Patent application number | Description | Published |
20080298399 | Methods for Synchronizing the Transmission and the Reception of a Media Stream Over a Network - The present invention relates to methods for synchronizing the transmission and the reception of a media stream over a network, such as the Internet, comprising of a receiver clock having an adjustable reset value, where the adjustable reset value may be a function of the reference time for a receiver clock and the reference time for a sender clock. | 12-04-2008 |
20080298473 | Methods for Parallel Deblocking of Macroblocks of a Compressed Media Frame - This invention relates to methods for the parallel deblocking of macroblocks of a compressed media frame, such as a frame from a compressed video stream, to smooth out artifacts and discontinuities caused by the compression of the media. These methods for parallel deblocking of a frame having a plurality of tiles wherein each tile having a data dependency on zero or more of said tiles, comprising the steps of: constructing a reference deblocking sequence for the processing of said tile as a function of the data dependency of each respective tile; calculating scheduling indices for said tiles as a function of said reference deblocking sequence; and deblocking said tiles in accordance with said scheduling indices. | 12-04-2008 |
20080317364 | Methods for determining neighboring locations for partitions of a video stream - This invention describes methods for pre-computing neighboring locations for partitions in a video stream and for placing those pre-computed neighboring locations into a table for later retrieval and later use. The redundancy in the information of the pre-computed neighboring locations can be used to reduce the number entries in the table of neighboring locations, thus effectively reducing the amount of memory needed to store this table. Further, indexing schemes are used for non-MBAFF coded video streams and MBAFF coded video streams to further minimize memory usage. | 12-25-2008 |
20090052791 | Methods for Calculating Video Inverse Transform - Inverse transforms used in video and image compression/decompression, such as DCT/IDCT used in MPEG-2 and MPEG-4, or the integer transforms used in H.264, are usually calculated with fast algorithms, which only take advantage of the symmetry existing in the transform matrix but ignores the peculiarities in the input data. While these kind of fast algorithms can apply to both forward and inverse transforms, they tend to be inefficient in calculating inverse transforms. In inverse transforms, most of the coefficients become zero after quantization, this invention takes advantage of this fact to further simplify the general fast algorithm and speed up the calculation. | 02-26-2009 |
Patent application number | Description | Published |
20150095311 | CROWD-POWERED SELF-IMPROVING INTERACTIVE VISUALANALYTICS FOR USER-GENERATED OPINION DATA - Embodiments relate to interacting with a collection of user opinion documents associated with a topic. One aspect includes obtaining opinion data for the collection of opinion documents associated with the topic. The opinion data includes one or more features discussed in the opinion documents, one or more key phrases included in each feature, one or more text snippets included in each feature, and at least one sentiment expressed in each text snippet. A visual interface is provided in which a feature summary view of the opinion documents acts a top level of a navigational hierarchy. The visual interface allows user navigation from the top level to a lower level of the navigational hierarchy in order to display more details about a text snippet, as compared to the feature summary view, while continuing to provide the feature summary view. | 04-02-2015 |
20150213002 | PERSONAL EMOTION STATE MONITORING FROM SOCIAL MEDIA - Embodiments relate to monitoring personal emotion states over time from social media. One aspect includes extracting personal emotion states from at least one social media data source using a semantic model including an integration of numeric emotion measurements and semantic categories. Timeline based emotion segmentation with consistent emotional semantics is performed based on the semantic model. In a visual interface, interactive visual analytics are provided to explore and monitor personal emotional states over time including both a numeric and semantic interpretation of emotions with visual encodings. Visual evidence for analytical reasoning of emotion is also provided. | 07-30-2015 |
20150379090 | MINING PRODUCT ASPECTS FROM OPINION TEXT - A text stream having one or more sentences is received, and any number of the one or more sentences are parsed to determine corresponding subject-verb-object (SVO) triples. Each sentence whose corresponding SVO triple contains an identified verb is selected, based on the identified verb, or a lemma of the identified verb, matching a predefined verb. A subject of each selected sentence is identified as an aspect candidate. Each identified aspect candidate is tokenized and normalized. One or more n-grams are generated for each tokenized and normalized aspect candidate. For each generated n-gram, a frequency at which the n-gram is generated is determined. A number of the generated n-grams are selected as aspects based on the frequency with which the number of n-grams are generated. | 12-31-2015 |
20160026738 | MODELING AND VISUALIZING A DYNAMIC INTERPERSONAL RELATIONSHIP FROM SOCIAL MEDIA - Embodiments relate to relationship modeling and visualization from social media. One aspect includes determining a relationship type of a network-based relationship, between an individual and a network contact of the individual, from at least one social media data source. The relationship type is determined using a relationship model based on relationship types that include operational, personal, and business. Another aspect includes performing timeline based relationship strength segmentation using Group Lasso. The timeline based relationship strength segmentation specifies a past and current strength of the relationship. A further aspect includes predicting a future strength of the relationship using Extended Kalman Filter, and providing, through a visual interface, interactive visual analytics to view and monitor relationship states including the past, current, and future strengths over time. | 01-28-2016 |
Patent application number | Description | Published |
20090092933 | Methods of Lithographically Patterning a Substrate - A method of lithographically patterning a substrate that has photoresist having removal areas and non-removal areas includes first exposing at least the non-removal areas to radiation effective to increase outer surface roughness of the photoresist in the non-removal areas at least post-develop but ineffective to change photoresist solubility in a developer for the photoresist to be cleared from the non-removal areas upon develop with the developer. Second exposing of radiation to the removal areas is conducted to be effective to change photoresist solubility in the developer for the photoresist to be cleared from the removal areas upon develop with the developer. The photoresist is developed with the developer effective to clear photoresist from the removal areas and to leave photoresist in the non-removal areas that has outer surface roughness in the non-removal areas which is greater than that before the first exposing. Other implementations and embodiments are contemplated. | 04-09-2009 |
20120015486 | Semiconductor Constructions And Methods Of Forming Patterns - Some embodiments include methods of forming patterns. A semiconductor substrate is formed to comprise an electrically insulative material over a set of electrically conductive structures. An interconnect region is defined across the electrically conductive structures, and regions on opposing sides of the interconnect region are defined as secondary regions. A two-dimensional array of features is formed over the electrically insulative material. The two-dimensional array extends across the interconnect region and across the secondary regions. A pattern of the two-dimensional array is transferred through the electrically insulative material of the interconnect region to form contact openings that extend through the electrically insulative material and to the electrically conductive structures, and no portions of the two-dimensional array of the secondary regions is transferred into the electrically insulative material. | 01-19-2012 |
20120038895 | LENS HEATING COMPENSATION IN PHOTOLITHOGRAPHY - Photolithographic apparatus and methods are disclosed. One such apparatus includes an optical path configured to provide a first diffraction pattern in a portion of an optical system and to provide a second diffraction pattern to the portion of the optical system after providing the first diffraction pattern. Meanwhile, one such method includes providing a first diffraction pattern onto a portion of an optical system, wherein a semiconductor article is imaged using the first diffraction pattern. A second diffraction pattern is also provided onto the portion of the optical system, but the second diffraction pattern is not used to image the semiconductor article. | 02-16-2012 |
20120154919 | APPARATUSES AND DEVICES FOR ABSORBING ELECTROMAGNETIC RADIATION, AND METHODS OF FORMING THE APPARATUSES AND DEVICES - Photonic nanostructures, light absorbing apparatuses, and devices are provided. The photonic nanostructures include a plurality of photonic nanobars configured to collectively absorb light over an excitation wavelength range. At least two of the photonic nanobars of the plurality have lengths that are different from one another. Each photonic nanobar of the plurality has a substantially small width and a substantially small height relative to the different lengths. A method for forming such may comprise forming a plurality of first photonic nanobars comprising a width and a height that are smaller than a length of the plurality of first photonic nanobars, and forming a plurality of second photonic nanobars comprising a width and a height that are smaller than a length of the second photonic nanobar, wherein the lengths of the plurality of first photonic nanobars and the lengths of the plurality of second photonic nanobars are different from one another. | 06-21-2012 |
20120177891 | METHODS OF FORMING A PATTERNED, SILICON-ENRICHED DEVELOPABLE ANTIREFLECTIVE MATERIAL AND SEMICONDUCTOR DEVICE STRUCTURES INCLUDING THE SAME - Methods of forming a patterned, silicon-enriched developable antireflective material. One such method comprises forming a silicon-enriched developable antireflective composition. The silicon-enriched developable antireflective composition comprises a silicon-enriched polymer and a crosslinking agent. The silicon-enriched polymer and the crosslinking agent are reacted to form a silicon-enriched developable antireflective material that is insoluble and has at least one acid-sensitive moiety. A positive-tone photosensitive material, such as a positive-tone photoresist, is formed over the silicon-enriched developable antireflective material and regions thereof are exposed to radiation. The exposed regions of the positive-tone photosensitive material and underlying regions of the silicon-enriched developable antireflective material are removed. Additional methods are disclosed, as are semiconductor device structures including a silicon-enriched developable antireflective material. | 07-12-2012 |
20120178026 | IMAGING DEVICES, METHODS OF FORMING SAME, AND METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES - An imaging device comprising at least one array pattern region and at least one attenuation region. A plurality of imaging features in the at least one array pattern region and a plurality of assist features in the at least one attenuation region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed. | 07-12-2012 |
20120257177 | ILLUMINATION DESIGN FOR LENS HEATING MITIGATION - A method for reducing the effects of lens heating of a lens in an imaging process includes determining heat load locations on the lens according to an illumination source and a reticle design, obtaining a lens response characterization according to the heat load locations, and utilizing the heat load locations and the lens response characterization to generate a lens heating sensitivity map. | 10-11-2012 |
20130059255 | Methods of Lithographically Patterning a Substrate - A method of lithographically patterning a substrate that has photoresist having removal areas and non-removal areas includes first exposing at least the non-removal areas to radiation effective to increase outer surface roughness of the photoresist in the non-removal areas at least post-develop but ineffective to change photoresist solubility in a developer for the photoresist to be cleared from the non-removal areas upon develop with the developer. Second exposing of radiation to the removal areas is conducted to be effective to change photoresist solubility in the developer for the photoresist to be cleared from the removal areas upon develop with the developer. The photoresist is developed with the developer effective to clear photoresist from the removal areas and to leave photoresist in the non-removal areas that has outer surface roughness in the non-removal areas which is greater than that before the first exposing. Other implementations and embodiments are contemplated. | 03-07-2013 |
20130252142 | IMAGING DEVICES, METHODS OF FORMING SAME, AND METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES - An imaging device comprising a first region and a second region. Imaging features in the first region and assist features in the second region are substantially the same size as one another and are formed substantially on pitch. Methods of forming an imaging device and methods of forming a semiconductor device structure are also disclosed. | 09-26-2013 |
20130302981 | Semiconductor Constructions And Methods Of Forming Patterns - Some embodiments include methods of forming patterns. A semiconductor substrate is formed to comprise an electrically insulative material over a set of electrically conductive structures. An interconnect region is defined across the electrically conductive structures, and regions on opposing sides of the interconnect region are defined as secondary regions. A two-dimensional array of features is formed over the electrically insulative material. The two-dimensional array extends across the interconnect region and across the secondary regions. A pattern of the two-dimensional array is transferred through the electrically insulative material of the interconnect region to form contact openings that extend through the electrically insulative material and to the electrically conductive structures, and no portions of the two-dimensional array of the secondary regions is transferred into the electrically insulative material. | 11-14-2013 |
20130309605 | METHODS FOR FORMING RESIST FEATURES, PATTERNS IN A RESIST, AND ARRAYS OF ALIGNED, ELONGATE RESIST FEATURES - Methods of forming resist features, resist patterns, and arrays of aligned, elongate resist features are disclosed. The methods include addition of a compound, e.g., an acid or a base, to at least a lower surface of a resist to alter acidity of at least a segment of one of an exposed, acidic resist region and an unexposed, basic resist region. The alteration, e.g., increase or decrease, in the acidity shifts an acid-base equilibrium to either encourage or discourage development of the segment. Such “chemical proximity correction” techniques may be used to enhance the acidity of an exposed, acidic resist segment, to enhance the basicity of an unexposed, basic resist segment, or to effectively convert an exposed, acidic resist segment to an unexposed, basic resist segment or vice versa. Thus, unwanted line breaks, line merges, or misalignments may be avoided. | 11-21-2013 |
20130323628 | RETICLE WITH COMPOSITE POLARIZER AND METHOD OF SIMULTANEOUS OPTIMIZATION OF IMAGING OF A SET OF DIFFERENT PATTERNS - A reticle with a composite polarizer includes: a transparent substrate; a patterned layer disposed on said transparent substrate; and a polarizing filter disposed on said transparent substrate, wherein said transparent substrate is substantially transparent with respect to illumination light, said patterned layer is partially opaque with respect to said illumination light, and said polarizing filter is capable of selectively polarizing said illumination light. | 12-05-2013 |
20140145311 | METHODS OF FORMING FEATURES IN SEMICONDUCTOR DEVICE STRUCTURES - Methods of forming features are disclosed. One method comprises forming a resist over a pool of acidic or basic material on a substrate structure, selectively exposing the resist to an energy source to form exposed resist portions and non-exposed resist portions, and diffusing acid or base of the acidic or basic material from the pool into proximal portions of the resist. Another method comprises forming a plurality of recesses in a substrate structure. The plurality of recesses are filled with a pool material comprising acid or base. A resist is formed over the pool material and the substrate structure and acid or base is diffused into adjacent portions of the resist. The resist is patterned to form openings in the resist. The openings comprise wider portions distal to the substrate structure and narrower portions proximal to the substrate structure. Additional methods and semiconductor device structures including the features are disclosed. | 05-29-2014 |
20140353803 | SEMICONDUCTOR DEVICE STRUCTURES - Methods of forming features are disclosed. One method comprises forming a resist over a pool of acidic or basic material on a substrate structure, selectively exposing the resist to an energy source to form exposed resist portions and non-exposed resist portions, and diffusing acid or base of the acidic or basic material from the pool into proximal portions of the resist. Another method comprises forming a plurality of recesses in a substrate structure. The plurality of recesses are filled with a pool material comprising acid or base. A resist is formed over the pool material and the substrate structure and acid or base is diffused into adjacent portions of the resist. The resist is patterned to form openings in the resist. The openings comprise wider portions distal to the substrate structure and narrower portions proximal to the substrate structure. Additional methods and semiconductor device structures including the features are disclosed. | 12-04-2014 |
20150015860 | Reticles, And Methods Of Mitigating Asymmetric Lens Heating In Photolithography - A method of mitigating asymmetric lens heating in photolithographically patterning a photo-imageable material using a reticle includes determining where first hot spot locations are expected to occur on a lens when using a reticle to pattern a photo-imageable material. The reticle is then fabricated to include non-printing features within a non-printing region of the reticle which generate additional hot spot locations on the lens when using the reticle to pattern the photo-imageable material. Other implementations are contemplated, including reticles which may be independent of method of use or fabrication. | 01-15-2015 |
20150380307 | METHODS OF FORMING OPENINGS IN SEMICONDUCTOR STRUCTURES - A method of forming a semiconductor structure comprises forming pools of acidic or basic material in a substrate structure. A resist is formed over the pools of acidic or basic material and the substrate structure. The acidic or basic material is diffused from the pools into portions of the resist proximal to the pools more than into portions of the resist distal to the pools. Then, the resist is exposed to a developer to remove a greater amount of the resist portions proximal to the pools compared to the resist portions distal to the pools to form openings in the resist. The openings have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. The method may further comprise forming features in the openings of the resist. The features have wider portions proximal to the substrate structure and narrower portions distal to the substrate structure. | 12-31-2015 |
Patent application number | Description | Published |
20120088845 | Synthesis, capping and dispersion of nanocrystals - Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films. | 04-12-2012 |
20130207053 | SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS - Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films. | 08-15-2013 |
20130221279 | SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS - Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films. | 08-29-2013 |
20140045323 | SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS - Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films. | 02-13-2014 |
20140295649 | SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS - Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films. | 10-02-2014 |
20140302664 | SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS - Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films. | 10-09-2014 |
20150203989 | SYNTHESIS, CAPPING AND DISPERSION OF NANOCRYSTALS - Preparation of semiconductor nanocrystals and their dispersions in solvents and other media is described. The nanocrystals described herein have small (1-10 nm) particle size with minimal aggregation and can be synthesized with high yield. The capping agents on the as-synthesized nanocrystals as well as nanocrystals which have undergone cap exchange reactions result in the formation of stable suspensions in polar and nonpolar solvents which may then result in the formation of high quality nanocomposite films. | 07-23-2015 |
Patent application number | Description | Published |
20130214447 | Apparatuses, Systems, and Associated Methods for Forming Porous Masses for Smoke Filter - A system for producing porous masses may include a mold cavity disposed along the material path, at least one hopper before at least a portion of the mold cavity for feeding a matrix material to the material path, a heat source in thermal communication with at least a first portion of the material path, and a cutter disposed along the material path after the first portion of the material path. | 08-22-2013 |
20130221562 | Apparatuses, Systems, and Associated Methods for Forming Porous Masses for Smoke Filter - A system for producing porous masses may include a mold cavity disposed along the material path, at least one hopper before at least a portion of the mold cavity for feeding a matrix material to the material path, a heat source in thermal communication with at least a first portion of the material path, and a cutter disposed along the material path after the first portion of the material path. | 08-29-2013 |
20130221563 | Apparatuses, Systems, and Associated Methods for Forming Porous Masses for Smoke Filter - A system for producing porous masses may include a mold cavity disposed along the material path, at least one hopper before at least a portion of the mold cavity for feeding a matrix material to the material path, a heat source in thermal communication with at least a first portion of the material path, and a cutter disposed along the material path after the first portion of the material path. | 08-29-2013 |
20130298923 | Apparatuses, Systems, and Associated Methods for Forming Porous Masses for Smoke Filter - A system for producing porous masses may include a mold cavity disposed along the material path, at least one hopper before at least a portion of the mold cavity for feeding a matrix material to the material path, a heat source in thermal communication with at least a first portion of the material path, and a cutter disposed along the material path after the first portion of the material path. | 11-14-2013 |
Patent application number | Description | Published |
20130032158 | Apparatuses, Systems, and Associated Methods for Forming Porous Masses for Smoke Filters - High-throughput production methods for manufacturing porous masses suitable for use in conjunction with smoking devices may include continuously combining a matrix material and a paper wrapper to form a desired cross-sectional shape where the matrix material is confined by the paper wrapper, the matrix material comprising a binder particle and an active particle; heating at least a portion of the matrix material so as to bind the matrix material at a plurality of contact points, thereby forming a porous mass length, wherein heating involves irradiating with microwave radiation at least a portion of the matrix material; cooling the porous mass length; and cutting the porous mass length radially thereby producing a porous mass. | 02-07-2013 |
20130120707 | OPHTHALMIC LENS CONTAINING A FRESNEL SURFACE AND METHOD FOR MANUFACTURING SAME - A process for manufacturing an ophthalmic lens containing a Fresnel microstructured surface inside the lens. The Fresnel lens is injection molded with a mold insert having a heat conductivity lower than the thermoplastic material used to form the Fresnel lens. A second thermoplastic material is overmolded to the Fresnel lens to cover and protect the microstructured surface. The mold insert is made from Nickel or thermoplastic. The resulting lens includes two layers having different refractive indices. The Fresnel lens is made from polycarbonate while the overmold is made from PMMA or TPU. | 05-16-2013 |
20140070465 | APPARATUSES, SYSTEMS, AND ASSOCIATED METHODS FOR FORMING POROUS MASSES FOR SMOKE FILTERS - High-throughput production apparatuses, systems, and associated methods may include pneumatic dense phase feeding. For example, a method may involve feeding via pneumatic dense phase feeding a matrix material into a mold cavity to form a desired cross-sectional shape, the matrix material comprising a binder particle and an active particle; heating (e.g., via microwave irradiation) at least a portion of the matrix material so as to bind the matrix material at a plurality of contact points thereby forming a porous mass length; cooling the porous mass length; and cutting the porous mass length radially thereby producing a porous mass. In some instances, the matrix material may include a plurality of active particles, a plurality of binder particles (optionally having a hydrophilic surface modification), and optionally a microwave enhancement additive. | 03-13-2014 |
20140076340 | APPARATUSES, SYSTEMS, AND ASSOCIATED METHODS FOR FORMING POROUS MASSES FOR SMOKE FILTERS - High-throughput production apparatuses, systems, and associated methods may include pneumatic dense phase feeding. For example, a method may involve feeding via pneumatic dense phase feeding a matrix material into a mold cavity to form a desired cross-sectional shape, the matrix material comprising a binder particle and an active particle; heating (e.g., via microwave irradiation) at least a portion of the matrix material so as to bind the matrix material at a plurality of contact points thereby forming a porous mass length; cooling the porous mass length; and cutting the porous mass length radially thereby producing a porous mass. In some instances, the matrix material may include a plurality of active particles, a plurality of binder particles (optionally having a hydrophilic surface modification), and optionally a microwave enhancement additive. | 03-20-2014 |
20140261475 | APPARATUSES, SYSTEMS, AND ASSOCIATED METHODS FOR FORMING ORGANIC POROUS MASSES FOR FLAVORED SMOKE FILTERS - Organic porous masses may be used in flavored smoke filters. Production of organic porous masses may involve introducing a matrix material into a mold cavity, the matrix material comprising a plurality of binder particles, a plurality of organic particles, and a microwave enhancement additive; heating at least a portion of the matrix material so as to bind the matrix material at a plurality of contact points, thereby forming an organic porous mass length, wherein heating involves irradiating with microwave radiation the at least a portion of the matrix material; and cutting the organic porous mass length radially thereby yielding an organic porous mass. | 09-18-2014 |