Katsui
Hiromitsu Katsui, Mie JP
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20110057192 | ACTIVE MATRIX SUBSTRATE AND DISPLAY UNIT PROVIDED WITH IT - An active matrix substrate includes a substrate; scanning lines formed on the substrate; an insulating film covering the scanning lines; signal lines intersecting the scanning lines via the insulating film; switching elements formed on the substrate, each operating in response to a signal which is applied to the corresponding scanning line; and pixel electrodes each capable of being electrically connected to the corresponding signal line via the switching elements. The insulating film is a multilayer insulating film including a first insulating layer and a second insulating layer. The first insulating layer is formed of an insulating material containing an organic component, and the multilayer insulating film has a low-stack region in at least a portion of a region overlapping each switching element, the first insulating layer not being formed in the low-stack region. The active matrix substrate reduces the capacitance formed at each intersection between a scanning line and a signal line, without causing an increase in the wiring resistance or a degradation of the driving ability of switching elements. | 03-10-2011 |
Hiromitsu Katsui, Osaka-Shi JP
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20120120616 | WIRING BOARD, METHOD FOR MANUFACTURING SAME, DISPLAY PANEL, AND DISPLAY DEVICE - A wiring board is provided which can prevent a metal electrode from corroding due to a defect in a transparent conductive electrode covering an end face of an organic insulating film. An active-matrix substrate includes: a glass substrate; a metal wire provided on the glass substrate; a gate insulating film covering the metal wire; an interlayer insulating film covering the gate insulating film; and a transparent electrode formed on the interlayer insulating film. The scanning wire provided with a terminal area where the transparent electrode is laminated directly on the scanning wire. The transparent electrode extends over the terminal area in such a way as to cover an end face of the interlayer insulating film that faces the terminal area and an end face of the gate insulating film that faces the terminal area. | 05-17-2012 |
20120248443 | ACTIVE MATRIX SUBSTRATE AND METHOD FOR MANUFACTURING THE SAME - An active matrix substrate includes a plurality of scanning lines ( | 10-04-2012 |
20120248450 | ACTIVE MATRIX SUBSTRATE AND METHOD FOR PRODUCING SAME - The present invention provides an active matrix substrate that is capable of reliably connecting a plurality of conductive layers that are arranged with an insulating layer therebetween. The active matrix substrate of the present invention has a first conductive layer (CS) and a second conductive layer ( | 10-04-2012 |
20130023086 | ACTIVE MATRIX SUBSTRATE, DISPLAY PANEL PROVIDED WITH SAME, AND METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE - An active matrix substrate includes a plurality of pixel electrodes (P) provided in a matrix, and a plurality of TFTs ( | 01-24-2013 |
20130048999 | SEMICONDUCTOR DEVICE, ACTIVE MATRIX SUBSTRATE, AND DISPLAY DEVICE - A semiconductor device ( | 02-28-2013 |
20130207115 | SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCTION THEREOF - A semiconductor device ( | 08-15-2013 |
20140014952 | ACTIVE MATRIX SUBSTRATE, DISPLAY PANEL, AND DISPLAY DEVICE - A drain electrode ( | 01-16-2014 |
20140147966 | SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE AND DISPLAY DEVICE - The semiconductor device ( | 05-29-2014 |
Hiromitsu Katsui, Osaka JP
Patent application number | Description | Published |
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20130009160 | ACTIVE MATRIX SUBSTRATE - Disposed on an insulating substrate ( | 01-10-2013 |
20130102115 | METHOD FOR MANUFACTURING ACTIVE MATRIX SUBSTRATE - The disclosed method for manufacturing an active matrix substrate includes a step in which a first mask is used to pattern a first conductive layer G, CS, and S, a step in which a second mask is used to pattern a first insulating layer, a step in which a third mask is used to pattern a semiconductor layer, a step in which a fourth mask is used to pattern a second conductive later, a step in which a fifth mask is used to pattern a second insulating layer, and a step in which a sixth mask is used to pattern a third conductive layer. | 04-25-2013 |
20140103385 | LIGHT-EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME - Occurrence of a crosstalk phenomenon in a light-emitting device including a tandem element is suppressed. A light-emitting device includes: lower electrodes over an insulating layer; a partition over a portion between the lower electrodes, which includes an overhang portion over an end portion of each of the lower electrodes; a first light-emitting unit over each of the lower electrodes and the partition; an intermediate layer over the first light-emitting unit; a second light-emitting unit over the intermediate layer; and an upper electrode over the second light-emitting unit. The distance between the overhang portion and each of the lower electrodes is larger than the total thickness of the first light-emitting unit and the intermediate layer over the lower electrode. | 04-17-2014 |
20140206117 | METHOD FOR MANUFACTURING DISPLAY DEVICE - An IZO layer ( | 07-24-2014 |
Masayoshi Katsui, Machida JP
Masayoshi Katsui, Kawasaki JP
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20110143601 | CONNECTOR - A connector which is to be mounted on a substrate includes a housing member having an opening portion in which an electrical device is to be inserted, and a contact member provided in the housing member to electrically connect the electrical device with the substrate. The contact member includes a first portion, a second portion facing the first portion with a gap and supported elastically with respect to the first portion, and a third portion supported by the second portion. The third portion comes into contact with a terminal of the electrical device electrically when the second portion is pushed by a pushing member which is to be inserted into the gap between the first portion and the second portion. | 06-16-2011 |
20110306229 | CONNECTOR ASSEMBLY - A connector assembly includes a plug connector including a plug housing and an engaging portion that outwardly protrudes from each of side-surfaces of the plug housing, and a receptacle connector including a receptacle housing and a metal fitting that is formed at each of side walls of the receptacle housing, the metal fitting including a retaining portion that is formed at a lower part of the metal fitting and is exposed at a lower part of each of the side walls, and a beam portion that is formed at an upper part of the metal fitting and inwardly projects from each of the side walls of the receptacle housing at a height above a bottom surface of the receptacle housing, the beam portion forming a space with the bottom surface of the receptacle housing to receive the engaging portion of the plug connector. | 12-15-2011 |
Noboru Katsui, Tokyo JP
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20150326775 | CAMERA DEVICE, CAMERA SYSTEM AND CAMERA CONTROL METHOD - A camera device includes: an imaging unit taking image light to obtain a video signal; an output unit outputting the video signal obtained in the imaging unit to a connected cable; a detection unit detecting current variation or voltage variation of the video signal to be outputted from the output unit; and a control unit determining a control signal transmitted through the cable based on the signal variation detected by the detection unit and performing operation control corresponding to the determined control signal. | 11-12-2015 |
Rie Katsui, Osaka JP
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20080268268 | TITANIUM OXIDE PHOTOCATALYST, METHOD FOR PRODUCING SAME AND USE THEREOF - A titanium oxide-based photocatalyst which can exhibit excellent photocatalytic properties in response to visible light while maintaining its inherent activity in response to ultraviolet light and which is suitable for mass production contains bismuth as a first additional metal component and at least one metal element selected from silicon, zirconium, aluminum, and hafnium as a second additional metal component in titanium oxide. The Bi/Ti atomic ratio is preferably at least 0.0001 and at most 1.0, the atomic ratio of the second additional metal to Ti is preferably at least 0.0001 and at most 0.8, and a portion of bismuth is preferably present in the form of lower valence (Bi | 10-30-2008 |
Seizo Katsui, Osaka JP
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20130000531 | METHOD FOR SUPPLYING COMBUSTION AIR IN VERTICAL INCINERATOR AND VERTICAL INCINERATOR - A method for supplying combustion air in a vertical incinerator according to one embodiment of the present invention is such that during incineration treatment by the vertical incinerator | 01-03-2013 |
Shuji Katsui, New York, NY US
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20100099241 | METHOD OF FABRICATING SEMICONDUCTOR DEVICE - A method of fabricating a semiconductor device according to one embodiment includes: removing a native oxide film and adhering silicon nitrides on an area of a Si based substrate in hydrogen gas atmosphere under a condition in which a pressure is a first pressure and a temperature is a first temperature, a silicon nitride-containing member being formed on the Si based substrate, the area being a area not covered by the member; lowering the temperature to a second temperature from the first temperature while maintaining the pressure at the first pressure in hydrogen gas atmosphere; lowering the pressure to a second pressure from the first pressure while maintaining the temperature at the second temperature in hydrogen gas atmosphere; and epitaxially growing a crystal on the area of the Si based substrate in a precursor gas atmosphere after the pressure is lowered to the second pressure, the crystal including at least one of Si and Ge, the precursor gas atmosphere including at least one of hydrogen, Si and Ge. | 04-22-2010 |
Tadashi Katsui, Kanagawa JP
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20110142611 | COUNTER-ROTATING AXIAL FLOW FAN - A counter-rotating axial flow fan with improved characteristics and reduced noise compared to the related art can be provided. Defining the number of front blades as N, the number of stationary blades as M, and the number of rear blades as P, and defining the maximum axial chord length of the front blades as Lf, the maximum axial chord length of the rear blades as Lr, the outside diameter of the front blades as Rf, and the outside diameter of the rear blades as Rr, the counter-rotating axial flow fan satisfies the following two relationships: N≧P>M; and Lf/(Rf×π/N)≧1.25 and/or Lr/(Rr×π/P)≧0.83. | 06-16-2011 |
20110142612 | COUNTER-ROTATING AXIAL FLOW FAN - A counter-rotating axial flow fan in which the shape of stationary blades of a middle stationary portion is optimized to reduce noise is provided. Defining the maximum axial chord length of front blades as Lf, the maximum axial chord length of rear blades as Lr, and the maximum axial chord length of stationary blades as Lm, a relationship of Lm/(Lf+Lr)<0.14 is satisfied. Defining the maximum dimension between the blade chord for lower surfaces of the stationary blades and the lower surfaces as K | 06-16-2011 |
20110142614 | COUNTER-ROTATING AXIAL FLOW FAN - A counter-rotating axial flow fan with reduced noise at the target operating point achieved without modifying a front impeller, a rear impeller, or a middle stationary portion is provided. An annular rib including a projecting surface for generating turbulent flow is formed on an inner wall portion of a casing at a position off from the middle stationary portion to a side of the rear impeller, the projecting surface extending radially inwardly of the inner wall portion and extending continuously in the circumferential direction of the inner wall portion. A fluid striking the projecting surface for generating turbulent flow is partially disturbed to form a turbulent flow before entering an area in which the rear impeller is provided. The turbulent flow suppresses flow separation of a fluid flowing along the surfaces of rear blades of the rear impeller from the surfaces of the rear blades. | 06-16-2011 |