| Patent application number | Description | Published |
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| 20090228234 | TEMPERATURE MEASUREMENT APPARATUS AND METHOD - A temperature measurement apparatus includes a light source; a first splitter that splits a light beam into a measurement beam and a reference beam; a reference beam reflector that reflects the reference beam; an optical path length adjustor; a second splitter that splits the reflected reference beam into a first reflected reference beam and a second reflected reference beam; a first photodetector that measures an interference between the first reflected reference beam and a reflected measurement beam obtained by the measurement beam reflected from a target object; a second photodetector that measures an intensity of the second reflected reference beam; and a temperature calculation unit. The temperature calculation unit calculates a location of the interference by subtracting an output signal of the second photodetector from an output signal of the first photodetector, and calculates a temperature of the target object from the calculated location of the interference. | 09-10-2009 |
| 20100206482 | PLASMA PROCESSING APPARATUS AND TEMPERATURE MEASURING METHOD AND APPARATUS USED THEREIN - A plasma processing apparatus includes a temperature measuring unit; airtightly sealed temperature measuring windows provided in a mounting table, for optically communicating to transmit a measurement beam through a top surface and a bottom surface of the mounting table; and one or more connection members for connecting the mounting table and a base plate, which is provided in a space between the mounting table and the base plate. In the plasma processing apparatus, a space above the mounting table is set to be maintained under a vacuum atmosphere, and a space between the mounting table and the base plate is set to be maintained under a normal pressure atmosphere, and each collimator is fixed to the base plate at a position corresponding to each temperature measuring window, thereby measuring a temperature of the substrate via the temperature measuring windows by the temperature measuring unit. | 08-19-2010 |
| 20100243607 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING SAME - A substrate processing method uses a substrate processing apparatus including a chamber for accommodating a substrate, a lower electrode to mount the substrate, a first RF power applying unit for applying an RF power for plasma generation into the chamber, and a second RF power applying unit for applying an RF power for bias to the lower electrode. The RF power for plasma generation is controlled to be intermittently changed by changing an output of the first RF power applying unit at a predetermined timing. If no plasma state or an afterglow state exists in the chamber by a control of the first RF power applying unit, an output of the second RF power applying unit is controlled to be in an OFF state or decreased below an output of the second RF power applying unit when the output of the first RF power applying unit is a set output. | 09-30-2010 |
| 20120207189 | TEMPERATURE MEASUREMENT APPARATUS AND METHOD - A temperature measurement apparatus includes a light source; a first splitter that splits a light beam into a measurement beam and a reference beam; a reference beam reflector that reflects the reference beam; an optical path length adjustor; a second splitter that splits the reflected reference beam into a first reflected reference beam and a second reflected reference beam; a first photodetector that measures an interference between the first reflected reference beam and a reflected measurement beam obtained by the measurement beam reflected from a target object; a second photodetector that measures an intensity of the second reflected reference beam; and a temperature calculation unit. The temperature calculation unit calculates a location of the interference by subtracting an output signal of the second photodetector from an output signal of the first photodetector, and calculates a temperature of the target object from the calculated location of the interference. | 08-16-2012 |
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| 20080236747 | GAS ANALYZING APPARATUS AND SUBSTRATE PROCESSING SYSTEM - A gas analyzing apparatus includes a measurement chamber having a mounting member for mounting thereon a substrate on which a sample is adsorbed; a depressurizing mechanism for depressurizing the inside of the measurement chamber; and a heating unit for heating the substrate having the adsorbed sample thereon and mounted on the mounting member. The apparatus further includes: a mass spectrometer inserted in the measurement chamber, for detecting gas molecules escaping from the sample with an increasing temperature; and a temperature measuring unit for measuring a temperature of the substrate having the adsorbed sample thereon by using an interferometer which detects an optical thickness of the substrate. | 10-02-2008 |
| 20080304543 | TEMPERATURE MEASURING APPARATUS AND TEMPERATURE MEASURING METHOD - A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetector. The temperature measuring apparatus further includes an attenuator that attenuates the reference beam reflected from the reference beam reflector to thereby make an intensity thereof closer to an intensity of the measurement beam reflected from the temperature measurement object. | 12-11-2008 |
| 20090047795 | PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM - A plasma processing apparatus includes a first radio frequency (RF) power supply unit for applying a first RF power for generating a plasma from a processing gas to at least one of a first and a second electrode which are disposed facing each other in an evacuable processing chamber. The first RF power supply unit is controlled by a control unit so that a first phase at which the first RF power has a first amplitude for generating a plasma and a second phase at which the first RF power has a second amplitude for generating substantially no plasma are alternately repeated at predetermined intervals. | 02-19-2009 |
| 20090194508 | SUBSTRATE PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD - A substrate plasma processing apparatus includes a substrate holding electrode and a counter electrode which are arranged in a chamber, a high frequency generating device which applies a high frequency of 50 MHZ or higher to the substrate holding electrode, a DC negative pulse generating device which applies a DC negative pulse voltage in a manner of superimposing on the high frequency, and a controller controlling to cause intermittent application of the high frequency and cause intermittent application of the DC negative pulse voltage according to the timing of on or off of the high frequency. | 08-06-2009 |
| 20100072172 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - There are provided a substrate processing apparatus and a substrate processing method realizing an effective reduction of a voltage change of a substrate on an electrode to reduce the variation of incident energy of ions entering the substrate. The substrate processing apparatus includes: a first electrode holding a substrate on a main surface of the first electrode; a second electrode facing the first electrode; a RF power source applying to the first electrode a RF voltage whose frequency is equal to or higher than 40 MHz; and a pulse voltage applying unit applying to the first electrode a pulse voltage decreasing in accordance with a lapse of time, by superimposing the pulse voltage on the RF voltage. | 03-25-2010 |
| 20120224603 | TEMPERATURE MEASURING APPARATUS AND TEMPERATURE MEASURING METHOD - A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetector. The temperature measuring apparatus further includes an attenuator that attenuates the reference beam reflected from the reference beam reflector to thereby make an intensity thereof closer to an intensity of the measurement beam reflected from the temperature measurement object. | 09-06-2012 |
| 20130122714 | PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND STORAGE MEDIUM - A plasma processing apparatus includes a first radio frequency (RF) power supply unit for applying a first RF power for generating a plasma from a processing gas to at least one of a first and a second electrode which are disposed facing each other in an evacuable processing chamber. The first RF power supply unit is controlled by a control unit so that a first phase at which the first RF power has a first amplitude for generating a plasma and a second phase at which the first RF power has a second amplitude for generating substantially no plasma are alternately repeated at predetermined intervals. | 05-16-2013 |
| 20140286375 | TEMPERATURE MEASURING APPARATUS AND TEMPERATURE MEASURING METHOD - A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetector. The temperature measuring apparatus further includes an attenuator that attenuates the reference beam reflected from the reference beam reflector to thereby make an intensity thereof closer to an intensity of the measurement beam reflected from the temperature measurement object. | 09-25-2014 |
| Patent application number | Description | Published |
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| 20080218744 | TEMPERATURE MEASURING APPARATUS AND TEMPERATURE MEASURING METHOD - A temperature measuring apparatus includes a light source, a first splitter, a second splitter, a reference beam reflector, an optical path length adjuster, a reference beam transmitting member, a first to an nth measuring beam transmitting member and a photodetector. The temperature measuring apparatus further includes a controller that stores, as initial peak position data, positions of interference peaks respectively measured in advance by irradiating the first to the nth measuring beam onto the first to the nth measurement point of the temperature measurement object, and compares the initial peak position data to positions of interference peaks respectively measured during a temperature measurement to thereby estimate a temperature at each of the first to the nth measurement point. | 09-11-2008 |
| 20120182418 | ELECTRONIC LEVEL DEVICE AND LEVEL STAFF USED FOR ELECTRONIC LEVEL DEVICE - An electronic level includes a wide-angle lens system having a two-dimensional imaging element configured to form thereon a picture image including an image of a level staff assigned with a code pattern, an extraction part configured to extract the image of the level staff from the picture image, a height-level measurement value calculation part configured to obtain a height-level measurement value indicated by a portion of the code pattern in the image of the level staff extracted by the extraction part, the portion of the code pattern located at a collimation optical axis of the wide-angle lens system, and a calculation part configured to calculate a collimation height from the height-level measurement value. | 07-19-2012 |
| 20130302068 | Developing Device, Assembly, and Image Forming Apparatus - A developing device includes a first developing member that rotates in a manner such that a moving direction of a portion opposing the image carrier is opposite a moving direction of the image carrier, a second developing member provided on a downstream side of the first developing member in a rotating direction of the image carrier and rotates in a manner such that a moving direction of a portion opposing the image carrier is the same as the moving direction of the image carrier, a distributing member supported movably relative to a proximal portion where the first developing member is closest to the second developing member so as to distribute developer to the first and second developing members by contact with the developer, and an a biasing member that biases the distributing member upstream in the rotating direction of the first developing member. | 11-14-2013 |
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| 20110222918 | DEVELOPING DEVICE, ASSEMBLY BODY, AND IMAGE FORMING APPARATUS - A developing device includes: a first-developer-holding-member facing a surface of a rotating latent image carrier, it rotating such that a moving direction thereof is opposite to that of the carrier at a portion where they face; a second-developer-holding-member provided at a downstream-side of the first-developer-holding-member in a direction in which the carrier rotates, and facing the surface of the carrier, it rotating such that a moving direction thereof is the same as that of the carrier at a portion where they face; a ratio of circumferential speeds of the first-developer-holding-member and the second-developer-holding-member being variable; a splitting member that splits a developer for the first-developer-holding-member and the second-developer-holding-member by hitting against the developer located between the first-developer-holding-member and the second-developer-holding-member; a moving unit that moves the splitting member; and a control unit that controls the moving unit to move the splitting member to vary split ratio of the developer. | 09-15-2011 |
| 20110229215 | DEVELOPING DEVICE, ASSEMBLY, AND IMAGE FORMING APPARATUS - A developing device includes a first developing member that rotates in a manner such that a moving direction of a portion opposing the image carrier is opposite a moving direction of the image carrier, a second developing member provided on a downstream side of the first developing member in a rotating direction of the image carrier and rotates in a manner such that a moving direction of a portion opposing the image carrier is the same as the moving direction of the image carrier, a distributing member supported movably relative to a proximal portion where the first developing member is closest to the second developing member so as to distribute developer to the first and second developing members by contact with the developer, and an a biasing member that biases the distributing member upstream in the rotating direction of the first developing member. | 09-22-2011 |
| 20130164042 | DEVELOPING DEVICE AND IMAGE FORMING APPARATUS INCLUDING THE SAME - A developing device includes first and second developer carriers facing each other in a facing region, a regulating member that regulates a layer thickness of developer, and a separation member. The first and second developer carriers respectively include first and second magnetic members that are respectively magnetized with first and second facing magnetic poles having opposite polarities. The separation member separates the developer so that the developer is supplied toward the first and second developer carriers. The separation member is disposed such that distances between the separation member and the first and second developer carriers are the smallest in a region in which a magnitude of a combined magnetic field of the first and second magnetic poles locally decreases as compared with a case where at least one of the first and second developer carriers is independently disposed due to interaction between the first and second facing magnetic poles. | 06-27-2013 |
| 20140023408 | DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - There is provided a developing device including a first developing roller that is disposed to be rotatable with a desired distance set between the first developing roller and an outer circumferential surface of a rotatable latent image holding member, transports a developer onto an outer circumferential surface thereof while holding the developer by magnetic force, and has a substantially cylindrical shape, and a second developing roller that is disposed to be rotatable with desired distances set between the second developing roller and the respective outer circumferential surfaces of the corresponding latent image holding member and the corresponding first developing roller at a position on the downstream side of the first developing roller in a rotation direction of the latent image holding member, transports the developer onto an outer circumferential surface thereof while holding the developer by magnetic force, and has a substantially cylindrical shape. | 01-23-2014 |
| 20140023409 | DEVELOPING DEVICE, IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD - Provided is a developing device including a pair of developer holding members that include a pair of cylinder members, which are disposed close to each other and rotate in the same direction at an adjacent gap at which both cylinder members are in close proximity, and a pair of magnetic force generation sections which are provided inside the pair of cylinder members respectively and generate magnetic forces for holding a developer on the cylinder members, and a pair of developing magnetic poles that are provided in the pair of magnetic force generation sections respectively, are disposed to be opposed to a latent image holding member, and are set to have the same polarity. | 01-23-2014 |
| 20140056603 | IMAGE FORMING APPARATUS - An image forming apparatus includes a latent image carrier, a container that contains a developer including a toner, developer transport members disposed so that peripheral surfaces thereof face the latent image carrier, a power supply that supplies voltages to the developer transport members, a detector that detects a toner concentration of the developer, and a controller. The controller performs control so that the power supply supplies to the developer transport members, when the toner concentration detected by the detector is higher than a predetermined upper limit, voltages having waveforms that generating a potential difference therebetween that causes the toner concentration of the developer distributed to a most downstream developer transport member to decrease and the toner concentration of the developer distributed to at least one of the developer transport members that is disposed upstream of the most downstream developer transport member to increase. | 02-27-2014 |
| 20140178106 | DEVELOPING DEVICE AND IMAGE FORMING APPARATUS - A developing device includes first and second developing rollers, a trimmer, a divider, and a movement regulator. The first and second developing rollers are arranged so as to face an outer peripheral surface of a photoconductor at downstream and upstream positions, respectively, in a rotation direction of the photoconductor, and respectively include first and second sleeves and first and second magnets. The trimmer is arranged so as to face an outer peripheral surface of the first developing roller, and regulates formation of a layer of developer held by the first developing roller. The divider divides the developer regulated by the trimmer into developer that adheres to the first developing roller and developer that adheres to the second developing roller. The movement regulator is disposed between the trimmer and the divider and regulates movement of the developer held by the first developing roller before the developer is divided. | 06-26-2014 |
