Patent application number | Description | Published |
20090040487 | IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY - An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis. | 02-12-2009 |
20090050776 | APPARATUS FOR MANIPULATION OF AN OPTICAL ELEMENT - The invention relates to an apparatus for manipulation of an optical element in up to six degrees of freedom with respect to a structure via at least three actuator devices. The actuator devices each have at least two force-controlled actuators, which each produce an effective force along one degree of freedom, with linking points of the actuator devices acting directly on the optical element. | 02-26-2009 |
20090141258 | Imaging Device in a Projection Exposure Machine - An imaging device in a projection exposure machine for microlithography includes at least one optical element and at least one manipulator, a linear drive for manipulating the position of the optical element. The linear drive has at least one moving element, the moving element having a shearing part and a lifting part. The shearing part is arranged to move the optical element and the lifting part is arranged to move the shearing part. The linear drive has a supporting element which is in contact with and prevents movement of the optical element while the shearing part is moved by the lifting part. | 06-04-2009 |
20090324174 | DEVICE CONSISTING OF AT LEAST ONE OPTICAL ELEMENT - An optical assembly comprises at least one optical element movable in at least two degrees of freedom and at least one actuator for adjusting the least one optical element; at least one sensor for sensing the position of the at least one element in at least two degrees of freedom and is characterised in that the at least one sensor is located at least substantially diagonally opposite to the least one actuator. | 12-31-2009 |
20100157270 | APPARATUS FOR MANIPULATION OF AN OPTICAL ELEMENT - The invention relates to an apparatus for manipulation of an optical element ( | 06-24-2010 |
20100284652 | COMPOSITE BODY - A composite body is joined together of at least two bodies ( | 11-11-2010 |
20110025992 | OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT - An optical system, such as an illumination system, includes an optical arrangement having at least one optical element and at least one heat dissipation element configured to at least partially dissipate thermal energy generated in the optical element(s) to the outside environment of the optical system. The heat dissipation element(s) is(are) arranged without direct contact with the optical element(s). | 02-03-2011 |
20110199597 | IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY - An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis. | 08-18-2011 |
20110279914 | OPTICAL ELEMENT UNIT - An optical element unit is provided comprising an optical element group for projecting light along an optical axis of the optical element group and a housing having an inner housing part partly defining a first space and a light passageway between the inner housing part and a second space. The inner housing part receives the optical element group. The optical element group comprises an ultimate optical element located in the region of the light passageway. A load-relieving device is provided adjacent to the ultimate optical element, the load relieving device partly defining the first space and the second space and at least partly relieving the ultimate optical element from loads resulting from pressure differences between the first space. | 11-17-2011 |
20120044473 | OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY - To reduce deformations which may be caused by a functional coating on a substrate in an optical element for UV or EUV lithography, an optical element is suggested comprising a functional coating ( | 02-23-2012 |
20130170056 | SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY - Substrates suitable for mirrors which are used at wavelengths in the EUV wavelength range have a main body ( | 07-04-2013 |
20140064791 | OPTICAL ELEMENT UNIT - An optical element unit is provided comprising an optical element group for projecting light along an optical axis of the optical element group and a housing having an inner housing part partly defining a first space and a light passageway between the inner housing part and a second space. The inner housing part receives the optical element group. The optical element group comprises an ultimate optical element located in the region of the light passageway. A load-relieving device is provided adjacent to the ultimate optical element, the load relieving device partly defining the first space and the second space and at least partly relieving the ultimate optical element from loads resulting from pressure differences between the first space. | 03-06-2014 |