Patent application number | Description | Published |
20080314737 | Methods of Making Molybdenium Titanium Sputtering Plates and Targets - Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the β(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase β(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided. | 12-25-2008 |
20110097236 | METHODS OF MAKING MOLYBDENUM TITANIUM SPUTTERING PLATES AND TARGETS - Molybdenum titanium sputter targets are provided. In one aspect, the targets are substantially free of the β(Ti, Mo) alloy phase. In another aspect, the targets are substantially comprised of single phase β(Ti, Mo) alloy. In both aspects, particulate emission during sputtering is reduced. Methods of preparing the targets, methods of bonding targets together to produce large area sputter targets, and films produced by the targets, are also provided. | 04-28-2011 |
20110303535 | SPUTTERING TARGETS AND METHODS OF FORMING THE SAME - In various embodiments, sputtering targets incorporate an intermediate plate having a coefficient of thermal expansion (CTE) between a CTE of the backing plate and a CTE of the target material. | 12-15-2011 |
20120189483 | Methods of forming molybdenum sputtering targets - In various embodiments, tubular sputtering targets are produced by forming a tubular billet at least by pressing molybdenum powder in a mold and sintering the pressed molybdenum powder, working the tubular billet to form a worked billet, and heat treating the worked billet. | 07-26-2012 |
20130081748 | METHODS OF MANUFACTURING LARGE-AREA SPUTTERING TARGETS BY COLD SPRAY - In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding. | 04-04-2013 |
20130081944 | LARGE-AREA SPUTTERING TARGETS - In various embodiments, joined sputtering targets are formed at least in part by spray deposition of the sputtering material and/or welding. | 04-04-2013 |
20130156967 | SPRAY REJUVENATION OF SPUTTERING TARGETS - In various embodiments, used sputtering targets are refurbished at least in part by maintaining a large obliquity angle between the spray-deposition gun and the depressed surface contour of the target during spray deposition of the target material. | 06-20-2013 |
20130224059 | METHODS OF FORMING MOLYBDENUM SPUTTERING TARGETS - In various embodiments, planar sputtering targets are produced by forming a billet at least by pressing molybdenum powder in a mold and sintering the pressed powder, working the billet to form a worked billet, heat treating the worked billet, working the worked billet to form a final billet, and heat treating the final billet. | 08-29-2013 |
20140299466 | HIGH-DENSITY METALLIC SPUTTERING TARGETS - The present invention is directed to a process for producing high density, refractory metal products via a press/sintering process. The invention is also directed to a process for producing a sputtering target and to the sputtering target so produced. | 10-09-2014 |