Patent application number | Description | Published |
20100202706 | IC LAYOUT PATTERN MATCHING AND CLASSIFICATION SYSTEM AND METHOD - A system and method for restricting the number of layout patterns by pattern identification, matching and classification, includes decomposing the pattern windows into a low frequency component and a high frequency component using a wavelet analysis for an integrated circuit layout having a plurality of pattern windows. Using the low frequency component as an approximation, a plurality of moments is computed for each pattern window. The pattern windows are classified using a distance computation for respective moments of the pattern windows by comparing the distance computation to an error value to determine similarities between the pattern windows. | 08-12-2010 |
20120017194 | METHOD FOR FAST ESTIMATION OF LITHOGRAPHIC BINDING PATTERNS IN AN INTEGRATED CIRCUIT LAYOUT - The present invention provides a lithographic difficulty metric that is a function of an energy ratio factor that includes a ratio of hard-to-print energy to easy-to-print energy of the diffraction orders along an angular coordinate θ | 01-19-2012 |
20130071007 | IC LAYOUT PATTERN MATCHING AND CLASSIFICATION SYSTEM AND METHOD - A system and method for restricting the number of layout patterns by pattern identification, matching and classification, includes decomposing the pattern windows into a low frequency component and a high frequency component using a wavelet analysis for an integrated circuit layout having a plurality of pattern windows. Using the low frequency component as an approximation, a plurality of moments is computed for each pattern window. The pattern windows are classified using a distance computation for respective moments of the pattern windows by comparing the distance computation to an error value to determine similarities between the pattern windows. | 03-21-2013 |
20140123083 | AUTOMATIC WAFER DATA SAMPLE PLANNING AND REVIEW - A method of constructing a mask for use in semiconductor device manufacturing is disclosed. A first shape that is related to mask construction is selected from a set of shapes. A second shape related to the mask construction is selected from the set of shapes. The first shape and the second shape are represented using a first shape vector and a second shape vector, respectively. A cluster is formed that includes the first shape and the second shape when the first shape vector and the second shape vector are within a selected criterion. | 05-01-2014 |
20140291513 | AUTOMATIC FILTERING OF SEM IMAGES - A method, system, and computer program product to automatically evaluate a scanning electron microscope (SEM) image are described. The method includes obtaining a source image and the SEM image taken of the source image. The method also includes evaluating the SEM image based on comparing source contours extracted from the source image and SEM contours extracted from the SEM image to determine whether the SEM image passes or fails. | 10-02-2014 |
20140291519 | AUTOMATIC FILTERING OF SEM IMAGES - A method, system, and computer program product to automatically evaluate a scanning electron microscope (SEM) image are described. The method includes obtaining a source image and the SEM image taken of the source image. The method also includes evaluating the SEM image based on comparing source contours extracted from the source image and SEM contours extracted from the SEM image to determine whether the SEM image passes or fails. | 10-02-2014 |