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Eri

Michiaki Eri, Hino-Shi JP

Patent application numberDescriptionPublished
20080244007ELECTRONIC CONFERENCE SYSTEM, INFORMATION PROCESSING APPARATUS, AND PROGRAM - According to one embodiment, a client computer of an electronic conference system comprises a unit which determines whether or not the client computer is equipped with the image pickup device, a unit which notifying a server computer of the electronic conference system of the determination, a unit which receives the member list information from the server computer, and a unit which displays the plurality of client computers in list form so as to make it possible to determine whether or not each of the client computers is equipped with the image pickup device, based on the member list information.10-02-2008
20100005262Information Processing Apparatus, Data Restoring Method of Information Processing Apparatus, and Data Restoring Program of Information Processing Apparatus - According to the present invention, an information processing apparatus includes: a first storage module; a second storage module; a first acquiring module configured to acquire data from the first storage module when a failure occurs; a determination module configured to determine whether the data acquired by the first acquiring module includes system data having a possibility of changing system operation; and a first copying module configured to copy the data to the second storage device with a destination information, wherein, when the determination module determines that the data does not include the system data, a previous location of the data before occurrence of the failure is set as the destination information, and wherein, when the determination module determines that the data includes the system data, a certain location in the first storage module is set as the destination information.01-07-2010

Patent applications by Michiaki Eri, Hino-Shi JP

Sigrid Eri, Ranheim NO

Patent application numberDescriptionPublished
20100184872PREPARATION OF FISCHER-TROPSCH CATALYSTS - A method of producing a catalyst for use in a Fischer-Tropsch synthesis reaction. The method comprises the steps of: impregnating a catalyst support material with an active cobalt catalyst component to form a catalyst precursor; and calcining the catalyst precursor in an atmosphere of a dry calcining gas.07-22-2010
20120149787FISCHER-TROPSCH CATALYSTS - A method of producing an alumina-supported cobalt catalyst for use in a Fischer-Tropsch synthesis reaction, which comprises: calcining an initial γ-alumina support material at a temperature to produce a modified alumina support material; impregnating the modified alumina support material with a source of cobalt; calcining the impregnated support material, activating the catalyst with a reducing gas, steam treating the activated catalyst, and activating the steam treated catalyst with a reducing gas.06-14-2012
20130012606FISCHER-TROPSCH SYNTHESIS - A process for the preparation of an F-T catalyst in which the presence of alkaline earth metals is minimized in the support itself and in the processing conditions, in order to provide a catalyst with an alkaline earth metal content of less than 2000 ppm.01-10-2013
20130143736Attrition Resistant Supports for Fischer-Tropsch Catalyst and Process for Making Same - The invention relates to a novel method of preparing attrition resistance spinel supports for Fischer Tropsch catalysts. The process comprises: (a) combining aluminum oxide, metal compound capable of forming spinel phase, and soluble compound of a trivalent aluminum; (b) mixing the combination resulting in (a) in a manner sufficient to form a slurry comprising the aforementioned combination; and (c) processing the mixture of (b) under conditions sufficient to form metal aluminate spinel composition. Metal aluminate spinel, for example, is formed in the last step by calcining the mixture from (b) at a temperature in the range of 700 to 1300° C., but the process is also capable, of producing attrition resistant supports (e.g., having a DI of 5 or less) at a relatively lower temperature in the range of 700 to 1050° C. The invention also produces the attrition resistance with lower metal loadings than that reported for prior attrition resistant spinel supports.06-06-2013
20130184360CATALYST TREATMENT - A method of preparing a Fischer-Tropsch catalyst for handling, storage, transport and deployment, including the steps of impregnating a porous support material with a source of cobalt, calcining the impregnated support material activating the catalyst, and passivating the activated catalyst.07-18-2013
20130199966FISCHER-TROPSCH CATALYSTS - A method of producing an aluminium oxide supported catalyst for use in a Fischer-Tropsch synthesis reaction, which comprises: spray-drying a slurry of γ-alumina and a source of a spinel forming metal to form a solid precursor material; calcining the precursor material to form a modified support material including a metal aluminate spinel; impregnating the modified alumina support material with a source of cobalt; calcining the impregnated support material, and activating the catalyst.08-08-2013
20130210939FISCHER-TROPSCH CATALYST REGENERATION - A process for the regeneration of deactivated catalyst from a Fischer-Tropsch synthesis reactor, the catalyst being a supported cobalt catalyst. The process comprises the following steps: a withdrawal step, in which a portion of deactivated catalyst together with liquid hydrocarbon is withdrawn from the reactor; a concentration step, in which the concentration of the catalyst in the liquid hydrocarbon is increased; a calcination step, in which the deactivated catalyst composition is subjected to an oxidising gas to oxidise carbonaceous material contained in the deactivated catalyst in to gaseous oxides of the components of the carbonaceous material; and a reactivation step, in which the deactivated catalyst composition is reactivated to produced a regenerated catalyst.08-15-2013

Patent applications by Sigrid Eri, Ranheim NO

Takeshi Eri, Hitachi JP

Patent application numberDescriptionPublished
20090160026Nitride semiconductor free-standing substrate and method for making same - A nitride semiconductor free-standing substrate includes a nitride semiconductor crystal and an inversion domain with a density of not less than 10/cm06-25-2009
20110006397Group III nitride semiconductor free-standing substrate and method of manufacturing the same, group III nitride semiconductor device and method of manufacturing the same - A group III nitride semiconductor free-standing substrate includes an as-grown surface, more than half of a region of the as-grown surface including a single crystal plane. The single crystal plane includes an off-angle inclined in an m-axis or a-axis direction from a C-plane with a group III polarity, or in a c-axis or a-axis direction from an M-plane.01-13-2011

Takeshi Eri, Hitachi-Shi JP

Patent application numberDescriptionPublished
20100258812GROUP-III NITRIDE SEMICONDUCTOR FREESTANDING SUBSTRATE AND MANUFACTURING METHOD OF THE SAME - To provide a group-III nitride semiconductor freestanding substrate, with carrier concentration of a peripheral part of a n-type group-III nitride semiconductor freestanding substrate set to be lower than the carrier concentration inside of the peripheral part. In this freestanding substrate, preferably value Δσ obtained by dividing a difference between a maximum value of the carrier concentration and a minimum value of the carrier concentration in a surface of the freestanding substrate by the maximum value of the carrier concentration is greater than 0.05, and the carrier concentration in any place in the surface of the freestanding substrate exceeds 5.0×1010-14-2010

Yoshifumi Eri, Kanagawa JP

Patent application numberDescriptionPublished
20130059244SILICA PARTICLES, ELECTROSTATIC IMAGE DEVELOPING TONER, DEVELOPER FOR DEVELOPING ELECTROSTATIC IMAGES, AND METHOD OF FORMING IMAGES - Silica particles have a volume average particle diameter in a range of from about 80 nm to about 300 nm, an average degree of circularity in a range of from about 0.920 to about 0.935, and a geometric standard deviation of the degree of circularity in a range of from about 1.02 to about 1.15.03-07-2013
20140112677IMAGE FORMING APPARATUS - An image forming apparatus includes a toner image forming unit that forms and continuously transfers a toner image based on image data onto a transported sheet from the front to the rear in a sheet transport direction as the sheet is transported, a fixing unit positioned downstream of the toner image forming unit in the transport direction and that fixes the transferred toner image onto the sheet, an image determining unit that determines whether the formed toner image is a scattering toner image that causes toner scattering during the transfer, and a speed controlling unit that controls, when it is determined that the toner image is a scattering toner image, a transport speed of the sheet and a transfer speed of the toner image to the sheet such that the speeds are slower than those when it is determined that the toner image is not a scattering toner image.04-24-2014
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