Patent application number | Description | Published |
20110082033 | MATERIAL, METHOD FOR PRODUCING A MATERIAL AND USE THEREOF - The present invention relates to a material including a matrix and at least one reinforcing element introduced therein, wherein the matrix is selected from the group consisting of plastic, carbon, ceramic, glass, clay, metal, and combinations thereof, and the reinforcing element is spherical to ellipsoidal in shape and has an onionskin-like structure. The present invention further relates to a method for producing a material including steps preparing at least one spherical to ellipsoidal reinforcing element having an onionskin-type structure, and introducing the reinforcing element into a matrix, wherein the matrix is selected from the group consisting of plastic, carbon, ceramic, glass, clay, metal, and combinations thereof. The present invention further relates to use of the material in a friction application, as abrasion protection, an injection moulding part, a support plate, catalyst substrate or as bone replacement material. | 04-07-2011 |
Patent application number | Description | Published |
20080213155 | Method for siliconizing carbon-containing Materials - A method for treating workpieces that consist of porous carbon material with liquid silicon with the formation of silicon carbide, comprising the steps: Preheating porous carbon workpieces under inert gas to the selected operating temperature T | 09-04-2008 |
20090304567 | CERAMIC MATERIALS CONTAINING SPHERICAL SHAPED CARBON PARTICLES - Ceramic materials with a matrix which contains at least one carbide, at least one carbide-forming element and carbon, and which furthermore contain a dispersed phase of carbon particles with spherical shape and an average diameter of 0.2 μm to 800 μm, a process for their production and their use for thermal insulation, as a protective layer in ceramic armoring against mechanical action, or as a friction layer in brake disks or clutch disks. | 12-10-2009 |
20100043699 | Method for Siliconizing Carbon-Containing Materials - A method for treating workpieces that consist of porous carbon material with liquid silicon with the formation of silicon carbide, comprising the steps: Preheating porous carbon workpieces under inert gas to the selected operating temperature T | 02-25-2010 |
20110003138 | PROCESS FOR PRODUCING CERAMIC MATERIALS USING SILICON CARBIDE - Process for producing bodies from ceramic materials using silicon carbide, comprising the steps: configuration of fiber-reinforced porous bodies ( | 01-06-2011 |
Patent application number | Description | Published |
20100109963 | Sealing an Antenna System - An adaptation apparatus comprises a closing-off body and an enlargement. The closing-off body comprises a generated surface which is adapted to establish contact with an external conductor of a waveguide. The enlargement is arranged on the generated surface. The enlargement is adapted such that the enlargement spaces apart an electrical short circuit at a predetermined space from the generated surface of the closing-off body. | 05-06-2010 |
20120262331 | Filling level measuring device antenna cover - A filling level measuring device antenna cover includes a base body and a plurality of circular fins concentrically arranged on the base body, wherein the fins and the base body consist of a plastic material. The fins and the base body are one piece and injection-moulded. | 10-18-2012 |
20130127654 | Measurement System Comprising A Pressure Resistant Feed-Through - Stated is a process separation device for a fill-level measuring device including a pressure resistant feed-through for an inner conductor. The process separation device comprises an inner conductor, an outer conductor, a process side, a control side, and a feed-through. The inner conductor comprises a first conical region, and/or the outer conductor comprises a second conical region. The feed-through comprises the first conical region and/or is encompassed by the second conical region, and in this manner establishes a connection having positive fit between the inner conductor and the outer conductor. | 05-23-2013 |
Patent application number | Description | Published |
20090262009 | PARABOLIC AERIAL WITH A CONICAL DIFFUSION DISC FOR FILL LEVEL RADAR - Reflections on the aerial system of a fill level radar result in reduced measuring quality at short range. Small echo signals at short range can thus disappear in the noise. According to one embodiment of the present invention a parabolic aerial for a fill level radar is stated, which parabolic aerial comprises a parabolic mirror, an exciter and a diffusion disc. The diffusion disc is used for laterally removing interfering electromagnetic waves that would otherwise be absorbed by the exciter. In this way the decay behaviour at short range can be reduced. | 10-22-2009 |
20100066594 | Modular design for a fill-level-radar antenna system - A modular system is for assembling a fill-level radar antenna, a fill-level radar antenna, and o a fill level radar. The modular system comprises several modules that can be interconnected. In this way a host of different fill-level radar antennae may be produced that are optimally adapted to the corresponding conditions. | 03-18-2010 |
20110109499 | MODULAR DESIGN FOR A FILL-LEVEL-RADAR ANTENNA SYSTEM - A modular system is for assembling a fill-level radar antenna, a fill-level radar antenna, and o a fill level radar. The modular system comprises several modules that can be interconnected. In this way a host of different fill-level radar antennae may be produced that are optimally adapted to the corresponding conditions. | 05-12-2011 |
20140091962 | LEVEL GAUGE SYSTEM AND ADAPTOR WITH REFLECTOR - A level measuring device with a signal generator for electromagnetic waves includes an elongated hollow waveguide or for guiding the generated electromagnetic waves, wherein on the end of the hollow waveguide a reflector is situated and a method for operating the same. | 04-03-2014 |
20140182370 | PARABOLIC ANTENNA WITH AN INTEGRATED SUB REFLECTOR - A sensor for a fill level measuring device for determining the fill level in a container by determining the delay time of high-frequency signals, comprising a main reflector having an edge region and an inner region, a sub reflector, which is connected to the edge region of the main reflector via a radome, an inner space, which is encompassed by the radome and the main reflector, and a hollow waveguide which is connected to the main reflector and has a front end, which is oriented toward the sub reflector for coupling electromagnetic waves in and/or out, wherein the radome and the sub reflector are embodied as integral or unitary in formation. | 07-03-2014 |
Patent application number | Description | Published |
20130046963 | ACCESS TO CONTEXT INFORMATION IN A HETEROGENEOUS APPLICATION ENVIRONMENT - Various embodiments of systems and methods to provide access to context information in a heterogeneous application environment are described herein. The context information of a source application is received. The context information is based on the execution of the source application. Further, the context information is stored in one or more context vectors of a global context unit, the one or more context vectors corresponding to the source application and one or more target applications. Furthermore, access to the context information of the global context unit is provided for the one or more target applications upon receiving invoking access indication from the one or more target applications. Also, the source application and the one or more target applications are integrated with the global context unit. | 02-21-2013 |
20130166722 | HANDLING INCIDENTS RELATED TO BUSINESS PROCESSES - In one embodiment, the method includes identifying an incident associated with a scene. The incident is identified through a reporter object associated with the scene. Based upon the identified incident, one or more observer objects related to the scene is determined. The incident is communicated to the one or more observer objects. | 06-27-2013 |
20140101586 | TRIGGERING A REFRESH OF DISPLAYED CONTENT ON A MOBILE DEVICE - The present disclosure involves methods, systems, and devices, including computer programs encoded on a computer storage medium, for providing a generic refresh of displayed content on computing devices, e.g., handheld devices. In one aspect, a method comprises displaying on a screen of the device a content area and a tab area comprising at least one tab. The content area is being refreshed upon receiving an activation of the tab followed by a command associated to a dragging of the tab towards a center of the screen followed by a command associated to a release of the tab, wherein the command associated to a dragging of the tab towards the center of the screen is received while receiving the activation of the tab. In some instances, the refreshing of the content area causes the content area to display updated web content associated to the tab. | 04-10-2014 |
Patent application number | Description | Published |
20100157046 | METHOD AND APPARATUS FOR ANALYZING A GROUP OF PHOTOLITHOGRAPHIC MASKS - The invention relates to a method for analyzing a group of at least two masks for photolithography, wherein each of the masks comprises a substructure of a total structure, which is to be introduced in a layer of the wafer in the lithographic process, and the total structure is introduced in the layer of the wafer by introducing the substructures in sequence. In this method, a first aerial image of a first one of the at least two masks is recorded, digitized and stored in a data structure. Then, a second aerial image of a second one of the at least two masks is recorded, digitized and stored in a data structure. A combination image is generated from the data of the first and second aerial images, which combination image is represented and/or evaluated. | 06-24-2010 |
20100181479 | Particle-optical systems and arrangements and particle-optical components for such systems and arrangements - A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity. | 07-22-2010 |
20100266937 | METHOD FOR REPAIRING PHASE SHIFT MASKS - The invention relates to a method for repairing phase shift masks for photolithography in which a phase shift mask is checked for the presence of defects and, if defects are present, (i) an analysis is conducted as to which of the defects negatively affect imaging properties of the phase shift mask, (ii) said defects are improved, (iii) the imaging properties of the improved phase shift mask are analyzed and the maintenance of a predetermined tolerance criterion is checked, and (iv) the two preceding steps (ii) and (iii) are optionally repeated multiple times if the imaging properties do not meet the predetermined tolerance criterion. In such a method, the imaging properties are analyzed in that, for each defect to be improved, a test variable is determined for the defect as a function of focus and illumination, and at least one additional non-defective point on the phase shift mask in the immediate vicinity of the defect is determined, and a minimum allowable deviation between the test variable for the defect and the non-defective point is predetermined as the tolerance criterion. | 10-21-2010 |
20120104252 | Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements - A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity. | 05-03-2012 |
20140158902 | Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements - A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity. | 06-12-2014 |
Patent application number | Description | Published |
20090125344 | SYSTEM AND METHOD FOR FUSION BETWEEN INCOMPATIBLE DATA MODELS - Disclosed is a system and a method for fusion between incompatible data models. The system generates a product data structure of a first data model and a product data structure of a second data model. Using a business Add-in method, this product data structure of the first data model is fused to the second data model to generate a fused product data structure of the second data model. An output controller is provided to output this fused product data structure of the second data model, thus making functions of first data model available in the second data model. | 05-14-2009 |
20100169140 | Preparing a Time-Sensitive Delivery Request - Some implementations provide a system for preparing a time-sensitive delivery request at least a predefined interval of time before the delivery request is to be forwarded to a supplier. This delivery request may be a request for a component that is to be assembled as part of a production order. This delivery request may be created by a detail-planning system and stored in a resource-planning system. This delivery request may be forwarded to the supplier upon determining that assembly of the production order has reached a first reporting point. | 07-01-2010 |
20110029120 | Manufacturing Resource Planning using a Component Management System - Order information is received for an order executable using a computer system to assemble a product from a plurality of components at a manufacturing location. A real-time record associated with the manufacturing location and being kept updated substantially in real time with order changes is updated with the order information, the real-time record associating the order with the plurality of components. For each of the plurality of components, it is determined whether a component change due to the order information meets a component-specific change criterion associated with the component. A static record is updated with the component change for any of the plurality of components required for the order where the component-specific change criterion is met. After the static record is updated, a management process configured to manage supply of at least one of the plurality of components according to the static record is initiated for the manufacturing location. | 02-03-2011 |
20110029345 | Managing Planning of Component Requirements - Component planning for a product manufacturing enterprise having a central computer device and respective local manufacturing computer devices. A BOM for product types manufactured at the multiple manufacturing plants is maintained in the central computer device, defining that each of the product types belongs to a platform design and includes at least (i) a first component common to all of the products types and (ii) a second component not common to all of the product types. First-component data and second-component data from the BOM are forwarded to a central planning unit in the central computer device for generating a central plan for the first component, and to local planning units in the manufacturing computer devices configured to generate a local plan for the second component used by the corresponding manufacturing plant, respectively. The components are purchased according to the central plan and the local plan. | 02-03-2011 |
20120159493 | ADVANCED SEQUENCING GAP MANAGEMENT - Systems and methods to provide advance sequencing gap management. In example embodiments, a need to generate a proxy gap order for a sequence is detected. Using one or more processors, the proxy gap order is generated based on the detected need. The generated proxy gap order is then inserted into a particular location of the sequence based on the detected need. | 06-21-2012 |
20120194347 | PROACTIVE ADAPTIVE EQUIPMENT MAINTENANCE - Systems and methods to provide proactive adaptive equipment maintenance. In example embodiments, a stress layout representing a physical location is maintained. The stress layout includes a grid system having a plurality of cells. A maintenance indicator value for each cell in which a fixed object is located is calculated. This maintenance indicator value represents a stress level applied to the fixed object. A determination whether the maintenance indicator value exceeds a maintenance threshold for the fixed object is performed. Based on the determining that the maintenance indicator value exceeds the maintenance threshold, automatic generation of a maintenance order for the fixed object is triggered. | 08-02-2012 |
20130060371 | NEXT GENERATION SEQUENCING MANAGEMENT - Systems and methods to provide sequence management are provided. In example embodiments, a production sequence having a plurality of sequencing objects linked together by relationships is generated. Each sequencing object of the plurality of sequencing objects has a relationship to at least one adjacent sequencing object in the production sequence. A trigger to perform a resequence of the production sequence is received. In response, a new production sequence is determined. The new production sequence may be generated by reusing the sequencing objects and updating at least one of the relationships in the production sequence in order to change the production sequence into the new production sequence. The new production sequence may then be posted. Related capacity planning objects are decoupled from the sequencing objects and the sequencing objects are not affected automatically. | 03-07-2013 |
20130151303 | CARBON FOOTPRINT RESTRICTION IN SEQUENCING PROCESS - An example system defines a carbon footprint restriction type in a manufacturing process. The system may comprise a carbon equivalent computation module and a carbon footprint computation module. The carbon equivalent computation module may define a carbon equivalent base attribute for each component unit of the manufacturing process and a carbon equivalent production attribute for the manufacturing process. The carbon footprint computation module may compute a carbon footprint value of an assembled product produced from the manufacturing process of the component units based on the carbon equivalent base attribute of each component unit and the carbon equivalent production attribute of the manufacturing process. An indicator associated with the carbon footprint value of the assembled product is displayed. | 06-13-2013 |