Patent application number | Description | Published |
20080218883 | OPTICAL ELEMENT HOLDING APPARATUS - A holding apparatus that holds an optical element above a base includes three holding units provided at different positions along an outer periphery of the optical element. Each holding unit includes a first member provided on the optical element, a second member provided on the base, a columnar third member extending in a direction perpendicular to both a tangential direction and a radial direction of the optical element, and a plate-shaped fourth member having a thickness in the radial direction of the optical element. The first member and the second member are connected to each other with the third member and the fourth member disposed therebetween. | 09-11-2008 |
20090231735 | OPTICAL ELEMENT SUPPORTING DEVICE, LENS BARREL, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD - An optical-element supporting device includes a first supporting unit and a second supporting unit configured to support an optical element. The first and second supporting units are spaced apart. The first and second supporting units support the optical element so as to constrain translational motion of the optical element along each of three axial directions and rotation of the optical element about each of the three axes. Where n is the number of axes constrained by the first supporting unit among the translational motion of the optical element along each of the three axial directions and the rotation of the optical element about each of the three axes, and m is the number of axes constrained by the second supporting unit among the translational motion of the optical element along each of the three axial directions and the rotation of the optical element about each of the three axes, n+m=6 is satisfied. | 09-17-2009 |
20120007279 | HOLDING DEVICE, IMPRINT APPARATUS, AND ARTICLE MANUFACTURING METHOD - A holding device of the present invention for holding a mold, the device includes a holder configured to attract the mold to hold the mold; an actuator supported by the holder so as to face a side of the mold, and configured to apply a force to the side to deform the mold; and a detector supported by the holder so as to face the side, and configured to detect a position of the side in a direction of the force. Here, the detector is configured to detect, as the position, a position of a first region in the side, the actuator is configured to apply the force to a second region in the side, and the second region is around the first region. | 01-12-2012 |
20120056350 | ORIGINAL AND ARTICLE MANUFACTURING METHOD USING SAME - The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate. | 03-08-2012 |
20120193832 | HOLDING APPARATUS, IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME - A holding apparatus of the present invention for holding a mold, includes a chuck configured to attract the mold to hold the mold, including a plurality of holding units each of which is configured to hold the attracted mold, and including a support configured to support the plurality of holding units; and an actuator supported by the support and deforms the mold by applying a force. At least one of the holding units is supported by the support unit so as to be displaceable in the direction of the force applied by the actuator. | 08-02-2012 |
20130037981 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus that molds an imprint material on a substrate using a mold, and forms a pattern on the substrate, the imprint apparatus includes a mold holding unit configured to hold the mold, which includes a surface including a pattern area, a substrate holding unit configured to hold the substrate, a first acquisition unit configured to acquire information concerning a difference in shape between the pattern area and a shot already formed on the substrate, and a control unit configured to control at least one of the mold holding unit and the substrate holding unit to adjust a spacing between the mold and the substrate, based on the information concerning the difference in shape acquired by the first acquisition unit, in a state where the pattern area and the imprint material are in contact with each other. | 02-14-2013 |
20130093113 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD USING SAME - An imprint apparatus transfers a pattern formed on a mold to a resin on a substrate. The imprint apparatus includes a shape correction mechanism configured to apply a force to the mold to thereby deform a pattern region formed on the mold; a heating mechanism configured to heat a substrate-side pattern region formed on the substrate to thereby deform the substrate-side pattern region; and a control unit configured to obtain information regarding a difference between shapes of the pattern region formed on the mold and the substrate-side pattern region and control the shape correction mechanism and the wafer heating mechanism so as to reduce the difference between the shapes of the pattern region formed on the mold and the substrate-side pattern region based on the obtained information. | 04-18-2013 |
20130300031 | IMPRINT APPARATUS AND METHOD OF MANUFACTURING ARTICLE - The present invention provides an imprint apparatus which performs an imprint process in which a resin on a substrate is cured while a mold having a pattern formed thereon is pressed against the resin to transfer the pattern onto the substrate, the apparatus comprising a changing unit which includes a contact member having a contact surface that comes into contact with a side surface of the mold, and is configured to apply a force to the side surface of the mold through the contact member to change a shape of the pattern formed on the mold, and an adjusting unit configured to change at least one of an angle and a position of the contact member to adjust a contact state between the contact surface and the side surface of the mold. | 11-14-2013 |
20140054823 | ORIGINAL AND ARTICLE MANUFACTURING METHOD USING SAME - The original of the present invention has a pattern to be transferred. For example, the original of the present invention is a mold for use in an imprint apparatus or a mask for use in an exposure apparatus. The original has a negative effective Poisson's ratio. Alternatively, the original has an effective Poisson's ratio smaller than that of a quartz glass plate. | 02-27-2014 |
20140138875 | IMPRINT APPARATUS AND ARTICLE MANUFACTURING METHOD - An imprint apparatus molds and cures an imprint material on a substrate using a mold to thereby form a pattern on the substrate. The apparatus includes a first drive mechanism configured to apply a force in a planar direction of the mold and change the planar shape of the pattern portion formed in the mold, and a second drive mechanism configured to deform the mold about an axis (for example, the Y axis) that is orthogonal to the pressing direction of the mold and the uncured resin (for example, the Z axis) and a direction of the force applied by the first drive mechanism (for example, the X axis). | 05-22-2014 |