Patent application number | Description | Published |
20110231076 | BRAKE CONTROLLING APPARATUS - A brake controlling apparatus (electronic control unit) of a braking device including a booster valve to be opened at a time of request to boost a pressure of a brake liquid to supply to a wheel to be controlled, and a piston pump for supplying pressurized brake liquid to an upstream side of the booster valve, the brake controlling apparatus including a brake liquid pressure controlling unit that sets a duty ratio between a closing period and a opening period of the booster valve so that a dischargeable period of the brake liquid in the piston pump appears in the opening period of the booster valve, and controls the booster valve based on the duty ratio. | 09-22-2011 |
20110246041 | VEHICLE STABILIZATION CONTROLLING APPARATUS - When a the brake assist control and a left/right distribution control are performed at the same time, since braking forces, which are equal to or larger than the braking force generated by a brake operation of a driver, are generated to wheels by the brake assist control, in a case where the driver requests a large deceleration, a desired deceleration can be obtained. Further, since a difference is made between the braking forces generated to left/right wheels by the left/right distribution control, in a case where a yaw direction behavior is generated to a vehicle, the yaw direction behavior can be reduced by a difference between the braking forces. | 10-06-2011 |
20130204491 | VEHICLE BRAKING DEVICE AND CONTROL DEVICE - Provided is a vehicle braking device for applying a braking force on tires arranged on a vehicle body rotatably, the vehicle braking device including a fluid pressure braking unit configured to act the braking force on the tires; a master cylinder configured to supply fluid pressure to the fluid pressure braking unit; a pressure detection sensor configured to detect pressure of the fluid pressure supplied from the master cylinder to the fluid pressure braking unit; and a control device that includes a storage unit configured to store detected driving conditions, a braking operation determining unit configured to determine state of the braking operation based on the fluid pressure detected by the pressure detection sensor, and a control unit configured to control operation based on the determination result of the braking operation determining unit. | 08-08-2013 |
20130211668 | VEHICLE BRAKING DEVICE AND CONTROL DEVICE - A vehicle braking device including a braking operation judging unit that judges that a braking operation is input when a fluid pressure detected by a pressure detecting sensor is not smaller than a threshold value set in advance in a process of a first mode in which it is judged that the device normally operates, and judges that the braking operation is input when judging that wheel deceleration of a tire detected by a wheel speed detecting sensor is larger than a threshold value in a process of a second mode in which it is judged the pressure detecting sensor does not normally detect a pressure or it is judged that a failure occurs in the fluid pressure, and a control unit puts a brake lamp arranged on a vehicle body into a lighting state from a non-lighting state when it is judged that the braking operation is input. | 08-15-2013 |
20130325253 | VEHICLE BRAKE DEVICE - In a vehicle brake device having a hydraulic pressure sensor for detecting an output value corresponding to the pressure of a fluid pressure adjusted by a master cylinder and a master cylinder pressure calculating unit for storing the output value of the hydraulic pressure sensor at which the pressure of the master cylinder becomes 0 as a zero-point correction value and calculating a master cylinder pressure by correcting the output value of the hydraulic pressure sensor based on the zero-point correction value, the vehicle brake device has a zero-point correction value updating unit for setting, when the output value detected by the hydraulic pressure sensor is smaller than the zero-point correction value stored in the master cylinder pressure calculating unit, the output value as a new zero-point correction value and updating the zero-point correction value. | 12-05-2013 |
20140195133 | VEHICLE BRAKING FORCE CONTROL DEVICE AND METHOD FOR CONTROLLING VEHICLE BRAKING FORCE - A vehicle braking force control device includes a controller that controls braking force of a wheel by controlling friction braking force generated by a friction braking device and regenerative braking force generated by regenerative braking devices and that performs anti-skid control based on a requested amount of braking force reduction by controlling the friction braking force and reducing the regenerative braking force by an amount of regenerative braking force reduction. The controller sets a target change amount of the friction braking force based on the requested amount of braking force reduction and the amount of regenerative braking force reduction, and controls the friction braking force based on the target change amount when the controller reduces the regenerative braking force by the amount of regenerative braking force reduction. | 07-10-2014 |
Patent application number | Description | Published |
20090035417 | Emulsifying Agent - The present invention has its object to provide a novel emulsifier which is obtainable from an edible yeast and is highly safe and shows by itself a high level of emulsifying property and high emulsion stability; a water-soluble composition containing a liposoluble substance, together with the emulsifier; and methods of producing these. The present invention includes: an emulsifier which comprises, as an active ingredient, a carbohydrate- and protein-based complex derived from a culture fluid obtained by cultivating an edible yeast; a water-soluble composition which comprises an emulsifier and a liposoluble substance; and a method of producing the emulsifier and the water-soluble composition. | 02-05-2009 |
20120136138 | ICE-CRYSTAL GROWTH INHIBITING SUBSTANCE - An objective to be achieved by the present invention is to provide an ice-crystal growth inhibiting substance which has an excellent ice-crystal growth inhibiting activity suitable for practical use and which can be produced easily, efficiently and economically in safe steps usable in food production. Another objective of the present invention is to provide a method for producing the ice-crystal growth inhibiting substance, a polypeptide which is an active part of the ice-crystal growth inhibiting substance, as well as an ice-crystal growth inhibiting substance composition, a food, a biological sample protectant and a cosmetic each containing the ice-crystal growth inhibiting substance or the polypeptide. The ice-crystal growth inhibiting substance according to the present invention is characterized in that the ice-crystal growth inhibiting substance is derived from a plant, and has a molecular weight of 400 kDa or more as measured by gel filtration chromatography. | 05-31-2012 |
20130146803 | ICE CRYSTALLIZATION INHIBITOR DERIVED FROM BASIDIOMYCETE - The objective to be solved by the present invention is to provide an ice-crystallization inhibitor which has a practicable and excellent ice-crystallization inhibiting property and which can be efficiently and stably produced in a safe process suitable for food production. Also, the objective of the present invention is to provide an antibody which specifically reacts with the ice-crystallization inhibitor, and a composition, a food, a biological sample protectant and a cosmetic which contain the ice-crystallization inhibitor. Furthermore, the objective of the present invention is to provide a polysaccharide which is derived from a basidiomycete and which is used for inhibiting ice-crystallization of a liquid containing water, and a method for inhibiting ice-crystallization of a liquid containing water. The ice-crystallization inhibitor according to the present invention is characterized in being a polysaccharide derived from a basidiomycete. | 06-13-2013 |
20130165626 | ANTIFREEZE PROTEIN - An objective of the present invention is to provide an antifreeze protein which is capable of being efficiently produced on an industrial level at low cost and which is safe and has an excellent antifreezing activity for use on a practical level. Also, an objective of the present invention is to provide a polypeptide that corresponds to the active part of the antifreeze protein; a composition, a food, a biological sample protectant and a cosmetic containing the antifreeze protein or the polypeptide; and an antibody that specifically reacts with the antifreeze protein or the polypeptide. The antifreeze protein according to the present invention is characterized in being derived from a plant and having a specific amino acid sequence or being a plant seed protein. | 06-27-2013 |
20140213663 | ICE CRYSTALLIZATION INHIBITOR DERIVED FROM PLANT SEED - The objective to be solved by the present invention is to provide a novel ice crystallization inhibitor which is industrially useful, which can be efficiently and stably produced in a safe process suitable for a food production without difficulty and which has excellent functions and properties. Also, the objective of the present invention is to provide an antibody which specifically reacts with the ice crystallization inhibitor, and a composition, a food, a biological sample protectant and a cosmetic which contain the ice crystallization inhibitor. Furthermore, the objective of the present invention is to provide a peptide which gives an indication of a protein having an ice crystallization inhibitory activity. The ice crystallization inhibitor according to the present invention is characterized in comprising a seed protein derived from a plant belonging to genus | 07-31-2014 |
Patent application number | Description | Published |
20100172620 | Optical Axis Converting Element and Method for Manufacturing the Same - Disclosed in a multichannel optical waveguide device characterized by comprising: a structure including a cladding and having a light-incident end surface, a light-outgoing end surface, and a plurality of flat reflection surfaces located parallel with each other; and L-shaped cores embedded in the cladding, the L-shaped cores being three-dimensionally arranged parallel with each other in m rows and n columns (where m and n are 2 or more), each L-shaped core having end faces which are exposed respectively to the light-incident end surface and the light-outgoing end surface, m number of the L-shaped cores in each column guiding light from the light-incident end surface to the light-outgoing end surface by changing direction of light on n number of the flat reflection surfaces, wherein an interval between the two adjacent cores on the light-incoming end surface is different from an interval between the two adjacent cores on the light-outgoing end surface, the two adjacent cores on the light-incoming end surface respectively corresponding to the two adjacent cores on the light-outgoing end surface. | 07-08-2010 |
20110132397 | Silicon Wafer Cleaning Agent - A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent. | 06-09-2011 |
20110162680 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step. | 07-07-2011 |
20110214685 | Cleaning Agent For Silicon Wafer - A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved. | 09-08-2011 |
20110301305 | Fluorinated Dicarboxylic Acid Derivative and Polymer Obtained Therefrom - According to the present invention, a polymer is obtained by polycondensation of a fluorinated dicarboxylic acid derivative of the general formula (M-1) or an acid anhydride of the fluorinated dicarboxylic acid with a polyfunctional compound having two to four reactive groups corresponding in reactivity to carbonyl moieties of the fluorinated dicarboxylic acid derivative or acid anhydride. | 12-08-2011 |
20120017934 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R | 01-26-2012 |
20120174945 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 07-12-2012 |
20140174465 | Cleaning Agent for Silicon Wafer - A cleaning agent for a silicon wafer (a first cleaning agent) contains at least a water-based cleaning liquid and a water-repellent cleaning liquid for providing at least a recessed portion of an uneven pattern with water repellency during a cleaning process. The water-based cleaning liquid is a liquid in which a water-repellent compound having a reactive moiety chemically bondable to Si element in the silicon wafer and a hydrophobic group, and an organic solvent including at least an alcoholic solvent are mixed and contained. With this cleaning agent, the cleaning process which tends to induce a pattern collapse can be improved. | 06-26-2014 |
20140373870 | Liquid Chemical for Forming Protecting Film - Disclosed is a liquid chemical for forming a water-repellent protecting film. The liquid chemical contains an agent for forming a water-repellent protecting film, and a solvent. The agent is for provided to form a water-repellent protecting film on a wafer after a cleaning step for the wafer and before a drying step for the wafer, the wafer having at its surface an uneven pattern and containing at least one kind element of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water-repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized in that the agent for forming a water-repellent protecting film is a compound represented by the following general formula [1]. | 12-25-2014 |
20150101643 | Silicon Wafer Cleaning Agent - A silicon wafer cleaning agent includes at least a water-based cleaning liquid, and a water-repellent cleaning liquid for providing water-repellent to an uneven pattern at least at recessed portions during a cleaning process. The water-repellent cleaning liquid is a liquid composed of a water-repellent compound containing a reactive moiety which is chemically bondable to Si in the silicon wafer, and a hydrophobic group, or is a liquid wherein 0.1 mass % or more of the water-repellent compound relative to the total quantity of 100 mass % of the water-repellent cleaning liquid and an organic solvent are mixed and contained therein. A cleaning process wherein a pattern collapse is easily induced can be improved by using the cleaning agent. | 04-16-2015 |
Patent application number | Description | Published |
20120164818 | Process for Cleaning Wafers - Disclosed is a process for cleaning a wafer having an uneven pattern at its surface. The process includes at least: a step of cleaning the wafer; a step of substituting a cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and a step of drying the wafer. The process is characterized in that the cleaning liquid has a boiling point of 55 to 200° C., and characterized in that the water-repellent liquid chemical used for the substitution has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions. With this process, it is possible to provide a cleaning process for improving the cleaning step that tends to induce a pattern collapse. | 06-28-2012 |
20120211025 | PROCESS FOR CLEANING WAFERS - A process for cleaning a wafer having an uneven pattern at its surface. The process includes at least the steps of: cleaning the wafer with a cleaning liquid; substituting the cleaning liquid retained in recessed portions of the wafer with a water-repellent liquid chemical after cleaning; and drying the wafer, wherein the cleaning liquid contains 80 mass % or greater of a solvent having a boiling point of 55 to 200° C., and wherein the water-repellent liquid chemical supplied in the substitution step has a temperature of not lower than 40° C. and lower than a boiling point of the water-repellent liquid chemical thereby imparting water repellency at least to surfaces of the recessed portions. | 08-23-2012 |
20130056023 | Chemical for Forming Protective Film - Disclosed is a liquid chemical for forming a water repellent protective film on a wafer that has at its surface a finely uneven pattern and contains silicon element at least at a part of the uneven pattern, the water repellent protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains: a silicon compound (A) represented by the general formula R | 03-07-2013 |
20130092191 | Liquid Chemical for Forming Water Repellent Protective Film - The present invention relates to a method for cleaning wafers while preventing pattern collapse of the wafers in semiconductor device fabrication, the wafer having at its surface an uneven pattern and containing silicon element at least on surfaces of recessed portions. Provided is: a liquid chemical for forming a protective film which allows efficient cleaning; and a method for cleaning wafers, using the liquid chemical. A liquid chemical for forming a water repellent protective film is provided for forming a protective film on a wafer (having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern), the protective film being formed at least on surfaces of recessed portions of the uneven pattern at the time of cleaning the wafer. The liquid chemical contains a dialkylsilyl compound represented by the formula [1] and does not contain an acid and a base. | 04-18-2013 |
20130104931 | Liquid Chemical for Forming Protective Film, and Cleaning Method for Wafer Surface | 05-02-2013 |
20130146100 | Water Repellent Protective Film Forming Agent, Liquid Chemical for Forming Water Repellent Protective Film, and Wafer Cleaning Method Using Liquid Chemical - A water repellent protective film forming agent is provided for forming a protective film on a wafer that has an uneven pattern at its surface. The protective film is formed at least on surfaces of recessed portions of the wafer at the time of cleaning the wafer. The wafer is a wafer that contains a material including silicon element at least at the surfaces of the recessed portions of the uneven pattern or a wafer that contains at least one kind of material selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride and ruthenium at least at a part of the surfaces of the recessed portions of the uneven pattern. The water repellent protective film forming agent is provided to contain a silicon compound represented by the following general formula [1]: | 06-13-2013 |
Patent application number | Description | Published |
20140326139 | METHOD FOR PRODUCING NITROGEN GAS, METHOD FOR SEPARATING GAS AND DEVICE FOR PRODUCING NITROGEN GAS - A method for producing nitrogen gas from a raw material gas using a PSA system, the method including using a second adsorbent, which is packed in an auxiliary adsorption tank provided in a line connecting two main adsorption tanks packed with a first adsorbent, to reduce the oxygen concentration within a recovered gas discharged from the main adsorption tank performing a depressurization equalization step, and then introducing the gas into the main adsorption tank performing a pressurization equalization step. | 11-06-2014 |
20150007724 | NITROGEN-ENRICHED GAS MANUFACTURING METHOD, GAS SEPARATION METHOD AND NITROGEN-ENRICHED GAS MANUFACTURING APPARATUS - A nitrogen-enriched gas manufacturing method and a nitrogen-enriched gas manufacturing apparatus which minimize variations in the compressor load in order to ensure satisfactory utilization of the performance of the compressor. Specifically, a nitrogen-enriched gas manufacturing method for separating a nitrogen-enriched gas from a raw material air containing nitrogen gas using a plurality of adsorption tanks packed with an adsorbent the method including a pressurization and adsorption step, a depressurization and equalization step, a depressurization and regeneration step, and a pressurization and equalization step, wherein in the pressurization or depressurization and equalization step, the raw material air which has been compressed by the compressor is stored in a compressed raw material air tank provided on a branch line between the compressor and the adsorption tanks, and in the pressurization and adsorption step, the raw material air stored in the compressed raw material air tank is introduced into the adsorption tank and used as a portion of the gas that pressurizes the inside of the adsorption tank. | 01-08-2015 |
Patent application number | Description | Published |
20130321487 | DISPLAY, IMAGE PROCESSING UNIT, AND DISPLAY METHOD - A display includes: a display section; and a display driving section driving the display section based on a first image data set and a second image data set that alternate with each other. The display driving section drives the display section by performing a first scan with use of a first block as a driving unit in accordance with the first image data set and a second scan with use of a second block as a driving unit in accordance with the second image data set. The first block is composed of a plurality of consecutive pixel lines, and the second block is composed of a plurality of consecutive pixel lines and is different from the first block. | 12-05-2013 |
20130335457 | DISPLAY UNIT, IMAGE PROCESSING UNIT, AND DISPLAY METHOD - An image processing unit includes: a gain calculating section obtaining, based on first luminance information for each pixel, a first gain, in which the first gain is configured to increase with an increase in pixel luminance value in a range where the pixel luminance value is equal to or larger than a predetermined luminance value, and in which the pixel luminance value is derived from the first luminance information; and a determination section determining, based on the first luminance information and the first gain, second luminance information for each of the pixels. | 12-19-2013 |
20140176623 | SELF-LUMINOUS DISPLAY DEVICE, CONTROL METHOD OF SELF-LUMINOUS DISPLAY DEVICE, AND COMPUTER PROGRAM - Provided is a self-luminous display device including a data calculation section configured to calculate, by using a supplied video signal, data relating to a luminance amount accumulated in a unit of a first block in a target region for luminance control in a screen on which a plurality of pixels are arranged in a matrix, each of the pixels including a light emitting element which emits light by itself according to a current amount, a resampling section configured to resample the data relating to the luminance amount in the target region, in a unit of a second block, the data relating to the luminance amount being calculated by the data calculation section, the second block being larger than the first block, and a scaling section configured to generate data for luminance control in the target region by scaling the data resampled by the resampling section. | 06-26-2014 |
20140368556 | DISPLAY DEVICE - A display apparatus includes: a display unit that includes a display area including display elements arranged in a two-dimensional matrix and is configured to display an image in the display area based on a video signal; and a correction signal generation unit configured to generate a correction signal that accelerates a change with time for a display element having a small change with time and performs a slowdown or a stop of the change with time for a display element having a large change with time, based on a value of the video signal and time-varying characteristics of a luminance of each display element. When the display apparatus is not used after a normal image is displayed based on the video signal, a corrected image based on the correction signal is displayed to equalize a degree of the change with time of each display element. | 12-18-2014 |
20150154937 | COLOR SIGNAL PROCESSING CIRCUIT, COLOR SIGNAL PROCESSING METHOD, DISPLAY DEVICE, AND ELECTRONIC APPARATUS - A color signal processing circuit of the present disclosure includes: a correction signal generation unit which generates, on the basis of a signal level of a color signal corresponding to one primary color among color signals corresponding to a plurality of primary colors being input, a correction signal for chromaticity of a color signal corresponding to another primary color as a difference value from a signal level of each color signal corresponding to predetermined chromaticity; and a correction unit which uses the correction signal generated by the correction signal generation unit to correct the color signal corresponding to the other primary color. | 06-04-2015 |
20150228225 | DISPLAY APPARATUS AND DISPLAY METHOD - A display apparatus includes light-emission units, write transistors, drive transistors, and a plurality of gate drivers. The light-emission units each form a pixel and each configured to emit light by a drive current. The write transistors are each configured to write a video signal of each pixel in each of pixel capacitances. The drive transistors are each configured to control the drive current of the light-emission unit by a voltage corresponding to the video signal written in the pixel capacitance. The plurality of gate drivers are configured to control write of the video signal in the pixel capacitances by the write transistors and control a drive voltage supplied to the drive transistors, the plurality of gate drivers being each configured to perform control such that the write transistors write the video signal in the pixel capacitances of all the pixels and then supply the drive voltage to the drive transistors. | 08-13-2015 |
Patent application number | Description | Published |
20100274966 | HIGH AVAILABILTY LARGE SCALE IT SYSTEMS WITH SELF RECOVERY FUNCTIONS - Storage Systems in the IT system provide information of the status of its components to the System Monitoring Server. System Monitoring Server calculates storage availability of storage systems based on information using failure rates of the components, and determines whether the volumes of the storage system should be migrated based on a predetermined policy. If migration is required, System Monitoring Server selects the target storage system based on storage availability of storage systems, and requests migration to be performed. | 10-28-2010 |
20110138136 | STORAGE SYSTEM AND CONTROLLING METHODS FOR THE SAME - For the purpose of optimizing the performance separation according to the usage status of the protocol and the storage system performance, in a storage system | 06-09-2011 |
20120023233 | METHOD FOR EXECUTING MIGRATION BETWEEN VIRTUAL SERVERS AND SERVER SYSTEM USED FOR THE SAME - For each of multiple migration policies, a server system | 01-26-2012 |
20130024634 | INFORMATION PROCESSING SYSTEM AND METHOD FOR CONTROLLING THE SAME - The present invention concerns one of the plurality of first storage apparatuses, prior to a file migration to the second storage apparatus, notifies to the second storage apparatus of file migration information being information relating to the file migration, the second storage apparatus calculates an increment of a load on the second storage apparatus that is generated by the file migration based on information written in the file migration information, the second storage apparatus determines whether the file migration is allowable based on a current load on the second storage apparatus itself and the increment, the second storage apparatus notifies the determination result to the one of the plurality of first storage apparatuses that has notified the file migration information, and the one of the plurality of first storage apparatuses determines whether to migrate the file to the second storage apparatus based on the determination result. | 01-24-2013 |
20130097400 | STORAGE SYSTEM AND CONTROLLING METHODS FOR THE SAME - For the purpose of optimizing the performance separation according to the usage status of the protocol and the storage system performance, in a storage system | 04-18-2013 |
20140358856 | INFORMATION PROCESSING SYSTEM AND METHOD FOR CONTROLLING THE SAME - The present invention concerns one of the plurality of first storage apparatuses, prior to a file migration to the second storage apparatus, notifies to the second storage apparatus of file migration information being information relating to the file migration, the second storage apparatus calculates an increment of a load on the second storage apparatus that is generated by the file migration based on information written in the file migration information, the second storage apparatus determines whether the file migration is allowable based on a current load on the second storage apparatus itself and the increment, the second storage apparatus notifies the determination result to the one of the plurality of first storage apparatuses that has notified the file migration information, and the one of the plurality of first storage apparatuses determines whether to migrate the file to the second storage apparatus based on the determination result. | 12-04-2014 |
Patent application number | Description | Published |
20110197831 | Pulverized Coal Burning Boiler - A pulverized coal burning boiler is provided, which reduces an air-excess ratio thereby to reduce the emission of unburned contents such as CO. The pulverized coal burning boiler includes a pulverized coal feed measuring device for measuring the feeding rates of the pulverized coal to be conveyed through coal feeding pipes, individually, and a control device for calculating the burning air feeding rates to match the pulverized coal feeding rates thereby to send a control command signal to burning air feed adjusting device, so that a burner air ratio set by a burner air ratio setting device may be kept on the basis of both the pulverized coal feeding rate, which is measured by the pulverized coal feed measuring device, and the burning air feeding rate, which is measured by the burning air feeding rate measuring device and fed to a pulverized coal burner connected to the coal feeding pipes. | 08-18-2011 |
20130244190 | OXYGEN COMBUSTION SYSTEM AND METHOD FOR OPERATING SAME - An oxygen combustion system includes a boiler to burn fuel using combustion gas composed of oxygen-rich gas and circulating flue gas, a dust remover disposed in a flue through which flue gas discharged from the boiler flows, a second flue leading the combustion gas to the boiler, the combustion gas being made by mixing the circulating flue gas extracted downstream of the dust remover with the oxygen-rich gas, a combustion gas heater exchanging heat between the flue gas flowing between the boiler and dust remover and the combustion gas flowing through the second flue, and a flue gas cooler disposed between the heater and the dust remover to cool the flue gas. A control unit controls at least one of a flow rate and cooling medium temperature of the flue gas cooler such that temperature of the flue gas introduced into the dust remover will be between 90° C. and 140° C. | 09-19-2013 |
20140290251 | Drying Conveyer, and Thermal Electric Power Generation System Provided with Same - [Problem] To provide a drying conveyer apparatus capable of efficiently and uniformly drying coarse particles. | 10-02-2014 |