Patent application number | Description | Published |
20080297744 | Lithographic apparatus and device manufacturing method - An immersion lithographic apparatus is described with a drain configured to remove liquid from a gap between an edge of the substrate and the substrate table on which the substrate is supported. The drain is provided with a means to provide liquid to the drain irrespective of the position of the substrate table and/or a means to saturate gas within the drain. Those measures reduce the variations in heat load due to evaporation of liquid in the drain. | 12-04-2008 |
20090091716 | Lithographic apparatus and method of cleaning a lithographic apparatus - An immersion lithographic apparatus is described in which an inlet is provided to provide cleaning fluid to a space between an object, such as a substrate, positioned on a substrate table and the substrate table. | 04-09-2009 |
20090323045 | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE LITHOGRAPHIC APPARATUS - A Lithographic Apparatus and a Method of Operating the Lithographic Apparatus A lithographic projection apparatus is disclosed that includes a substrate table, a positioner, a projection system and a fluid handling system. The substrate table is constructed and arranged to hold a substrate, the substrate having an edge feature. The projection system is configured to project a patterned beam of radiation onto the substrate. The fluid handling system is constructed and arranged to supply a liquid flow to a space between the projection system and the substrate table and to at least partly confine the liquid to the space. The positioner is configured to position the substrate on the substrate table so that the edge feature lies downstream of the substrate in the liquid flow. | 12-31-2009 |
20110242512 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. | 10-06-2011 |
20110273678 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. | 11-10-2011 |