Fujisato
Tetsuhiko Fujisato, Yamaguchi JP
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20100044322 | AERATION UNIT, AERATION APPARATUS EQUIPPED THEREWITH AND METHOD OF AERATION - An aeration unit, an aeration apparatus and a method of aeration are provided that can quickly realize water quality with gas dissolution balance appropriate for living creatures in water, and that can be utilized for treating polluted water at sewage treatment facilities and used in a gas-liquid contact step at chemical plants or others. A multiple stage aeration apparatus | 02-25-2010 |
Tetsuhiko Fujisato, Ube-Shi JP
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20090051168 | Gravity wave power generation apparatus - A power generation apparatus that will not exhaust carbon dioxide is provided where a strong rotating motion is created by the combination of solar heat energy, gravitational energy, and ocean current or tidal current energy. In the sea area having stream current such as ocean current and tidal current, the power generation apparatus is constructed by a weight mass provided with a rotation axis (shaft) on the top part thereof, a floating body provided with a bearing for fitting in the rotation axis where it moves up and down according to the swell on the ocean surface, a normal rotation conversion generator for converting the reverse motion produced on the rotation axis to a normal rotating motion by using a one-way clutch or a ratchet mechanism, and a mooring member for fastening the wire rope between the anchor and the connecting point of the floating body and weight mass. | 02-26-2009 |
Toshiaki Fujisato, Nirasaki City JP
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20100244350 | MOUNTING TABLE STRUCTURE AND PLASMA FILM FORMING APPARATUS - A mounting table structure for mounting thereon an object to be processed to form a metal-containing thin film on the object includes a ceramic mounting table in which a chuck electrode and a heater are embedded, and a metal flange connected to a bottom surface of a peripheral portion of the mounting table. The mounting table structure further includes a metal base which is joined to the flange by screws and has a coolant path for flowing a coolant therein, and a metal seal member interposed between the flange and the base. | 09-30-2010 |
20120247949 | FILM FORMING METHOD, RESPUTTERING METHOD, AND FILM FORMING APPARATUS - A film forming method includes depositing a metal thin film on a target substrate by generating an inductively coupled plasma in a processing chamber while introducing a plasma generating gas in the processing chamber with the substrate disposed on a placing table, by supplying DC power to a metal target from a DC power source, and by applying high-frequency bias to the placing table. A resputtering method includes resputtering the deposited metal thin film by stopping the generating of the inductively coupled plasma, by stopping the power supply from the DC power source, and by applying the high-frequency bias to the placing table while introducing the plasma generating gas in the processing chamber to form a capacitively coupled plasma in the processing chamber and by attracting ions of the plasma generating gas to the target substrate where the metal thin film is deposited. | 10-04-2012 |
Toshiaki Fujisato, Nirasaki JP
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20140090597 | PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS - In a plasma processing method, plasma processing is performed in a state where the object is attracted and held on the electrostatic chuck by applying a first voltage as an application voltage thereto and a thermal conduction gas is supplied to a gap between the electrostatic chuck and the object. The application voltage is decreased while stopping the supply of the thermal conduction gas and exhausting the thermal conduction gas remaining between the electrostatic chuck and the object upon completion of the plasma processing. The object is separated from the electrostatic chuck by setting the application voltage to the electrostatic chuck to zero after the application voltage is decreased. | 04-03-2014 |
Toshiaki Fujisato, Yamanashi JP
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20140060572 | PLASMA PROCESSING APPARATUS AND CLEANING METHOD FOR REMOVING METAL OXIDE FILM - In a plasma processing apparatus, a mounting table is provided in a processing chamber, and a remote plasma generating unit is configured to generate an excited gas by exiting a hydrogen-containing gas. The remote plasma generating unit has an outlet for discharging the excited gas. A diffusion unit is provided to correspond to the outlet of the remote plasma generating unit and serves to receive the excited gas flowing from the outlet and diffuse the hydrogen active species having a reduced amount of hydrogen ions. An ion filter is disposed between the diffusion unit and the mounting table while being separated from the diffusion unit. The ion filter serves to capture the hydrogen ions contained in the hydrogen active species diffused by the diffusion unit and allow the hydrogen active species having a further reduced amount of hydrogen ions to pass therethrough the mounting table. | 03-06-2014 |
Toshiaki Fujisato, Nirasaki-Shi JP
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20130001076 | MOUNTING TABLE STRUCTURE AND PLASMA FILM FORMING APPARATUS - A mounting table structure includes a mounting table body, made of a conductive material, for mounting thereon the processing target object and serving as an electrode; a base table, made of a conductive material, disposed below the mounting table body with a gap therebetween in a state insulated from the mounting table body; a support column, connected to the ground side, for supporting the base table; a high frequency power supply line, connected to the mounting table body, for supplying a high frequency bias power to the mounting table body; and a power stabilization capacitor provided between the ground side and a hot side to which the high frequency bias power is applied. Here, an electrostatic capacitance of the power stabilization capacitor is set to be larger than an electrostatic capacitance of a stray capacitance between the mounting table body and the protective cover member. | 01-03-2013 |
Toshiaki Fujisato, Tokyo JP
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20090242383 | APPARATUS AND METHOD FOR RF GROUNDING OF IPVD TABLE - An IPVD source assembly and method is provided for supplying and ionizing material for coating a semiconductor wafer. The assembly includes a process space containing a plasma and an electrostatic chuck moveable in to and out of the process space. The chuck is configured to support the semiconductor wafer. The assembly further includes a first shield in electrical communication with a table and a second shield. The first shield is configured to shield at least a portion of the electrostatic chuck when the chuck is in the process space and the second shield is configured to shield at least a portion of a space below the electrostatic chuck and the process space. A conducting element electrically connects the second shield to the table to substantially prevent a formation of a second plasma in the space below the electrostatic chuck and the process space. | 10-01-2009 |
Toshiaki Fujisato, Albany, NY US
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20120315404 | APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METHOD OF OPERATING - A method for vapor deposition on a substrate in a vapor deposition system having a process space separated from a transfer space. The method disposes a substrate in a process space of a processing system that is vacuum isolated from a transfer space of the processing system, processes the substrate at either of a first position or a second position in the process space while maintaining vacuum isolation from the transfer space by way of a movement accommodating sealing material, and deposits a material on the substrate at either the first position or the second position. | 12-13-2012 |
Toshiya Fujisato, Osaka-Fu JP
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20100021961 | METHOD FOR PREPARING BIOLOGICAL SCAFFOLD MATERIAL - Disclosed is a method for production of a bio-derived scaffold for use in regenerative medicine, which has a bio-compatibility and biodegradability and can self-organize and grow without causing calcification. The method comprises the steps of partially fixing a biological soft tissue with glutaraldehyde by cross-linking and incubating the partially fixed tissue together with an elastase. | 01-28-2010 |
Toshiya Fujisato, Osaka JP
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20100145444 | METHOD OF PREPARING DECELLULARIZED SOFT TISSUE, GRAFT AND CULTURE MATERIAL - It is intended to provide a method of preparing a decellularized soft tissue whereby swelling after an ultrahigh pressure treatment can be inhibited, etc. The above-described method of preparing a decellularized soft tissue comprises the application step wherein an ultrahigh hydrostatic pressure is applied to an isolated soft tissue in a medium to thereby disrupt cells in the soft tissue, and the removal step wherein the disrupted cells are removed. As the medium, use is made of an aqueous solution containing a water-soluble polysaccharide such as dextran. | 06-10-2010 |
Toshiya Fujisato, Suita-Shi JP
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20090155760 | Method of Cell Injection into Biotissue and Apparatus Therefor - A method of injecting cells into a biological tissue comprising thrusting injection needle ( | 06-18-2009 |