Patent application number | Description | Published |
20080212053 | Device manufacturing method, lithographic apparatus and device manufactured thereby - A device manufacturing method is disclosed. The method includes patterning a beam of radiation, projecting the patterned beam of radiation onto a plurality of outer target portions of a substrate in a sequence in which each subsequent outer target portion is spaced-apart from a preceding outer target portion, and subsequent to projecting the patterned beam of radiation on the plurality of outer target portions, projecting the patterned beam of radiation onto an inner target portion of the substrate. | 09-04-2008 |
20080266625 | System for Reading Data on a Holographic Storage Medium - The invention relates to a system for reading data from a holographic storage medium (HSM), said system comprising an optical ring cavity defining a closed optical path so as to recycle the light of a reference beam that is used to read out the holographic storage medium, in view of increasing the light path efficiency by lengthening its path. | 10-30-2008 |
20080266654 | Extreme ultraviolet microscope - An extreme ultraviolet (EUV) microscope configured to analyze a sample. The microscope includes a source of EUV radiation constructed and arranged to generate the EUV radiation with a wavelength at least in a range of about 2-6 nm, and an optical system constructed and arranged to illuminate the sample with the EUV radiation and to collect a radiation emanating from the sample. The optical system is arranged with at least one mirror that includes a multilayer structure for in-phase reflection of at least a portion of the radiation in the range of about 2-6 nm. | 10-30-2008 |
20090015819 | OPTICAL ANALYSIS SYSTEM, BLOOD ANALYSIS SYSTEM AND METHOD OF DETERMINING AN AMPLITUDE OF A PRINCIPAL COMPONENT - The optical analysis system ( | 01-15-2009 |
20090115980 | Illumination system and filter system - A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap. | 05-07-2009 |
20090206279 | Method and Device for Removing Particles Generated by Means of a Radiation Source During Generation of Short-Wave Radiation - A method for removing contaminant particles ( | 08-20-2009 |
20090302217 | Hybrid Phase Plate - The invention relates to a hybrid phase plate for use in a TEM. The phase plate according to the invention resembles a Boersch phase plate in which a Zernike phase plate is mounted. As a result the phase plate according to the invention resembles a Boersch phase plate for electrons scattered to such an extent that they pass outside the central structure ( | 12-10-2009 |
20100200772 | RADIATION SYSTEM WITH CONTAMINATION BARRIER - A radiation system includes a contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris coming from the radiation source. The contamination barrier includes a plurality of lamellas. The surface of the lamellas includes a material. The radiation system also includes a collector configured to collect radiation from the contamination barrier. An optical surface of the collector includes a material that is the same as the material of the surface of the lamellas. | 08-12-2010 |
20110266439 | Method of Using a Direct Electron Detector for a TEM - A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the centre of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results. | 11-03-2011 |
20120032078 | Backscatter Reduction in Thin Electron Detectors - In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor. | 02-09-2012 |
20140166879 | Backscatter Reduction in Thin Electron Detectors - In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor. | 06-19-2014 |