Patent application number | Description | Published |
20090014841 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING - A first region having a first pattern which includes a first minimum dimension, a second region having a second pattern which includes a second minimum dimension larger the first minimum dimension, the second region being arranged adjacent to the first region, wherein a boundary between the first region and the second region is sectioned by a width which is twice of more of a minimum dimension which exists in an adjacent region. | 01-15-2009 |
20090155990 | MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE AND METHOD FOR CREATING A LAYOUT THEREOF - A method for manufacturing a semiconductor device of one embodiment of the present invention includes: forming an insulation layer to be processed over a substrate; forming a first sacrificial layer in a first area over the substrate, the first sacrificial layer being patterned to form in the first area a functioning wiring connected to an element; forming a second sacrificial layer in a second area over the substrate, the second sacrificial layer being patterned to form in the second area a dummy wiring; forming a third sacrificial layer at a side wall of the first sacrificial layer and forming a fourth sacrificial layer at a side wall of the second sacrificial layer, the third sacrificial layer and the fourth sacrificial layer being separated; forming a concavity by etching the insulation layer to be processed using the third sacrificial layer and the fourth sacrificial layer as a mask; and filling a conductive material in the concavity. | 06-18-2009 |
20090237993 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND CONTROL METHOD - The nonvolatile semiconductor memory device related to the present invention includes a plurality of memory cells, a read/program circuit which supplies a program voltage and a program verification voltage to the plurality of memory cells and desired data is programmed, supplies a first program verification voltage to the plurality of memory cells and then supplies a second program verification voltage to the plurality of memory cells when programming the data, and a read/program control circuit which determines memory cells which reach a first data program state and memory cells which do not reach the first data program state when supplying the first program verification voltage, and determines memory cells which reach a second data program state and memory cells which do not reach the second data program state when supplying the second program verification voltage, and supplies a program control voltage which changes the program operation state for each memory cell. | 09-24-2009 |
20090256265 | SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE - A semiconductor integrated circuit device includes a plurality of contact layers located between two lines running in parallel in a first direction. Each of the contact layers has a structure in which an upper contact and a lower contact are coupled together. The plurality of contact layers are arranged zigzag along the first direction, and coupling portions of the upper contact and the lower contact are displaced from the center of the upper contact in a second direction perpendicular to the first direction. | 10-15-2009 |
20090303790 | NONVOLATILE SEMICONDUCTOR MEMORY DEVICE AND METHOD FOR CONTROLLING THE SAME - The present invention provides a semiconductor memory device that can minimize the widening of the threshold voltage distribution of cell transistors during a data erasing operation. The semiconductor memory device includes:
| 12-10-2009 |
20100034025 | NON-VOLATILE SEMICONDUCTOR STORAGE SYSTEM - There is provided a non-volatile memory having electrically rewritable non-volatile memory cells arranged therein. A controller controls operation at the non-volatile memory. The non-volatile memory comprises a status output section configured to output status information indicating a status of read operation, write operation or erase operation in the non-volatile memory cell. The controller comprises a control signal generating section configured to output a control signal for a certain operation in the non-volatile memory, and a control signal switching section configured to instruct the control signal generating section to switch the control signal based on the status information. | 02-11-2010 |
20100264547 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING - A first region having a first metal wiring, the first metal wiring being buried into an insulation film with a first minimum dimension, and a second region having a second metal wiring, the second metal wiring being buried in the insulation film with a second minimum dimension which is larger than the first minimum dimension, the second region being arranged adjacent to the first region, wherein a thickness of the first metal wiring and a thickness of the second metal wiring are different. | 10-21-2010 |
20130164934 | MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE AND METHOD FOR CREATING A LAYOUT THEREOF - A method for manufacturing a semiconductor device of one embodiment of the present invention includes: forming an insulation layer to be processed over a substrate; forming a first sacrificial layer in a first area over the substrate, the first sacrificial layer being patterned to form in the first area a functioning wiring connected to an element; forming a second sacrificial layer in a second area over the substrate, the second sacrificial layer being patterned to form in the second area a dummy wiring; forming a third sacrificial layer at a side wall of the first sacrificial layer and forming a fourth sacrificial layer at a side wall of the second sacrificial layer, the third sacrificial layer and the fourth sacrificial layer being separated; forming a concavity by etching the insulation layer to be processed using the third sacrificial layer and the fourth sacrificial layer as a mask; and filling a conductive material in the concavity. | 06-27-2013 |
20140240037 | BUFFER CIRCUIT - A buffer circuit includes a first current mirror circuit, a second current mirror circuit, a first transistor, and a second transistor. The first current mirror circuit passes a first mirror current through a second node, corresponding to a first current passed through a first node, and is activated based on a first activating signal. The second current mirror circuit is connected to the first node and the second node, passes a second mirror current through the second node, corresponding to a second current passed through the first node, and is activated based on a second activating signal. The first transistor has a gate to which a reference voltage is applied and has a drain connected to the first node. The second transistor has a gate to which an input voltage is applied and has a drain connected to the second node. | 08-28-2014 |
20150041986 | MANUFACTURING METHOD OF A SEMICONDUCTOR DEVICE AND METHOD FOR CREATING A LAYOUT THEREOF - A method for manufacturing a semiconductor device of one embodiment of the present invention includes: forming an insulation layer to be processed over a substrate; forming a first sacrificial layer in a first area over the substrate, the first sacrificial layer being patterned to form in the first area a functioning wiring connected to an element; forming a second sacrificial layer in a second area over the substrate, the second sacrificial layer being patterned to form in the second area a dummy wiring; forming a third sacrificial layer at a side wall of the first sacrificial layer and forming a fourth sacrificial layer at a side wall of the second sacrificial layer, the third sacrificial layer and the fourth sacrificial layer being separated; forming a concavity by etching the insulation layer to be processed using the third sacrificial layer and the fourth sacrificial layer as a mask; and filling a conductive material in the concavity. | 02-12-2015 |