Patent application number | Description | Published |
20090186980 | MANUFACTURING METHOD OF LOW-K THIN FILMS AND LOW-K THIN FILMS MANUFACTURED THEREFROM - The present invention relates to a method of manufacturing a low-k thin film and the low-k thin film manufactured therefrom. More specifically, the method of manufacturing a low-k thin film in accordance with an embodiment of the present invention includes subjecting thin film, which is formed by plasma polymerization, to post-heat treatment using an RTA device, and low-k thin film manufactured therefrom. | 07-23-2009 |
20110053800 | METHOD OF MANUFACTURING PATTERNED SUBTRATE FOR CULTURING CELLS, PATTERNED SUBTRATE FOR CULTURING CELLS, PATTERNING METHOD OF CULTURING CELLS, AND PATTERNED CELL CHIP - The present invention relates to a method of manufacturing a patterned substrate for culturing cells, comprising the steps of: (1) preparing a substrate; (2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate; (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma. | 03-03-2011 |
20140190565 | POLYMER/INORGANIC MULTI-LAYER ENCAPSULATION FILM - This invention relates to a polymer/inorganic multi-layer encapsulation film, and more particularly, to a multi-layer encapsulation film, which includes a plasma polymer thin film layer formed using a cross-shaped precursor having Si—O bonding and an inorganic thin film layer, and ensures flexibility and has improved encapsulation. | 07-10-2014 |
20140255968 | METHOD FOR FABRICATING A PATTERNED SUBSTRATE FOR A CELL CULTURE, A PATTERNED SUBSTRATE FOR CELL CULTURE, AND A CELL CHIP - The present invention relates to a method for fabricating a patterned substrate for a cell culture, comprising the steps of: (1) preparing a substrate; (2) depositing a plasma polymer layer by using a precursor material on the substrate; (3) placing a shadow mask having a predetermined pattern on the plasma polymer layer; (4) treating the substrate, having the shadow mask placed thereon, with a reactive gas using plasma; and (5) removing the shadow mask from the substrate, and a patterned substrate for the cell culture fabricated thereby. The invention also relates to a method for a cell culture with a pattern, comprising the step of culturing cells on the patterned substrate for the cell culture, and a patterned cell chip, and a method of screening a material having an activity of inducing or promoting angiogenesis using the patterned cell chip. | 09-11-2014 |
20140257450 | TUBE WITH MODIFIED INNER WALL SURFACE USING PLASMA AND A PREPARATION METHOD THEREOF - The present invention relates to a preparation method of a tube and a transplantable polymer tube prepared by such method, which includes modifying the inner surface of a tube using plasma. A preparation method of a tube may include preparing a tube, modifying the inner surface of the tube using microplasma so as to have reactivity, forming a thin film layer on the modified surface of the tube to prevent aging or impart adhesiveness, and modifying the surface of the thin film layer using microplasma so as to enhance cell adhesion thereon. | 09-11-2014 |
20150048487 | PLASMA POLYMERIZED THIN FILM HAVING HIGH HARDNESS AND LOW DIELECTRIC CONSTANT AND MANUFACTURING METHOD THEREOF - The present invention relates to a plasma polymerized thin film having high hardness and a low dielectric constant and a manufacturing method thereof, and in particular, relates to a plasma polymerized thin film having high hardness and a low dielectric constant for use in semiconductor devices, which has improved mechanical strength properties such as hardness and elastic modulus while having a low dielectric constant, and a manufacturing method thereof. | 02-19-2015 |
20150232806 | Method of manufacturing patterned substrate for culturing cells, patterned substrate for culturing cells, patterning method of culturing cells, and patterned cell chip - The present invention relates to a method of manufacturing a patterned substrate for culturing cells, comprising the steps of: (1) preparing a substrate; (2) forming a first plasma polymer layer by integrating a first precursor material using a plasma on the substrate; (3) placing a shadow mask having a predetermined pattern on the first plasma polymer layer; and (4) forming a second patterned plasma polymer layer by integrating a second precursor material using a plasma. | 08-20-2015 |