Govind Dayal
Govind Dayal Singh, Kanpur IN
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20140355639 | METAMATERIAL STRUCTURES FOR Q-SWITCHING IN LASERS - Techniques described herein are generally related to metamaterial structures for Q-switching in laser systems. The various described techniques may be applied to methods, systems, devices or combinations thereof. Sonic described metamaterial structures may include a substrate and a first conductive layer disposed on a first surface of the substrate. A dielectric layer may be disposed on a first surface of the first conductive layer and a second conductive layer having a substantially symmetric geometric shape may be disposed on a first surface of the dielectric layer. The second conductive layer may cover a portion of the first surface of the dielectric layer. | 12-04-2014 |
Govind Dayal Singh, Uttar Pradesh, Kanpur IN
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20150301444 | SYSTEMS AND METHODS FOR DRY PROCESSING FABRICATION OF BINARY MASKS WITH ARBITRARY SHAPES FOR ULTRA-VIOLET LASER MICROMACHINING - A system and method for producing binary dry process laser microfabrication masks is disclosed. A laser is focused on a first mask to produce a mask image, the mask image thereafter being reduced by demagnification optics to provide a reduced image. A target is exposed to the reduced image to create features of reduced size from the original mask. The target may be used to form a binary mask capable of withstanding laser radiation power necessary for direct target micromachining. A binary mask may be used to create other binary masks in an iterative process to provide binary masks with successively smaller features based on the image reduction due to the demagnification optics. | 10-22-2015 |
Govind Dayal Singh, Kanpur, Uttar Pradesh IN
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20150355538 | FABRICATION OF BINARY MASKS WITH ISOLATED FEATURES - An environmentally benign method for producing binary microfabrication masks is disclosed. An optical target may be provided that includes a water-soluble polymer material in contact with an ultraviolet radiation transmittable substrate. A laser may be focused on a primary mask to produce a mask image, the mask image thereafter being reduced by demagnification optics to provide a reduced image. The optical target may be exposed to the reduced image to create features of reduced size from the primary mask. The water-soluble polymer exposed to the ultraviolet radiation may be ablated from the optical target. The optical target may be subsequently metalized using a metal vapor to coat the remaining polymer material and exposed substrate. The metalized optical target may be contacted with an aqueous fluid to remove the metalized polymer material leaving the binary mask. | 12-10-2015 |
Govind Dayal Singh, Allahabad IN
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20150367452 | SHADOW MASKS AND METHODS FOR THEIR PREPARATION AND USE - A method of forming a shadow mask is provided. The method includes annealing at least one polymeric sheet to form at least one annealed polymeric sheet. The method also includes transferring a pattern from a primary mask to the annealed polymeric sheet using laser micromachining to form the shadow mask. | 12-24-2015 |