Patent application number | Description | Published |
20080297753 | APPARATUS AND METHOD FOR DEFECT-FREE MICROLITHOGRAPHY - An illumination source pupil for microlithography includes a substrate of substantially opaque material having an x-axis and a y-axis defined with respect to the substrate. The substrate has a first arcuate opening therein, and a second arcuate opening therein. The substrate also includes a third opening therein positioned at the intersection of the x-axis and the y-axis. | 12-04-2008 |
20100017778 | METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORRECTION AND OPTICAL PROXIMITY CORRECTION METHODS INCLUDING SAME - Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced in an optical proximity correction simulation of a target geometry. The target geometry may comprise a plurality of line segments, each line segment of the plurality having one evaluation point defined thereon. The method may further comprise shifting at least one evaluation point to an associated point on the predicted contour of the image. | 01-21-2010 |
20100134774 | CALIBRATION METHODS AND DEVICES USEFUL IN SEMICONDUCTOR PHOTOLITHOGRAPHY - Several embodiments of photolithography devices and associated methods of focal calibration are disclosed herein. In one embodiment, a method for determining a focus shift in a photolithography system include placing a microelectronic substrate on a substrate support of the photolithography system and producing first and second refraction patterns on the photoresist layer corresponding to first and second grating patterns, respectively, of a single reticle by illuminating the first and second grating patterns with an asymmetric monopole source perpendicular to the first and second grating patterns. The method further includes measuring an image shift between the first and second refraction patterns on the photoresist layer and determining a defocus shift of the illumination source based on the image shift. | 06-03-2010 |
20120030638 | METHODS FOR DEFINING EVALUATION POINTS FOR OPTICAL PROXIMITY CORRECTION AND OPTICAL PROXIMITY CORRECTION METHODS INCLUDING SAME - Methods are disclosed for defining evaluation points for use in optical proximity correction of a rectangular target geometry. A method for defining evaluation points for use in optical proximity correction of a rectangular target geometry may comprise predicting a contour of an image to be produced in an optical proximity correction simulation of a target geometry. The target geometry may comprise a plurality of line segments, each line segment of the plurality having one evaluation point defined thereon. The method may further comprise shifting at least one evaluation point to an associated point on the predicted contour of the image. | 02-02-2012 |
20130323627 | Photomasks, Methods Of Forming A Photomask, And Methods Of Photolithographically Patterning A Substrate - A photomask includes a substrate having a device region and an adjacent edge region over transparent material. The device region includes spaced primary features of constant pitch at least adjacent the edge region. The edge region includes spaced sub-resolution assist features of the constant pitch of the spaced primary features at least adjacent the device region and which are off-phase by from about 30° to about 150° from +/−180°. Additional embodiments, including methods, are disclosed. | 12-05-2013 |
20150017575 | Photomasks, Methods Of Forming A Photomask, And Methods Of Photolithographically Patterning A Substrate - A photomask includes a substrate having a device region and an adjacent edge region over transparent material. The device region includes spaced primary features of constant pitch at least adjacent the edge region. The edge region includes spaced sub-resolution assist features of the constant pitch of the spaced primary features at least adjacent the device region and which are off-phase by from about 30° to about 150° from +/−180°. Additional embodiments, including methods, are disclosed. | 01-15-2015 |
Patent application number | Description | Published |
20130232135 | PRESENTING CONTENT IN ACCORDANCE WITH A PLACEMENT DESIGNATION - Methods, systems, and computer program products are provided for presenting content in accordance with a placement designation. One example method includes identifying terms associated with a campaign, the campaign having an associated content item that is presented to users responsive to requests for content, receiving an indication of a placement designation including targeting criteria for presenting the content item in a search suggestion control along with search suggestions, storing information associated with the campaign, and processing content requests. | 09-05-2013 |
20130232167 | TARGETING CONTENT BASED ON RECEIPT OF PARTIAL TERMS - Methods, systems, and computer program products are provided for targeting content to users based on receipt of partial terms. One example method includes identifying one or more terms associated with a campaign, the campaign having an associated content item that is presented to users responsive to requests for content, presenting a campaign sponsor with an option to target the content item to users based on receipt of a partial form of one of the one or more terms, receiving from the campaign sponsor a selection of a designation of the partial form of the term for use in targeting, and optionally presenting the content item in a search suggestion control along with search completions in response to receipt of the partial form of the term in a search control. | 09-05-2013 |