Patent application number | Description | Published |
20080293890 | Elastomeric Resin Compositions with Improved Resistance to Draw Resonance - This invention relates to polyolefin compositions. In particular, the invention pertains to elastic polymer compositions that can be more easily processed on cast film lines, extrusion lamination or coating lines due to improved resistance to draw resonance. The compositions of the present invention comprise an elastomeric polyolefin resin and a high pressure low density type resin. The preferred compositions of the present invention comprise from 88 to 99 percent elastomer or plastomer and from 1 to 12 percent by weight of a high pressure low density type resin. | 11-27-2008 |
20100298515 | ETHYLENE/ALPHA-OLEFIN BLOCK COPOLYMERS - Embodiments of the invention provide a class of ethylene/α-olefin block interpolymers. The ethylene/α-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, M | 11-25-2010 |
20110015354 | PROPYLENE/ALPHA-OLEFIN BLOCK INTERPOLYMERS - Embodiments of the invention provide a class of mesophase separated propylene/α-olefin block interpolymers with controlled block sequences. The propylene/α-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, M | 01-20-2011 |
20110015363 | PROPYLENE/A-OLEFIN BLOCK INTERPOLYMERS - Embodiments of the invention provide a class of propylene/α-olefin block interpolymers. The propylene/α-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, M | 01-20-2011 |
20110032621 | ETHYLENE/ALPHA-OLEFIN BLOCK INTERPOLYMERS - Embodiments of the invention provide a class of mesophase separated ethylene/α-olefin block interpolymers with controlled block sequences. The ethylene/α-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, M | 02-10-2011 |
20110054121 | BUTENE/ALPHA-OLEFIN BLOCK INTERPOLYMERS - Embodiments of the invention provide a class of butene/α-olefin block interpolymers. The butene/α-olefin inter-polymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, M | 03-03-2011 |
20110060103 | BUTENE/A-OLEFIN BLOCK INTERPOLYMERS - Embodiments of the invention provide a class of mesophase separated butene/α-olefin block interpolymers with controlled block sequences. The butene/α-olefin interpolymers are characterized by an average block index, ABI, which is greater than zero and up to about 1.0 and a molecular weight distribution, M | 03-10-2011 |
20110082249 | BLOCK COMPOSITES IN SOFT COMPOUNDS - Embodiments of the invention provide block composites and their use in soft compounds. | 04-07-2011 |
20110313106 | CRYSTALLINE BLOCK COMPOSITES AS COMPATIBILIZERS - Embodiments of the invention provide crystalline block composites and their use as compatibilizers. | 12-22-2011 |
20120208946 | BLOCK COPOLYMERS IN SOFT COMPOUNDS - Embodiments of the invention provide block composites and their use in soft compounds. | 08-16-2012 |
20130209344 | Thermal annealing process - A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(dimethylsiloxane) block copolymer component to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under particularized atmospheric conditions for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(dimethylsiloxane) in the annealed film to SiO | 08-15-2013 |
20130209696 | Diblock copolymer blend composition - A diblock copolymer blend containing a unique combination of an ordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer and a disordered poly(styrene)-b-poly(methyl methacrylate) diblock copolymer is provided. Also provided are substrates treated with the diblock copolymer blend. | 08-15-2013 |
20140014002 | High temperature thermal annealing process - A method for processing a substrate is provided; wherein the method comprises applying a film of a copolymer composition, comprising a poly(styrene)-b-poly(siloxane) block copolymer component; and, an antioxidant to a surface of the substrate; optionally, baking the film; subjecting the film to a high temperature annealing process under a gaseous atmosphere for a specified period of time; followed by a treatment of the annealed film to remove the poly(styrene) from the annealed film and to convert the poly(siloxane) in the annealed film to SiO | 01-16-2014 |
20140378601 | Reinforced Polypropylene Composition - The present disclosure provides a composition comprising:
| 12-25-2014 |