Patent application number | Description | Published |
20080246882 | NONLINEAR PROCESSING DEVICE AND IMAGE DISPLAY APPARATUS - A nonlinearly processed (gamma-corrected) video signal is subjected to three-dimensional signal level correction using three-dimensional correction values and corresponding to a position in a horizontal direction and a vertical direction of a pixel on a display screen of an image display unit and the signal level of the pixel data. Thereby, accurate gamma correction is made possible, and horizontal and vertical area information (grid block) can be disposed in an optimum positional relation according to resolution of the screen. | 10-09-2008 |
20080287043 | Polishing apparatus - A polishing apparatus is used for polishing a substrate such as a semiconductor wafer to a flat mirror finish. The polishing apparatus includes a polishing table having a polishing surface, a top ring configured to hold and press the substrate against the polishing surface, a top ring shaft configured to lift and lower the top ring, and an elongation detecting device configured to detect an elongation of the top ring shaft. The polishing apparatus further includes a controller configured to set a vertical position of the top ring at the time of polishing, and control a lifting and lowering mechanism to lower the top ring to a preset polishing position as the set vertical position. The controller corrects the preset polishing position based on the elongation of the top ring shaft which has been detected by the elongation detecting device. | 11-20-2008 |
20080318492 | Substrate holding apparatus, polishing apparatus, and polishing method - A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member. | 12-25-2008 |
20080318499 | Substrate holding apparatus, polishing apparatus, and polishing method - A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member. | 12-25-2008 |
20090209175 | Polishing apparatus and substrate processing method - A polishing apparatus can detect escape of a substrate from a top ring during polishing. The polishing apparatus including: a polishing table ( | 08-20-2009 |
20120309277 | SUBSTRATE HOLDING APPARATUS, POLISHING APPARATUS, AND POLISHING METHOD - A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring includes a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member. | 12-06-2012 |