Patent application number | Description | Published |
20090262325 | Positioning System, Lithographic Apparatus and Device Manufacturing Method - A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass. | 10-22-2009 |
20100149516 | Lithographic Apparatus and A Method to Compensate for the Effect of Disturbances on the Projection System of a Lithographic Apparatus - Embodiments of the invention provide a lithographic apparatus including an illumination system configured to condition a radiation beam, a patterning device support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, an active air mount to support the projection system, the active air mount including at least one actuator, and a feed-forward device, the feed-forward device being configured to provide on the basis of a set-point signal of a movable object, a feed-forward signal to the at least one actuator, wherein the feed-forward signal is designed to decrease a disturbance effect on the projection system due to movement of the movable object. | 06-17-2010 |
20110001254 | Imprint Lithography Apparatus and Method - An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate. | 01-06-2011 |
20110194088 | Projection System, Lithographic Apparatus, Method of Projecting a Beam of Radiation onto a Target and Device Manufacturing Method - A projection system (PS) is provided that includes a sensor system ( | 08-11-2011 |
20120147355 | Positioning System, Lithographic Apparatus and Device Manufacturing Method - A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass. | 06-14-2012 |
20130050670 | POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part. | 02-28-2013 |
20130128246 | Lithography Method and Apparatus - In an embodiment, a lithography method is disclosed that includes providing a providing a first heat load to a first area of an object, and providing a second heat load to a second area of the object, wherein the second heat load is configured to ensure a deformation of the first area of the object caused by providing both the first heat load and the second heat load is smaller than a deformation of the first area of the object caused by providing only the first heat load. | 05-23-2013 |
20140340659 | Lithographic Apparatus and Device Manufacturing Method - A lithographic apparatus component, such as a metrology system or an optical element (e.g., a mirror) is provided with a temperature control system for controlling deformation of the component. The control system includes channels provided close to a surface of the component through which a two phase cooling medium is supplied. The metrology system measures a position of at least a moveable item with respect to a reference position and includes a metrology frame connected to the reference position. An encoder is connected to the moveable item and constructed and arranged to measure a relative position of the encoder with respect to a reference grid. The reference grid may be provided directly on a surface of the metrology frame. A lithographic projection apparatus may have the metrology system for measuring a position of the substrate table with respect to the projection system. | 11-20-2014 |
20140368800 | Lithographic Apparatus With A Metrology System For Measuring A Position Of A Substrate Table - A lithographic apparatus comprises a substrate table for accommodating a substrate; a projection system for imaging a pattern onto the substrate, and a metrology system for measuring a position of the substrate table with respect to the projection system. The metrology system comprises a metrology frame connected to the projection system, a grid positioned stationary with respect to the metrology frame, and an encoder connected to the substrate table and facing the grid for measuring the position of the substrate table relative to the grid. The metrology frame has a surface oriented towards the substrate table, and the surface has been configured, e.g., by writing or etching, so as to form the grid. | 12-18-2014 |
20150098067 | LITHOGRAPHIC APPARATUS - A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body. | 04-09-2015 |
20150109599 | SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder. | 04-23-2015 |
Patent application number | Description | Published |
20090057621 | ELECTRICALLY CONDUCTIVE COMPOSITIONS AND METHOD OF MANUFACTURE THEREOF - Disclosed herein is a method of manufacturing an electrically conductive composition comprising reducing the viscosity of a molten masterbatch to form a reduced viscosity molten masterbatch; and mixing the reduced viscosity molten masterbatch with a polymer to form the electrically conductive composition. Disclosed herein too is a method of manufacturing an electrically conductive composition comprising mixing a molten masterbatch with a first polymer in a first extruder, wherein the first polymer has a melt viscosity that is lower than the melt viscosity of the molten masterbatch; reducing the melt viscosity of the molten masterbatch to form a reduced viscosity molten masterbatch; and mixing the reduced viscosity molten masterbatch with a second polymer in a second extruder to form the electrically conductive composition. | 03-05-2009 |
20090215949 | FLAME RETARDANT POLYCARBONATE COMPOSITIONS - Blends of polycarbonate (PC) with an impact modifier, such as a butadiene-styrene based polymer like acrylonitrile-butadiene-styrene (ABS) polymers or methacrylate-butadiene-styrene (MBS) polymers, having improved flame retardance are disclosed. From about 0.5% to about 3% by weight of a filler selected from the group consisting of a clay, talc, and aluminum oxide particles are added to the blend. The resulting flame retardant polymer composition has improved flame retardance with acceptable maintenance of mechanical and/or processing properties. | 08-27-2009 |
20110229704 | FLAME RETARDANT POLYCARBONATE COMPOSITIONS, METHOD OF MANUFACTURE THEREOF, AND ARTICLES THEREFROM - A thermoplastic polycarbonate composition includes, based on the total weight of the thermoplastic polycarbonate composition: 15 to less than 40 wt. % of a reinforcing mineral filler; and greater than 60 to 85 wt. % of a polymer component, including, based on the weight of the polymer component, 68 to 99.9 wt. % of an aromatic polycarbonate, 0.1 to 2 wt. % of a fluorinated polymer, optionally, 0.1 to 25 wt. % of an impact modifier; and optionally, 0.1 to 5 wt. % of an additive composition including an antioxidant, a mold release agent, and a stabilizer; wherein a molded sample of the thermoplastic polycarbonate composition has no drips when measured in accordance with NF P 92-505 at a thickness of 3.0 mm. | 09-22-2011 |