Patent application number | Description | Published |
20080226430 | Carrying mechanism, a carrying device and a vacuum processing apparatus - A carrying device which can prevent an object to be carried from being contaminated with dust and carry the object to a correct position. The present invention is constructed by first and second parallelogram linkages. The second parallelogram linkage is formed by using a link of the first parallelogram linkage, has four sides with an equal length, and is linearly extended or retracted along a linear guide. Links of the first parallelogram linkage and links of the second parallelogram linkage are configured to rotate while being in a restrained state of 90° at pivots of both ends of the common link of the first and second parallelogram linkage, respectively. An arm is provided at a pivot of an end of a link opposed to the link of the first parallelogram linkage such that the arm rotates in a restrained state of 90° relative to the link. | 09-18-2008 |
20090092467 | Stage apparatus - To enable division for transportation and secure proper treatment on a substrate to be treated, the present invention provides a stage apparatus ( | 04-09-2009 |
20090173278 | Stage apparatus - To obtain a stage apparatus that can be divided for land transportation and can properly treat a substrate to be treated, the present invention provides a stage apparatus including a substrate holding plane which holds a substrate to be treated W, a pair of guide frames ( | 07-09-2009 |
20100109220 | Substrate Holding Mechanism and Substrate Assembly Apparatus Including the Same - Object To provide a substrate assembly apparatus capable of simplifying a structure of the apparatus and performing appropriate detachment of a substrate constantly. | 05-06-2010 |
20100135751 | ROTATION INTRODUCTION MECHANISM, SUBSTRATE TRANSFER APPARATUS, AND VACUUM PROCESSING APPARATUS - There are provided a rotation introduction mechanism which transmits a rotating motion on the atmosphere side into vacuum, is arranged simply, has a low sliding resistance, and has a long life, a substrate transfer apparatus, a substrate transfer apparatus having a small pivot radius and generating a smaller amount of dusts, and a vacuum processing apparatus. A lubricant holding member is attached to a vacuum seal mechanism. The substrate transfer apparatus is arranged such that a first link mechanism includes a first arm and a fourth arm, a second link mechanism includes a second arm and a third arm, the first arm is fixedly attached to a first drive shaft, the first arm is fixedly attached to a second drive shaft, the third arm is rotatably attached to the first drive shaft, and the fourth arm is rotatably attached to the second drive shaft. The vacuum processing apparatus includes the substrate transfer apparatus. | 06-03-2010 |
20110062641 | STAGE EQUIPPED WITH ALIGNMENT FUNCTION, PROCESSING APPARATUS HAVING THE STAGE EQUIPPED WITH ALIGNMENT FUNCTION, AND METHOD OF ALIGNING SUBSTRATE - There is provided an inexpensive stage which is equipped with an alignment function and is capable of easily performing high-accuracy alignment especially in a θ direction even in case an object to be processed is large in weight. The stage equipped with an alignment function has a stage main body for holding a substrate while leaving a processing surface thereof open to access. The stage is provided with: a suction means capable of sucking that surface of the substrate which lies opposite to the processing surface; a gas supply means for supplying a gas to such a region of the substrate as is other than a portion sucked by the suction means; and a drive means to give a rotating force to the suction means so that the substrate can be rotated on the same plane by causing the suction means to serve as the center of rotation. | 03-17-2011 |
20110227294 | Seal Mechanism and Treatment Apparatus - [Object] To provide a seal mechanism that reduces a maintenance frequency for replenishment of a lubricating material and has small friction resistance, and a treatment apparatus equipped with the seal mechanism.
| 09-22-2011 |
20120025054 | HOLDING APPARATUS, CONVEYING APPARATUS, AND ROTATION-TRANSMITTING APPARATUS - A holding apparatus, a conveying apparatus, and a rotation-transmitting apparatus are provided that are capable of holding an object in a tiltable manner. A conveying apparatus according to one form of the present invention includes a pad supported by a supporting member on a hand. A concave portion is formed on the pad, and by the concave portion engaging with the supporting member fixed to the hand, a pad is supported in a tiltable manner. A conveying object is held by an adhesive layer of the pad adhering thereto. By tilting with respect to the hand , the pad follows the shape or vibration of the conveying object, with the result that the conveying object can be conveyed stably. | 02-02-2012 |
20120114456 | HOLDING APPARATUS, CONVEYING APPARATUS, AND ROTATION-TRANSMITTING APPARATUS - A holding apparatus, a conveying apparatus, and a rotation-transmitting apparatus are provided that are capable of stably holding an object while suppressing an influence of a change in shape of the object and a fluctuation of a holding form. A conveying apparatus according to one form of the present invention includes a hand and a holding body provided on the hand. The holding body includes a holding member that includes a holding surface that comes into close contact with a holding object, the holding member being capable of holding a conveying object on the holding surface, and a viscoelastic member that is formed of a viscoelastic material and bonds the hand to the holding member. By the viscoelastic member being elastically deformed and the entire surface of the holding member being brought into close contact with the holding object, the conveying apparatus is capable of holding the conveying object on the hand. | 05-10-2012 |
20130129462 | Substrate Conveyance Method and Substrate Conveyance System - [Object] To provide a wafer conveyance method and a wafer conveyance system that are able to quickly transfer a wafer without losing positional accuracy. | 05-23-2013 |