Hans-Artur Boesser, Breidenbach DE
Hans-Artur Boesser, Breidenbach DE
Patent application number | Description | Published |
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20080202201 | DEVICE AND METHOD FOR AUTOMATIC DETECTION OF INCORRECT MEASUREMENTS BY MEANS OF QUALITY FACTORS - What is disclosed is a device ( | 08-28-2008 |
20080252903 | METHOD FOR DETERMINING THE FOCAL POSITION OF AT LEAST TWO EDGES OF STRUCTURES ON A SUBSTRATE - A method for determining the focal position of at least two edges of structures ( | 10-16-2008 |
20080259327 | Device for Inspecting a Microscopic Component | 10-23-2008 |
20080278790 | APPARATUS WITH ENHANCED RESOLUTION FOR MEASURING STRUCTURES ON A SUBSTRATE FOR SEMICONDUCTOR MANUFACTURE AND USE OF APERTURES IN A MEASURING APPARATUS - A measuring system is disclosed with enhanced resolution for periodic structures on a substrate for semiconductor manufacture. Aperture structures of varying geometries are provided in the illumination beam path. The aperture structures differ regarding the transmission characteristics of light, and which adjust the intensity distribution of the diffraction orders in the imaging pupil of the optical system. | 11-13-2008 |
20090031572 | Coordinate measuring machine for measuring structures on a substrate - A coordinate measuring machine ( | 02-05-2009 |
20090033508 | System and method for determining positions of structures on a substrate - A system and a method for determining positions of structures on a substrate are disclosed. The system includes at least one measurement table ( | 02-05-2009 |
20090066955 | Device and method for determining an optical property of a mask - A coordinate measuring machine ( | 03-12-2009 |
20090066970 | Arrangement and method for improving the measurement accuracy in the nm range for optical systems - A method and a device for improving the measurement accuracy in the nm range for optical systems are disclosed. The object is provided with a plurality of structures oriented in the X and Y-coordinate direction. The light beam coming from at least one light source defines an optical illumination path. | 03-12-2009 |
20100020332 | Interferometric device for position measurement and coordinate measuring machine - An interferometric device for position measurement of an element moveable in a plane is disclosed. A laser light source measures the position of the moveable element and emits the required measuring light. A beam splitter splits the measuring light into a first partial beam path and a second partial beam path, which each impinge on a reflecting surface of the moveable element via an interferometer. Herein, at least the beam splitter, which splits the measuring light into a first partial beam path and a second partial beam path, and the beam splitter, which directs the third partial beam path onto an etalon via an interferometer, have a respective beam trap associated with them, which traps the light returning from the respective interferometers. | 01-28-2010 |
20100302555 | Metrology system and method for monitoring and correcting system generated errors - A metrology system ( | 12-02-2010 |