Patent application number | Description | Published |
20110104995 | CARRIER FOR A DOUBLE-SIDE POLISHING APPARATUS, DOUBLE-SIDE POLISHING APPARATUS USING THIS CARRIER, AND DOUBLE-SIDE POLISHING METHOD - A carrier for a double-side polishing apparatus comprising at least: a metallic carrier base that is arranged between upper and lower turn tables having polishing pads attached thereto and has a holding hole formed therein to hold a wafer sandwiched between the upper and lower turn tables at the time of polishing; and a ring-like resin insert that is arranged along an inner peripheral portion of the holding hole of the carrier base and is in contact with a peripheral portion of the held wafer, wherein an inner peripheral end portion of the holding hole of the carrier base has an upwardly opening tapered surface, an outer peripheral portion of the ring-like insert has a reverse tapered surface with respect to the tapered surface of the holding hole of the carrier base, and the resin insert is fitted in the holding hole of the carrier base through the tapered surface. | 05-05-2011 |
20110124271 | CARRIER FOR DOUBLE-SIDE POLISHING APPARATUS, DOUBLE-SIDE POLISHING APPARATUS USING THE SAME, AND DOUBLE-SIDE POLISHING METHOD - A carrier for a double-side polishing apparatus, including at least: a carrier base placed between upper and lower turn tables, the carrier base having a holding hole therein, the holding hole holds the wafer sandwiched between the upper and lower turn tables. A ring-shaped resin ring disposed along an inner circumference of the holding hole, the resin ring protecting a chamfered portion by making contact with the chamfered portion of the held wafer, wherein the resin ring has a concave groove on an inner circumference thereof, upper and lower tapered surfaces are formed in the concave groove. A double-side polishing apparatus using the carrier and a double-side polishing method that can reduce the generation of taper in a polished surface and improve the flatness while suppressing the generation of an outer peripheral sag of the wafer. | 05-26-2011 |
20120329373 | DOUBLE-SIDE POLISHING APPARATUS - A double-side polishing apparatus including at least: upper and lower turn tables each having a polishing pad attached thereto; a carrier having a holding hole formed therein for holding a wafer between the upper and lower turn tables; a sensor for detecting a thickness of the wafer during polishing, the sensor being disposed in a through-hole provided at the upper turn table in a direction of an upper-turn-table rotation axis; and a sensor holder for holding the sensor, wherein a material of the sensor holder is quartz. As a result, there is provided a double-side polishing apparatus that can polish a wafer while the difference from the target wafer thickness is reduced by surely inhibiting deformation of the sensor holder due to the influence of heat generated during the polishing of the wafer. | 12-27-2012 |
20130316521 | METHOD FOR PRODUCING SILICON WAFER - The present invention provides a method for producing a silicon wafer including a step of, after growing the oxide film on one surface of a raw material silicon wafer by chemical-vapor deposition, performing double-side polishing of the raw material silicon wafer in such a manner that a suede polishing pad or a velour polishing pad with an asker-C rubber hardness of 50° or more but less than 90° is used for the oxide-film surface. | 11-28-2013 |
Patent application number | Description | Published |
20090185947 | SILICON ALLOY, ALLOY POWDER THEREOF, MANUFACTURING APPARATUS, MANUFACTURING PROCESS AND SINTERED ALLOY THEREOF - A controlled combustion synthesis apparatus comprises an ignition system, a pressure sensor for detecting internal pressure, a nitrogen supply, a gas pressure control valve for feeding nitrogen and exhausting reaction gas, means for detecting the internal temperature of the reaction container, a water cooled jacket, and a cooling plate. A temperature control system controls the temperature of the reaction container by controlling the flow of cooling water supplied to the jacket and the cooling plate in response to the detected temperature. By combustion synthesizing, while controlling the internal pressure and temperature, the apparatus can synthesize a silicon alloy including 30-70 wt. % silicon, 10-45 wt. % nitrogen, 1-40 wt. % aluminum, and 1-40 wt % oxygen. | 07-23-2009 |
20110052440 | MANUFACTURE OF SINTERED SILICON ALLOY - Dehydration and drying of a silicon alloy argil which uses water as a principal binder are carried out by a freeze-drying process, a microwave irradiation process, or a combination thereof. In the freeze-drying process, the shaped compact is put into a cooling medium within 5 minutes after completion of shape forming, retained therein for at least 5 minutes to quick-freeze water within the compact while the water is still in a finely-dispersed condition. The compact is exposed to a pressure below the triple point pressure of water. In the microwave irradiation process, the shaped compact is put into a container exposed to continuous microwave irradiation at 2.450 GHz for at least 5 minutes while under a reduced pressure below atmospheric pressure. | 03-03-2011 |
20110105297 | DUPLEX EUTECTIC SILICON ALLOY, MANUFACTURING METHOD THEREOF, AND MANUFACTURING METHOD OF SINTERED COMPACT USING SILICON ALLOY POWDER - A duplex eutectic silicon alloy including 30-70 weight % silicon, 10-45 weight % nitrogen, 1-40 weight % aluminum, and 1-40 weight % oxygen has a eutectic structure comprising a β′-sialon phase and an ο′-sialon phase. The alloy is produced by controlling cooling at a rate of 50° C. or less per minute in combustion synthesis. A ductile sintered product capable of replacing steel in various applications can be produced by placing a compact composed of a powder of the alloy in a sintering furnace which can supply a heat quantity at least ten times the heat capacity of the compact; and sintering the compact at a pressure at least as great as atmospheric pressure, within a nitrogen atmosphere in which the silicon gas mole fraction is 10% or more, and at a temperature within the range from 1400° C. to 1700° C. | 05-05-2011 |
20140065367 | STRUCTURE HAVING SPECIFIC SURFACE SHAPE AND METHOD FOR MANUFACTURING SAID STRUCTURE - There is provided a structure having convex parts with an average height of 100 nm or more and 1000 nm or less, or concave parts with an average depth of 100 nm or more and 1000 nm or less on a surface thereof. The convex parts or the concave parts thereof are present at an average cycle of 50 nm or more and 400 nm or less in at least one direction. The structure is obtained by polymerizing a polymerizable composition containing a (meth)acrylate compound by light irradiation, electron beam irradiation and/or heating, the (meth)acrylate compound contains 53% by mass or more polyethylene glycol di(meth)acrylate based on the whole (meth)acrylate compound. The structure has a storage elastic modulus at 25° C. of 2 GPa or less and/or a storage elastic modulus at 180° C. of less than 0.5 GPa. | 03-06-2014 |
Patent application number | Description | Published |
20100010295 | TREATMENT TOOL - This treatment tool having: an inserted part that can be inserted and passed through an endoscope, in which a treatment part for carrying out a specific treatment on a tissue is provided to the distal end of the inserted part which is passed through the endoscope and disposed inside the body. The treatment part being provided to the inserted part so as to be freely projecting and retracting; and provided with: an operator portion at the base end portion of the inserted part which is pulled out from the endoscope, for manipulating the projection and retraction of the treatment part. | 01-14-2010 |
20110066157 | TREATMENT TOOL - Provided is a treatment tool endoscopically inserted into a body cavity. The treatment tool includes a treatment part for performing a treatment within the body cavity; a connecting member connected to a proximal end of the treatment part; a sheath through which the treatment part and the connecting member are inserted so as to be able to advance or retreat in an axis direction; an operation part which is connected to the connecting member and extends and retracts the connecting member with respect to the sheath; and a coupling member, which is formed in a tubular shape, provided with a large diameter portion with substantially the same external diameter as the internal diameter of the sheath and a fixing portion with an external diameter smaller than that of the large diameter portion, and fixed to at least any one of the connecting member and the treatment part. The connecting member or the treatment part is inserted to the fixing portion and fixed to the fixing portion in a state where the diameter of the fixing portion is smaller than that of the large diameter portion, and the large diameter portion prevents the treatment part and the connecting member from wobbling in a direction separating from the axis of the sheath within the sheath. | 03-17-2011 |
20120203063 | TREATMENT TOOL FOR ENDOSCOPE - A treatment tool for endo scope includes a pair of forceps members supported by a forceps rotation axis such that they can rotate relatively, an operation part for performing an open-close operation of the pair of forceps members, an operation wire that connects the pair of forceps members and the operation part, an insertion part which the operation wire is inserted into, a cover member that secures the forceps rotation axis to the insertion part, a connection member including a link rotation axis, provided at a distal-end part of the operation wire, and a pair of link members, first end parts of each being rotatably connected via respective rotation axis members to a proximal-end part of each of the pair of forceps members, and second end parts of each being rotatably connected to the link rotation axis. The cover member includes restricting parts. | 08-09-2012 |
Patent application number | Description | Published |
20110157704 | ANTIREFLECTIVE FILM AND PRODUCTION METHOD THEREOF - It is aimed at finding out a surface pattern and physical properties required for an antireflective film having an excellent antireflective property for light, a light transmissivity, and the like, and at providing an antireflective film having such a specific surface pattern and physical properties, and a production method of the antireflective film; and provided for this object, is an antireflective film, obtained by: processing a surface of an aluminum material, by mechanical polishing, chemical polishing and/or electrolytic polishing; subsequently producing a pattern of mold having taper-shaped pores on the surface of the aluminum material, by combining a formation of an anodic oxide coating based on anodic oxidation of the surface of the aluminum material, with etching of the anodic oxide coating; and transferring the pattern of mold onto an antireflective film-forming material; wherein the antireflective film has, on a surface thereof, convexities having an average height between 100 nm inclusive and 1,000 nm inclusive, or concavities having an average depth between 100 nm inclusive and 1,000 nm inclusive, and the convexities or concavities are present at an average period between 50 nm inclusive and 400 nm inclusive, at least in a certain single direction; and wherein the antireflective film has a haze of 15% or less. | 06-30-2011 |
20130059158 | SYNTHETIC RESIN LAMINATE - A synthetic resin laminate for use for transparent substrate materials and transparent protective materials is excellent in interlayer adhesiveness, form stability in high-temperature and high humidity environments, surface hardness and impact resistance. The synthetic resin laminate has a vinyl copolymer resin (A) layer and a polycarbonate resin (B) layer, wherein layer (A) is directly laminated on one surface of layer (B), and in which (A) contains a (meth)acrylate structural unit (a) represented by a specific formula and an aliphatic vinyl structural unit (b) represented by a specific formula, the total proportion of the (meth)acrylate structural unit (a) and the aliphatic vinyl structural unit (b) is from 90 to 100 mol % relative to the total of all the structural units in (A), and the proportion of the (meth)acrylate structural unit (a) is from 65 to 80 mol % relative to the total of all the structural units in (A). | 03-07-2013 |
20130059980 | THERMOPLASTIC TRANSPARENT RESIN COMPOSITION - To provide a highly transparent thermoplastic resin composition without requiring, for example, a special molecular design or incorporation of an additive, with the refractive index of the composition being readily controllable. | 03-07-2013 |
20130095337 | THERMOPLASTIC RESIN LAMINATE - A thermoplastic resin laminate is a transparent substrate material or protective material which is excellent in transparency, birefringence, and pattern-formability. The laminate is a synthetic resin laminate formed of a methacrylic resin layer, and a vinyl copolymer resin layer laminated on one or both sides of the methacrylic resin layer. The vinyl copolymer resin contains a (meth)acrylate structural unit and an aliphatic vinyl structural unit represented by specific formulas. The ratio of the sum of the (meth)acrylate structural units and the aliphatic vinyl structural units is 90 to 100 mol % with respect to all the structural units that form the resin. The ratio by mole of the (meth)acrylate structural unit to the aliphatic vinyl structural unit is 65:35 to 85:15. The methacrylic resin contains a structural unit having no benzene ring in an amount of 90 mol % or more with respect to all the structural units. | 04-18-2013 |
20130183537 | SYNTHETIC RESIN LAMINATE - The invention provides a synthetic resin laminate having a thermoplastic resin (A) layer and a thermoplastic resin (B) layer provided on each side of the thermoplastic resin (A) layer, the thermoplastic resin (A) having a styrene structural unit content of 65 to 90 mol % with respect to all the structural units forming the resin, characterized in that the thermoplastic resin (B) is a (meth)acrylic acid ester-styrene copolymer resin which is predominantly formed of a (meth)acrylic acid ester structural unit (a) represented by formula (1) and a styrene structural unit, and which has a ratio by mole of (meth)acrylic acid ester structural unit (a) to styrene structural unit of 70:30 to 84:16. The synthetic resin laminate is excellent in transparency, anti-warpage property, interlayer adhesion, adhesion to a hard coat layer formed from a photosensitive hard coating material, scratch resistance, and weather resistance. | 07-18-2013 |