Hagiwara, Saitama
Daisuke Hagiwara, Saitama JP
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20150160074 | TEMPERATURE DETECTING APPARATUS AND COMPUTER PROGRAM THEREFOR - A temperature detecting apparatus detects a temperature of a detection target having a switch element. The temperature detecting apparatus includes a current detecting unit and a temperature estimating unit. The current detecting unit detects an output current from the detection target changing depending on an on/off operation of the switch element. The temperature estimating unit, on the basis of a current value detected by the current detecting unit, calculates a conduction loss of the switch element and a switching loss of the switch element to estimate the temperature of the detection target on the basis of the calculated conduction loss and the calculated switching loss. | 06-11-2015 |
20150160324 | FAULT DETECTING APPARATUS AND COMPUTER PROGRAM THEREFOR - A fault detecting apparatus, to use an output current from a drive circuit as a current value detected by a current sensor, calculates a duty ratio of a control signal to be supplied to the drive circuit to define the duty ratio as a theoretical value of the duty ratio of the control signal. The fault detecting apparatus compares a duty ratio of a control signal actually supplied to the drive circuit with the theoretical value of the duty ratio of the control signal to determine whether the current sensor (fails on the basis of a comparison result. | 06-11-2015 |
Koichi Hagiwara, Saitama JP
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20090155782 | Homoeologous Region Determining Method by Homo Junction Fingerprint Method, Homoeologous Region Determining Device, and Gene Screening Method - To provide a method for efficiently searching for a recessive disease gene without needing any pedigree analysis. In a homoeologous region determining method, the following steps are conducted. It is determined whether or not the base constituting a polymorphic marker of a sample DNA of diploid or higher polyploidy is a homojunction. Homojunction region information representing the region of the sample DNA where polymorphic markers determined as continuous homojunctions acquired. If the continuous probability and/or continuous distance of the polymorphic markers contained in the homojunction region information satisfy a predetermined determination condition, the homojunction region is determined as a homoeologous region. A homoeologous region determining device and a gene screening method for identifying a disease susceptibility gene from the determined homoeologous region are also provided. | 06-18-2009 |
20090327203 | HOMOZYGOTE HAPLOTYPE METHOD - To provide a method of efficiently searching for a disease sensitivity gene and an apparatus therefor. It is intended to provide: a method of determining a homoeologous region which comprises the polymorphism marker selection step of selecting a polymorphism marker usable as the subject of the homozygote determination, the homozygote determination step of determining whether or not bases constituting a specimen DNA which is a diploid or higher are homozygous, the homozygote haplotype data acquisition step of selecting exclusively polymorphism markers determined as homozygous and acquiring homozygote haplotype data of each specimen, the homozygous region data acquisition step of comparing the above-described homozygote haplotype data of two or more specimens and acquiring common homozygous region data, and the homoeologous region determination step of determining a common homozygous region satisfying definite homoeology requirements as a homoeologous region between the corresponding specimens for each common homozygous region data; and an apparatus and a gene screening method with the use of this method. | 12-31-2009 |
Maki Hagiwara, Saitama JP
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20110122301 | IMAGING DEVICE AND IMAGING METHOD - An imaging device includes a CCD-type solid-state imaging element, an imaging control section, a fill light firing section, and a light firing amount calculation section. The CCD-type solid-state imaging element includes a first photoelectric conversion element and a second photoelectric conversion element adjacent to the first photoelectric conversion element. A charge is independently readable from the first photoelectric conversion element and the second photoelectric conversion element. The imaging control section, in response to one photographing command, executes imaging by the solid-state imaging element in two exposure time periods of a first exposure time period exposing the first photoelectric conversion element and a second exposure time period exposing the second photoelectric conversion element. The second exposure time period overlaps the first exposure time period and is shorter than the first exposure time period. The fill light firing section fires fill light. | 05-26-2011 |
Shinji Hagiwara, Saitama JP
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20100092730 | PRESSURE-SENSITIVE ADHESIVE SHEET AND PROCESS FOR PRODUCING THE SAME - An adhesive sheet which can be produced without using a release sheet having an uneven surface form and which can prevent or remove air bubbles and blisters and a process for producing the same are provided by an adhesive sheet prepared by laminating a non-permeable adhesive layer in which both surfaces are flat on an uneven surface of a base material having concave and convex parts in which adjacent concave parts are communicated with each other at least on one surface so that the adhesive layer is brought into contact with the convex part of the base material and a process comprising laminating a release sheet provided on a release treated surface with a non-permeable adhesive layer in which both surfaces are flat and a base material having concave and convex parts in which adjacent concave parts are communicated with each other at least on one surface so that the non-permeable adhesive layer is brought into contact with the convex part of the base material. | 04-15-2010 |
Shuji Hagiwara, Saitama JP
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20090121957 | ANTENNA - A plate-shaped radiating element of a shape having at least three planes is formed by bending a metal plate having a substantially rectangular shape. A first slit is provided from a lower edge of the plate-shaped radiating element up to a portion in the vicinity of an upper edge of the plate-shaped radiating element while passing through a center point of the plate-shaped radiating element, and forms plate-shaped dipole elements on both sides thereof. A second slit is provided parallel to the upper edge of the plate-shaped radiating element and forms a folded element on an upper side thereof. Feeding points are provided on both sides of the first slit at the lower edge of the plate-shaped radiating element. | 05-14-2009 |
Yuji Hagiwara, Saitama JP
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20100029895 | Fluorinated Diamine and Polymer Formed Therefrom - There is provided a fluorine-containing diamine represented by formula (1). | 02-04-2010 |
20100035185 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method - A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. | 02-11-2010 |
20110015431 | Processes for Production of 2-Bromo-2,2-Difluoroethanol and 2-(Alkylcarbonyloxy)-1,1-Difluoroethanesulfonic Acid Salt - Disclosed is a process for producing 2-bromo-2,2-difluoroethanol, which comprises reducing a bromodifluoroacetic acid derivative represented by the formula [1] by using an ate hydride complex as a reducing agent. 2-Bromo-2,2-difluoroethanol thus produced can be used as the starting material to carry out the esterification step, the sulfination step and the oxidation step in this order, thereby producing a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid salt, wherein A represents a substituted or unsubstituted linear, branched or cyclic alkoxy group having 1 to 20 carbon atoms, a substituted or unsubstituted aryloxy group having 6 to 15 carbon atoms, a heteroaryloxy group having 4 to 15 carbon atoms, or a halogen atom. | 01-20-2011 |
20110034721 | 2-(Alkylcarbonyloxy)-1, 1-Difluoroethanesulfonic Acid Salt and Method for Producing the Same - By using an organic base when a carboxylic acid bromodifluoroethyl ester is sulfinated by using a sulfinating agent, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt. By oxidizing the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfinic acid ammonium salt, there is obtained 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt. By using the 2-(alkylcarbonyloxy)-1,1-difluoroethanesulfonic acid ammonium salt as a raw material and exchanging it into an onium salt directly or through saponification/esterification, there can be obtained a 2-alkylcarbonyloxy-1,1-difluoroethanesulfonic acid onium salt. | 02-10-2011 |
20110177453 | Fluorine-Containing Sulfonates Having Polymerizable Anions and Manufacturing Method Therefor, Fluorine-Containing Resins, Resist Compositions, and Pattern-Forming Method Using Same - According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. | 07-21-2011 |
20110207954 | Method for Producing Alkoxycarbonylfluoroalkanesulfonic Acid Salt - In the present invention, a target alkoxycarbonylfluoroalkanesulfonic acid salt is obtained by using a halofluoroalkanoic acid ester as a starting raw material, sulfinating the halofluoroalkanoic acid ester in the presence of an amine (as a first step), and then, oxidizing the resulting sulfination product (as a second step). Further, an alkoxycarbonylfluoroalkanesulfinic acid onium salt, which is useful as a photoacid generator, is obtained by salt exchange reaction of the alkoxycarbonylfluoroalkanesulfonic acid salt. | 08-25-2011 |
20110313190 | Fluoroalkanesulfonic Acid Ammonium Salts and Method for Producing Same - When sulfinating a carboxylic acid bromofluoroalkyl ester by using a sulfinating agent, an organic base is used, thereby obtaining a fluoroalkanesulfinic acid ammonium salt. This is oxidized to obtain a fluoroalkanesulfonic acid ammonium salt. This is used as the raw material and is converted to an onium salt or is converted to an onium salt by going through saponification and esterification, thereby obtaining a fluoroalkanesulfonic acid onium salt. This fluoroalkanesulfonic acid onium salt is useful as a photoacid generator used for chemically amplified resist materials, etc. | 12-22-2011 |
20110318542 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same - There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 | 12-29-2011 |
20120004447 | Ammonium Fluoroalkanesulfonates and a Synthesis Method Therefor - An ammonium hydroxyfluoroalkanesulfinate is obtained by using an organic base while sulfinating a bromofluoroalcohol with a sulfinating agent. An ammonium hydroxyfluoroalkanesulfonate is obtained by oxidizing the ammonium hydroxyfluoroalkanesulfinate. An onium fluoroalkanesulfonate is obtained by converting the ammonium hydroxyfluoroalkanesulfonate into an onium salt through esterification. This onium fluoroalkanesulfonate is useful as a photoacid generator in chemically amplified resists and the like. | 01-05-2012 |
20120077126 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method - A fluorine-containing polymer of the present invention contains a repeating unit (a) of the general formula (2) and has a mass-average molecular weight of 1,000 to 1,000,000. This polymer is suitably used in a resist composition for pattern formation by high energy ray radiation of 300 nm or less wavelength or electron beam radiation or a top coat composition for liquid immersion lithography and is characterized as having high water repellency, notably high receding contact angle. | 03-29-2012 |