Dorsh
Cari L. Dorsh, Corvallis, OR US
Patent application number | Description | Published |
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20080262222 | Near infrared dyes - Near infrared (NIR) dyes, image recording substrate including the NIR dye, and methods of making the NIR dyes, are disclosed. | 10-23-2008 |
Cari L. Dorsh, Mcminnville, OR US
Patent application number | Description | Published |
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20090086601 | Methods and apparatus for merging pre-rendered and dynamic optical-storage label indicia - An optical storage disc label recorder includes a first memory portion adapted for storing a first set of track-marking data, the first set of track-marking data defining one or more pre-defined images, each pre-defined image having one or more pre-defined fields for dynamic text content, a second memory portion for storing a second set of track-marking data including the dynamic text content, and a digital processor adapted for combining the first and second sets of track-marking data. | 04-02-2009 |
Tom Dorsh, Mcminnville, OR US
Patent application number | Description | Published |
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20110256726 | PLASMA ACTIVATED CONFORMAL FILM DEPOSITION - Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film. | 10-20-2011 |
20140209562 | PLASMA ACTIVATED CONFORMAL FILM DEPOSITION - Methods of depositing a film on a substrate surface include surface mediated reactions in which a film is grown over one or more cycles of reactant adsorption and reaction. In one aspect, the method is characterized by the following operations: (a) exposing the substrate surface to a first reactant in vapor phase under conditions allowing the first reactant to adsorb onto the substrate surface; (b) exposing the substrate surface to a second reactant in vapor phase while the first reactant is adsorbed on the substrate surface; and (c) exposing the substrate surface to plasma to drive a reaction between the first and second reactants adsorbed on the substrate surface to form the film. | 07-31-2014 |