Kulshreshtha
Bhawna Kulshreshtha, Linz AT
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20130237652 | BIMODAL POLYETHYLENE COMPOSITION FOR INJECTION MOULDED ARTICLES - Bimodal high density polyethylene composition for producing moulded articles comprising —an ethylene homopolymer or an ethylene alpha-olefin copolymer which is a bimodal high density polymer (COMPONENT A) in combination with —an alphanucleating agent (COMPONENT B), —a slip agent being a primary fatty acid amide, (COMPONENT C) and —one or more additives selected from antioxidants, acid scavengers, pigments and UV-stabilisers (COMPONENT D), the composition showing an increased the crystallisation temperature and a decreased coefficient of friction compared to a bimodal HDPE composition prepared with the sole use of nucleating agent and compared to the sole use of a slip agent; and its use for producing injection moulded articles, especially caps and closures. | 09-12-2013 |
Kshitij Kulshreshtha, Karnataka IN
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20150067423 | A Q-GATING CELL ARCHITECTURE TO SATIATE THE LAUNCH-OFF-SHIFT (LOS) TESTING AND AN ALGORITHM TO IDENTIFY BEST Q-GATING CANDIDATES - A method for creating an architecture to support Q-gating for launch-off-shift (LOS) scan testing using a plurality of flip-flops is provided. The method may include applying a common clock signal to each clock input of the plurality of flip-flops and applying a gated scan enable signal to each scan enable input of the plurality of flip-flops. The method may further include applying a global scan enable signal directly to each of a plurality of Q-gates corresponding to each of the plurality of flip-flops, wherein the global scan enable signal traverses a signal path that bypasses combinational logic located between any two flip-flops of the plurality of flip-flops. | 03-05-2015 |
Neel B. Kulshreshtha, Burlington Township, NJ US
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20150040405 | ELECTRIC HAIR CLIPPER - An electric hair clipper includes a housing containing an electrical source and drive-related components. A clipper mechanism having a reciprocating clipper is located beneath the bottom of the housing but is spaced therefrom by a central hub that extends downwardly from the bottom of the housing. The housing, central hub and clipper mechanism are arranged such that a person can hold the electric hair clipper by placing his or her fingers in the space between the housing and the clipper mechanism with the central hub lying between two fingers and with the back of the person's fingers resting in a pair of elongated spaced apart recesses formed in the bottom of the housing on opposite sides of the hub. | 02-12-2015 |
Prashant Kulshreshtha, San Jose, CA US
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20160064264 | HIGH TEMPERATURE ELECTROSTATIC CHUCKING WITH DIELECTRIC CONSTANT ENGINEERED IN-SITU CHARGE TRAP MATERIALS - Techniques are disclosed for methods and apparatuses for increasing the breakdown voltage while substantially reducing the voltage leakage of an electrostatic chuck at temperatures exceeding about 300 degrees Celsius in a processing chamber. | 03-03-2016 |
Prashant Kumar Kulshreshtha, San Jose, CA US
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20150228463 | CLEANING PROCESS FOR CLEANING AMORPHOUS CARBON DEPOSITION RESIDUALS USING LOW RF BIAS FREQUENCY APPLICATIONS - Methods for cleaning a processing chamber to remove amorphous carbon containing residuals from the processing chamber are provided. The cleaning process utilizes a low frequency RF bias power during the cleaning process. In one embodiment, a method of cleaning a processing chamber includes supplying a cleaning gas mixture into a processing chamber, applying a RF bias power of about 2 MHz or lower to a substrate support assembly disposed in the processing chamber to form a plasma in the cleaning gas mixture in the processing chamber, and removing deposition residuals from the processing chamber. | 08-13-2015 |
20160049323 | METHOD AND APPARATUS OF PROCESSING WAFERS WITH COMPRESSIVE OR TENSILE STRESS AT ELEVATED TEMPERATURES IN A PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION SYSTEM - Embodiments of the present disclosure provide an electrostatic chuck for maintaining a flatness of a substrate being processed in a plasma reactor at high temperatures. In one embodiment, the electrostatic chuck comprises a chuck body coupled to a support stem, the chuck body having a substrate supporting surface, and the chuck body has a volume resistivity value of about 1×10 | 02-18-2016 |
20160099147 | GAS FLOW PROFILE MODULATED CONTROL OF OVERLAY IN PLASMA CVD FILMS - Methods for modulating local stress and overlay error of one or more patterning films may include modulating a gas flow profile of gases introduced into a chamber body, flowing gases within the chamber body toward a substrate, rotating the substrate, and unifying a center-to-edge temperature profile of the substrate by controlling the substrate temperature with a dual zone heater. A chamber for depositing a film may include a chamber body comprising one or more processing regions. The chamber body may include a gas distribution assembly having a blocker plate for delivering gases into the one or more processing regions. The blocker plate may have a first region and a second region, and the first region and second region each may have a plurality of holes. The chamber body may have a dual zone heater. | 04-07-2016 |
Vaibhav Kulshreshtha, Badheka Marg IN
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20150298116 | MIXED METAL OXIDIC NANO SHEETS COATED MONOLITHIC CATALYSTS USEFUL FOR THE DECOMPOSITION OF TOXIC N2O AND A PROCESS FOR THE PREPARATION THEREOF - The present invention describes process of preparation of inter-polymer film of p-methylstyrene-co-divinylbenzene and its conversion into anion exchange membrane through a greener route which dispenses with the use of chloromethyl ether. The membrane with polyethylene binder is shown to have equivalent or even superior performance to anion exchange membrane prepared from styrene-co-divinylbenzene/polyethylene through chloromethyl ether route. | 10-22-2015 |