptosis in cancer cells comprising a fragment of the REIC/Dkk-3 gene and a cancer therapeutic agent comprising the same. This invention also provides a polynucleotide fragment encoding the REIC/Dkk-3 protein (a) or (b), which encodes a polypeptide having apoptosis activity: (a) a polynucleotide encoding a polypeptide comprising an amino acid sequence of amino acid 1 to any of amino acids 39 to 78 of the amino acid sequence of the REIC/Dkk-3 protein as shown in SEQ ID NO: 2; or (b) a polynucleotide encoding a polypeptide comprising an amino acid sequence derived from the amino acid sequence of amino acid 1 to any of amino acids 39 to 78 of the amino acid sequence of the REIC/Dkk-3 protein as shown in SEQ ID NO: 2 by substitution, deletion, or addition of 1 or several amino acids and having apoptosis activity. | 07-08-2010 |
20100323365 | PRIMER AND PROBE FOR DETECTING CHLAMYDOPHILA CAVIAE, AS WELL AS A CHLAMYDOPHILA CAVIAE DETECTION METHOD USING THE SAME - Provided are a novel primer and a probe for the detection of | 12-23-2010 |
20110182817 | ANTIBODY AGAINST CALCIFIED GLOBULE AND USE OF THE SAME - The present inventors carried out immunization using renal/urinary calculus-derived calcified globules or carotid artery-derived arteriosclerotic plaques, and then obtained antibodies specific to calcified globules (NLO) via screening with NLO. The present inventors demonstrated that the antibodies reacted specifically to arteriosclerotic lesions (calcified lesions) and visualized arteriosclerotic plaques (in particular, calcified lesions) by using fluorescently labeled antibodies. Accordingly, the present inventors completed the present invention. | 07-28-2011 |
20110189237 | Therapeutic Agent for Malignant Mesothelioma and Immunostimulant - According to the present invention, a method for treating malignant mesothelioma using REIC/Dkk-3 and a therapeutic agent for malignant mesothelioma comprising REIC/Dkk-3 are provided. A mesothelioma therapeutic agent is provided, comprising the following REIC/Dkk-3 DNA or a vector comprising the DNA as an active ingredient:
| 08-04-2011 |
20110269824 | CANCER CELL DEATH INDUCING AGENT HAVING EFFECTS OF POTENTIATING ANTICANCER DRUG AGAINST ANTICANCER-DRUG-RESISTANT CANCER - The present invention provides a drug capable of causing cancer cells to restore anticancer drug sensitivity in cases in which cancer has acquired resistance to an anticancer drug and inducing cell death in cancer cells. The present invention specifically provides a cancer cell death inducing agent comprising REIC/Dkk-3 DNA as an active ingredient and having effects of potentiating an anticancer drug for cancer cells having anticancer drug resistance. | 11-03-2011 |
20120034251 | PHARMACEUTICAL COMPOSITION FOR TREATING OR PREVENTING CANCER BY INDUCING DENDRITIC CELL-LIKE DIFFERENTIATION FROM MONOCYTES TO IMPROVE ANTICANCER IMMUNE ACTIVITY - According to the present invention, a composition for inducing or activating dendritic cell-like cells so as to treat or prevent cancer by immunotherapy is provided. | 02-09-2012 |
20120309050 | SYSTEM FOR INCREASING GENE EXPRESSION AND VECTOR COMPRISING THE SYSTEM - An object of the present invention is to provide a method for increasing the expression of foreign genes, in particular, using a promoter, an enhancer, and the like, and an expression cassette containing a promoter, an enhancer, and the like, by which gene expression can be increased. The purpose is achieved with the use of the gene expression cassette comprising a DNA construct containing a gene to be expressed and a poly A addition sequence that are located downstream of a 1 | 12-06-2012 |
20130059306 | PRIMER AND PROBE FOR DETECTING CHLAMYDIA TRACHOMATIS, AND METHOD FOR DETECTING CHLAMYDIA TRACHOMATIS USING SAME - The present invention relates to an oligonucleotide which is designed on the basis of a nucleotide sequence shown in SEQ ID NO: 1 or SEQ ID NO: 2 and hybridizes with the endogenous plasmid gene of | 03-07-2013 |
20130267025 | Partial Region Polypeptide of REIC/Dkk-3 Protein - A polypeptide capable of strongly inducing and activating dendritic-cell-like cells for treating or prevent cancer by immunotherapy, and DNA encoding the polypeptide. The polypeptide is a polypeptide (a) or (b) consisting of a partial region of the REIC/Dkk-3 protein. | 10-10-2013 |
20140147917 | REIC-EXPRESSING ADENOVIRUS VECTOR - An objective of the present invention is to provide an adenovirus vector expressing a REIC/Dkk-3 protein at a high level and containing a DNA construct for expression of REIC/Dkk-3 DNA, wherein the DNA construct is prepared by ligating, from the 5′ terminal side,
| 05-29-2014 |
Patent application number | Description | Published |
20090235056 | RECORDING MEDIUM STORING PERFORMANCE MONITORING PROGRAM, PERFORMANCE MONITORING METHOD, AND PERFORMANCE MONITORING DEVICE - A performance monitoring device has an interrupt detection unit that detects generation of an interrupt process to be executed by a processor in accordance with TLB entry invalidation executed in an operating system. A counter value acquisition unit acquires a counter value of a predetermined event counted by the processor when the interrupt process is detected by the interrupt detection unit. A process information acquisition unit acquires identification information for identifying a process executed on the processor from the operating system immediately before the interrupt process is detected by the interrupt detection unit. An associating unit associates the counter value acquired by the counter value acquisition unit during the interrupt process with the identification information acquired by the process information acquisition unit immediately before the interrupt process. | 09-17-2009 |
20090288090 | PRIORITY CONTROL PROGRAM, APPARATUS AND METHOD - A disclosed priority control program recorded in a computer-readable medium causes a computer to execute, in job allocation for computational resources, a first step of lowering a job allocation priority of a user based on an estimated utilization amount of a job associated with the user, the job allocation priority indicating a degree of priority of the user in obtaining an allocation of the computational resource, and the estimated utilization amount being an amount of the computational resources estimated to be used for the job and being submitted to and recorded in a memory device on a job-to-job basis; and a second step of increasing the job allocation priority over time at a restoration rate which corresponds to a user-specific amount of the computational resources available for the user per unit time, the user-specific amount being recorded in the memory device on a user-to-user basis. | 11-19-2009 |
20100058079 | APPARATUS AND METHOD FOR SAMPLING POWER CONSUMPTION - In the computer apparatus which has a processing unit, a power consumption measuring unit, and a power counter, the power consumption of running programs on the processing unit is measured at arbitrary constant period, wherein the measuring value is integrated to the power counter. When the power counter overflows, the processing unit is interrupted for sampling information required for analysis. Then the processing unit which received the interruption executes a sampling of the power consumption base. So, power consumption based sampling and profiling becomes to be enabled. | 03-04-2010 |
20100293551 | Job scheduling apparatus and job scheduling method - When allocating an unallocated queued job, by using a CDA having a mesh structure to which active jobs are allocated, a job scheduling apparatus scans an event list that includes information about allocation events and release events for jobs, determines the coordinates and the time at which submeshes corresponding to the queued jobs are reserved, and arranges the submeshes by overlapping them on the CDA. | 11-18-2010 |
20110019535 | COMPUTER PROGRAM, APPARATUS, AND METHOD FOR MANAGING NETWORK - In response to a route-changing event, original routes on the network are changed to new routes. A destination-reachable range is identified as a range from which packets can reach an information processing device specified by a destination address. Modification of forwarding data is performed for a neighbor communication device which is located outside the destination-reachable range and adjacent to a communication device in the destination-reachable range, so as to enable forwarding of packets to that communication device in the destination-reachable range. The modified forwarding data is then transmitted to the neighbor communication device. The modification made to the forwarding data results in an additional destination-reachable range, which is thus added to the destination-reachable range. Another cycle of processing is then performed on the basis of the expanded destination-reachable range. | 01-27-2011 |
20110041014 | PROGRAM STATUS DETECTING APPARATUS AND METHOD - A method for a computer including a processor that is capable of counting invalidation of translation lookaside buffers and generating an interrupt at the occurrence of the invalidation, the invalidation being performed by an operating system upon switching between application programs, includes acquiring identification information of application programs from the operating system and storing the identification information as a first list; detecting an interrupt generated from the processor at the occurrence of switching from a first application program to a second application program; and when the interrupt is detected, acquiring the identification information of the first and second application programs from the operating system or the mechanism and comparing the acquired identification information with the first list to determine whether either of the first and second application programs is a program that has been created or disappeared. | 02-17-2011 |
20110125824 | COMPUTER FOR PERFORMING INTER-PROCESS COMMUNICATION, COMPUTER-READABLE MEDIUM STORING INTER-PROCESS COMMUNICATION PROGRAM, AND INTER-PROCESS COMMUNICATION METHOD - In response to an all-to-all inter-process communication request from a local process, a computer repeatedly determines a destination server in accordance with a destination-server determination procedure so that, in a same round of destination-server determinations repeatedly performed by the respective servers during all-to-all inter-process communication, the servers determine servers that are different from one another as destination servers. Each time the destination server is determined, the computer sequentially determines a process running on the determined destination server as a destination process. Each time the destination process is determined, the computer obtains transmission data for the destination process from a send buffer in which the transmission data is stored as a result of execution of the local process and transmits the obtained transmission data to the destination server so as to enable reading of the transmission data during execution of the determined destination process in the destination server. | 05-26-2011 |
20110191779 | RECORDING MEDIUM STORING THEREIN JOB SCHEDULING PROGRAM, JOB SCHEDULING APPARATUS, AND JOB SCHEDULING METHOD - A job scheduling apparatus determines an assignment order, which is the order in which jobs are assigned to a computational resource, on the basis of priority levels and being associated with the assignment order. The apparatus assigns the jobs to the computational resource on the basis of the assignment order. The apparatus reduces the priority levels for the jobs that have been assigned to the computational resource. The apparatus increases the priority levels with time. Regarding a priority level among the priority levels, if, at a future time, which is a fixed time period from the start of execution of the jobs, an amount of an increase in the priority level is expected to be equal to or larger than an amount of a reduction in the priority level for a job, assignment of the job to the computational resource is executed. | 08-04-2011 |
20120020372 | PROHIBITION TURN DETERMINATION APPARATUS - A prohibition turn determination apparatus determines an initial path so that the communication amounts of respective links connecting switches to each other are most efficiently distributed between a communication pair, that is, a pair of servers communicating with each other via a network. Then, the prohibition turn determination apparatus calculates the communication amounts of respective turns formed along the initial path based on the communication amounts set between end nodes which are the communication pair. Next, the prohibition turn determination apparatus determines prohibition turns, which are not used for packet communication, based on the communication amounts of respective turns by an Up/down method or a TP method. Finally, the prohibition turn determination apparatus determines the final routing to avoid the prohibition turns. | 01-26-2012 |
Patent application number | Description | Published |
20110132397 | Silicon Wafer Cleaning Agent - A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent. | 06-09-2011 |
20110162680 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step. | 07-07-2011 |
20110214685 | Cleaning Agent For Silicon Wafer - A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved. | 09-08-2011 |
20120017934 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R | 01-26-2012 |
20120164818 | Process for Cleaning Wafers - Disclosed is a process for cleaning a wafer having an uneven pattern at its surface. The process includes at least: a step of cleaning the wafer; a step of substituting a cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and a step of drying the wafer. The process is characterized in that the cleaning liquid has a boiling point of 55 to 200° C., and characterized in that the water-repellent liquid chemical used for the substitution has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions. With this process, it is possible to provide a cleaning process for improving the cleaning step that tends to induce a pattern collapse. | 06-28-2012 |
20120174945 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 07-12-2012 |
20120211025 | PROCESS FOR CLEANING WAFERS - A process for cleaning a wafer having an uneven pattern at its surface. The process includes at least the steps of: cleaning the wafer with a cleaning liquid; substituting the cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and drying the wafer, wherein the cleaning liquid contains 80 mass % or greater of a solvent having a boiling point of 55 to 200° C., and wherein the water-repellent liquid chemical supplied in the substitution step has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions. | 08-23-2012 |
20120272999 | Liquid Chemical for Forming Water Repellent Protecting Film, and Process for Cleaning Wafers Using the Same - A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %. | 11-01-2012 |
20130056023 | Chemical for Forming Protective Film - Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains: a silicon compound (A) represented by the general formula R | 03-07-2013 |
20130092191 | Liquid Chemical for Forming Water Repellent Protective Film - The present invention relates to a method for cleaning wafers while preventing pattern collapse of the wafers in semiconductor device fabrication, the wafer having at its surface an uneven pattern and containing silicon element at least on surfaces of recessed portions. Provided is: a liquid chemical for forming a protective film which allows efficient cleaning; and a method for cleaning wafers, using the liquid chemical. A liquid chemical for forming a water repellent protective film is provided for forming a protective film on a wafer (having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern), the protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains a dialkylsilyl compound represented by the formula [1] and does not contain an acid and a base. | 04-18-2013 |
20130104931 | Liquid Chemical for Forming Protective Film, and Cleaning Method for Wafer Surface | 05-02-2013 |
20130146100 | Water Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water Repellent Protective Film, and Wafer Cleaning Method Using Liquid Chemical - A water repellent protective film forming agent is provided for forming a protective film on a wafer that has an uneven pattern at its surface. The protective film is formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer. The wafer is a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern. The water repellent protective film forming agent is provided to contain a silicon compound represented by the following general formula [1]: | 06-13-2013 |
20130255534 | Method of Preparing Liquid Chemical for Forming Protective Film - Disclosed herein is a method for preparing a liquid chemical for forming a water-repellent protective film, the liquid chemical being for forming the water-repellent protective film at the time of cleaning a wafer having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern at least on surfaces of recessed portions of the uneven pattern, the liquid chemical containing a nonaqueous organic solvent, a silylation agent, and an acid or a base. The method includes (i) adjusting a water content of the nonaqueous organic solvent to 200 mass ppm or less by dehydration; and (ii) mixing the nonaqueous organic solvent, the silylation agent, and the acid or the base after the adjusting step. | 10-03-2013 |
20140174465 | Cleaning Agent for Silicon Wafer - A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved. | 06-26-2014 |
20140311379 | Method for Preparing Liquid Chemical for Forming Water Repellent Protective Film - A method for preparing a liquid chemical for forming a water-repellant protective film, the liquid chemical having a solvent and an agent for forming a water-repellant protective film, the liquid chemical being for forming a water-repellent protective film at least on surfaces of recessed portions of an uneven pattern of a wafer having the uneven pattern at its surface, the method including: a first refinement step for eliminating the elements (metal impurities) Na, Mg, K, Ca, Mn, Fe, Cu, Li, Al, Cr, Ni, Zn and Ag in a solvent by distilling the solvent or by a particle-eliminating membrane and an ion exchange resin membrane; a mixing step for mixing the solvent after the first refinement step and an agent for forming a water-repellant protective film; and a second refinement step for eliminating particles in a liquid chemical after the mixing step by a particle-eliminating membrane. | 10-23-2014 |
20140373870 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 12-25-2014 |
Patent application number | Description | Published |
20090087573 | Process for Producing Base Material for Forming Heat Shielding Film - There is provided a production process of a heat-ray shielding film-formed base member comprising the steps of mixing a sol solution, formed by using a starting raw material of trialkoxysilane or trialkoxysilane and tetraalkoxysilane, with a solution in which tin-doped indium oxide ultra-fine particles are dispersed, to make a treatment agent; and applying the treatment agent to a base member. In this production process, the treatment agent has an organic solvent having a boiling point of 100-200° C. as a dispersion medium, and the application is conducted by a means by bringing a member retaining the treatment agent into contact with the base member or by a means by spraying the treatment agent, thereby adjusting haze value of the film to be formed to 0.5% or less. | 04-02-2009 |
20100143600 | Coating Fluid Applicable by Hand for Sol-Gel Film Formation - A coating solution for obtaining sol-gel films, the coating solution being composed of a solid matter and a solvent, the solid matter including a silicon oxide oligomer obtained by subjecting an alkoxysilane to hydrolysis and polycondensation in an acid aqueous solution; the solvent including an organic solvent having a boiling point of 100° C. or higher and a viscosity of 3.5 mPa·s or lower and the aqueous acid solution, the number average molecular weight of the silicon oxide oligomer in terms of polystyrene being 500-4000, the content of the solid matter in the coating solution being 8-30 weight %, and the content of the silicon oxide oligomer in the solid matter being 10 weight % or greater. | 06-10-2010 |
20100227159 | Heat Ray Shielding Glass for Vehicle and Process for Producing the Same - [Problems] To develop a heat ray shielding glass usable as a vehicle glass having up-and-down function, the heat ray shielding glass having a film hardness and generating no abnormal noise by friction due to up-and-down movement. | 09-09-2010 |
20140339321 | PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER - The present invention provides a pressure feed container capable of ensuring the cleanliness of a liquid such as a protective film-forming liquid chemical or a protective film-forming liquid chemical kit for preparing the liquid chemical even after long-term storage, and also capable of suppressing electrostatic charge in the liquid. The present invention provides a pressure feed container configured to store a protective film-forming liquid chemical or a protective film-forming liquid chemical kit that is mixed into the protective film-forming liquid chemical, and to transfer a liquid upon application of pressure to the inside of the container, the protective film-forming liquid chemical being for forming a water-repellent protective film on at least surfaces of recessed portions of an uneven pattern formed on a surface of a wafer containing a silicon element at least at a part of the uneven pattern. The protective film-forming liquid chemical contains a nonaqueous organic solvent, a silylation agent, and an acid or a base; the protective film-forming liquid chemical kit includes a treatment liquid A containing a nonaqueous organic solvent and a silylation agent, and a treatment liquid B containing a nonaqueous organic solvent and an acid or a base; the pressure feed container includes a container body configured to contain a liquid selected from the protective film-forming liquid chemical, the treatment liquid A, and the treatment liquid B, and a liquid flowing nozzle configured such that the liquid flows therethrough to be introduced into the container body and/or to be extracted from the container body; the container body includes a metal can body in which a portion configured to contact the liquid is formed from a resin material; the liquid flowing nozzle is provided with a neutralization mechanism configured to reduce electrostatic potential in the liquid; and a liquid contact portion of the liquid flowing nozzle excluding the neutralization mechanism is formed from a resin material. | 11-20-2014 |