Patent application number | Description | Published |
20130091539 | SYSTEM AND METHOD FOR INSIDER THREAT DETECTION - A system and method include obtaining data related to accessing cyber assets and accessing physical assets from a combined cyber access and physical access control system that protects cyber and physical assets of an organization from both authorized and unauthorized access with malicious intent. The system and method compare the data to known patterns of expected behavior, and identify patterns of suspicious behavior as a function of comparing the data to the patterns of expected behavior. The comparison is utilized to identify potentially malicious insider behavior toward the cyber and physical assets. | 04-11-2013 |
20130282609 | IMAGE RECOGNITION FOR PERSONAL PROTECTIVE EQUIPMENT COMPLIANCE ENFORCEMENT IN WORK AREAS - A method comprises receiving one or more images of a person from one or more image capture devices in response to an input, identifying one or more items of personal protective equipment in the one or more images, determining the positioning of the one or more items of personal protective equipment relative to the person in the one or more images, and verifying compliance with personal protective equipment standards based on the one or more identified items of personal protective equipment and the positioning of the one or more items of personal protective equipment. | 10-24-2013 |
20140104413 | INTEGRATED DIMENSIONING AND WEIGHING SYSTEM - An object analysis system includes a scale for measuring the weight of the object, a range camera configured to produce a range image of an area in which the object is located, and a computing device configured to determine the dimensions of the object based, at least in part, on the range image. Methods for determining the dimensions of an object include capturing a range image and/or a visible image of a scene that includes the object. | 04-17-2014 |
20150142138 | PHYSICAL PRESENCE VERIFICATION BY AN INDUSTRIAL CONTROL SYSTEM CONTROLLER - Physical presence verification by an industrial control system controller is described herein. One industrial control system controller includes a mechanism configured to verify that a user of the industrial control system controller is physically present at a location of the controller, a memory, and a processor configured to execute executable instructions stored in the memory to permit the user to perform industrial control operations using the controller only if the user is physically present at the location of the controller. | 05-21-2015 |
20150312216 | LEGACY DEVICE SECURITIZATION WITHIN A MICROGRID SYSTEM - Devices, methods, systems, and computer-readable media for legacy device securitization within a microgrid system are described herein. One or more embodiments include a system having a microgrid network with at least one remote network connection to a non-local network device and the network having at least one local legacy device in communication with the non-local network device and a bump-in-the-wire (BITW) security device between the local legacy device and the at least one remote connection. | 10-29-2015 |
Patent application number | Description | Published |
20110223734 | METHODS OF FORMING AN ARRAY OF MEMORY CELLS, METHODS OF FORMING A PLURALITY OF FIELD EFFECT TRANSISTORS, METHODS OF FORMING SOURCE/DRAIN REGIONS AND ISOLATION TRENCHES, AND METHODS OF FORMING A SERIES OF SPACED TRENCHES INTO A SUBSTRATE - A method of forming a series of spaced trenches into a substrate includes forming a plurality of spaced lines over a substrate. Anisotropically etched sidewall spacers are formed on opposing sides of the spaced lines. Individual of the lines have greater maximum width than minimum width of space between immediately adjacent of the spacers between immediately adjacent of the lines. The spaced lines are removed to form a series of alternating first and second mask openings between the spacers. The first mask openings are located where the spaced lines were located and are wider than the second mask openings. Alternating first and second trenches are simultaneously etched into the substrate through the alternating first and second mask openings, respectively, to form the first trenches to be wider and deeper within the substrate than are the second trenches. Other implementations and embodiments are disclosed. | 09-15-2011 |
20120021573 | Methods Of Forming An Array Of Memory Cells, Methods Of Forming A Plurality Of Field Effect Transistors, Methods Of Forming Source/Drain Regions And Isolation Trenches, And Methods Of Forming A Series Of Spaced Trenches Into A Substrate - A method of forming a series of spaced trenches into a substrate includes forming a plurality of spaced lines over a substrate. Anisotropically etched sidewall spacers are formed on opposing sides of the spaced lines. Individual of the lines have greater maximum width than minimum width of space between immediately adjacent of the spacers between immediately adjacent of the lines. The spaced lines are removed to form a series of alternating first and second mask openings between the spacers. The first mask openings are located where the spaced lines were located and are wider than the second mask openings. Alternating first and second trenches are simultaneously etched into the substrate through the alternating first and second mask openings, respectively, to form the first trenches to be wider and deeper within the substrate than are the second trenches. Other implementations and embodiments are disclosed. | 01-26-2012 |
20130005115 | Methods Of Forming An Array Of Memory Cells, Methods Of Forming A Plurality Of Field Effect Transistors, Methods Of Forming Source/Drain Regions And Isolation Trenches, And Methods Of Forming A Series Of Spaced Trenches Into A Substrate - A method of forming a series of spaced trenches into a substrate includes forming a plurality of spaced lines over a substrate. Anisotropically etched sidewall spacers are formed on opposing sides of the spaced lines. Individual of the lines have greater maximum width than minimum width of space between immediately adjacent of the spacers between immediately adjacent of the lines. The spaced lines are removed to form a series of alternating first and second mask openings between the spacers. The first mask openings are located where the spaced lines were located and are wider than the second mask openings. Alternating first and second trenches are simultaneously etched into the substrate through the alternating first and second mask openings, respectively, to form the first trenches to be wider and deeper within the substrate than are the second trenches. Other implementations and embodiments are disclosed. | 01-03-2013 |
20130341795 | Methods of Forming Semiconductor Constructions - Some embodiments include a semiconductor construction having a pair of lines extending primarily along a first direction, and having a pair of contacts between the lines. The contacts are spaced from one another by a lithographic dimension, and are spaced from the lines by sub-lithographic dimensions. Some embodiments include a method of forming a semiconductor construction. Features are formed over a base. Each feature has a first type sidewall and a second type sidewall. The features are spaced from one another by gaps. Some of the gaps are first type gaps between first type sidewalls, and others of the gaps are second type gaps between second type sidewalls. Masking material is formed to selectively fill the first type gaps relative to the second type gaps. Excess masking material is removed to leave a patterned mask. A pattern is transferred from the patterned mask into the base. | 12-26-2013 |
20140045317 | Methods Of Forming An Array Of Memory Cells, Methods Of Forming A Plurality Of Field Effect Transistors, Methods Of Forming Source/Drain Regions And Isolation Trenches, And Methods Of Forming A Series Of Spaced Trenches Into A Substrate - A method of forming a series of spaced trenches into a substrate includes forming a plurality of spaced lines over a substrate. Anisotropically etched sidewall spacers are formed on opposing sides of the spaced lines. Individual of the lines have greater maximum width than minimum width of space between immediately adjacent of the spacers between immediately adjacent of the lines. The spaced lines are removed to form a series of alternating first and second mask openings between the spacers. The first mask openings are located where the spaced lines were located and are wider than the second mask openings. Alternating first and second trenches are simultaneously etched into the substrate through the alternating first and second mask openings, respectively, to form the first trenches to be wider and deeper within the substrate than are the second trenches. Other implementations and embodiments are disclosed. | 02-13-2014 |
20140162457 | Substrate Mask Patterns, Methods Of Forming A Structure On A Substrate, Methods Of Forming A Square Lattice Pattern From An Oblique Lattice Pattern, And Methods Of Forming A Pattern On A Substrate - A method of forming a pattern on a substrate comprises forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Sidewall lining is formed over inner and over outer sidewalls of the cylinder-like structures, and that forms interstitial spaces laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall linings that are over outer sidewalls of four of the cylinder-like structures. Other embodiments are disclosed, including structure independent of method. | 06-12-2014 |
20140162458 | Methods of Forming A Pattern On A Substrate - A method of forming a pattern on a substrate includes forming openings in material of a substrate. The openings are widened to join with immediately adjacent of the openings to form spaced pillars comprising the material after the widening. Other embodiments are disclosed. | 06-12-2014 |
20140162459 | Methods of Forming A Pattern On A Substrate - A method of forming a pattern on a substrate includes forming spaced first material-comprising pillars projecting elevationally outward of first openings formed in second material. Sidewall spacers are formed over sidewalls of the first material-comprising pillars. The sidewall spacers form interstitial spaces laterally outward of the first material-comprising pillars. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall spacers that are over sidewalls of four of the first material-comprising pillars. | 06-12-2014 |
20140232008 | Semiconductor Constructions and Methods of Forming Semiconductor Constructions - Some embodiments include a semiconductor construction having a pair of lines extending primarily along a first direction, and having a pair of contacts between the lines. The contacts are spaced from one another by a lithographic dimension, and are spaced from the lines by sub-lithographic dimensions. Some embodiments include a method of forming a semiconductor construction. Features are formed over a base. Each feature has a first type sidewall and a second type sidewall. The features are spaced from one another by gaps. Some of the gaps are first type gaps between first type sidewalls, and others of the gaps are second type gaps between second type sidewalls. Masking material is formed to selectively fill the first type gaps relative to the second type gaps. Excess masking material is removed to leave a patterned mask. A pattern is transferred from the patterned mask into the base. | 08-21-2014 |
20140256140 | Methods Of Forming A Pattern On A Substrate - A method of forming a pattern on a substrate includes forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Photoresist is formed elevationally over and laterally inward of the cylinder-like structures. The photoresist is patterned to form interstitial spaces into the photoresist laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by at least three of the cylinder-like structures. The patterned photoresist is used as an etch mask while etching interstitial openings into the base and while the photoresist is laterally inward of the cylinder-like structures. Other aspects are disclosed. | 09-11-2014 |
20140329179 | METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES, AND RELATED SEMICONDUCTOR DEVICE STRUCTURES - A method of forming a semiconductor device structure comprises forming a template material over a substrate, the template material exhibiting preferential wetting to a polymer block of a block copolymer. A positive tone photoresist material is formed over the template material. The positive tone photoresist material is exposed to radiation to form photoexposed regions and non-photoexposed regions of the positive tone photoresist material. The non-photoexposed regions of the positive tone photoresist material are removed with a negative tone developer to form a pattern of photoresist features. The pattern of photoresist features and unprotected portions of the template material are exposed to an oxidizing plasma to form trimmed photoresist features and a pattern of template features. The trimmed photoresist features are removed with a positive tone developer. Other methods of forming a semiconductor device structure, and a semiconductor device structure are also described. | 11-06-2014 |
20140370684 | METHODS FOR FORMING SUB-RESOLUTION FEATURES IN SEMICONDUCTOR DEVICES - Methods of forming semiconductor devices and features in semiconductor device structures include conducting an anti-spacer process to remove portions of a first mask material to form first openings extending in a first direction. Another anti-spacer process is conducted to remove portions of the first mask material to form second openings extending in a second direction at an angle to the first direction. Portions of the second mask material underlying the first mask material at intersections of the first openings and second openings are removed to form holes in the second mask material and to expose a substrate underlying the second mask material. | 12-18-2014 |
20150206760 | Substrate Mask Patterns, Methods Of Forming A Structure On A Substrate, Methods Of Forming A Square Lattice Pattern From An Oblique Lattice Pattern, And Methods Of Forming A Pattern On A Substrate - A method of forming a pattern on a substrate comprises forming spaced, upwardly-open, cylinder-like structures projecting longitudinally outward of a base. Sidewall lining is formed over inner and over outer sidewalls of the cylinder-like structures, and that forms interstitial spaces laterally outward of the cylinder-like structures. The interstitial spaces are individually surrounded by longitudinally-contacting sidewall linings that are over outer sidewalls of four of the cylinder-like structures. Other embodiments are disclosed, including structure independent of method. | 07-23-2015 |
Patent application number | Description | Published |
20100003195 | KDR AND VEGF/KDR BINDING PEPTIDES AND THEIR USE IN DIAGNOSIS AND THERAPY - The present invention provides polypeptides, peptide dimer, and multimeric complexes comprising at least one binding moiety for KDR or VEGF/KDR complex, which have a variety of uses wherever treating, detecting, isolating or localizing angiogenesis is advantageous. Particularly disclosed are synthetic, isolated polypeptides capable of binding KDR or VEGF/KDR complex with high affinity (e.g., having a K | 01-07-2010 |
20140107041 | KDR AND VEGF/KDR BINDING PEPTIDES AND THEIR USE IN DIAGNOSIS AND THERAPY - The present invention provides polypeptides, peptide dimer, and multimeric complexes comprising at least one binding moiety for KDR or VEGF/KDR complex, which have a variety of uses wherever treating, detecting, isolating or localizing angiogenesis is advantageous. Particularly disclosed are synthetic, isolated polypeptides capable of binding KDR or VEGF/KDR complex with high affinity (e.g., having a K | 04-17-2014 |
Patent application number | Description | Published |
20140161732 | KDR AND VEGF/KDR BINDING PEPTIDES AND THEIR USE IN DIAGNOSIS AND THERAPY - The present invention provides polypeptides, peptide dimers, and multimeric complexes comprising at least one binding moiety for KDR or VEGF/KDR complex, which have a variety of uses wherever treating, detecting, isolating or localizing angiogenesis is advantageous. Particularly disclosed are synthetic, isolated polypeptides capable of binding KDR or VEGF/KDR complex with high affinity (e.g., having a K | 06-12-2014 |
20140286864 | KDR AND VEGF/KDR BINDING PEPTIDES AND THEIR USE IN DIAGNOSIS AND THERAPY - The present invention provides polypeptides, peptide dimer, and multimeric complexes comprising at least one binding moiety for KDR or VEGF/KDR complex, which have a variety of uses wherever treating, detecting, isolating or localizing angiogenesis is advantageous. Particularly disclosed are synthetic, isolated polypeptides capable of binding KDR or VEGF/KDR complex with high affinity (e.g., having a K | 09-25-2014 |
Patent application number | Description | Published |
20100266598 | PEPTIDE THAT ELICITS NEUTRALIZING ANTIBODIES TARGETING THE HIV CO-RECEPTOR, CCR5 - The present invention relates, e.g., to an isolated peptide comprising a sequence of contiguous amino acids that is at least about 60% identical (e.g., at least about 60%, 65%, 70%, 75%, 80%, 85%, 90%, 95%, 98% or 100% identical) to the sequence E-W-Q-K-E-G-L-V-T-L-W-L (SEQ ID NO:1), or an active variant of an isolated peptide comprising SEQ ID NO:1. Neutralizing antibodies generated by, or specific for, such peptides are also described, in particular antibodies which are specific for the HIV co-receptor, CCR5, and which inhibit infection of a host cell by HIV. Neutralizing single strand and complete human monoclonal antibodies against CCR5 are described. Methods of using such peptides or antibodies, for inhibiting infection by HIV, are also described. | 10-21-2010 |
Patent application number | Description | Published |
20100285982 | IMMUNOGENIC PEPTIDES OF INFLUENZA VIRUS - Peptides and polypeptides that elicit immunogenic responses in a mammal; especially neutralizing antibodies, against human and avian influenza strains H1N1, H3N2, H5N1 and H7N7 are disclosed Immunogenic compositions including these peptides, and polypeptides are also provided. Compositions including these peptides and polypeptides with or without adjuvants are disclosed. Nucleic acids and expression cassettes encoding these peptides and polypeptides are also disclosed. Methods of inhibiting infection by influenza, with or without cell entry, are also disclosed using these peptides and polypeptides. | 11-11-2010 |
20120196306 | COMPOSITIONS AND METHODS FOR THE DETECTION OF HIV-1/HIV-2 INFECTION - This invention relates to compositions and methods for the detection of immunodeficiency virus infection, especially immunodeficiency virus-1 (HIV-I) infection. The invention particularly concerns compositions and methods that may be used in HIV vaccine recipients whose sera may contain vaccine-generated anti-HIV-1 antibodies. | 08-02-2012 |
20120301504 | Influenza Virus Recombinant Proteins - The present invention includes influenza Hemagglutinin protein fragments that fold properly when expressed in bacteria. | 11-29-2012 |
20130137083 | Detection of H5N1 Influenza Infection - A combination of H5N1 influenza peptides that provide for H5N1 diagnosis with a high level of sensitivity and specificity is described. | 05-30-2013 |
Patent application number | Description | Published |
20130116128 | INTEGRATED SEQUENCING APPARATUSES AND METHODS OF USE - Provided are methods and apparatuses for performing sequencing using droplet manipulation, for example, via electrowetting-based techniques. Also provided are integrated methods and apparatuses for performing sample preparation and sequencing on the same apparatus. In addition, provided are methods of reducing reagent waste and preloaded consumable cartridges comprising reagents for sample preparation and/or sequencing. | 05-09-2013 |
20140073514 | INTEGRATED SEQUENCING APPARATUSES AND METHODS OF USE - Provided are methods and apparatuses for performing sequencing using droplet manipulation, for example, via electrowetting-based techniques. Also provided are integrated methods and apparatuses for performing sample preparation and sequencing on the same apparatus. In addition, provided are methods of reducing reagent waste and preloaded consumable cartridges comprising reagents for sample preparation and/or sequencing. | 03-13-2014 |
20140274746 | SUPER RESOLUTION IMAGING - A detection apparatus that includes (a) an array of responsive pads on a substrate surface; (b) an array of pixels, wherein each pixel in the array has a detection zone on the surface that includes a subset of at least two of the pads; and (c) an activation circuit to apply a force at a first and second pad in the subset, wherein the activation circuit is configured to apply a different force at the first pad compared to the second pad, and wherein the activation circuit has a switch to selectively alter the force at the first pad and the second pad. | 09-18-2014 |
20140274747 | SUPER RESOLUTION IMAGING - A detection apparatus that includes (a) an array of responsive pads on a substrate surface; (b) an array of pixels, wherein each pixel in the array has a detection zone on the surface that includes a subset of at least two of the pads; and (c) an activation circuit to apply a force at a first and second pad in the subset, wherein the activation circuit is configured to apply a different force at the first pad compared to the second pad, and wherein the activation circuit has a switch to selectively alter the force at the first pad and the second pad. | 09-18-2014 |
Patent application number | Description | Published |
20080197019 | Method of detecting directly undetecable analytes using directly detectable spacer molecules - The present invention provides a method of indirectly detecting at least one directly undetectable analyte of interest. According to the method, a leading electrolyte and a trailing electrolyte are provided. In addition, a mixture of the at least one directly undetectable analyte and at least two directly detectable spacer molecules is provided. The directly detectable spacer molecules and the directly undetectable analyte are then concentrated and separated into zones using isotachophoresis. A displacement between the zones of directly detectable spacer molecules is then used to determine the presence of the directly undetectable analyte. | 08-21-2008 |
20090032401 | Method and Apparatus Using Electric Field for Improved Biological Assays - Disclosed are a method and apparatus that use an electric field for improved biological assays. The electric field is applied across a device having wells, which receive reactants, which carry a charge. The device thus uses a controllable voltage source between the first and second electrodes, which is controllable to provide a positive charge and a negative charge to a given electrode. By controlled use of the electric field charged species in a fluid in a fluid channel are directed into or out of the well by an electric field between the electrodes. The present method involves the transport of fluids, as in a microfluidic device, and the electric field-induced movement of reactive species according to various assay procedures, such as DNA sequencing, synthesis or the like. | 02-05-2009 |
20100029915 | METHOD AND SYSTEM FOR SELECTIVE ISOLATION OF TARGET BIOLOGICAL MOLECULES IN A GENERAL PURPOSE SYSTEM - Embodiments of the present techniques provide systems and methods for isolating particular classes of biological molecules, for example, proteins or nucleic acids, from mixtures of biological components. The methods use solutions that react with the biological molecules to enhance their adsorption by substrates, allowing contaminants to be washed away from the targeted molecules. Embodiments include automated systems that can be used to implement the technique with no or minimal intervention. Other embodiments include separation column technologies that may be used in the techniques. | 02-04-2010 |
20130008789 | METHOD AND APPARATUS USING ELECTRIC FIELD FOR IMPROVED BIOLOGICAL ASSAYS - Disclosed are a method and apparatus that use an electric field for improved biological assays. The electric field is applied across a device having wells, which receive reactants, which carry a charge. The device thus uses a controllable voltage source between the first and second electrodes, which is controllable to provide a positive charge and a negative charge to a given electrode. By controlled use of the electric field charged species in a fluid in a fluid channel are directed into or out of the well by an electric field between the electrodes. The present method involves the transport of fluids, as in a microfluidic device, and the electric field-induced movement of reactive species according to various assay procedures, such as DNA sequencing, synthesis or the like. | 01-10-2013 |
20140255272 | METHOD AND SYSTEM FOR SELECTIVE ISOLATION OF TARGET BIOLOGICAL MOLECULES IN A GENERAL PURPOSE SYSTEM - Embodiments of the present techniques provide systems and methods for isolating particular classes of biological molecules, for example, proteins or nucleic acids, from mixtures of biological components. The methods use solutions that react with the biological molecules to enhance their adsorption by substrates, allowing contaminants to be washed away from the targeted molecules. Embodiments include automated systems that can be used to implement the technique with no or minimal intervention. Other embodiments include separation column technologies that may be used in the techniques. | 09-11-2014 |
Patent application number | Description | Published |
20110020330 | ANTIBODY INHIBITORS OF GDF-8 AND USES THEREOF - The disclosure provides novel antibodies against growth and differentiation factor-8 (GDF-8), including antibody fragments, which inhibit GDF-8 activity in vitro and in vivo. The disclosure also provides methods for diagnosing, preventing, or treating degenerative disorders of muscle, bone, or insulin metabolism. | 01-27-2011 |
20120107928 | Antibody Inhibitors of GDF-8 and Uses Thereof - The disclosure provides novel antibodies against growth and differentiation factor-8 (GDF-8), including antibody fragments, which inhibit GDF-8 activity in vitro and in vivo. The disclosure also provides methods for diagnosing, preventing, or treating degenerative disorders of muscle, bone, or insulin metabolism. | 05-03-2012 |
20150024484 | Antibody Inhibitors of GDF-8 and Uses Thereof - The disclosure provides novel antibodies against growth and differentiation factor-8 (GDF-8), including antibody fragments, which inhibit GDF-8 activity in vitro and in vivo. The disclosure also provides methods for diagnosing, preventing, or treating degenerative disorders of muscle, bone, or insulin metabolism. | 01-22-2015 |