| Patent application number | Description | Published |
|---|
| 20080280235 | Non-Aqueous Photoresist Stripper That Inhibits Galvanic Corrosion - Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous, non-corrosive cleaning compositions that resist galvanic corrosion when used on stacked layer structures of different types of metals at a surface of an electronic device. Such non-aqueous photoresist strippers and cleaning compositions comprise: (a) at least one polar organic solvent, (b) at least one di or polyamine having both at least one primary amine group and one or more secondary and/or tertiary amine groups, and having the formula wherein R | 11-13-2008 |
| 20080287333 | Non-Aqueous Microelectronic Cleaning Compositions Containing Fructose - Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose. | 11-20-2008 |
| 20090156453 | Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors - Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor polymer having multiple hydroxyl- or amino-functional groups pendant from the polymer backbone. | 06-18-2009 |
| 20110207645 | Non-aqueous, non-corrosive microelectronic cleaning compositions containing polymeric corrosion inhibitors - Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor polymer having multiple hydroxyl- or amino-functional groups pendant from the polymer backbone. | 08-25-2011 |
| 20110212865 | Gluconic acid containing photoresist cleaning composition for multi-metal device processing - A microelectronic photoresist cleaning composition suitable for cleaning multi-metal microelectronic devices and to do so without any substantial or significant galvanic corrosion occurring when there is a subsequent rinsing step employing water. | 09-01-2011 |
